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    • 10. 发明授权
    • Method for fabricating a high pressure piezoresistive transducer
    • 制造高压压阻式换能器的方法
    • US5702619A
    • 1997-12-30
    • US723519
    • 1996-09-30
    • Anthony D. KurtzAndrew V. BemisTimothy A. NunnAlexander A. Ned
    • Anthony D. KurtzAndrew V. BemisTimothy A. NunnAlexander A. Ned
    • G01L9/00H01L21/00B44C1/22
    • G01L9/0055
    • A method of fabricating a high pressure piezoresistive pressure transducer having a substantially linear pressure versus stress output over its full range of operation. The method involves bonding a carrier wafer having a dielectric isolating layer on one surface and a supporting member on the opposite surface, to a pattern wafer containing at least two single crystalline longitudinal piezoresistive sensing elements of a second conductivity. Both the pattern wafer and sections of the carrier wafer are etched leaving the piezoresistive sensing elements bonded directly to the dielectric isolating layer, and a diaphragm member having a deflecting portion and a non-deflecting portion. The diaphragm member is constructed to have an aspect ratio which is of the order of magnitude of one. The piezoresistive sensing elements have a large transverse piezoresistive coefficient normal to the plane of the diaphragm and both a large longitudinal piezoresistive coefficient and a small transverse piezoresistive coefficient in the plane of the diaphragm. One of the at least two piezoresistive sensing elements is positioned above the non-deflection portion of the diaphragm in an area of minimal longitudinal stress and the other is positioned above the deflecting portion of the diaphragm in an area of high compressive stress. The positioning of the second sensor over the deflecting portion of the diaphragm is selected so that there will be equal and opposite resistance changes registered from the sensors. The method results in an improved transducer design when compared to prior art devices.
    • 一种制造高压压阻式压力传感器的方法,该压力传感器在其全部操作范围内具有基本线性的压力与应力输出。 该方法包括将具有介电隔离层的载体晶片和相对表面上的支撑构件结合到包含至少两个具有第二导电性的单晶纵向压阻式感测元件的图案晶片。 蚀刻晶片和载体晶片的两个部分,留下直接结合到绝缘隔离层的压阻感测元件,以及具有偏转部分和非偏转部分的隔膜部件。 隔膜构件被构造成具有一个数量级的纵横比。 压阻感测元件具有垂直于隔膜平面的大的横向压阻系数,并且在隔膜平面中具有大的纵向压阻系数和小的横向压阻系数。 至少两个压阻感测元件中的一个在最小纵向应力的区域中位于隔膜的非偏转部分上方,另一个位于隔膜的偏转部分的高压缩应力区域的上方。 选择第二传感器在隔膜的偏转部分上的定位,使得从传感器注册相同和相反的阻力变化。 与现有技术的装置相比,该方法导致改进的换能器设计。