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1. 发明申请

US20060023351A1 Bilayer coil insulation for magnetic write heads to minimize pole recession 有权
标题翻译：用于磁性写头的双层线圈绝缘，以尽量减少极限衰退
公开(公告)号：US20060023351A1
公开(公告)日：2006-02-02
申请号：US10903341
申请日：2004-07-30
申请人： Andrew Chiu , Edward Lee , John Yang , Michael Yang , Sue Zhang
发明人： Andrew Chiu , Edward Lee , John Yang , Michael Yang , Sue Zhang
IPC分类号： G11B5/17
CPC分类号： G11B5/3163 , G11B5/17 , G11B5/1871
摘要： A magnetic write head for use in a data recording system having first and second magnetic pole, the first pole having a P1 pedestal. An electrically conductive coil passes through a space between the first and second poles for inducing a magnetic flux through the yoke formed by the first and second poles. A bi-layer insulation layer disposed between the poles includes a layer of photoresist for preventing voids and a layer of alumina formed thereover to provide a structural brace to prevent recession of the P1 pedestal during manufacturing operations such as soda blast.
摘要翻译：一种用于具有第一和第二磁极的数据记录系统的磁性写头，所述第一极具有P1基座。导电线圈通过第一和第二极之间的空间，用于引导通过由第一和第二极形成的轭的磁通。设置在极之间的双层绝缘层包括用于防止空隙的光致抗蚀剂层和形成在其上的氧化铝层，以提供结构支架，以防止诸如苏打爆炸的制造操作期间P1基座的凹陷。

2. 发明申请

US20050083606A1 Write head design with improved bump to control write saturation 失效
标题翻译：写头设计具有改进的凸块来控制写入饱和度
公开(公告)号：US20050083606A1
公开(公告)日：2005-04-21
申请号：US10687284
申请日：2003-10-15
申请人： Edward Lee , Katalin Pentek , Yong Shen , Sue Zhang
发明人： Edward Lee , Katalin Pentek , Yong Shen , Sue Zhang
IPC分类号： G11B5/127 , G11B5/147 , G11B5/60
CPC分类号： G11B5/60 , G11B5/127 , G11B5/147
摘要： A magnetic head having an air bearing surface (ABS) and a first pole tip. A second pole tip is spaced apart from and facing the upper end of the first pole tip across a write gap. A bump extends into a portion of the upper end of the first pole tip and a portion of the bottom end of the second pole tip, the bump being positioned away from the ABS. The bump defines a throat height of the first and second pole tips.
摘要翻译：具有空气轴承表面（ABS）和第一极端的磁头。第二极尖与间隙隔开并面对第一极尖的上端。凸块延伸到第一极尖端的上端的一部分和第二极尖的底端的一部分，凸块被定位成远离ABS。凸块限定第一和第二极尖的喉部高度。

3. 发明申请

US20050237666A1 Magnetic write head with recessed overcoat 失效
标题翻译：磁性写头与凹进的大衣
公开(公告)号：US20050237666A1
公开(公告)日：2005-10-27
申请号：US10831834
申请日：2004-04-26
申请人： Wen-Chien Hsiao , Wipul Jayasekara , Edward Lee , Vladimir Nikitin , Patrick Webb , Sue Zhang
发明人： Wen-Chien Hsiao , Wipul Jayasekara , Edward Lee , Vladimir Nikitin , Patrick Webb , Sue Zhang
IPC分类号： G11B5/127 , G11B5/147 , G11B5/31
CPC分类号： G11B5/1278 , G11B5/3143
摘要： A magnetoresistive read/write head having a first layer of alumina and a second layer of silicon dioxide overlaying a P3 layer of the head. In a preferred embodiment, the silicon dioxide layer is recessed away from an Air Bearing Surface (ABS) to reduce protrusion of a P2 layer and the P3 layer in the head, and to reduce degradation in the magnetic properties of the pole tips of the P2 and P3 layer ends.
摘要翻译：具有第一氧化铝层和覆盖头部的P 3层的第二二氧化硅层的磁阻读写头。在优选实施例中，二氧化硅层从空气轴承表面（ABS）凹入，以减少头部中的P 2层和P 3层的突出，并且降低磁头的磁性能的降低 P 2和P 3层结束。

4. 发明申请

US20070026537A1 Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer 失效
标题翻译：使用CMP剥离层和耐电层制造用于垂直记录的磁头的方法
公开(公告)号：US20070026537A1
公开(公告)日：2007-02-01
申请号：US11184364
申请日：2005-07-18
申请人： Ming Jiang , Sue Zhang , Yi Zheng
发明人： Ming Jiang , Sue Zhang , Yi Zheng
IPC分类号： G11B5/33 , H01L21/00
CPC分类号： G11B5/3163 , G11B5/1278
摘要： A method using a CMP resistant hardmask in a process of fabricating a pole piece for a magnetic head is described. A set of layers used as the mask for milling the pole piece preferably includes a CMP resistant hardmask of silicon dioxide, a resist hardmask, an upper hardmask and a photoresist mask respectively. A multi-step reactive-ion etching (RIE) process is preferably used to sequentially remove the excess materials in the layer stack to ultimately define the multilayer mask for the pole piece. The excess pole piece material is then milled away. The wafer is then refilled with a nonmagnetic material such as alumina. A CMP liftoff is used to remove the resist hardmask. The material for the CMP resistant hardmask is selected to have a high resistance to the CMP liftoff process in comparison to the refill material. The CMP resistant hardmask is preferably then removed by a RIE process.
摘要翻译：描述了在制造用于磁头的极片的工艺中使用CMP耐磨硬掩模的方法。作为用于研磨极片的掩模的一组层优选分别包括二氧化硅的CMP耐磨硬掩模，抗蚀剂硬掩模，上硬掩模和光致抗蚀剂掩模。优选使用多步反应离子蚀刻（RIE）工艺来顺序地去除层叠中的多余材料以最终限定极片的多层掩模。然后将多余的极片材料磨掉。然后用非磁性材料如氧化铝再填充晶片。 CMP剥离用于去除抗蚀剂硬掩模。选择用于CMP耐磨硬掩模的材料以与补充材料相比具有对CMP剥离工艺的高抗性。然后优选通过RIE工艺去除CMP耐磨硬掩模。

5. 发明申请

US20050152064A1 Magnetic head coil system and damascene/reactive ion etching method for manufacturing the same 失效
标题翻译：磁头线圈系统和镶嵌/反应离子蚀刻方法制造相同
公开(公告)号：US20050152064A1
公开(公告)日：2005-07-14
申请号：US11040387
申请日：2005-01-20
申请人： Daniel Bedell , Richard Hsiao , James Jarratt , Patrick Webb , Sue Zhang
发明人： Daniel Bedell , Richard Hsiao , James Jarratt , Patrick Webb , Sue Zhang
IPC分类号： G11B5/17 , G11B5/31 , G11B5/147
CPC分类号： G11B5/313 , G11B5/3123 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/4906 , Y10T29/49064 , Y10T29/49073
摘要： A system and method are provided for manufacturing a coil structure for a magnetic head. Initially, an insulating layer is deposited with a photoresist layer deposited on the insulating layer. Moreover, a silicon dielectric layer is deposited on the photoresist layer as a hard mask. The silicon dielectric layer is then masked. A plurality of channels is subsequently formed in the silicon dielectric layer using reactive ion etching (i.e. CF4/CHF3). The silicon dielectric layer is then used as a hard mask to transfer the channel pattern in the photoresist layer using reactive ion etching with, for example, H2/N2/CH3F/C2H4 reducing chemistry. To obtain an optimal channel profile with the desired high aspect ratio, channel formation includes a first segment defining a first angle and a second segment defining a second angle. Thereafter, a conductive seed layer is deposited in the channels and the channels are filled with a conductive material to define a coil structure. Chemical-mechanical polishing may then be used to planarize the conductive material.
摘要翻译：提供一种用于制造用于磁头的线圈结构的系统和方法。首先，沉积有沉积在绝缘层上的光致抗蚀剂层的绝缘层。此外，硅介电层作为硬掩模沉积在光致抗蚀剂层上。然后掩蔽硅介电层。随后使用反应离子蚀刻（即CF 4 / CH 3）3在硅介电层中形成多个通道。然后将硅介电层用作硬掩模，以使用例如H 2/2 N 2 / CH的反应离子蚀刻将光致抗蚀剂层中的沟道图案转印还原化学反应。为了获得具有期望的高纵横比的最佳通道轮廓，通道形成包括限定第一角度的第一段和限定第二角度的第二段。此后，导电种子层沉积在通道中，并且通道填充有导电材料以限定线圈结构。然后可以使用化学机械抛光来平坦化导电材料。

6. 发明申请

US20060231523A1 Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling 有权
标题翻译：使用CMP和反应离子铣削的组合来平面化垂直写入极的方法
公开(公告)号：US20060231523A1
公开(公告)日：2006-10-19
申请号：US11453681
申请日：2006-06-14
申请人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Robertson , Sue Zhang
发明人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Robertson , Sue Zhang
IPC分类号： B44C1/22 , G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/1871 , G11B5/3169 , Y10T29/49032 , Y10T29/49039 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
摘要翻译：垂直写头包括具有限定轨道宽度并且具有平坦化表面并且在其两侧和下方由氧化铝层封装的角的倾斜主极，所述氧化铝层具有抛光表面并且在其两侧的主极上方延伸作为步骤。

7. 发明申请

US20060028762A1 Perpendicular write pole formation using durimide/alumina hard mask without CMP liftoff 失效
标题翻译：使用耐磨酰亚胺/氧化铝硬掩模的无垂直写磁极形成，无CMP剥离
公开(公告)号：US20060028762A1
公开(公告)日：2006-02-09
申请号：US11195532
申请日：2005-08-01
申请人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Zhang
发明人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Zhang
IPC分类号： G11B5/127
CPC分类号： G11B5/1871 , G11B5/1278 , G11B5/3163 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.
摘要翻译：垂直写头包括主极，其包括形成在层压层工艺上的Durimide /氧化铝硬掩模，以形成主极，而不使用剥离或化学机械抛光工艺，从而避免极的圆角，主极被控制在形状，用于改善斜面的轨道宽度和角度的临界尺寸的控制，以避免不期望的相邻轨道写入。

8. 发明申请

US20050277299A1 Methods for fabricating read sensor for magnetic heads with reduced read track width 失效
标题翻译：用于制造磁头读取传感器的方法，读取磁道宽度减小
公开(公告)号：US20050277299A1
公开(公告)日：2005-12-15
申请号：US10856679
申请日：2004-05-28
申请人： Quang Le , Sue Zhang
发明人： Quang Le , Sue Zhang
IPC分类号： G11B5/31 , H01L21/311 , H01L21/314
CPC分类号： C23C16/44 , G11B5/3163 , G11B5/3169 , H01L21/3146
摘要： The fabrication of the read head sensor components where chemical mechanical polishing (CMP) stop layer is deposited above the sensor layers, a first reactive ion etch (RIE) layer and a second RIE layer are deposited, where the second RIE layer is etchable with a different ion species than the first RIE layer. A stencil layer is then deposited and patterned to create an etching stencil having the desired magnetic read track width of the sensor. An RIE step is then conducted in which the second RIE layer is etched. An RIE step for the first RIE layer is then conducted with a different ion species. Thereafter, the sensor layers are milled where the remaining portions of the first and second RIE layers act as a milling mask. A CMP assisted liftoff step is then conducted in which the remaining portions of the ion milling mask are removed.
摘要翻译：沉积化学机械抛光（CMP）停止层沉积在传感器层上方，第一反应离子蚀刻（RIE）层和第二RIE层的读取头传感器部件的制造，其中第二RIE层可以用不同的离子种类比第一个RIE层。然后沉积和图案化模板层以产生具有传感器的期望磁读取磁道宽度的蚀刻模版。然后进行RIE步骤，其中蚀刻第二RIE层。然后用不同的离子种类进行第一RIE层的RIE步骤。此后，将第一和第二RIE层的剩余部分用作铣削掩模的传感器层进行研磨。然后进行CMP辅助剥离步骤，其中除去离子铣削掩模的剩余部分。

9. 发明申请

US20050264949A1 Recessed SiO2 or Si3N4 overcoat for GMR head in magnetic disk drive 审中-公开
标题翻译：用于磁盘驱动器中的GMR磁头的嵌入式SiO2或Si3N4外涂层
公开(公告)号：US20050264949A1
公开(公告)日：2005-12-01
申请号：US10857036
申请日：2004-05-28
申请人： Yunxiao Gao , Aron Pentek , Alan Tam , Sue Zhang
发明人： Yunxiao Gao , Aron Pentek , Alan Tam , Sue Zhang
IPC分类号： G11B5/127 , G11B5/31 , G11B5/33
CPC分类号： G11B5/3136 , G11B5/3106 , G11B5/3133 , G11B5/3163 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A giant magnetoresistive (GMR) head contains an overcoat layer consisting of silicon dioxide or silicon nitride. These materials have a coefficient of thermal expansion (CTE) that is less than alumina, which is conventionally used for the overcoat layer. As a result, the overcoat layer exhibits a smaller temperature-induced protrusion when the head heats up from friction with the passing air stream. The process of forming the head includes forming a recess in the overcoat layer that reduces the stress on the poles and improves the performance of the head. The process includes depositing a seed layer over the overcoat layer in preparation to plating a metal mask layer with an opening where the recess is to be formed, wet chemical etching the seed layer through the opening in the mask layer and performing an ion milling process to remove any remaining traces of the seed layer. With the seed layer completely removed, a trench having smooth sidewalls and bottom can be etched in the overcoat layer by a reactive ion etch (RIE) process. The saw that is used to separate the head elements in the wafer can be passed through the clean trench without contacting the overcoat layer, thereby avoiding the chipping and cracking that might otherwise result from the use of a silicon dioxide or silicon nitride overcoat layer.
摘要翻译：巨磁阻（GMR）磁头包含由二氧化硅或氮化硅组成的外涂层。这些材料的热膨胀系数（CTE）小于通常用于外涂层的氧化铝。结果，当头部与通过的空气流的摩擦加热时，外涂层表现出较小的温度引起的突起。形成头部的过程包括在外涂层中形成凹陷，其减小了磁极上的应力并提高了磁头的性能。该方法包括在外涂层上沉积种子层，以准备对具有要形成凹部的开口镀金属掩模层，通过掩模层中的开口湿化学蚀刻晶种层并执行离子铣削加工去除种子层的剩余痕迹。随着种子层完全去除，可以通过反应离子蚀刻（RIE）工艺在覆盖层中蚀刻具有平滑侧壁和底部的沟槽。用于分离晶片中的头元件的锯可以通过干净的沟槽而不与外涂层接触，从而避免由于使用二氧化硅或氮化硅外涂层而导致的切屑和裂纹。

10. 发明申请

US20050241140A1 High milling resistance write pole fabrication method for perpendicular recording 失效
标题翻译：用于垂直记录的高铣削电阻写极制造方法
公开(公告)号：US20050241140A1
公开(公告)日：2005-11-03
申请号：US10836867
申请日：2004-04-30
申请人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas Werner , Sue Zhang
发明人： Amanda Baer , Quang Le , Kim Lee , Aron Pentek , Douglas Werner , Sue Zhang
IPC分类号： G11B5/127 , G11B5/187
CPC分类号： G11B5/1871 , G11B5/3116 , G11B5/3163 , Y10T29/49021 , Y10T29/49043
摘要： A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
摘要翻译：一种用于构造锥形写入极的方法，该方法包括使用双层硬掩模。

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