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1. 发明申请

US20100183962A1 METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM 有权
标题翻译：用于检查污染物限制和EUV投影曝光系统的方法
公开(公告)号：US20100183962A1
公开(公告)日：2010-07-22
申请号：US12690571
申请日：2010-01-20
申请人： Andreas DORSEL , Stefan Schmidt
发明人： Andreas DORSEL , Stefan Schmidt
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70916 , G03F7/70425 , G03F7/70608 , G03F7/7075 , G03F7/70808 , G03F7/70866 , G03F7/70925 , G03F7/70983
摘要： A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed. By rejecting wafers having an especially high contamination risk, the contamination of optical elements in the projection exposure system (1) on wafer exposure may be distinctly reduced.
摘要翻译：关于污染极限检查至少一个晶片（13）的方法，其中关于抗污染物质（13a）的晶片（13）的抗蚀剂（13a）的污染潜力被检测为污染物质晶片（13）在EUV投影曝光系统（1）中曝光之前的污染极限。该方法优选地包括：将晶片（13）和/或涂覆有与晶片（13）的抗蚀剂（13a）相同的抗蚀剂（13a）的测试盘放置在真空室（19）中，抽真空室 19），并且测量从真空室（19）中的晶片（13）脱气的污染物质的污染潜力，并且还将晶片（13）的污染电位与污染极限进行比较。还公开了一种用于执行该方法的EUV投影曝光系统（1）。通过拒绝具有特别高的污染风险的晶片，可以明显减少投影曝光系统（1）中晶片曝光的光学元件的污染。

2. 发明授权

US08288064B2 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system 有权
标题翻译：关于污染极限和EUV投影曝光系统检查晶片的方法
公开(公告)号：US08288064B2
公开(公告)日：2012-10-16
申请号：US13153662
申请日：2011-06-06
申请人： Andreas Dorsel , Stefan Schmidt
发明人： Andreas Dorsel , Stefan Schmidt
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70916 , G03F7/70425 , G03F7/70608 , G03F7/7075 , G03F7/70808 , G03F7/70866 , G03F7/70925 , G03F7/70983
摘要： A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed. By heating wafers having a high contamination risk, the contamination of optical elements in the projection exposure system (1) on wafer exposure may be distinctly reduced.
摘要翻译：关于污染极限检查至少一个晶片（13）的方法，其中关于抗污染物质（13a）的晶片（13）的抗蚀剂（13a）的污染潜力被检测为污染物质晶片（13）在EUV投影曝光系统（1）中曝光之前的污染极限。该方法优选地包括：将晶片（13）和/或涂覆有与晶片（13）的抗蚀剂（13a）相同的抗蚀剂（13a）的测试盘放置在真空室（19）中，抽真空室 19），并且测量从真空室（19）中的晶片（13）脱气的污染物质的污染潜力，并且还将晶片（13）的污染电位与污染极限进行比较。还公开了一种用于执行该方法的EUV投影曝光系统（1）。通过加热具有高污染风险的晶片，可以明显减少投影曝光系统（1）中的晶片曝光的光学元件的污染。

3. 发明授权

US07955767B2 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system 有权
标题翻译：关于污染极限和EUV投影曝光系统检查晶片的方法
公开(公告)号：US07955767B2
公开(公告)日：2011-06-07
申请号：US12690571
申请日：2010-01-20
申请人： Andreas Dorsel , Stefan Schmidt
发明人： Andreas Dorsel , Stefan Schmidt
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70916 , G03F7/70425 , G03F7/70608 , G03F7/7075 , G03F7/70808 , G03F7/70866 , G03F7/70925 , G03F7/70983
摘要： A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed. By rejecting wafers having an especially high contamination risk, the contamination of optical elements in the projection exposure system (1) on wafer exposure may be distinctly reduced.
摘要翻译：关于污染极限检查至少一个晶片（13）的方法，其中关于抗污染物质（13a）的晶片（13）的抗蚀剂（13a）的污染潜力被检测为污染物质晶片（13）在EUV投影曝光系统（1）中曝光之前的污染极限。该方法优选地包括：将晶片（13）和/或涂覆有与晶片（13）的抗蚀剂（13a）相同的抗蚀剂（13a）的测试盘放置在真空室（19）中，抽真空室 19），并且测量从真空室（19）中的晶片（13）脱气的污染物质的污染潜力，并且还将晶片（13）的污染电位与污染极限进行比较。还公开了一种用于执行该方法的EUV投影曝光系统（1）。通过拒绝具有特别高的污染风险的晶片，可以明显减少投影曝光系统（1）中晶片曝光的光学元件的污染。

4. 发明授权

US07815437B2 Spotlight for illumination in film, studio, event or theatre environments 有权
标题翻译：在电影，演播室，活动或剧院环境中聚光灯
公开(公告)号：US07815437B2
公开(公告)日：2010-10-19
申请号：US12311762
申请日：2007-10-11
申请人： Klaus Stegmaier , Michael Jonischkeit , Christian Friedinger , Stefan Schmidt
发明人： Klaus Stegmaier , Michael Jonischkeit , Christian Friedinger , Stefan Schmidt
IPC分类号： H01R39/00 , H01R35/00
CPC分类号： H01R35/02 , F21V23/06 , F21W2131/406
摘要： A spotlight for illumination in film, studio, event or theatre environments, with an electrical terminal for connecting the spotlight to a supply line for supplying electricity to the spotlight, is provided. The electrical terminal is rotatably mounted on the spotlight and can be matched in terms of its alignment, so as to connect the spotlight to the supply line. The position of the electrical terminal can be matched in dependence on the arrangement of the spotlight, in order to supply the electric supply line to the spotlight from different directions.
摘要翻译：提供了电影，演播室，事件或剧院环境中的照明的聚光灯，其中设有用于将聚光灯连接到用于向聚光灯供电的电源线的电气端子。电气端子可旋转地安装在聚光灯上，并且可以在其对准方面匹配，以将聚光灯连接到供应线。可以根据聚光灯的布置来匹配电气端子的位置，以便从不同的方向向聚光灯提供电源线。

5. 发明授权

US07370569B2 Hydraulic drive 失效
标题翻译：液压驱动
公开(公告)号：US07370569B2
公开(公告)日：2008-05-13
申请号：US10557023
申请日：2004-05-14
申请人： Stefan Schmidt , Rolf Heidenfelder
发明人： Stefan Schmidt , Rolf Heidenfelder
IPC分类号： F15B13/04 , F15B15/17
CPC分类号： B30B15/16 , B30B15/161 , F03C1/007 , F15B11/022 , F15B11/024 , F15B11/028 , F15B11/036 , F15B2211/20592 , F15B2211/3133 , F15B2211/6653
摘要： What is disclosed is a hydraulic drive mechanism for a blanking or forming machine comprising a working cylinder having several pressure chambers, the piston of which acts directly or indirectly on a workpiece to be processed, wherein at least one pressure chamber of the working cylinder for retracting and extending the piston is adapted to be subjected to a tank pressure or a supply pressure via a continuously adjustable valve, and comprising a valve assembly arranged upstream of the continuously adjustable valve, whereby an inlet port of the continuously adjustable valve may be subjected to a higher or lower supply pressure, wherein the valve assembly comprises a switching valve adapted to be switched over between a basic position and a switching position in dependence on the load pressure at the working cylinder in order to tap the supply pressure from a low-pressure source or from a high-pressure source.
摘要翻译：所公开的是一种用于冲裁或成型机的液压驱动机构，其包括具有多个压力室的工作缸，该工作缸的活塞直接或间接地作用在待加工的工件上，其中用于回缩的工作缸的至少一个压力室并且延伸的活塞适于经由连续可调节的阀进行罐压力或供给压力，并且包括设置在连续可调节阀的上游的阀组件，由此可连续调节的阀的入口可以经受更高或更低的供应压力，其中阀组件包括适于根据工作气缸处的负载压力在基本位置和开关位置之间切换的切换阀，以便从低压源或来自高压源。

6. 发明申请

US20060283176A1 Method and apparatus for regenerating a NOx trap and a particulate trap 审中-公开
标题翻译：用于再生NOx捕集器和颗粒捕集器的方法和装置
公开(公告)号：US20060283176A1
公开(公告)日：2006-12-21
申请号：US11155943
申请日：2005-06-17
申请人： Helmut Venghaus , Lee Watts , Andreas Mayr , Clive Telford , Marco Ranalli , Peter Kroner , David Herranz , Gregg Speer , Stefan Schmidt , A. Walleck
发明人： Helmut Venghaus , Lee Watts , Andreas Mayr , Clive Telford , Marco Ranalli , Peter Kroner , David Herranz , Gregg Speer , Stefan Schmidt , A. Walleck
IPC分类号： F01N3/00 , F01N3/10
CPC分类号： F01N3/0821 , F01N3/0253 , F01N3/0814 , F01N3/0842 , F01N3/0871 , F01N3/106 , F01N9/002 , F01N13/009 , F01N13/0097 , F01N2560/025 , F02D41/0275 , Y02T10/24 , Y02T10/47
摘要： An apparatus comprises an emission abatement device and a ratio oscillator. The emission abatement device comprises a NOx trap and a particulate trap. The ratio oscillator is configured to oscillate a ratio of the oxygen content and regenerative agent content of a flow advanced to the emission abatement device so as to alternately partially regenerate the NOx trap and the particulate trap for a plurality of cycles. An associated method is disclosed.
摘要翻译：一种装置包括发射减排装置和比率振荡器。减排装置包括NOx捕集器和颗粒捕集器。比率振荡器被配置为使前进到发射消除装置的流的氧含量和再生剂含量的比率摆动，以便多次循环地部分地再生NOx捕集器和颗粒捕集器。公开了一种相关联的方法。

7. 发明申请

US20060144632A1 Motor vehicle provided with a diesel propulsion engine 有权
标题翻译：汽车配备柴油推进发动机
公开(公告)号：US20060144632A1
公开(公告)日：2006-07-06
申请号：US10499897
申请日：2003-11-12
申请人： Marco Ranalli , Stefan Schmidt , Andreas Mayr , Jurgen Klement
发明人： Marco Ranalli , Stefan Schmidt , Andreas Mayr , Jurgen Klement
IPC分类号： B60K13/04
CPC分类号： F01N3/2033 , F01N3/0256 , F01N3/035 , F01N3/0814 , F01N3/0821 , F01N3/0885 , F01N3/36 , F01N3/38 , F01N5/02 , F01N13/009 , F01N2240/02 , F01N2250/06 , F01N2430/06 , F01N2610/03 , F01N2610/10 , F01N2610/107 , Y02A50/2322 , Y02T10/16 , Y02T10/26
摘要： A motor vehicle includes a diesel propulsion engine and an exhaust system that comprises a discontinuously regenerating exhaust gas purification system. A fuel evaporator unit serves to enrich engine exhaust gases with fuel vapors. The fuel evaporator unit is connected to a vehicle fuel tank, and is provided upstream of the exhaust gas purification system. The fuel evaporator unit includes a fuel evaporator in the form of a heat exchanger that is exposed to the exhaust gas stream. The heat exchanger has a fuel feed line and a fuel vapor discharge. The fuel evaporator unit also includes an auxiliary oxidizing converter connected upstream of the heat exchanger. A percentage of nonburned diesel fuel in the exhaust gases fed into the auxiliary oxidizing converters is adjustable using an enrichment device.
摘要翻译：机动车辆包括柴油推进发动机和包括不连续再生的废气净化系统的排气系统。燃料蒸发器单元用于利用燃料蒸气来丰富发动机废气。燃料蒸发器单元连接到车辆燃料箱，并且设置在废气净化系统的上游。燃料蒸发器单元包括暴露于废气流的热交换器形式的燃料蒸发器。热交换器具有燃料供给管线和燃料蒸气排出口。燃料蒸发器单元还包括连接在热交换器上游的辅助氧化转化器。供给到辅助氧化转化器中的废气中的非燃烧柴油的百分比可以使用浓缩装置来调节。

8. 发明授权

US06856388B2 Optical sensor for measuring the distance and/or inclination of a surface 失效
标题翻译：用于测量表面的距离和/或倾斜度的光学传感器
公开(公告)号：US06856388B2
公开(公告)日：2005-02-15
申请号：US10048334
申请日：2001-05-10
申请人： Stefan Schmidt
发明人： Stefan Schmidt
IPC分类号： G01B11/00 , G01B11/02 , G01B11/24 , G01B11/26
CPC分类号： G01B11/24 , G01B11/026
摘要： An optical sensor for measuring the distance and/or inclination of a surface, particularly relative to a reference plane, or for detecting the distance and/or change in inclination of a surface, wherein a light spot is generated on a detector in that a light beam that is collimated in a first direction is focused in a direction perpendicular to the first direction, so that a line focus is effected along the first direction on the surface and the line focus is imaged on the detector in the second direction and, at the same time, the beam that is reflected at the surface and collimated in the first direction is focused on the detector, wherein the line focus is perpendicular to the reflection plane defined by the impinging, reflected beam.
摘要翻译：一种光学传感器，用于测量表面的距离和/或倾斜度，特别是相对于参考平面，或用于检测表面的距离和/或倾斜度的变化，其中在检测器上产生光斑，因为光沿第一方向准直的光束在垂直于第一方向的方向上被聚焦，使得沿着表面上的第一方向实现线对焦，并且在第二方向上将线焦点成像在检测器上，并且在同时，在表面反射并沿第一方向准直的光束聚焦在检测器上，其中线焦点垂直于由入射的反射光束限定的反射平面。

9. 发明授权

US06594006B1 Method and array for detecting the position of a plane scanned with a laser scanner 失效
标题翻译：用于检测用激光扫描器扫描的平面的位置的方法和阵列
公开(公告)号：US06594006B1
公开(公告)日：2003-07-15
申请号：US09744122
申请日：2001-03-16
申请人： Dirk Muehlhoff , Guenther Rudolph , Stefan Schmidt , Gerhard Doering , Guenter Berthel , Thomas Hartmann
发明人： Dirk Muehlhoff , Guenther Rudolph , Stefan Schmidt , Gerhard Doering , Guenter Berthel , Thomas Hartmann
IPC分类号： G01B1126
CPC分类号： G05B19/402 , G05B2219/37558 , G05B2219/37563 , G05B2219/50028 , G05B2219/50133 , G05D3/12
摘要： A method and an arrangement for detecting the position of the plane XY of an object, which plane XY is to be scanned, and for its positioning in the focal plane X′Y′ of a laser scanner, preferably for a laser scanning microscope. According to the disclosure, it is provided in a method of the type described above that, after a rough orientation of the object carried out by placing on an object holder, a laser beam is directed successively in time to at least three different points P1, P2 . . . Pn located in the scan plane XY of the object and, in doing so, each of the reflections proceeding from the points P1, P2 . . . Pn is imaged on a position-sensitive detector, an actual position value is determined at the detector for each reflection and is compared with a stored reference position value, adjustment commands for changing the inclination of the object holder are obtained from the deviations of the actual position values from the reference position values, and the inclination of the object holder is changed on the basis of these adjustment commands until points P1, P2 . . . Pn are located in the focal plane X′Y′ of the laser scanner.
摘要翻译：一种用于检测物体的平面XY的位置的方法和装置，该平面XY将被扫描平面XY，并且用于其定位在激光扫描仪的焦平面X'Y'中，优选地用于激光扫描显微镜。根据本发明，提供了一种上述类型的方法，在通过放置在物体保持器上进行物体的粗略取向之后，将激光束在时间上连续地指向至少三个不同点P1， P2。。。 Pn位于物体的扫描平面XY中，并且在这样做时，每个反射从点P1，P2进行。。。 Pn在位置敏感检测器上成像，在检测器处为每次反射确定实际位置值，并与存储的参考位置值进行比较，从实际的偏差获得用于改变物体保持器的倾斜度的调节命令基准位置值的位置值，并且基于这些调整指令改变对象保持器的倾斜直到点P1，P2。。。 Pn位于激光扫描器的焦平面X'Y'中。

10. 发明授权

US10156038B2 Household appliance having an embossed wall 有权
公开(公告)号：US10156038B2
公开(公告)日：2018-12-18
申请号：US13131044
申请日：2009-12-07
申请人： Andreas Bohm , Klaus Försterling , Kemal Genc , Johannes Geyer , Stefan Schmidt
发明人： Andreas Bohm , Klaus Försterling , Kemal Genc , Johannes Geyer , Stefan Schmidt
IPC分类号： A47B77/06 , D06F39/12 , A47L15/42
摘要： A household appliance includes a cabinet-shaped housing comprised of a plurality of walls. At least one of the walls has an arrangement of embossings. The arrangement of embossings includes a first embossing arranged centered in relation to a center of the at least one wall and configured in the shape of a ring when viewed from above. A second embossing is arranged outside the first embossing in substantial concentric relationship to the first embossing and configured in the shape of a ring when viewed from above. At least one third embossing is arranged outside the second embossing and has a strip-shaped configuration. The presence of embossings in the at least one wall is able to reduce vibrations and thereby significantly reduce the amount of unwanted noise.

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