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1. 发明授权

US07423722B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07423722B2
公开(公告)日：2008-09-09
申请号：US10766526
申请日：2004-01-29
申请人： Albert Johannes Maria Jansen , Jan Jaap Kuit , Erik Roelof Loopstra , Raymond Laurentius Johannes Schrijver
发明人： Albert Johannes Maria Jansen , Jan Jaap Kuit , Erik Roelof Loopstra , Raymond Laurentius Johannes Schrijver
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70066 , G03F7/70425 , G03F7/70475 , G03F7/707
摘要： A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
摘要翻译：光刻设备具有适于在至少两个位置容纳掩模的掩模台，使得具有大于曝光场的图案区域的掩模可以通过首先在掩模的第一位置进行曝光，然后执行第二第二位置的面罩曝光。

2. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

3. 发明授权

US09414477B2 Radiation source, lithographic apparatus and device manufacturing method 有权
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：US09414477B2
公开(公告)日：2016-08-09
申请号：US12540548
申请日：2009-08-13
申请人： Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
发明人： Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/7085
摘要： A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.
摘要翻译：辐射源包括被配置为产生用于产生辐射源的辐射输出的辐射束的光束发生器，以及被配置为监视辐射束的光束监视器。光刻设备包括辐射源。一种器件制造方法包括通过利用第二类型的辐射束来产生第一类型的辐射，监测第二类型的辐射的质量，以及将第一类型的辐射的图案化的束投射到衬底上。

4. 发明授权

US09411250B2 Radiation system and lithographic apparatus 有权
标题翻译：辐射系统和光刻设备
公开(公告)号：US09411250B2
公开(公告)日：2016-08-09
申请号：US13062872
申请日：2009-04-30
申请人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Vladimir Vitalevich Ivanov , Vladimir Mihailovitch Krivtsun
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70175 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
摘要翻译：辐射系统被配置为产生辐射束。辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

6. 发明授权

US09152058B2 Lithographic apparatus and device manufacturing method involving a member and a fluid opening 有权
标题翻译：涉及构件和流体开口的平版印刷设备和设备制造方法
公开(公告)号：US09152058B2
公开(公告)日：2015-10-06
申请号：US13194136
申请日：2011-07-29
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
摘要翻译：一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。

7. 发明授权

US09134632B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09134632B2
公开(公告)日：2015-09-15
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译：公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离框架。

8. 发明授权

US08913225B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08913225B2
公开(公告)日：2014-12-16
申请号：US13189288
申请日：2011-07-22
申请人： Tammo Uitterdijk , Erik Roelof Loopstra , Laurens Anthony Sanderse
发明人： Tammo Uitterdijk , Erik Roelof Loopstra , Laurens Anthony Sanderse
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70958
摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
摘要翻译：在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层来自液体的最终元素。在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。

9. 发明申请

US20140211184A1 Radiation Source 有权
标题翻译：辐射源
公开(公告)号：US20140211184A1
公开(公告)日：2014-07-31
申请号：US14241986
申请日：2012-07-27
申请人： Christian Wagner , Erik Roelof Loopstra
发明人： Christian Wagner , Erik Roelof Loopstra
IPC分类号： G03F7/20 , G02B27/28 , H05G2/00
CPC分类号： H05G2/008 , G02B27/283 , G03F7/70025 , G03F7/70033 , G03F7/70983 , H01S3/0064 , H01S3/2316 , H01S3/2333 , H05G2/003 , H05G2/005
摘要： According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
摘要翻译：根据本发明的第一方面，提供了一种辐射源，包括：喷嘴，被配置为沿着轨迹朝着等离子体形成位置引导燃料液滴流（70）; 激光器，被配置为在等离子体形成位置处的燃料液滴处引导激光辐射，以在使用中产生辐射产生等离子体; 其中所述激光器包括：种子激光器（50），用于提供种子激光束（52）; 用于从种子激光器接收种子激光束的分束器（54）; 用于从分束器接收种子激光束并进行光放大的光放大器（58）位于所述光放大器下游的第一反射器（60），被配置为将所述种子激光束引导通过所述光放大器并且返回到所述分束器; 以及位于所述分束器的更下游的第二反射器（70），被配置为从所述分束器接收所述种子激光束并将所述种子激光束的至少一部分引导回所述分束器。

10. 发明申请

US20140160450A1 RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：放射源和方法用于光刻设备和器件制造方法
公开(公告)号：US20140160450A1
公开(公告)日：2014-06-12
申请号：US14233116
申请日：2012-07-04
申请人： Erik Roelof Loopstra , Johan Frederik Dijksman
发明人： Erik Roelof Loopstra , Johan Frederik Dijksman
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B05B1/086 , B05B1/24 , B05B17/0607 , H05G2/005 , H05G2/006
摘要： A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，该燃料液滴发生器布置成提供燃料液滴流和至少一个被配置为至少蒸发的激光一些燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，进料室和储存器，其中泵送装置被布置成以熔融流状态从储存器通过进料室提供并且作为液滴流从喷嘴流出。进料室具有与填充有液体的驱动腔接触的外表面，并且液体被振动器驱动，振动器通过振动器从进料室的外表面通过进料室的熔融燃料传播到熔融燃料中液体。

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