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1. 发明授权

US09494872B2 Inspection method for lithography 有权
标题翻译：光刻检验方法
公开(公告)号：US09494872B2
公开(公告)日：2016-11-15
申请号：US13060390
申请日：2009-09-08
申请人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
发明人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F7/70625
摘要： The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined.
摘要翻译：本发明涉及一种检查装置和方法，其包括将测量辐射束投射到基板上的目标上，以便测量从目标反射的辐射，并获得与基板的特性有关的信息。在本实施例中，作为基板上的聚焦光束的测量点大于目标。关于从目标反射的辐射的信息被保留，并且关于从目标周围的表面反射的辐射的信息被消除。这可以通过在靶周围没有反射（或没有镜面反射）表面或通过在靶周围具有已知结构来完成，可以从总反射光束识别和去除信息。在投影仪的瞳平面中测量反射光束，使得所获得的信息与反射光束的衍射级和轮廓，基底上的结构的临界尺寸或重叠相关。

2. 发明授权

US08982329B2 Method and apparatus for measuring line end shortening, substrate and patterning device 有权
标题翻译：用于测量线端缩短的方法和装置，基板和图案形成装置
公开(公告)号：US08982329B2
公开(公告)日：2015-03-17
申请号：US12933806
申请日：2009-04-22
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Marcus Adrianus Van De Kerkhof
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B27/32 , G01B11/14 , G03F7/20 , G01N21/956 , G03F1/00 , G03F1/44
CPC分类号： G03F7/70683 , G01N21/95607 , G03F1/0092 , G03F1/14 , G03F1/44 , G03F1/84 , G03F7/70625 , G03F7/70641
摘要： End of line effect can occur during manufacture of components using a lithographic apparatus. These end of line effects can result in line end shortening of the features being manufactured. Such line end shortening may have an adverse impact on the component being manufactured. It is therefore desirable to predict and/or monitor the line end shortening. A test pattern is provided that has two separate areas such that, as designed, when the two areas are illuminated with radiation (for example from an angle-resolved scatterometer) they result in diffused radiation with asymmetry that is equal in sign to each other, but opposite in magnitude. When the test pattern is actually manufactured, line end shortening occurs, and so the asymmetry of the two areas are not equal and opposite. From the measured asymmetry of the manufactured test pattern, the amount of line end shortening that has occurred can be estimated.
摘要翻译：在使用光刻设备的部件的制造期间可能发生线路效应的结束。这些线路效应的结束可能导致正在制造的功能的线端缩短。这种线端缩短可能对正在制造的部件产生不利影响。因此，希望预测和/或监视线端缩短。提供了具有两个独立区域的测试图案，使得如设计的那样，当两个区域被辐射照射时（例如，从角度分辨的散射仪）照射，它们导致具有彼此相等的不对称性的漫射辐射，但在数量上相反。当实际制造测试图形时，发生线端缩短，因此两个区域的不对称性不相等。根据制造的测试图案的测量不对称性，可以估计发生的线端缩短量。

3. 发明授权

US08947637B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08947637B2
公开(公告)日：2015-02-03
申请号：US13226103
申请日：2011-09-06
申请人： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
发明人： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
IPC分类号： G03B27/58 , G03F9/00 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译：提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失辐射探测器的元件。

4. 发明授权

US08830472B2 Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus 有权
标题翻译：评估基板，检查装置和光刻装置的模型的方法
公开(公告)号：US08830472B2
公开(公告)日：2014-09-09
申请号：US12920984
申请日：2009-03-30
申请人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
发明人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
IPC分类号： G01N21/55 , G01N21/956 , G01N21/95 , G03F7/20 , G01N21/47 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/95607 , G01N2021/8845 , G03F7/70625
摘要： A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.
摘要翻译：提出了一种评估底物模型的方法。使用第一波长的辐射进行散射测量。然后改变辐射的波长，并进行进一步的散射测量。如果散射测量在波长范围内是一致的，则模型是足够准确的。然而，如果散射测量值随着波长的变化而变化，则衬底的模型不够准确。

5. 发明授权

US08773637B2 Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark 有权
标题翻译：平版印刷设备和使用传感器和对准标记将图案施加到基板的装置制造方法
公开(公告)号：US08773637B2
公开(公告)日：2014-07-08
申请号：US12908564
申请日：2010-10-20
申请人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
发明人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
IPC分类号： G03B27/52 , G03F9/00
CPC分类号： G03F7/70775 , B21B38/00 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088 , G03F9/7092 , H01J2235/062
摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.
摘要翻译：光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。传感器的示例包括光电检测器的线阵列。单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。在保持基板支撑固定的同时执行建立基准位置的至少最后一步。避免了现有技术传感器的机械扫描引起的错误和延迟。或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

6. 发明授权

US08629418B2 Lithographic apparatus and sensor therefor 有权
标题翻译：光刻设备及其传感器
公开(公告)号：US08629418B2
公开(公告)日：2014-01-14
申请号：US11591674
申请日：2006-11-02
申请人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
发明人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
IPC分类号： G01N15/06 , H01J3/14
CPC分类号： G03F7/7085
摘要： A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
摘要翻译：一种用于高数值孔径光刻设备中的衬底级别的传感器，该传感器具有覆盖感测元件的透明板，并且包括改善辐射与感测元件的耦合的元件。改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。

8. 发明授权

US08436984B2 Lithographic apparatus and method of irradiating at least two target portions 有权
标题翻译：光刻设备和照射至少两个目标部分的方法
公开(公告)号：US08436984B2
公开(公告)日：2013-05-07
申请号：US12639744
申请日：2009-12-16
申请人： Cornelis Lambertus Maria Van Weert , Marcus Adrianus Van De Kerkhof , Bearrach Moest
发明人： Cornelis Lambertus Maria Van Weert , Marcus Adrianus Van De Kerkhof , Bearrach Moest
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70066
摘要： A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.
摘要翻译：公开了一种光刻设备，其包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分以及该至少两个目标部分之间的表面材料。该装置还包括一个光学系统，该光学系统配置成沿着光学路径朝向桌子投射辐射束，同时具有同时照射至少两个目标部分的横截面。该装置还包括可移动到光路中的屏蔽物，以限制辐射束的横截面以限制至少两个目标部分之间的照明，其中当辐射照射时，至少两个目标部分之间的表面材料会降解从光学系统。

9. 发明授权

US08068212B2 Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements 有权
标题翻译：光刻设备被配置为补偿由于光学元件的加热引起的投影特征的临界尺寸的变化
公开(公告)号：US08068212B2
公开(公告)日：2011-11-29
申请号：US12892733
申请日：2010-09-28
申请人： Marcus Adrianus Van De Kerkhof , M'Hamed Akhssay , Mamoun El Ouasdad , Asis Uasghiri
发明人： Marcus Adrianus Van De Kerkhof , M'Hamed Akhssay , Mamoun El Ouasdad , Asis Uasghiri
IPC分类号： G03B27/74 , G03B27/42
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
摘要翻译：公开了一种光刻设备，其被配置为在场内和/或场之间对剂量进行校正，以补偿由于投影系统的元件的加热引起的临界尺寸变化。

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