专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20140160450A1 RADIATION SOURCE AND METHOD FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：放射源和方法用于光刻设备和器件制造方法
公开(公告)号：US20140160450A1
公开(公告)日：2014-06-12
申请号：US14233116
申请日：2012-07-04
申请人： Erik Roelof Loopstra , Johan Frederik Dijksman
发明人： Erik Roelof Loopstra , Johan Frederik Dijksman
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , B05B1/086 , B05B1/24 , B05B17/0607 , H05G2/005 , H05G2/006
摘要： A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，该燃料液滴发生器布置成提供燃料液滴流和至少一个被配置为至少蒸发的激光一些燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，进料室和储存器，其中泵送装置被布置成以熔融流状态从储存器通过进料室提供并且作为液滴流从喷嘴流出。进料室具有与填充有液体的驱动腔接触的外表面，并且液体被振动器驱动，振动器通过振动器从进料室的外表面通过进料室的熔融燃料传播到熔融燃料中液体。

2. 发明授权

US07377764B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07377764B2
公开(公告)日：2008-05-27
申请号：US11150465
申请日：2005-06-13
申请人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Johan Frederik Dijksman , Helmar Van Santen , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.
摘要翻译：公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁被构造成形成从周围区域基本密封的封闭空间。

3. 发明授权

US08866111B2 Radiation source and method for lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备及其制造方法的辐射源及方法
公开(公告)号：US08866111B2
公开(公告)日：2014-10-21
申请号：US14233116
申请日：2012-07-04
申请人： Erik Roelof Loopstra , Johan Frederik Dijksman
发明人： Erik Roelof Loopstra , Johan Frederik Dijksman
IPC分类号： H05G2/00 , G01N21/33 , H05H1/00 , B05B17/06 , B05B1/24 , B05B1/08
CPC分类号： H05G2/003 , B05B1/086 , B05B1/24 , B05B17/0607 , H05G2/005 , H05G2/006
摘要： A radiation source for generating EUV from a stream of molten fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporize at least some of the droplets of fuel, whereby radiation is generated. The fuel droplet generator has a nozzle, a feed chamber, and a reservoir, with a pumping device arranged to supply a flow of fuel in molten state from the reservoir through the feed chamber and out of the nozzle as a stream of droplets. The feed chamber has an outer face in contact with a drive cavity filled with a liquid, and the liquid is driven to oscillate by a vibrator with the oscillation transmissible to the molten fuel in the feed chamber from the outer face of the feed chamber through the liquid.
摘要翻译：用于通过LPP（激光产生等离子体）或（双激光等离子体）从熔融燃料液滴流产生EUV的辐射源具有燃料液滴发生器，该燃料液滴发生器布置成提供燃料液滴流和至少一个被配置为至少蒸发的激光一些燃料液滴，从而产生辐射。燃料液滴发生器具有喷嘴，进料室和储存器，其中泵送装置被布置成以熔融流状态从储存器通过进料室提供并且作为液滴流从喷嘴流出。进料室具有与填充有液体的驱动腔接触的外表面，并且液体被振动器驱动，振动器通过振动器从进料室的外表面通过进料室的熔融燃料传播到熔融燃料中液体。

4. 发明授权

US09113539B2 Radiation source 有权
标题翻译：辐射源
公开(公告)号：US09113539B2
公开(公告)日：2015-08-18
申请号：US13597754
申请日：2012-08-29
申请人： Hendrikus Gijsbertus Schimmel , Johan Frederik Dijksman , Dzmitry Labetski
发明人： Hendrikus Gijsbertus Schimmel , Johan Frederik Dijksman , Dzmitry Labetski
IPC分类号： G01N21/01 , G03B27/52 , G03B27/54 , H05B31/02 , H05G2/00 , G03F7/20
CPC分类号： H05G2/005 , G03F7/70033 , G03F7/70883 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： A radiation source comprises a reservoir, a nozzle, a laser, and a positive lens. The reservoir is configured to retain a volume of fuel. The nozzle, in fluid connection with the reservoir, is configured to direct a stream of fuel along a trajectory towards a plasma formation location. The laser configured to direct laser radiation at the stream at the plasma formation location to generate, in use, a radiation generating plasma. The positive lens arrangement configured to focus an at least potential spread of trajectories of the stream of fuel toward the plasma formation location, the lens comprising an electric field generating element and/or a magnetic field generating element.
摘要翻译：辐射源包括储存器，喷嘴，激光器和正透镜。储存器构造成保持一定体积的燃料。与储存器流体连接的喷嘴被配置成将沿着轨迹的燃料流引导到等离子体形成位置。激光器被配置为在等离子体形成位置处的流处引导激光辐射，以在使用中产生辐射产生等离子体。正透镜装置被配置为将燃料流的轨迹的至少势能扩散聚焦到等离子体形成位置，该透镜包括电场产生元件和/或磁场产生元件。

5. 发明授权

US08990018B2 Method of preparing a swallowable capsule comprising a sensor 有权
标题翻译：制备包含传感器的吞咽胶囊的方法
公开(公告)号：US08990018B2
公开(公告)日：2015-03-24
申请号：US12933891
申请日：2009-03-24
申请人： Johan Frederik Dijksman , Anke Pierik , Judith Margreet Rensen , Jeff Shimizu , Petrus Leonardus Adrianus Van Der Made , Michel Gerardus Pardoel , Frits Tobi De Jongh , Johan Gerard Kleibeuker
发明人： Johan Frederik Dijksman , Anke Pierik , Judith Margreet Rensen , Jeff Shimizu , Petrus Leonardus Adrianus Van Der Made , Michel Gerardus Pardoel , Frits Tobi De Jongh , Johan Gerard Kleibeuker
IPC分类号： G06F19/00 , A61B5/04 , B65D83/04 , A61B5/07 , A61B5/145 , A61B5/1495
CPC分类号： A61B5/073 , A61B5/14539 , A61B5/1495 , A61B2560/0223
摘要： A kit includes a swallowable capsule (1, 45) with a potentiometric sensor (3), such as a pH sensor, with an unfilled electrolyte cell (31). The kit further includes a separate container (46) containing a liquid electrolyte. The kit can, e.g., be packed in a blister package. After unpacking the capsule the electrolyte cell (31) is filled with the electrolyte.
摘要翻译：试剂盒包括具有电位传感器（3）的吞咽胶囊（1,45），例如pH传感器，其具有未填充的电解质电池（31）。该试剂盒还包括含有液体电解质的单独的容器（46）。试剂盒可以例如包装在泡罩包装中。在拆开胶囊之后，电解质电池（31）充满电解质。

6. 发明授权

US08961801B2 Imprint lithography method and apparatus 有权
标题翻译：压印光刻方法和装置
公开(公告)号：US08961801B2
公开(公告)日：2015-02-24
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC分类号： C03C15/00 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/00
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译：在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。

7. 发明授权

US08753557B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08753557B2
公开(公告)日：2014-06-17
申请号：US13331985
申请日：2011-12-20
申请人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
IPC分类号： B28B11/08
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译：公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由第二阵列散布在由第一阵列印刷的图案之间。

8. 发明授权

US07998651B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07998651B2
公开(公告)日：2011-08-16
申请号：US11433765
申请日：2006-05-15
申请人： Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
发明人： Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
IPC分类号： C03C15/00 , G03C5/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
摘要翻译：制作印模模板的方法包括在基底上提供转移层并在转印层上提供可压印介质层，使用主印模模板将图案压印到可压印介质中，通过将可印迹介质暴露于光化反应来聚合可印迹介质辐射，然后蚀刻所得聚合物层，转印层和基底，使得印记图案转印到基底上，基底由此变成具有与母版印模板上提供的图案相反的图案的印模模板。

9. 发明申请

US20110049097A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS 有权
标题翻译：印刷方法和装置
公开(公告)号：US20110049097A1
公开(公告)日：2011-03-03
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC分类号： B44C1/22
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译：在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。

10. 发明授权

US07878791B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07878791B2
公开(公告)日：2011-02-01
申请号：US11364490
申请日：2006-03-01
申请人： Klaus Simon , Karel Diederick Van Der Mast , Johan Frederik Dijksman
发明人： Klaus Simon , Karel Diederick Van Der Mast , Johan Frederik Dijksman
IPC分类号： B29C59/02 , G03B27/58
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
摘要翻译：公开了一种光刻设备，其具有布置成保持基板的第一基板台和布置成保持基板的第二基板台，布置成保持压印模板的压印模板保持器和可压印介质分配器，其中第一基板台是在位于或邻近可压印介质分配器的第一位置和位于压印模板保持器之间或邻近压印模板保持器的第二位置之间移动，并且第二衬底台可在第一和第二位置之间移动，使得第一和第二衬底表交换位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式