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1. 发明申请

US20120009521A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20120009521A1
公开(公告)日：2012-01-12
申请号：US13233832
申请日：2011-09-15
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/20 , G03F7/027 , C07C309/17 , C07D493/18 , C07C309/24 , C07D327/04 , C07D213/79 , C07D285/15 , G03F7/004 , C07C317/46
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

2. 发明授权

US08206890B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US08206890B2
公开(公告)日：2012-06-26
申请号：US12499610
申请日：2009-07-08
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/039 , C07C381/12 , C07C309/04 , C07C309/17
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

3. 发明申请

US20100015552A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20100015552A1
公开(公告)日：2010-01-21
申请号：US12499610
申请日：2009-07-08
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）以及在暴露时产生酸的酸发生剂组分（B），其中所述酸发生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“ R 9“各自独立地表示芳基或烷基，其中R 7”至R 9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个 “表示具有下述通式（I）表示的基团的取代芳基作为取代基; X-表示阴离子; Rf表示氟化烷基。

4. 发明授权

US08367299B2 Resist composition, method of forming resist pattern, compound and acid generator 有权
标题翻译：抗蚀剂组合物，形成抗蚀剂图案的方法，化合物和酸发生剂
公开(公告)号：US08367299B2
公开(公告)日：2013-02-05
申请号：US13233832
申请日：2011-09-15
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/039
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

5. 发明授权

US08252509B2 Resist composition and method of forming resist pattern 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和方法
公开(公告)号：US08252509B2
公开(公告)日：2012-08-28
申请号：US12861474
申请日：2010-08-23
申请人： Yoshiyuki Utsumi , Takehiro Seshimo , Hiroaki Shimizu , Naoto Motoike
发明人： Yoshiyuki Utsumi , Takehiro Seshimo , Hiroaki Shimizu , Naoto Motoike
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039 , G03F7/26
CPC分类号： C08F20/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base material component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an nitrogen-containing organic compound (D), wherein the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) shown below: wherein R20 represents a methylene group, an ethylene group, an oxygen atom or —C(CH3)2—; R21 represents a hydrogen atom or an organic group; and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, —C(═O)—O—R23, —C(═O)—NH—R23 or a carboxyl group, wherein R23 represents a linear or branched alkyl group of 1 to 15 carbon atoms, an unsaturated hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group, and a represents an integer of 0 to 2.
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在碱显影液中溶解度变化的基材成分（A），曝光时产生酸的酸产生剂成分（B）和含氮有机化合物（D），其中所述含氮有机化合物（D）包括由下述通式（d1）表示的化合物：其中R 20表示亚甲基，亚乙基，氧原子或-C（CH 3）2 - ; R 21表示氢原子或有机基团; R 22表示烷氧基，烷氧基羰基氧基，羟基，卤素原子，-C（= O）-O-R 23，-C（= O）-NH-R 23或羧基，其中R 23表示直链状或具有1至15个碳原子的支链烷基，不饱和烃基，脂族环基或芳族烃基，并且表示0至2的整数。

6. 发明申请

US20100233624A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20100233624A1
公开(公告)日：2010-09-16
申请号：US12717870
申请日：2010-03-04
申请人： Yasuhiko Kakinoya , Naoto Motoike
发明人： Yasuhiko Kakinoya , Naoto Motoike
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the component (A) including a polymeric compound (A1) having an acid dissociable, dissolution inhibiting group in the structure thereof and including a structural unit (a0) having an —SO2-containing cyclic group on the terminal of the side chain, and the component (B) including an acid generator (B1) containing a compound represented by general formula (b1-1) (R0 represents a hydrocarbon group of 1 to 12 carbon atoms which may have a substituent, provided that the carbon atom adjacent to the sulfur atom within the —SO3− group has no fluorine atom bonded thereto, and Z+ represents an organic cation). R0—SO3−Z+ (b1-1)
摘要翻译：一种正型抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解性的碱成分（A）和暴露时产生酸的酸发生剂组分（B），所述组分（A）包含高分子化合物）在其结构中具有酸解离的溶解抑制基团，并且在侧链的末端包含具有含-SO 2的环状基团的结构单元（a0），和包含酸发生剂（B1）的成分（B）含有通式（b1-1）表示的化合物（R0表示可具有取代基的1〜12个碳原子的烃基，条件是与-SO 3 - 基中的硫原子相邻的碳原子不含氟原子 Z +表示有机阳离子）。 R0-SO3-Z +（b1-1）

7. 发明申请

US20090311625A1 Method for forming photoresist pattern and photoresist laminate 审中-公开
标题翻译：形成光致抗蚀剂图案和光致抗蚀剂层压板的方法
公开(公告)号：US20090311625A1
公开(公告)日：2009-12-17
申请号：US12461807
申请日：2009-08-25
申请人： Akiyoshi Yamazaki , Naoto Motoike , Daisuke Kawana , Kazufumi Sato
发明人： Akiyoshi Yamazaki , Naoto Motoike , Daisuke Kawana , Kazufumi Sato
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/091
摘要： A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; selectively exposing the photoresist; and developing the photoresist. The novel method is characterized in that the acid-generating agent and the fluorine-based acidic compound are selected so that the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film.
摘要翻译：用于形成光致抗蚀剂图案的方法包括以下步骤：在基底上沉积光致抗蚀剂膜，光致抗蚀剂膜含有能够在暴露于光时产生酸的酸产生剂; 在抗蚀剂膜上覆盖抗反射膜，所述抗反射膜含有氟基酸性化合物; 选择性地曝光光致抗蚀剂; 并显影光致抗蚀剂。该新方法的特征在于，选择酸产生剂和氟基酸性化合物，使得在曝光后光致抗蚀剂膜中产生酸的酸具有比氟酸酸性更高的酸度化合物在抗反射膜中。

8. 发明申请

US20070141514A1 Method for forming photoresist pattern and photoresist laminate 审中-公开
标题翻译：形成光致抗蚀剂图案和光致抗蚀剂层压板的方法
公开(公告)号：US20070141514A1
公开(公告)日：2007-06-21
申请号：US11703790
申请日：2007-02-08
申请人： Akiyoshi Yamazaki , Naoto Motoike , Daisuke Kawana , Kazfumi Sato
发明人： Akiyoshi Yamazaki , Naoto Motoike , Daisuke Kawana , Kazfumi Sato
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/091
摘要： A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; selectively exposing the photoresist; and developing the photoresist. The novel method is characterized in that the acid-generating agent and the fluorine-based acidic compound are selected so that the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film.
摘要翻译：用于形成光致抗蚀剂图案的方法包括以下步骤：在基底上沉积光致抗蚀剂膜，光致抗蚀剂膜含有能够在暴露于光时产生酸的酸产生剂; 在抗蚀剂膜上覆盖抗反射膜，所述抗反射膜含有氟基酸性化合物; 选择性地曝光光致抗蚀剂; 并显影光致抗蚀剂。该新方法的特征在于，选择酸产生剂和氟基酸性化合物，使得在曝光后光致抗蚀剂膜中产生酸的酸具有比氟酸酸性更高的酸度化合物在抗反射膜中。

9. 发明申请

US20050170276A1 Chemical-amplification positive-working photoresist composition 审中-公开
标题翻译：化学扩增正性光刻胶组合物
公开(公告)号：US20050170276A1
公开(公告)日：2005-08-04
申请号：US10514320
申请日：2003-10-27
申请人： Kazuyuki Nitta , Naoto Motoike
发明人： Kazuyuki Nitta , Naoto Motoike
IPC分类号： G03F7/039 , G03C1/492 , H01L21/027
CPC分类号： G03F7/0392
摘要： Disclosed is a chemical-amplification positive-working photoresist composition having compliability to various types of resist patterns with excellent sensitivity and pattern resolution exhibiting high exposure margin and focusing depth latitude. Of the essential components including (A) a resin capable of being imparted with increased alkali-solubility by interacting with an acid and (B) an acid-generating compound, the component (A) is a combination of (a1) a first resin and (a2) a second resin each as a hydroxystyrene-based copolymeric resin partially substituted for the hydroxyl hydrogen atoms with acid-dissociable solubility-reducing substituent groups. Characteristically, in addition to the difference in the mass-average molecular weight being high for (a1) and low for (a2), the acid-dissociability of the substituents in the (a1) resin is higher than that in the (a2) resin as in a combination of 1-ethoxyethyl for (a1) and tetrahydropyranyl for (a2).
摘要翻译：公开了一种化学扩增正性光致抗蚀剂组合物，其具有对具有优异的灵敏度和图案分辨率的各种类型的抗蚀剂图案具有高曝光余量和聚焦深度纬度的适应性。在包括（A）能够通过与酸相互作用而赋予碱溶性增加的树脂和（B）产酸化合物的基础组分中，组分（A）是（a1）第一树脂和（a2）第二树脂，各自作为部分被羟基氢原子取代的具有酸解离性溶解性降低取代基的羟基苯乙烯类共聚树脂。特别地，除了（a1）的质量平均分子量的差异和（a2）的低分子量之外，（a1）树脂中的取代基的酸解离性高于（a2）树脂如（a1）的1-乙氧基乙基和（a2）的四氢吡喃基的组合。

10. 发明申请

US20100136480A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20100136480A1
公开(公告)日：2010-06-03
申请号：US12615924
申请日：2009-11-10
申请人： Naoto Motoike , Yasuhiko Kakinoya
发明人： Naoto Motoike , Yasuhiko Kakinoya
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0048 , G03F7/2041
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid; an acid generator component (B) which generates an acid upon exposure; and an organic solvent (S), wherein the base component (A) includes a polymeric compound (A1) which contains a structural unit (a0) represented by the general formula (a0-1) shown below: [Chemical Formula 1] (in the formula, R1 represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; R2 represents a bivalent linking group; and R3 represents a cyclic group which has —SO2— within the ring skeleton), and the organic solvent (S) includes a cyclic ketone having a 5 to 7-membered ring or an ether represented by the general formula (S-1) shown below: [Chemical Formula 2] (in the formula, R4 represents an alkyl group of 1 to 5 carbon atoms; R5 represents an alkyl group of 1 to 3 carbon atoms; and n represents an integer of 0 to 2).
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）酸性发生剂组分（B），其在暴露时产生酸; 和有机溶剂（S），其中，所述基础成分（A）含有含有下述通式（a0-1）所示的结构单元（a0）的高分子化合物（A1）：[化学式1] 式中，R 1表示氢原子，低级烷基或卤代低级烷基; R 2表示二价连接基团，R 3表示在环骨架中具有-SO 2 - 的环状基团）和有机溶剂（ S）包括具有下述通式（S-1）所示的具有5〜7元环的醚或醚：[化学式2]（式中，R4表示1〜5个碳的烷基原子; R 5表示1〜3个碳原子的烷基，n表示0〜2的整数。

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