专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06596445B1 O-acyloxime photoinitiators 有权
标题翻译： O-酰基肟光引发剂
公开(公告)号：US06596445B1
公开(公告)日：2003-07-22
申请号：US09338152
申请日：1999-06-23
申请人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： C07C25164
CPC分类号： C07C251/66 , B33Y70/00 , C07C251/68 , C07C323/47 , C07D295/135 , C07D335/18 , C08F2/50 , G03F7/0007 , G03F7/002 , G03F7/0045 , G03F7/031 , G03F7/0388
摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
摘要翻译：式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

2. 发明申请

US20050191567A1 Oxime ester photoinitiators 有权
公开(公告)号：US20050191567A1
公开(公告)日：2005-09-01
申请号：US11103194
申请日：2005-04-11
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , G03F9/00
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

3. 发明授权

US06949678B2 Oxime ester photoinitiators 失效
公开(公告)号：US06949678B2
公开(公告)日：2005-09-27
申请号：US09734625
申请日：2000-12-12
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , C07C251/60
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

4. 发明授权

US07381842B2 Oxime ester photoinitiators 有权
公开(公告)号：US07381842B2
公开(公告)日：2008-06-03
申请号：US11103194
申请日：2005-04-11
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： C07C251/60
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

5. 发明授权

US6022906A .alpha.-aminoacetophenone photoinitiators 失效
标题翻译： α-氨基苯乙酮光引发剂
公开(公告)号：US6022906A
公开(公告)日：2000-02-08
申请号：US982147
申请日：1997-12-01
申请人： Masaki Ohwa , Hitoshi Yamoto , Jean-Luc Birbaum , Hiroko Nakashima , Akira Matsumoto , Hidetaka Oka
发明人： Masaki Ohwa , Hitoshi Yamoto , Jean-Luc Birbaum , Hiroko Nakashima , Akira Matsumoto , Hidetaka Oka
IPC分类号： G03F7/027 , C07C225/16 , C07C233/33 , C07C311/37 , C07C317/32 , C07C323/12 , C07C323/25 , C07C323/31 , C07C323/32 , C07D207/08 , C07D211/20 , C07D295/10 , C07D295/108 , C08F2/50 , G03C1/73 , G03F7/00 , G03F7/031 , C07C221/00 , C07D265/32
CPC分类号： C07D295/108 , C07C323/12 , C07C323/25 , C07C323/32 , C07D211/20 , G03F7/031
摘要： Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.
摘要翻译：其中Ar如式I，II，III和IV的化合物是未取代或取代的苯基，联苯基或苯甲酰基苯基; 例如，Ar1具有与Ar相同的含义; Ar2尤其是苯基; X可能是直接的债券; Y氢等; R1和R2例如C1-C8烷基; R3尤其是氢或C 1 -C 12烷基; R4尤其是C1-C12烷基; 或者R 3和R 4一起是C 3 -C 7亚烷基; R5是例如C1-C6亚烷基; Z为二价基团; 条件是Ar，Ar1，Ar2，Ar3，R1，R2，R3，R4，R5或Y中的至少一个被1至5个SH基团取代，或者Y包含至少一个-SS-基团是用于烯键式不饱和化合物聚合的光引发剂。

6. 发明授权

US06485885B1 Photopolymerizable thermosetting resin compositions 有权
标题翻译：光聚合性热固性树脂组合物
公开(公告)号：US06485885B1
公开(公告)日：2002-11-26
申请号：US09720441
申请日：2000-12-22
申请人： Hidetaka Oka , Masaki Ohwa , Akira Matsumoto , Hisatoshi Kura
发明人： Hidetaka Oka , Masaki Ohwa , Akira Matsumoto , Hisatoshi Kura
IPC分类号： G03F7004
CPC分类号： G03F7/031 , G03F7/038
摘要： Compositions comprising (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule; (B) at least one compound of formulas (I, II, III, IV, V or VI), wherein R1 inter alia is phenyl or alkyl; R2 is for example C2-C12alkonoyl which is unsubstituted or substituted or is benzoyl; R3, R4, R5, R6 and R7 independently of one another are for instance hydrogen, C1-C12alkyl, cyclohexyl or phenyl which is unsubstituted or substituted, or are benzyl, benzoyl, C2-C12alkanoyl or phenoxycarbonyl; R8 is for example hydrogen or C1-C12alkyl or a group (B); M is for example C1-C12alkylene, cyclohexylene or phenylene; M1 inter alia is a direct bond or C1-C12alkylenoxy; and Ar is a 5- or 6-membered aromatic heterocyclic ring; (C) a photopolymerizable reactive or unreactive diluent; and (D) as a thermosetting component an epoxy compound containing at least two epoxy groups in one molecule; are highly suitable as resists which are alkaline developable.
摘要翻译：包含（A）在分子中含有至少一个羧酸基团的低聚物或聚合物的组合物; （B）至少一种式（I，II，III，IV，V或VI）化合物，其中R 1特别是苯基或烷基; R2是例如未取代或取代的C 2 -C 12烷氧基或苯甲酰基; R 3，R 4，R 5，R 6和R 7彼此独立地是例如氢，C 1 -C 12烷基，环己基或未取代或取代的苯基，或者是苄基，苯甲酰基，C 2 -C 12烷酰基或苯氧基羰基; R8是例如氢或C1-C12烷基或基团（B）; M为例如C 1 -C 12亚烷基，亚环己基或亚苯基; M1特别是直接键或C1-C12亚烷基氧基; 且Ar为5-或6-元芳族杂环; （C）可光聚合反应性或非活性稀释剂; 和（D）作为热固性组分在一个分子中含有至少两个环氧基团的环氧化合物; 非常适合作为碱性显影的抗蚀剂。

7. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

8. 发明授权

US06261738B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06261738B1
公开(公告)日：2001-07-17
申请号：US09533952
申请日：2000-03-23
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： G03G7004
CPC分类号： G03F7/039 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22 , G03F7/0045 , Y10S430/12
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。

9. 发明授权

US06806024B1 Oxime derivatives and the use thereof as photoinitiators 有权
标题翻译：肟衍生物及其作为光引发剂的用途
公开(公告)号：US06806024B1
公开(公告)日：2004-10-19
申请号：US09914433
申请日：2001-08-27
申请人： Hisatoshi Kura , Hitoshi Yamato , Masaki Ohwa , Kurt Dietliker
发明人： Hisatoshi Kura , Hitoshi Yamato , Masaki Ohwa , Kurt Dietliker
IPC分类号： G03F7004
CPC分类号： G03F7/031 , B33Y70/00 , C07C309/66 , C07C309/73 , C07C323/57 , C07C381/00 , C07D307/66 , C07D333/36 , C07D339/08 , C07F9/097 , C07F9/655345 , C08F2/50 , Y10S430/12 , Y10S430/123
摘要： Radically photopolymerizable compositions comprising (a) at least one ethylenically unsaturated photopolymerizable compound; (b) as photoinitiator, at least one compound of formulae (I, II, III, IV, V and/or VI), wherein m is 0 or 1; n is 0, 1, 2 or 3; x is 1 or 2; R1 is inter alia phenyl, naphthyl, anthracyl or phenanthryl, a heteroaryl radical, C2-C12alkenyl, C4-C8cycloalkenyl, or C6-C12bicycloalkenyl; R′1 is inter alia C2-C12alkylene, or phenylene; R2 has one of the meanings of R1 or inter alia is phenyl; y is 1 or 2; R3 if x is 1 inter alia is C1-C18alkylsulfonyl, or phenyl-C1-C3alkylsulfonyl, R3 if x is 2, is for example C2-C12alkylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, or C1-C8alkyl; R6, R7, R8 inter alia are hydrogen, R26Y—, or phenyl; R9 inter alia is C5-C8cycloalkyl, or phenyl; A is for example —S—, —O—, or —NR10—; Q is C1-C8-alkylene optionally interrupted by —O—; X is —O— or —NR9—; R10 inter alia is hydrogen, or phenyl; and (c) at least one coinitiator; are especially suitable for the preparation of color filter systems.
摘要翻译：自由基光聚合组合物，其包含（a）至少一种烯属不饱和光聚合化合物; （b）作为光引发剂，至少一种式（I，II，III，IV，V和/或VI）的化合物，其中m为0或1; n为0,1,2或3; x为1或2; R 1特别是苯基，萘基，蒽基或菲基，杂芳基，C 2 -C 12烯基，C 4 -C 8环烯基或C 6 -C 12双环烯基; R'1特别是C 2 -C 12亚烷基或亚苯基; R2具有R 1的含义之一，尤其是苯基; y为1或2; 如果x是1，则R3如果是C 1 -C 18烷基磺酰基，或苯基-C 1 -C 3烷基磺酰基，如果x是2，则R 3是例如C 2 -C 12亚烷基二磺酰基; R4和R5尤其是氢，卤素或C1-C8烷基; R6，R7，R8特别是氢，R26Y-或苯基; R9尤其是C5-C8环烷基或苯基; A是例如-S-，-O-或-NR 10 - ; Q是任选被-O-间隔的C1-C8-亚烷基; X是-O-或-NR 9 - ; R 10尤其是氢或苯基; 和（c）至少一种共引发剂; 特别适用于制备滤色器系统。

10. 发明授权

US07829257B2 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US07829257B2
公开(公告)日：2010-11-09
申请号：US09734635
申请日：2000-12-12
申请人： Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
发明人： Hidetaka Oka , Kazuhiko Kunimoto , Hisatoshi Kura , Masaki Ohwa , Junichi Tanabe
IPC分类号： G03C1/00
CPC分类号： C08F2/50 , G03F7/031
摘要： Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
摘要翻译：光敏组合物，其包含（A）碱溶性化合物; （B）至少一种式I或II的化合物，其中R 1特别是C 4 -C 9环烷酰基，C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基，其各自为未取代或取代的; x为2或3; M1当x为2时，特别是亚苯基或亚萘基，其各自任选被取代。由OR3，SR4或NR5R6; 或M1，当x为3时，为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH，-SH，-CN，C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢，C1-C12烷基，C3-C12链烯基，环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢，C 1 -C 12烷基，C 2 -C 4羟烷基，C 2 -C 10烷氧基烷基，C 3 -C 5烯基，C 3 -C 8环烷基，苯基-C 1 -C 3烷基，C 1 -C 4烷酰基，C 3 -C 6烯酰基，苯甲酰基或苯基未取代或取代; 和（C）可光聚合化合物; 表现出意想不到的良好性能，特别是在光刻胶技术中。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式