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1. 发明授权

US09989687B2 Wave plate having consistent birefringence properties across the visible spectrum and manufacturing method for same 有权
公开(公告)号：US09989687B2
公开(公告)日：2018-06-05
申请号：US13699830
申请日：2010-05-25
申请人： Akio Takada , Takatoshi Yamada , Nobuyuki Koike , Masatoshi Sasaki , Kazuyuki Shibuya
发明人： Akio Takada , Takatoshi Yamada , Nobuyuki Koike , Masatoshi Sasaki , Kazuyuki Shibuya
IPC分类号： G02B5/30 , C23C16/40
CPC分类号： G02B5/3083 , C23C16/40 , G02B5/30 , G02B5/3025
摘要： A wave plate capable of increasing a birefringence quantity and being made into a thin film, and a method of manufacturing the wave plate. The wave plate includes a substrate, whereon convex portions and concave portions are formed with a period less than or equal to the wavelength of light that is used therewith, columnar portions, wherein fine grains of a dielectric material are layered by oblique vapor deposition of a dielectric material from two directions, in a columnar shape on the convex portions in the vertical direction relative to the surface of the substrate, and interstices that are located on the concave portions and disposed between the columnar portions. Using birefringence from the fine grains of the dielectric material and birefringence from the concave/convex portions of the substrate allows increasing the birefringence quantity and making a thin film.

2. 发明申请

US20130135727A1 WAVE PLATE AND WAVE PLATE MANUFACTURING METHOD 有权
标题翻译：波片和波片制造方法
公开(公告)号：US20130135727A1
公开(公告)日：2013-05-30
申请号：US13699830
申请日：2010-05-25
申请人： Akio Takada , Takatoshi Yamada , Nobuyuki Koike , Masatoshi Sasaki , Kazuyuki Shibuya
发明人： Akio Takada , Takatoshi Yamada , Nobuyuki Koike , Masatoshi Sasaki , Kazuyuki Shibuya
IPC分类号： G02B5/30 , C23C16/40
CPC分类号： G02B5/3083 , C23C16/40 , G02B5/30 , G02B5/3025
摘要： A wave plate capable of increasing a birefringence quantity and being made into a thin film, and a method of manufacturing the wave plate. The wave plate includes a substrate, whereon convex portions and concave portions are formed with a period less than or equal to the wavelength of light that is used therewith, columnar portions, wherein fine grains of a dielectric material are layered by oblique vapor deposition of a dielectric material from two directions, in a columnar shape on the convex portions in the vertical direction relative to the surface of the substrate, and interstices that are located on the concave portions and disposed between the columnar portions. Using birefringence from the fine grains of the dielectric material and birefringence from the concave/convex portions of the substrate allows increasing the birefringence quantity and making a thin film.
摘要翻译：能够增加双折射量并制成薄膜的波片及其制造方法。波片包括基板，其中凸部和凹部形成有小于或等于其使用的光的波长的周期，柱状部分，其中电介质材料的细晶粒通过倾斜气相沉积从相对于基板的表面在垂直方向的凸部上的柱状形状的两个方向的介电材料和位于凹部上并配置在柱状部之间的间隙。使用来自电介质材料的细晶粒的双折射和来自基板的凹/凸部分的双折射可以增加双折射量并制成薄膜。

3. 发明申请

US20130177717A1 METHOD FOR PRODUCING WAVELENGTH PLATE 审中-公开
标题翻译：生产波长板的方法
公开(公告)号：US20130177717A1
公开(公告)日：2013-07-11
申请号：US13806960
申请日：2011-06-23
申请人： Nobuyuki Koike , Takatoshi Yamada , Akio Takada , Masatoshi Sasaki
发明人： Nobuyuki Koike , Takatoshi Yamada , Akio Takada , Masatoshi Sasaki
IPC分类号： C23C16/40
CPC分类号： C23C16/40 , C23C14/226 , C23C14/5806 , G02B5/3083
摘要： To produce a wavelength plate that is superior in durability and stability and has a high moisture resistant property. A dielectric material is obliquely vapor deposited on a substrate so as to form a birefringent layer that has columnar portions in each of which fine particles of the dielectric material are stacked in a columnar shape, and interstices that are respectively formed between the columnar portions, and the birefringent layer is subjected to an annealing treatment at a temperature within the range of 100° C. or more to 300° C. or less. Then, a protective film with low moisture permeability is formed on the annealed birefringent layer by forming an inorganic compound on the birefringent layer at high density.
摘要翻译：制造耐久性和稳定性优异且耐湿性高的波长板。将电介质材料倾斜地气相沉积在基片上以形成双折射层，该双折射层具有柱状部分，其中每一个电介质材料的细颗粒以柱状形式堆叠，并且间隔分别形成在柱状部分之间，并且在100℃以上300℃以下的温度下对双折射层进行退火处理。然后，通过在双折射层上以高密度形成无机化合物，在退火的双折射层上形成具有低透湿性的保护膜。

4. 发明授权

US08842365B2 Phase difference element and method for manufacturing the same 有权
标题翻译：相位差元件及其制造方法
公开(公告)号：US08842365B2
公开(公告)日：2014-09-23
申请号：US13473100
申请日：2012-05-16
申请人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
发明人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
IPC分类号： G02B1/10 , G02B1/11
CPC分类号： G02B1/115
摘要： A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13.
摘要翻译：公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。相位差元件包括透明基板11，界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成，其中各膜的膜厚度等于或小于使用的光的波长。倾斜蒸镀膜由多层电介质材料形成。这些层从彼此相差180°的两个方向交替倾斜蒸镀。界面抗反射膜组12的折射率高于透明基板11的折射率，并且小于倾斜气相沉积膜13的折射率。

5. 发明申请

US20120293732A1 PHASE DIFFERENCE ELEMENT AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：相差元件及其制造方法
公开(公告)号：US20120293732A1
公开(公告)日：2012-11-22
申请号：US13473100
申请日：2012-05-16
申请人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
发明人： Nobuyuki Koike , Masatoshi Sasaki , Naoki Hanashima , Akio Takada , Takatoshi Yamada
IPC分类号： G02F1/1335 , B05D5/06 , G02B1/11
CPC分类号： G02B1/115
摘要： A phase difference element capable of reducing reflection of incident light and a manufacturing method for the phase difference element are disclosed. The phase difference element includes a transparent substrate 11, an interface anti-reflection film group 12 and an obliquely vapor deposited film 13. The interface anti-reflection film group is composed by one or more of alternately high and low refractive index films, with the film thicknesses of the respectively films being equal to or less than the wavelength of light in use. The obliquely vapor deposited film is formed by a plurality of layers of a dielectric material. These layers are alternately obliquely vapor deposited from two directions differing by 180° from each other. The refractive index of the interface anti-reflection film group 12 is higher than the refractive index of the transparent substrate 11 and lesser than that of the obliquely vapor deposited film 13 (FIG. 1).
摘要翻译：公开了能够减少入射光反射的相位差元件和相位差元件的制造方法。相位差元件包括透明基板11，界面防反射膜组12和倾斜气相沉积膜13.界面抗反射膜组由交替高和低折射率膜中的一个或多个组成，其中各膜的膜厚度等于或小于使用的光的波长。倾斜蒸镀膜由多层电介质材料形成。这些层从彼此相差180°的两个方向交替倾斜蒸镀。界面抗反射膜组12的折射率高于透明基板11的折射率，并且小于倾斜气相沉积膜13（图1）的折射率。

6. 发明授权

US08148441B2 Polishing pad and manufacturing method thereof 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08148441B2
公开(公告)日：2012-04-03
申请号：US11794284
申请日：2006-02-27
申请人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Masato Doura , Takeshi Fukuda , Kazuyuki Ogawa , Atsushi Kazuno , Hiroshi Seyanagi , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： C08G18/10
CPC分类号： B24B37/24 , B24D3/28 , C08G18/10 , C08G2101/00 , C08G18/3237 , C08G18/3215
摘要： A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
摘要翻译：制造由其中具有非常均匀的细小单元的聚氨酯树脂泡沫制成的抛光垫的方法和通过该方法获得的抛光垫提供了一种抛光垫具有更好的抛光特性（特别是平面化）的同时提供改善的可修整性，同时保持平面化特性和抛光速度。聚氨酯树脂发泡体是通过将异氰酸酯封端的预聚物与熔点为70℃以下的芳香族多胺扩链剂反应得到的固化物。

7. 发明授权

US07731568B2 Polishing pad and semiconductor device manufacturing method 有权
标题翻译：抛光垫和半导体器件的制造方法
公开(公告)号：US07731568B2
公开(公告)日：2010-06-08
申请号：US10598717
申请日：2004-10-20
申请人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
发明人： Tetsuo Shimomura , Masahiko Nakamori , Takatoshi Yamada , Kazuyuki Ogawa , Atsushi Kazuno , Masahiro Watanabe
IPC分类号： B24B7/00 , B24B7/19 , B24B5/00 , B24B29/00 , B24D11/00
CPC分类号： B24B37/205 , H01L21/30625
摘要： The object of the invention is to provide a polishing pad capable of maintaining high-precision end-point optical detection over a long period from the start of use to the end of use even if polishing is performed with an alkaline or acid slurry, as well as a method of manufacturing a semiconductor device with this polishing pad. The polishing pad of the invention is used in chemical mechanical polishing and has a polishing region and a light-transmitting region, wherein the light-transmitting region satisfies that the difference ΔT (ΔT=T0−T1) (%) between T0 and T1 is within 10(%) over the whole range of measurement wavelengths of from 400 to 700 nm, wherein T1 is the light transmittance (%) of the light-transmitting region measured at the measurement wavelength λ after dipping for 24 hours in a KOH aqueous solution at pH 11 or an H2O2 aqueous solution at pH 4 and T0 is the light-transmittance (%) measured at the measurement wavelength λ before the dipping.
摘要翻译：本发明的目的是提供一种抛光垫，即使在用碱性或酸性浆料进行研磨的同时，也能够在从使用开始到使用结束的长时间内保持高精度的端点光学检测作为使用该研磨垫的半导体装置的制造方法。本发明的抛光垫用于化学机械抛光，并具有抛光区域和透光区域，其中透光区域满足以下区别：Dgr; T（＆Dgr; T = T0-T1）（％） T0和T1在400〜700nm的测量波长的整个范围内在10（％）以内，其中T1是在浸渍24小时后在测量波长λ测量的透光区域的透光率（％） pH为11的KOH水溶液或pH4的H 2 O 2水溶液，T0为在浸渍前测定的波长λ下测定的透光率（％）。

8. 发明申请

US20100091803A1 Solid-state high-luminance far ultraviolet light emitting element including highly pure hexagonal boron nitride single crystal, solid-state laser, and solid-state light emitting apparatus 失效
标题翻译：包括高纯度六方晶系氮化硼单晶，固体激光器和固态发光装置的固态高亮度远紫外发光元件
公开(公告)号：US20100091803A1
公开(公告)日：2010-04-15
申请号：US12588462
申请日：2009-10-16
申请人： Kenji Watanabe , Takashi Taniguchi , Satoshi Koizumi , Hisao Kanda , Masayuki Katagiri , Takatoshi Yamada , Nesladek Milos
发明人： Kenji Watanabe , Takashi Taniguchi , Satoshi Koizumi , Hisao Kanda , Masayuki Katagiri , Takatoshi Yamada , Nesladek Milos
IPC分类号： H01S3/30 , H01J1/62
CPC分类号： C30B29/38 , B01J3/062 , B01J3/065 , B01J2203/0645 , B01J2203/066 , B01J2203/069 , C09K11/63 , H01S5/32341
摘要： A solid-state far ultraviolet light emitting element is formed by a hexagonal boron nitride single crystal, excited by electron beam irradiation to emit far ultraviolet light having a maximum light emission peak in a far ultraviolet region at a wavelength of 235 nm or shorter.
摘要翻译：固态远紫外线发光元件是通过电子束照射激发的六方氮化硼单晶形成的，以在波长235nm以下的远紫外区域发射具有最大发光峰的远紫外光。

9. 发明申请

US20090167139A1 PHOSPHORUS-DOPED DIAMOND FILM ALLOWING SIGNIFICANTLY REDUCED ELECTRON EMISSION VOLTAGE, METHOD FOR PRODUCING THE SAME, AND ELECTRON SOURCE USING THE SAME 有权
标题翻译：具有显着降低电子发射电压的磷光体金刚石膜，其制造方法和使用该电极的电子源
公开(公告)号：US20090167139A1
公开(公告)日：2009-07-02
申请号：US12066976
申请日：2006-08-28
申请人： Takatoshi Yamada , Shinichi Shikata
发明人： Takatoshi Yamada , Shinichi Shikata
IPC分类号： H01J19/02 , C30B23/02 , H01B1/00
CPC分类号： H01J9/025 , C23C16/274 , C23C16/278 , H01J1/304 , H01J2201/30457
摘要： According to the present invention, a phosphorus-doped diamond film allowing a significantly reduced electron emission voltage, a method for producing the same, and a diamond electron source using the same, such diamond electron source exerting stable and excellent electron emission characteristics, which can be used for a cold cathode surface structure operable with low voltage, are provided. Also, a method for producing a phosphorus-doped diamond film, comprising growing a diamond film on a diamond substrate by a microwave CVD method in an atmosphere containing gases (methane and hydrogen) and phosphorus with the use of tertiary butyl phosphorus as a source of addition of phosphorous, such diamond film containing phosphorus at a concentration of 1015 cm−3 or more, having a resistivity of 107 Ωcm or less, and allowing a voltage for initiation of electron emission to be 30 V or less, and a diamond electron source using the same are provided. In such diamond film, the electron emission voltage is significantly reduced.
摘要翻译：根据本发明，能够显着降低电子发射电压的磷掺杂金刚石薄膜，其制造方法和使用该方法的金刚石电子源，具有稳定和优异的电子发射特性的金刚石电子源，其可以用于可低压操作的冷阴极表面结构。另外，一种磷掺杂金刚石膜的制造方法，其特征在于，在含有气体（甲烷和氢）和磷的气氛中，通过微波CVD法在金刚石基板上生长金刚石膜，使用叔丁基磷作为加入磷，这种金刚石膜含有浓度为1015cm-3或更高的磷，具有107Ω·米或更小的电阻率，并允许电子发射的电压为30V或更小，金刚石电子源提供使用它们。在这种金刚石膜中，电子发射电压显着降低。

10. 发明申请

US20090104850A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20090104850A1
公开(公告)日：2009-04-23
申请号：US12065219
申请日：2006-08-22
申请人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
发明人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
IPC分类号： B24B1/00 , B24B7/20
CPC分类号： B24B37/24 , B24D3/32 , C08G18/36 , C08G2101/00 , Y10T428/24 , Y10T428/249953
摘要： An object of the present invention is to provide a polishing pad excellent in polishing rate and superior in longevity without generating center slow. Another object of the present invention is to provide a method of manufacturing a semiconductor device with the polishing pad. Disclosed is a polishing pad having a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight.
摘要翻译：本发明的目的是提供一种抛光速度优异且寿命长的抛光垫，而不产生中心慢。本发明的另一个目的是提供一种用抛光垫制造半导体器件的方法。公开了一种抛光垫，其具有由具有细孔的聚氨酯泡沫构成的抛光层，其中作为聚氨酯泡沫的起始组分的高分子量多元醇成分含有数均分子量的疏水性高分子量多元醇A，平均分子量为550〜800的疏水性高分子量多元醇B，A / B比为10/90〜50/50的数均分子量为950〜1300的疏水性高分子量多元醇B.

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