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    • 4. 发明授权
    • Analytical electron microscope and a method of operating such an
electron microscope
    • 分析电子显微镜和操作这种电子显微镜的方法
    • US5350921A
    • 1994-09-27
    • US94955
    • 1993-07-23
    • Takashi AoyamaYutaka Misawa
    • Takashi AoyamaYutaka Misawa
    • H01J37/252H01J37/26H01J37/295H01J49/26G01N23/00
    • H01J37/252H01J37/265
    • An analytical electron microscope automatically identifies objects in a sample on the basis of shape of the object, change of thickness of the object and/or change of element (such as change of element type or concentration). Therefore, the operator of the analytical electron microscope can specify a desired object, and an example or examples of that object in a sample can be identified automatically. The characteristics need to identify the object are determined by detecting the effect of the sample on the electron beam of the analytical electron microscope, using, for example, an energy dispersive type X-ray analyzer and an electron energy loss spectrometer. Once an example of the object has been identified, it may be analyzed further. The analytical electron microscope may also analyze a sample to identify and classify the objects present.
    • 分析电子显微镜根据物体的形状,物体的厚度变化和/或元素的变化(例如元件类型或浓度的变化)自动识别样品中的物体。 因此,分析电子显微镜的操作者可以指定期望的对象,并且可以自动识别样品中的该对象的示例或示例。 通过使用例如能量色散型X射线分析仪和电子能量损失光谱仪,通过检测样品对分析电子显微镜的电子束的影响来确定对象的特征。 一旦已经识别出对象的示例,则可以进一步分析该对象的示例。 分析电子显微镜还可以分析样品以鉴别和分类存在的物体。
    • 7. 发明授权
    • Semiconductor device and a method of manufacturing the same
    • 半导体装置及其制造方法
    • US07348245B2
    • 2008-03-25
    • US11443257
    • 2006-05-31
    • Masaaki ShinoharaKozo WatanabeFukuo OwadaTakashi Aoyama
    • Masaaki ShinoharaKozo WatanabeFukuo OwadaTakashi Aoyama
    • H01L21/8234
    • H01L27/11568G11C11/005G11C16/0466H01L27/105H01L27/11573H01L29/665H01L29/6656H01L29/6659H01L29/7833
    • Manufacturing method of a semiconductor device for forming a rewritable nonvolatile memory cell including a first field effect transistor for memory, a circuit including a second field effect transistor and a circuit including a third field effect transistor, including forming a gate insulating film over a semiconductor substrate, a gate electrode over the gate insulating film and sidewall spacers over the sidewalls of the gate electrode associated with each of the first through third field effect transistors. The sidewall spacers of at least the first field effect transistor have a different width than that of at least the second field effect transistor, the gate electrode of the third field effect transistor has a different length than that of at least the first field effect transistor for memory and the gate insulating film of the third field effect transistor has a thickness larger than that of the second field effect transistor.
    • 一种半导体器件的制造方法,用于形成包括用于存储器的第一场效应晶体管的可重写非易失性存储单元,包括第二场效应晶体管的电路和包括第三场效应晶体管的电路,包括在半导体衬底上形成栅极绝缘膜 栅极绝缘膜上的栅电极和与第一至第三场效应晶体管中的每一个相关联的栅电极的侧壁上的侧壁隔离物。 至少第一场效应晶体管的侧壁间隔物具有与至少第二场效应晶体管不同的宽度,第三场效应晶体管的栅电极具有与至少第一场效应晶体管不同的长度, 存储器和第三场效应晶体管的栅极绝缘膜的厚度大于第二场效应晶体管的厚度。
    • 8. 发明申请
    • Semiconductor device and a method of manufacturing the same
    • 半导体装置及其制造方法
    • US20060214256A1
    • 2006-09-28
    • US11443252
    • 2006-05-31
    • Masaaki ShinoharaKozo WatanabeFukuo OwadaTakashi Aoyama
    • Masaaki ShinoharaKozo WatanabeFukuo OwadaTakashi Aoyama
    • H01L29/00
    • H01L27/11568H01L27/115
    • A semiconductor device having a rewritable nonvolatile memory cell including a first field effect transistor for memory, a circuit including a second field effect transistor and a circuit including a third field effect transistor, the transistors each including a gate insulating film formed over a semiconductor substrate, a gate electrode over the gate insulating film and sidewall spacers over the sidewalls of the corresponding gate electrode. Sidewall spacers of the first field effect transistor are different from those of at least the second field effect transistors. Also, the gate insulating film of the third field effect transistor has a thickness larger than that of the second field effect transistor and the gate electrode of the third field effect transistor has a length different from that of either the first field effect transistor or second field effect transistor. The sidewall spacers of the first field effect transistor include a first silicon oxide film, a first silicon nitride film over the first silicon oxide film and a second silicon oxide film over the first silicon nitride film.
    • 一种半导体器件,具有可重写非易失性存储单元,其包括用于存储的第一场效应晶体管,包括第二场效应晶体管的电路和包括第三场效应晶体管的电路,所述晶体管包括形成在半导体衬底上的栅极绝缘膜, 在栅极绝缘膜上方的栅电极和相应栅电极的侧壁上的侧壁间隔物。 第一场效应晶体管的侧壁间隔物与至少第二场效应晶体管的侧壁间隔物不同。 此外,第三场效应晶体管的栅极绝缘膜的厚度大于第二场效应晶体管的栅极绝缘膜,第三场效应晶体管的栅电极的长度与第一场效应晶体管或第二场效应晶体管的长度不同 效应晶体管。 第一场效应晶体管的侧壁间隔物包括第一氧化硅膜,第一氧化硅膜上的第一氮化硅膜和位于第一氮化硅膜上的第二氧化硅膜。