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1. 发明授权

US5782638A Ornamental film article for dental substrate decoration and dental substrate decorated therewith 失效
标题翻译：用于牙科基材装饰的装饰膜制品和用其装饰的牙科基材
公开(公告)号：US5782638A
公开(公告)日：1998-07-21
申请号：US596042
申请日：1996-02-06
申请人： A. Daniel Warren, III , Gary E. Michels , Steven J. Hultquist
发明人： A. Daniel Warren, III , Gary E. Michels , Steven J. Hultquist
IPC分类号： A44C15/00 , A44C25/00 , A61C7/04 , A61C7/16 , A61C5/08
CPC分类号： A44C15/007 , A44C15/0005 , A61C7/023 , A61C7/04 , A61C7/16
摘要： An ornamental metal foil applique for adhesive securement to a dental substrate, comprises a metal foil body having main top and bottom faces of a predetermined shape, preferably with a maximum facial area dimension not exceeding 1 centimeter. The main bottom face may be microetched over at least a major portion of its facial area to enhance the adhesive securement of the applique to the dental substrate and/or have a mesh backing member or other formaminous backing structure secured to such face of the metal foil body. The applique of the invention may be usefully employed for ornamenting a dental substrate of an individual whose mouth contains such dental substrate, by bonding the main bottom face of the shaped metal foil to the dental substrate with an adhesive medium so that the ornamental metal foil applique is in a selected display position on the dental substrate.
摘要翻译：用于粘合固定到牙科基底的装饰性金属箔贴片+ E，acu e + EE包括金属箔体，其具有预定形状的主顶面和底面，优选最大面部面积尺寸不超过1厘米。主底面可以在其面部区域的至少大部分上进行微蚀刻，以增强贴敷+ E，acu e + EE到牙科基底的粘合剂固定，和/或具有网状背衬构件或其它形成网状背衬结构到金属箔体的这种面。本发明的贴布+ E，acu e + EE可以有用地用于装饰口腔中含有这种牙科基材的个体的牙科基底，通过使用粘合剂介质将成形金属箔的主底面粘合到牙科基底上使得装饰金属箔贴片+ E，acu e + EE处于牙科基底上的选定的显示位置。

2. 发明申请

US20100213083A1 Fluid Storage and Dispensing Systems, and Fluid Supply Processes Comprising Same 有权
标题翻译：流体储存和分配系统以及包含其的流体供应过程
公开(公告)号：US20100213083A1
公开(公告)日：2010-08-26
申请号：US11913553
申请日：2006-05-03
申请人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
发明人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
IPC分类号： F17C11/00 , F17C9/00
CPC分类号： F17C11/00 , F17C2201/0109 , F17C2201/032 , F17C2201/035 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/0639 , F17C2203/0678 , F17C2205/0184 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0391 , F17C2221/011 , F17C2221/013 , F17C2221/014 , F17C2221/031 , F17C2221/033 , F17C2221/035 , F17C2221/037 , F17C2223/0123 , F17C2223/013 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/013 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/0114 , F17C2227/0135 , F17C2227/0157 , F17C2250/032 , F17C2250/0443 , F17C2250/0636 , F17C2270/0168 , F17C2270/02 , F17C2270/0518
摘要： Fluid storage and dispensing systems, and processes for supplying fluids for use thereof. Various arrangements of fluid storage and dispensing systems are described, involving permutations of the physical sorbent-containing fluid storage and dispensing vessels and internal regulator-equipped fluid storage and dispensing vessels. The systems and processes are applicable to a wide variety of end-use applications, including storage and dispensing of hazardous fluids with enhanced safety. In a specific end-use application, reagent gas is dispensed to a semiconductor manufacturing facility from a large-scale, fixedly positioned fluid storage and dispensing vessel containing physical sorbent holding gas at subatmospheric pressure, with such vessel being refillable from a safe gas source of refill gas, as disclosed herein.
摘要翻译：流体储存和分配系统以及用于供应流体的方法。描述了流体存储和分配系统的各种布置，包括物理吸附剂流体存储和分配容器和内部调节器装备的流体存储和分配容器的排列。这些系统和工艺适用于各种各样的最终用途应用，包括存储和分配危险液体，并具有更高的安全性。在特定的最终用途应用中，反应气体从大规模固定位置的流体存储和分配容器中分配到半导体制造设备，所述流体储存和分配容器含有在低于大气压的气体保持气体的物理吸附剂，所述容器可再填充于安全气体源再填充气体，如本文所公开的。

3. 发明授权

US07951225B2 Fluid storage and dispensing systems, and fluid supply processes comprising same 有权
标题翻译：流体储存和分配系统以及包括该流体储存和分配系统的流体供应过程
公开(公告)号：US07951225B2
公开(公告)日：2011-05-31
申请号：US11913553
申请日：2006-05-03
申请人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
发明人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
IPC分类号： B01D53/02
CPC分类号： F17C11/00 , F17C2201/0109 , F17C2201/032 , F17C2201/035 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/0639 , F17C2203/0678 , F17C2205/0184 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0391 , F17C2221/011 , F17C2221/013 , F17C2221/014 , F17C2221/031 , F17C2221/033 , F17C2221/035 , F17C2221/037 , F17C2223/0123 , F17C2223/013 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/013 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/0114 , F17C2227/0135 , F17C2227/0157 , F17C2250/032 , F17C2250/0443 , F17C2250/0636 , F17C2270/0168 , F17C2270/02 , F17C2270/0518
摘要： Fluid storage and dispensing systems, and processes for supplying fluids for use thereof. Various arrangements of fluid storage and dispensing systems are described, involving permutations of the physical sorbent-containing fluid storage and dispensing vessels and internal regulator-equipped fluid storage and dispensing vessels. The systems and processes are applicable to a wide variety of end-use applications, including storage and dispensing of hazardous fluids with enhanced safety. In a specific end-use application, reagent gas is dispensed to a semiconductor manufacturing facility from a large-scale, fixedly positioned fluid storage and dispensing vessel containing physical sorbent holding gas at subatmospheric pressure, with such vessel being refillable from a safe gas source of refill gas, as disclosed herein.
摘要翻译：流体储存和分配系统以及用于供应流体的方法。描述了流体存储和分配系统的各种布置，包括物理吸附剂流体存储和分配容器和内部调节器装备的流体存储和分配容器的排列。这些系统和工艺适用于各种各样的最终用途应用，包括存储和分配危险液体，并具有更高的安全性。在特定的最终用途应用中，反应气体从大规模固定位置的液体储存和分配容器中分配到半导体制造设备，所述流体储存和分配容器含有处于低于大气压的气体的物理吸附剂，该容器可以从安全气体源再填充气体，如本文所公开的。

4. 发明申请

US20110226874A1 FLUID STORAGE AND DISPENSING SYSTEMS, AND FLUID SUPPLY PROCESSES COMPRISING SAME 有权
标题翻译：流体储存和分配系统，以及包含其的流体供应方法
公开(公告)号：US20110226874A1
公开(公告)日：2011-09-22
申请号：US13149666
申请日：2011-05-31
申请人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
发明人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
IPC分类号： B05B7/04 , F17C11/00 , B01D53/02
CPC分类号： F17C11/00 , F17C2201/0109 , F17C2201/032 , F17C2201/035 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/0639 , F17C2203/0678 , F17C2205/0184 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0391 , F17C2221/011 , F17C2221/013 , F17C2221/014 , F17C2221/031 , F17C2221/033 , F17C2221/035 , F17C2221/037 , F17C2223/0123 , F17C2223/013 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/013 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/0114 , F17C2227/0135 , F17C2227/0157 , F17C2250/032 , F17C2250/0443 , F17C2250/0636 , F17C2270/0168 , F17C2270/02 , F17C2270/0518
摘要： Fluid storage and dispensing systems, and processes for supplying fluids for use thereof. Various arrangements of fluid storage and dispensing systems are described, involving permutations of the physical sorbent-containing fluid storage and dispensing vessels and internal regulator-equipped fluid storage and dispensing vessels. The systems and processes are applicable to a wide variety of end-use applications, including storage and dispensing of hazardous fluids with enhanced safety. In a specific end-use application, reagent gas is dispensed to a semiconductor manufacturing facility from a large-scale, fixedly positioned fluid storage and dispensing vessel containing physical sorbent holding gas at subatmospheric pressure, with such vessel being refillable from a safe gas source of refill gas, as disclosed herein.
摘要翻译：流体储存和分配系统以及用于供应流体的方法。描述了流体存储和分配系统的各种布置，包括物理吸附剂流体存储和分配容器和内部调节器装备的流体存储和分配容器的排列。这些系统和工艺适用于各种各样的最终用途应用，包括存储和分配危险液体，并具有更高的安全性。在特定的最终用途应用中，反应气体从大规模固定位置的流体存储和分配容器中分配到半导体制造设备，所述流体储存和分配容器含有在低于大气压的气体保持气体的物理吸附剂，所述容器可再填充于安全气体源再填充气体，如本文所公开的。

5. 发明授权

US06764755B2 Channelized sorbent media, and methods of making same 有权
标题翻译：通道化吸附剂介质及其制备方法
公开(公告)号：US06764755B2
公开(公告)日：2004-07-20
申请号：US10023493
申请日：2001-12-17
申请人： Glenn M. Tom , Steven J. Hultquist
发明人： Glenn M. Tom , Steven J. Hultquist
IPC分类号： B32B516
CPC分类号： B01J20/28014 , B01J20/08 , B01J20/103 , B01J20/14 , B01J20/16 , B01J20/20 , B01J20/26 , B01J20/28004 , B01J20/28016 , B01J20/28019 , B01J20/2803 , B01J20/28033 , B01J20/28042 , B01J20/28045 , B01J20/28078 , B01J20/2808 , B01J20/28095 , Y10S95/90 , Y10S95/901 , Y10S95/903 , Y10T428/249953 , Y10T428/249971 , Y10T428/249974 , Y10T428/249975 , Y10T428/2982 , Y10T428/2995
摘要： A channelized sorbent material comprises porous sorbent particles characterized by an average pore diameter. Each sorbent particle has at least one interior channel of an average transverse dimension (i.e. transverse diameter) that is at least ten times larger than the average pore diameter of the porous sorbent particle. The interior channel may constitute a single cylindrical through-bore in the sorbent particle, or alternatively, an array of intersecting or non-intersecting channels. The porous sorbent particles preferably comprise bead activated carbon particles. Such channelized sorbent material is particular useful as sorbent media in an adsorption-desorption apparatus for storage and dispensing of a sorbable fluid.
摘要翻译：通道化的吸附剂材料包括以平均孔径为特征的多孔吸附剂颗粒。每个吸附剂颗粒具有至少一个平均横向尺寸（即横向直径）的内部通道，其至少比多孔吸附剂颗粒的平均孔径大十倍。内部通道可以构成吸附剂颗粒中的单个圆柱形通孔，或者可以是相交或非相交通道的阵列。多孔吸附剂颗粒优选包含珠粒活性炭颗粒。这种通道化的吸附剂材料特别用作用于储存和分配可吸附流体的吸附 - 解吸装置中的吸附剂介质。

6. 发明授权

US6132492A Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same 失效
标题翻译：用于分配高纯度气体的基于吸附剂的气体储存和输送系统，以及利用其制造半导体器件，产品和前体结构的装置和工艺
公开(公告)号：US6132492A
公开(公告)日：2000-10-17
申请号：US82596
申请日：1998-05-21
申请人： Steven J. Hultquist , Glenn M. Tom , Peter S. Kirlin , James V. McManus
发明人： Steven J. Hultquist , Glenn M. Tom , Peter S. Kirlin , James V. McManus
IPC分类号： B01D53/04 , B01D53/22 , B01D53/34 , F17C11/00
CPC分类号： B01D53/0446 , B01D53/229 , B01D53/34 , F17C11/00 , B01D2253/102 , B01D2253/104 , B01D2253/108 , B01D2253/202 , B01D2256/26 , B01D2258/0216 , B01D2259/4525 , F17C2223/0123 , F17C2270/0518 , H01J2237/006 , H01J2237/31701 , Y10S95/901 , Y10S95/902
摘要： A sorbent-based gas storage and dispensing system, including a storage and dispensing vessel containing a solid-phase physical sorbent medium having a sorbate gas physically adsorbed thereon. A chemisorbent material is provided in the vessel to chemisorb the impurities for gas phase removal thereof in the storage and dispensing vessel. Desorbed sorbate gas is discharged from the storage and dispensing vessel by a dispensing assembly coupled to the vessel. The chemisorbent may be provided in a capsule including an impurity-permeable, but sorbate gas-impermeable membrane, and installed in the vessel at the time of sorbent material loading. Semiconductor manufacturing processes and products manufactured by such processes are described.
摘要翻译：一种基于吸附剂的气体储存和分配系统，包括储存和分配容器，其含有物理吸附在其上的山梨酸气体的固相物理吸附剂介质。在容器中提供化学吸附剂材料以化学吸附杂质，以便在储存和分配容器中气相除去。解吸的山梨酸气体通过联接到容器的分配组件从储存和分配容器排出。化学吸附剂可以设置在胶囊中，包括杂质可渗透但不吸水气体的不透气膜，并且在吸附剂材料装载时安装在容器中。描述了通过这些工艺制造的半导体制造工艺和产品。

7. 发明授权

US4936877A Dopant delivery system for semiconductor manufacture 失效
标题翻译：用于半导体制造的掺杂剂输送系统
公开(公告)号：US4936877A
公开(公告)日：1990-06-26
申请号：US381583
申请日：1989-07-18
申请人： Steven J. Hultquist , Glenn M. Tom
发明人： Steven J. Hultquist , Glenn M. Tom
IPC分类号： B01D53/22 , C30B25/14
CPC分类号： C23C16/45561 , B01D53/22 , C30B25/14
摘要： A gas delivery system for supplying a vapor phase constituent at low concentration in a carrier gas, wherein the carrier gas is flowed through a contacting zone in which is disposed a permeable film through which the vapor phase constituent permeates into the contacing zone, to yield a product gas mixture comprising the vapor phase constituent and the carrier gas. In a particularly preferred embodiment, concentration of the vapor phase constituent in the product gas mixture is sensed, e.g., by a surface acoustical wave (SAW) concentration sensor device, and the concentration sensing is employed to controllably adjust the flow rate of the carrier gas flowed through the contacting zone, to maintain a selected delivery rate and concentration of the vapor phase constituent in the product gas mixture. The gas delivery system of the invention has particular utility for supplying gaseous dopant source compounds such as arsine, hydrogen selenide, and/or hydrogen telluride, for fabrication of semiconducting materials and semiconductor devices.
摘要翻译：一种用于在载气中提供低浓度的气相成分的气体输送系统，其中所述载气流过其中设置有透气膜的接触区，所述渗透膜通过所述渗透膜，所述气相组分渗透到所述引导区中，以产生产物气体混合物，其包含气相成分和载气。在特别优选的实施方案中，例如通过表面声波（SAW）浓度传感器装置感测产物气体混合物中气相成分的浓度，采用浓度检测来可控地调节载气的流速流过接触区，以保持产物气体混合物中气相成分选择的输送速率和浓度。本发明的气体输送系统特别适用于供应气态掺杂剂源化合物如胂，硒化氢和/或碲化氢，以制造半导体材料和半导体器件。

8. 发明授权

US08282023B2 Fluid storage and dispensing systems, and fluid supply processes comprising same 有权
标题翻译：流体储存和分配系统以及包括该流体储存和分配系统的流体供应过程
公开(公告)号：US08282023B2
公开(公告)日：2012-10-09
申请号：US13149666
申请日：2011-05-31
申请人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
发明人： W. Karl Olander , James V. McManus , Steven J. Hultquist , Jose I. Arno , Peter C. Van Buskirk
IPC分类号： B01D53/02
CPC分类号： F17C11/00 , F17C2201/0109 , F17C2201/032 , F17C2201/035 , F17C2201/054 , F17C2201/056 , F17C2201/058 , F17C2203/0639 , F17C2203/0678 , F17C2205/0184 , F17C2205/0326 , F17C2205/0329 , F17C2205/0338 , F17C2205/0391 , F17C2221/011 , F17C2221/013 , F17C2221/014 , F17C2221/031 , F17C2221/033 , F17C2221/035 , F17C2221/037 , F17C2223/0123 , F17C2223/013 , F17C2223/033 , F17C2223/035 , F17C2225/0123 , F17C2225/013 , F17C2225/033 , F17C2225/035 , F17C2225/038 , F17C2227/0114 , F17C2227/0135 , F17C2227/0157 , F17C2250/032 , F17C2250/0443 , F17C2250/0636 , F17C2270/0168 , F17C2270/02 , F17C2270/0518
摘要： Fluid storage and dispensing systems, and processes for supplying fluids for use thereof. Various arrangements of fluid storage and dispensing systems are described, involving permutations of the physical sorbent-containing fluid storage and dispensing vessels and internal regulator-equipped fluid storage and dispensing vessels. The systems and processes are applicable to a wide variety of end-use applications, including storage and dispensing of hazardous fluids with enhanced safety. In a specific end-use application, reagent gas is dispensed to a semiconductor manufacturing facility from a large-scale, fixedly positioned fluid storage and dispensing vessel containing physical sorbent holding gas at subatmospheric pressure, with such vessel being refillable from a safe gas source of refill gas, as disclosed herein.
摘要翻译：流体储存和分配系统以及用于供应流体的方法。描述了流体存储和分配系统的各种布置，包括物理吸附剂流体存储和分配容器和内部调节器装备的流体存储和分配容器的排列。这些系统和工艺适用于各种各样的最终用途应用，包括存储和分配危险液体，并具有更高的安全性。在特定的最终用途应用中，反应气体从大规模固定位置的流体存储和分配容器中分配到半导体制造设备，所述流体储存和分配容器含有在低于大气压的气体保持气体的物理吸附剂，所述容器可再填充于安全气体源再填充气体，如本文所公开的。

9. 发明授权

US06474076B2 Fluid storage and dispensing system featuring externally adjustable regulator assembly for high flow dispensing 有权
标题翻译：流体存储和分配系统，具有外部可调整的调节器组件，用于高流量分配
公开(公告)号：US06474076B2
公开(公告)日：2002-11-05
申请号：US10017970
申请日：2001-11-12
申请人： Luping Wang , Glenn M. Tom , James A. Dietz , Steven M. Lurcott , Steven J. Hultquist
发明人： Luping Wang , Glenn M. Tom , James A. Dietz , Steven M. Lurcott , Steven J. Hultquist
IPC分类号： F17C704
CPC分类号： F17C7/04 , F17C7/02 , F17C13/025 , F17C13/04 , F17C2201/0109 , F17C2201/0114 , F17C2201/032 , F17C2201/058 , F17C2203/0643 , F17C2203/0646 , F17C2205/018 , F17C2205/0338 , F17C2205/0341 , F17C2205/0382 , F17C2205/0385 , F17C2205/0391 , F17C2223/0123 , F17C2223/0153 , F17C2223/035 , F17C2250/032 , F17C2250/034 , F17C2250/043 , F17C2250/0636 , F17C2265/04 , F17C2270/025 , F17C2270/05 , F17C2270/0518
摘要： A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a superatmospheric pressure set point for dispensing.
摘要翻译：一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。容器包括用于从容器排出流体的流体排出口。流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压力设定点。

10. 发明授权

US06360546B1 Fluid storage and dispensing system featuring externally adjustable regulator assembly for high flow dispensing 失效
标题翻译：流体储存和分配系统，具有外部可调节调节器组件，用于高流量分配
公开(公告)号：US06360546B1
公开(公告)日：2002-03-26
申请号：US09635961
申请日：2000-08-10
申请人： Luping Wang , Glenn M. Tom , James A Dietz , Steven M. Lurcott , Steven J. Hultquist
发明人： Luping Wang , Glenn M. Tom , James A Dietz , Steven M. Lurcott , Steven J. Hultquist
IPC分类号： F17C704
CPC分类号： F17C7/04 , F17C7/02 , F17C13/025 , F17C13/04 , F17C2201/0109 , F17C2201/0114 , F17C2201/032 , F17C2201/058 , F17C2203/0643 , F17C2203/0646 , F17C2205/018 , F17C2205/0338 , F17C2205/0341 , F17C2205/0382 , F17C2205/0385 , F17C2205/0391 , F17C2223/0123 , F17C2223/0153 , F17C2223/035 , F17C2250/032 , F17C2250/034 , F17C2250/043 , F17C2250/0636 , F17C2265/04 , F17C2270/025 , F17C2270/05 , F17C2270/0518
摘要： A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a super atmospheric pressure set point for dispensing.
摘要翻译：一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。容器包括用于从容器排出流体的流体排出口。流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压设定点。

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