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    • 1. 发明授权
    • Substrate treating apparatus and substrate treating method
    • 基板处理装置及基板处理方法
    • US08372299B2
    • 2013-02-12
    • US12411266
    • 2009-03-25
    • Yasunori NakajimaYusuke Mori
    • Yasunori NakajimaYusuke Mori
    • C03C15/00
    • B08B3/08B08B3/048
    • A method and apparatus for performing treatment of substrates with a treating liquid. A first storage unit stores an initial life count specifying an allowable number of treatments of substrates to be carried out with treating liquid after an entire liquid replacement with a new supply of the treating liquid; a second storage device stores a normal life count specifying an allowable number of treatments to be carried out with the treating liquid after reaching the initial life count and after a partial liquid replacement; and a control device repeats treatment of the substrates after the entire liquid replacement until the initial life count is reached; and after the initial life count has been reached and the partial liquid replacement has been made, repeats treatment of the substrates until the normal life count is reached, and makes the partial liquid replacement each succeeding time the normal life count is reached.
    • 一种用处理液进行基材处理的方法和装置。 第一存储单元存储初始寿命数,其指定在处理液的新供应之后,在整个液体置换之后,用待处理液进行处理的基板的允许数量; 第二存储装置在达到初始寿命计数之后和在部分液体置换之后存储指定要用处理液进行的处理的允许数量的正常寿命计数; 并且控制装置在整个液体置换之后重复对基板的处理,直到达到初始寿命计数; 在达到初始寿命计数并进行部分液体置换之后,重复对基板的处理,直到达到正常寿命计数,并且在随后的时间达到正常寿命计数之后进行部分液体置换。
    • 9. 发明申请
    • SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
    • 基板处理装置和基板处理方法
    • US20090246968A1
    • 2009-10-01
    • US12411266
    • 2009-03-25
    • Yasunori NAKAJIMAYusuke MORI
    • Yasunori NAKAJIMAYusuke MORI
    • H01L21/306B08B3/00
    • B08B3/08B08B3/048
    • A substrate treating apparatus for performing treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid and performing a predetermined treatment of the substrates; a treating liquid supply unit for supplying the treating liquid to the treating tank; a treating liquid discharge unit for discharging the treating liquid from the treating tank; a first storage unit for storing in advance an initial life count specifying an allowable number of treatments of the substrates to be carried out with the treating liquid after an entire liquid replacement which replenishes the treating tank with a new supply the treating liquid from the treating liquid supply unit; a second storage device for storing in advance a normal life count specifying an allowable number of treatments to be carried out with the treating liquid after reaching the initial life count and after a partial liquid replacement which discharges part of the treating liquid in a predetermined amount from the treating tank through the treating liquid discharge device and replenishes, from the treating liquid supply device, a new supply of the treating liquid in an amount corresponding to the predetermined amount; and a control device for performing treatment of the substrates until the initial life count is reached after the entire liquid replacement, and after the initial life count is reached and the partial liquid replacement is made, performing treatment of the substrates while making the partial liquid replacement each time the normal life count is reached.
    • 一种用处理液进行基板处理的基板处理装置。 该设备包括处理槽,用于储存处理液并执行基板的预定处理; 处理液供给单元,其将处理液供给到处理槽; 处理液体排出单元,用于从处理槽排出处理液; 第一存储单元,用于在补充处理槽的整个液体替换之后,预先存储指定要执行的待处理基板的允许数量的初始寿命,该处理液从处理液中新提供处理液 供应单位 第二存储装置,用于预先存储指定在达到初始寿命计数之后用处理液进行的允许处理次数的正常寿命计数,以及在部分液体置换之后,将处理液的一部分从预定量排出 处理槽通过处理液体排出装置从处理液供给装置补充处理液的新供给量,其量相当于预定量; 以及控制装置,用于在整个液体置换之后进行基板的处理直到达到初始寿命计数,并且在达到初始寿命计数并进行部分液体更换之后,在进行部分液体置换的同时对基板进行处理 每次达到正常生活计数。