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1. 发明授权

US06979519B2 Phase shifting circuit manufacture method and apparatus 有权
标题翻译：相移电路制造方法及装置
公开(公告)号：US06979519B2
公开(公告)日：2005-12-27
申请号：US10843974
申请日：2004-05-12
申请人： Yao-Ting Wang , Yagyensh C. Pati
发明人： Yao-Ting Wang , Yagyensh C. Pati
IPC分类号： G03F1/00 , G03F1/26 , G03F1/30 , G03F1/34 , G03F1/36 , G03F7/14 , G03F7/20 , G06F17/50 , G01F9/00
CPC分类号： G03F7/70283 , G03F1/26 , G03F1/30 , G03F1/34 , G03F1/36 , G03F1/70 , G03F7/2022 , G03F7/70433 , G03F7/70441 , G03F7/705 , G06F17/5068
摘要： A method for manufacturing integrated circuits using opaque field, phase shift masking. One embodiment of the invention includes using a two mask process. The first mask is an opaque-field phase shift mask and the second mask is a single phase structure mask. A phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask.
摘要翻译：一种使用不透光场，相移屏蔽制造集成电路的方法。本发明的一个实施例包括使用两个掩模过程。第一掩模是不透明场相移掩模，第二掩模是单相结构掩模。使用不透明场上的相移重叠区域将相移窗与不透明场对准。相移掩模主要限定需要相移的区域。单相结构掩模主要限定不需要相移的区域。单相结构掩模还防止相移区域的擦除，并且防止产生否则将由相移掩模产生的不期望的伪影区域。

2. 发明申请

US20090138907A1 Remote control unit for a personalized video programming system 审中-公开
标题翻译：用于个性化视频编程系统的遥控单元
公开(公告)号：US20090138907A1
公开(公告)日：2009-05-28
申请号：US12290583
申请日：2008-10-31
申请人： Philip R. Wiser , Yagyensh C. Pati , Michael Youssefmir
发明人： Philip R. Wiser , Yagyensh C. Pati , Michael Youssefmir
IPC分类号： H04N7/025 , H04N5/44 , H04N7/16 , H04N5/445
CPC分类号： H04N5/4403 , H04N5/44543 , H04N21/25866 , H04N21/2668 , H04N21/42204 , H04N21/4415 , H04N21/44222 , H04N21/4532 , H04N21/4751 , H04N21/4753 , H04N21/4755 , H04N21/812 , H04N2005/4432 , H04N2005/4439 , H04N2005/4442 , H04N2005/4444
摘要： Systems and methods for a remote control for interacting with a video programming system are described. In some embodiments, a remote control unit for an intelligent video programming system having user-dedicated buttons, biometric identification systems, mechanical identification systems, electromechanical identification systems, or voice-activation identification systems on the remote control unit to allow a user to self-identify that user to the intelligent video programming system. Upon pressing this user-dedicated button or otherwise activating a self-identification system on the remote control unit, content personalized for that user is presented and the user's navigational behavior is tracked to further the presentation of personalized content for that user. Other embodiments are also described.
摘要翻译：描述用于与视频编程系统交互的遥控器的系统和方法。在一些实施例中，用于智能视频编程系统的遥控单元，其具有用户专用按钮，生物识别系统，机械识别系统，机电识别系统或遥控单元上的语音激活识别系统，将该用户识别到智能视频编程系统。在按下该用户专用按钮或以其他方式激活远程控制单元上的自我识别系统时，呈现为该用户个性化的内容，并跟踪用户的导航行为以进一步提供该用户的个性化内容的呈现。还描述了其它实施例。

3. 发明授权

US06757645B2 Visual inspection and verification system 有权
公开(公告)号：US06757645B2
公开(公告)日：2004-06-29
申请号：US09130996
申请日：1998-08-07
申请人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard N. Karklin
发明人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard N. Karklin
IPC分类号： G06F1750
CPC分类号： G06T7/0004 , G03F1/26 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/705 , G06F17/5068 , G06T2207/30148
摘要： A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area image is an image of a portion of a photolithography mask, and providing a set of lithography parameters as a second input to the image simulator. The defect area image may be provided by an inspection tool which scans the photolithography mask for defects using a high resolution microscope and captures images of areas of the mask around identified potential defects. The image simulator generates a first simulated image in response to the defect area image and the set of lithography parameters. The first simulated image is a simulation of an image which would be printed on a wafer if the wafer were to be exposed to an illumination source directed through the portion of the mask. The method may also include providing a second simulated image which is a simulation of the wafer print of the portion of the design mask which corresponds to the portion represented by the defect area image. The method also provides for the comparison of the first and second simulated images in order to determine the printability of any identified potential defects on the photolithography mask. A method of determining the process window effect of any identified potential defects is also provided for.

4. 发明授权

US06566023B2 Phase shifting circuit manufacture method and apparatus 有权
标题翻译：相移电路制造方法及装置
公开(公告)号：US06566023B2
公开(公告)日：2003-05-20
申请号：US10154858
申请日：2002-05-24
申请人： Yao-Ting Wang , Yagyensh C. Pati
发明人： Yao-Ting Wang , Yagyensh C. Pati
IPC分类号： G03F900
CPC分类号： G03F7/70283 , G03F1/26 , G03F1/30 , G03F1/34 , G03F1/36 , G03F1/70 , G03F7/2022 , G03F7/70433 , G03F7/70441 , G03F7/705 , G06F17/5068
摘要： A two mask process for small dimension features on an integrated circuit improves manufacturability and design tolerance. The first mask is an opaque-field phase shift mask and the second mask is a single phase structure mask. A phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask.
摘要翻译：集成电路上的小尺寸特征的两个掩模过程提高了可制造性和设计容差。第一掩模是不透明场相移掩模，第二掩模是单相结构掩模。使用不透明场上的相移重叠区域将相移窗与不透明场对准。相移掩模主要限定需要相移的区域。单相结构掩模主要限定不需要相移的区域。单相结构掩模还防止相移区域的擦除，并且防止产生否则将由相移掩模产生的不期望的伪影区域。

5. 发明申请

US20100325666A1 SYSTEM FOR CONTENT DELIVERY 有权
标题翻译：内容交付系统
公开(公告)号：US20100325666A1
公开(公告)日：2010-12-23
申请号：US12819001
申请日：2010-06-18
申请人： Philip R. WISER , Yagyensh C. Pati , Garry M. Paxinos , Michael Youssefmir , James Vincent Burmeister , Anderson Hoyt Jackson , Richard Blair Leavell
发明人： Philip R. WISER , Yagyensh C. Pati , Garry M. Paxinos , Michael Youssefmir , James Vincent Burmeister , Anderson Hoyt Jackson , Richard Blair Leavell
IPC分类号： H04N5/445
CPC分类号： H04N7/17336 , H04N21/2402 , H04N21/26216 , H04N21/631 , H04N21/6338 , H04N21/64738
摘要： A system for and method of transmitting audio and visual programming content, by identifying an amount of broadcast transmission capacity available for transmitting the content to one or more users. The content is separated into at least first and second portions based on user demand for the content and/or the identified available broadcast transmission capacity. The first portion of the content is transmitted, to a receiver/STB associated with at least one of the users, using the identified broadcast transmission capacity; and the second portion of the content is transmitted to the receiver using transmission other than broadcast transmission. The content can include nonlinear content. Transmission other than broadcast transmission can include unicast transmission, which can be in response to a user request and/or an initiation by a server. The received nonlinear content can be stored at the receiver for play back at a time different from the time of transmission.
摘要翻译：通过识别可用于向一个或多个用户发送内容的广播传输容量的量，发送音频和视频节目内容的系统和方法。基于用户对内容的需求和/或所识别的可用广播传输容量，将内容分成至少第一和第二部分。使用所识别的广播传输容量将内容的第一部分发送到与至少一个用户相关联的接收机/ STB; 并且使用除了广播传输之外的传输将内容的第二部分发送到接收机。内容可以包括非线性内容。广播传输以外的传输可以包括单播传输，其可以响应于用户请求和/或服务器的启动。接收到的非线性内容可以存储在接收机处，以便与传输时间不同的时间进行播放。

6. 发明申请

US20100031162A1 Viewer interface for a content delivery system 审中-公开
标题翻译：用于内容传送系统的查看器界面
公开(公告)号：US20100031162A1
公开(公告)日：2010-02-04
申请号：US12082955
申请日：2008-04-14
申请人： Philip R. Wiser , David Allred , Erin Patrice Benjamin , James Vincent Burmeister , Yagyensh C. Pati , Perry Simon , Michael Youssefmir
发明人： Philip R. Wiser , David Allred , Erin Patrice Benjamin , James Vincent Burmeister , Yagyensh C. Pati , Perry Simon , Michael Youssefmir
IPC分类号： G06F3/01 , G06Q30/00
CPC分类号： H04N7/162 , G06Q30/0255 , H04N5/44543 , H04N7/0122 , H04N7/1675 , H04N21/25883 , H04N21/25891 , H04N21/4147 , H04N21/431 , H04N21/4532 , H04N21/454 , H04N21/458 , H04N21/466 , H04N21/4667 , H04N21/4668 , H04N21/47214 , H04N21/4755 , H04N21/482 , H04N21/4826 , H04N21/6125 , H04N21/812
摘要： A viewer interface for a content delivery system is described. In one embodiment, a method for displaying programming content described. This method, occurring in a receiver controller, includes receiving a user identification from an user interface device; in response to the user identification, activating an interactive graphical display personalized for a viewer identified by the user identification; and displaying, in the interactive graphical display, a menu of programming content that can be personalized for the viewer according to the viewer's viewing preferences, wherein the programming content can be received from at least one of a broadcast transmission and unicast transmission. Other embodiments are also described.
摘要翻译：描述了用于内容传送系统的查看器界面。在一个实施例中，一种用于显示所描述的节目内容的方法。发生在接收机控制器中的该方法包括从用户接口设备接收用户标识; 响应于用户标识，激活为由用户标识识别的观众个性化的交互式图形显示; 以及在所述交互式图形显示中，根据所述观看者的观看偏好在所述交互式图形显示中显示可以为观众个性化的节目内容的菜单，其中可以从广播传输和单播传输中的至少一个接收节目内容。还描述了其它实施例。

7. 发明授权

US07523027B2 Visual inspection and verification system 有权
标题翻译：目视检查和验证系统
公开(公告)号：US07523027B2
公开(公告)日：2009-04-21
申请号：US10878847
申请日：2004-06-28
申请人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard N. Karklin
发明人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard N. Karklin
IPC分类号： G06F17/50
CPC分类号： G06T7/0004 , G03F1/26 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/705 , G06F17/5068 , G06T2207/30148
摘要： A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area image is an image of a portion of a photolithography mask, and providing a set of lithography parameters as a second input to the image simulator. The defect area image may be provided by an inspection tool which scans the photolithography mask for defects using a high resolution microscope and captures images of areas of the mask around identified potential defects. The image simulator generates a first simulated image in response to the defect area image and the set of lithography parameters. The first simulated image is a simulation of an image which would be printed on a wafer if the wafer were to be exposed to an illumination source directed through the portion of the mask. The method may also include providing a second simulated image which is a simulation of the wafer print of the portion of the design mask which corresponds to the portion represented by the defect area image. The method also provides for the comparison of the first and second simulated images in order to determine the printability of any identified potential defects on the photolithography mask. A method of determining the process window effect of any identified potential defects is also provided for.
摘要翻译：提供了一种用于检查用于缺陷的光刻掩模的方法和装置。检查方法包括向图像模拟器提供缺陷区域图像，其中缺陷区域图像是光刻掩模的一部分的图像，并且提供一组光刻参数作为图像模拟器的第二输入。缺陷区域图像可以由检查工具提供，该检查工具使用高分辨率显微镜扫描光刻掩模以获得缺陷，并捕获围绕所识别的潜在缺陷的掩模区域的图像。图像模拟器响应于缺陷区域图像和光刻参数集合而生成第一模拟图像。第一模拟图像是如果将晶片暴露于通过该掩模的该部分的照明源而将被印刷在晶片上的图像的模拟。该方法还可以包括提供第二模拟图像，其是对应于由缺陷区域图像表示的部分的设计掩模的部分的晶片印刷的模拟。该方法还提供了第一和第二模拟图像的比较，以便确定光刻掩模上任何识别的潜在缺陷的可印刷性。还提供了确定任何识别的潜在缺陷的过程窗口效应的方法。

8. 发明申请

US20080301750A1 Networked antenna and transport system unit 审中-公开
标题翻译：网络天线和传输系统单元
公开(公告)号：US20080301750A1
公开(公告)日：2008-12-04
申请号：US12082954
申请日：2008-04-14
申请人： Robert Denton Silfvast , Yagyensh C. Pati , Garry M. Paxinos , Philip R. Wiser , Michael Youssefmir , Marc H. Goldberg , John Sanford
发明人： Robert Denton Silfvast , Yagyensh C. Pati , Garry M. Paxinos , Philip R. Wiser , Michael Youssefmir , Marc H. Goldberg , John Sanford
IPC分类号： H04N7/173
CPC分类号： H04N21/6125 , H04N7/17318 , H04N21/4147 , H04N21/4334 , H04N21/43615 , H04N21/43622 , H04N21/6112 , H04N21/6118
摘要： A networked antenna transport system unit receiving at least broadcast transmissions is described. In one embodiment, an apparatus for redirecting content includes an antenna element array for receiving content from a broadcast transmission. This antenna element array is coupled to receiver electronics via an amplifier and a switch for processing the received content; the receiver electronics is further coupled to a sender module which is remotely coupled to a receiver module in a receiver controller via a local area network; and the sender module is configured to transmit the processed received content via the local area network to the receiver module in the receiver controller for storage and selective display on a display device. Other embodiments are also described.
摘要翻译：描述了至少接收广播传输的网络化天线传输系统单元。在一个实施例中，用于重定向内容的装置包括用于从广播传输接收内容的天线单元阵列。该天线元件阵列经由用于处理所接收的内容的放大器和开关耦合到接收器电子设备; 接收机电子设备还被耦合到发送器模块，发送器模块经由局域网远程耦合到接收器控制器中的接收器模块; 并且所述发送器模块被配置为经由所述局域网将经处理的接收到的内容发送到所述接收机控制器中的接收器模块，以在显示设备上进行存储和选择性显示。还描述了其它实施例。

9. 发明授权

US07107571B2 Visual analysis and verification system using advanced tools 有权
公开(公告)号：US07107571B2
公开(公告)日：2006-09-12
申请号：US09906920
申请日：2001-07-16
申请人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard Karklin
发明人： Fang-Cheng Chang , Yao-Ting Wang , Yagyensh C. Pati , Linard Karklin
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/26 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/705 , G06T7/0004 , G06T2207/30148
摘要： A system and method of analyzing defects on a mask used in lithography are provided. A defect area image is provided as a first input, a set of lithography parameters is provided as a second input, and a set of metrology data is provided as a third input. The defect area image comprises an image of a portion of the mask. A simulated image can be generated in response to the first input. The simulated image comprises a simulation of an image that would be printed on a wafer if the wafer were exposed to a radiation source directed at the portion of the mask. The characteristics of the radiation source comprise the set of lithography parameters and the characteristics of the mask comprise the set of metrology data.

10. 发明授权

US08544048B2 System for content delivery 有权
公开(公告)号：US08544048B2
公开(公告)日：2013-09-24
申请号：US12819001
申请日：2010-06-18
申请人： Philip R. Wiser , Yagyensh C. Pati , Garry M. Paxinos , Michael Youssefmir , James Vincent Burmeister , Anderson Hoyt Jackson , Richard Blair Leavell
发明人： Philip R. Wiser , Yagyensh C. Pati , Garry M. Paxinos , Michael Youssefmir , James Vincent Burmeister , Anderson Hoyt Jackson , Richard Blair Leavell
IPC分类号： G06F3/00 , H04N7/20 , H04N7/173 , H04N7/16
CPC分类号： H04N7/17336 , H04N21/2402 , H04N21/26216 , H04N21/631 , H04N21/6338 , H04N21/64738
摘要： A system for and method of transmitting audio and visual programming content, by identifying an amount of broadcast transmission capacity available for transmitting the content to one or more users. The content is separated into at least first and second portions based on user demand for the content and/or the identified available broadcast transmission capacity. The first portion of the content is transmitted, to a receiver/STB associated with at least one of the users, using the identified broadcast transmission capacity; and the second portion of the content is transmitted to the receiver using transmission other than broadcast transmission. The content can include nonlinear content. Transmission other than broadcast transmission can include unicast transmission, which can be in response to a user request and/or an initiation by a server. The received nonlinear content can be stored at the receiver for play back at a time different from the time of transmission.

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