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1. 发明授权

US4322451A Method of forming a colloidal wetting sensitizer 失效
标题翻译：形成胶体润湿敏化剂的方法
公开(公告)号：US4322451A
公开(公告)日：1982-03-30
申请号：US75454
申请日：1979-09-14
申请人： John A. Emerson , Wesley P. Townsend
发明人： John A. Emerson , Wesley P. Townsend
IPC分类号： C23C18/28 , C23C3/02
CPC分类号： C23C18/28
摘要： A method of forming a colloidal wetting sensitizer is disclosed. The method comprises combining a stannous species and a cupric species in an aqueous medium maintained at a pH of between 0.4 and 1.5.
摘要翻译：公开了形成胶体润湿敏化剂的方法。该方法包括在保持pH在0.4和1.5之间的水性介质中混合亚锡种类和铜种。

2. 发明授权

US5412506A Free-space optical interconnection arrangement 失效
标题翻译：自由空间光互连布置
公开(公告)号：US5412506A
公开(公告)日：1995-05-02
申请号：US848456
申请日：1992-03-09
申请人： Avi Y. Feldblum , Jurgen Jahns , Casimir R. Nijander , Frank Sauer , Wesley P. Townsend
发明人： Avi Y. Feldblum , Jurgen Jahns , Casimir R. Nijander , Frank Sauer , Wesley P. Townsend
IPC分类号： G02B3/00 , G02B5/18 , G02B6/26 , G02B6/28 , G02B6/32 , G02B6/43 , G02B27/42 , G02B6/34 , G02F1/03
CPC分类号： G02B6/43 , G02B5/1876 , G02B5/1885 , G02B5/1895 , G02B6/2848 , G02B6/32
摘要： A diffractive and a refractive microlens component are combined into a doublet lens to obtain imaging properties that are improvements over those achievable using separate components. In one application, diffractive/refractive microlens arrays are arranged to provide a free-space optical permutation interconnect arrangement.
摘要翻译：将衍射和折射微透镜组件组合成双透镜，以获得与使用单独部件可实现的成像性能相比的改进的成像性质。在一个应用中，衍射/折射微透镜阵列被布置成提供自由空间光学置换互连布置。

3. 发明授权

US5370768A Method for making microstructures 失效
标题翻译：制造微结构的方法
公开(公告)号：US5370768A
公开(公告)日：1994-12-06
申请号：US135644
申请日：1993-10-14
申请人： Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
发明人： Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
IPC分类号： G02B3/00 , B44C1/22 , C03C15/00 , C03C25/06 , H01L21/306
CPC分类号： G02B3/0018 , G02B3/0056
摘要： Prior to the production of microlenses (29) by the reactive ion etch technique, a pattern of notches (25) is formed in a second surface of a substrate (11) opposite a first surface on which the microlenses (29) are to be formed. Reactive ion etching of the first surface to produce the microlenses is sufficiently deep to reach the pattern of notches, thereby to separate the substrate. The array of notches may define, for example, an array of first areas (26) on the second surface, each area being surrounded by a notch. Photoresist elements (28) are then each located on an area of the first surface corresponding to a first area of the second surface, so that the separation separates the substrate into a plurality of segments (26) each containing only one of the microlenses (29). The notches can be made such that each of the segments (26) is cylindrical so that each of the microlenses formed from the substrate has a circular outer periphery.
摘要翻译：在通过反应离子蚀刻技术生产微透镜（29）之前，在与要在其上形成微透镜（29）的第一表面相对的衬底（11）的第二表面中形成凹口（25）的图案。第一表面的反应离子蚀刻以产生微透镜足够深以达到凹口的图案，从而分离衬底。凹口阵列可以例如限定第二表面上的第一区域（26）的阵列，每个区域被凹口包围。光阻元件（28）然后各自位于与第二表面的第一区域对应的第一表面的区域上，使得该分离将基板分离成多个段（26），每个段仅包含一个微透镜（29 ）。可以制成切口，使得每个片段（26）是圆柱形的，使得由基底形成的每个微透镜具有圆形的外周边。

4. 发明授权

US4816811A Compliant overlay for use as an optically-based touch-sensitive screen 失效
标题翻译：兼容的叠加层，用作基于光学的触摸屏
公开(公告)号：US4816811A
公开(公告)日：1989-03-28
申请号：US715280
申请日：1985-03-15
申请人： Eric L. Bogatin , Xina S. Quan , Thomas A. Schwartz , Wesley P. Townsend
发明人： Eric L. Bogatin , Xina S. Quan , Thomas A. Schwartz , Wesley P. Townsend
IPC分类号： G06F3/041 , G06F3/033 , G06F3/042 , G09G1/00
CPC分类号： G06F3/042 , G06F3/0421
摘要： A resilient and deformable touch screen that is adapted to be overlaid on the surface of a CRT screen is formed from a semi-rigid plastic frame attached to a flexible plastic pouch filled with a soft resilient material which adheres to the surface of the pouch.
摘要翻译：适于覆盖在CRT屏幕的表面上的弹性和可变形的触摸屏由连接到柔性塑料袋的半刚性塑料框架形成，该柔性塑料袋填充有柔软的弹性材料，该弹性材料粘附到袋的表面。

5. 发明授权

US4537799A Selective metallization process 失效
标题翻译：选择性金属化工艺
公开(公告)号：US4537799A
公开(公告)日：1985-08-27
申请号：US600712
申请日：1984-04-16
申请人： John K. Dorey, II , Steven L. Schmidt , Wesley P. Townsend
发明人： John K. Dorey, II , Steven L. Schmidt , Wesley P. Townsend
IPC分类号： C23C18/16 , H05K3/18 , B05D5/12 , B05D1/32 , B05D3/10
CPC分类号： H05K3/184 , C23C18/1605 , C23C18/1651 , C23C18/1653 , C23C18/206 , C23C18/2066 , C23C18/24 , C23C18/26 , C23C18/30 , H05K2203/0706 , H05K2203/0783 , H05K2203/0789 , H05K2203/1415
摘要： A selective metallization process particularly suited for making printed circuit boards comprises the step of treating a substrate having a negative mask thereon with a reactant, e.g., acetic acid, which modifies the surface of the mask without affecting the substrate so as to remove or prevent an active catalytic layer from remaining on the surface of the mask thereby preventing electroless plating on the mask.
摘要翻译：特别适用于制造印刷电路板的选择性金属化处理包括用反应物（例如乙酸）处理其上具有负面掩模的基材的步骤，该反应物改变掩模的表面而不影响基材，从而去除或防止活性催化剂层保留在掩模的表面上，从而防止掩模上的无电镀。

6. 发明授权

US5439782A Methods for making microstructures 失效
标题翻译：制作微结构的方法
公开(公告)号：US5439782A
公开(公告)日：1995-08-08
申请号：US165203
申请日：1993-12-13
申请人： William H. Haemmerle , William M. MacDonald , Casimir R. Nijander , Joseph Shmulovich , Wesley P. Townsend , Yiu-Huen Wong
发明人： William H. Haemmerle , William M. MacDonald , Casimir R. Nijander , Joseph Shmulovich , Wesley P. Townsend , Yiu-Huen Wong
IPC分类号： C23F4/00 , G02B6/122 , G02B6/13 , G02B6/30 , G02B6/12
CPC分类号： G02B6/1228 , G02B6/1221 , G02B6/305
摘要： Tapered optical waveguides (33') can be easily made by using photolithographic masking and etching to define on a substrate (21) a first polymer structure (22) having a substantially uniform thickness and a tapered width. The first polymer structure is heated sufficiently to form a meniscus along its entire length. The fluidity causes the material to redistribute itself such that, rather than being of uniform thickness, it has a thickness that varies with its width; consequently, the thickness as well as the width of the first polymer structure becomes tapered. The first polymer is cooled and hardened to form a second polymer structure (22') that has a tapered width and a tapered thickness as is desirable for a tapered optical waveguide. The second polymer structure itself can be used as a tapered optical waveguide, or it can be used to control the reactive ion etching of the underlying substrate. In the latter case, the configuration of the tapered second polymer structure is replicated in a glass substrate, for example, which then may be used as a glass tapered optical waveguide (33').
摘要翻译：锥形光波导（33'）可以通过使用光刻掩模和蚀刻来在衬底（21）上限定具有基本上均匀的厚度和锥形宽度的第一聚合物结构（22）来容易地制成。第一聚合物结构被充分加热以在整个长度上形成弯液面。流动性导致材料重新分布自身，使得不是具有均匀的厚度，而是具有随其宽度而变化的厚度; 因此，第一聚合物结构的厚度以及宽度变得逐渐变细。将第一聚合物冷却并硬化以形成第二聚合物结构（22'），其具有如锥形光波导所需的锥形宽度和锥形厚度。第二聚合物结构本身可以用作锥形光波导，或者可以用于控制底层基板的反应离子蚀刻。在后一种情况下，锥形第二聚合物结构的构造被复制在例如可用作玻璃锥形光波导（33'）的玻璃基板中。

7. 发明授权

US5286338A Methods for making microlens arrays 失效
标题翻译：制造微透镜阵列的方法
公开(公告)号：US5286338A
公开(公告)日：1994-02-15
申请号：US24035
申请日：1993-03-01
申请人： Avi Y. Feldblum , Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
发明人： Avi Y. Feldblum , Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
IPC分类号： G02B3/00 , C03C15/00 , G01M11/02 , G02B6/12 , G02B6/124 , B44C1/22 , C03C25/06
CPC分类号： C03C15/00 , G01M11/02 , G02B6/1245 , G02B2006/12176
摘要： During a reactive ion etching process (FIG. 5) for making lens elements (15, FIG. 4) in a silica substrate (12), the gas constituency in the reactive ion etch chamber is changed to adjust the curvature of lens elements formed in the silica substrate and to reduce the aberrations of such lens elements. For example, two gases, CHF.sub.3 and oxygen may be supplied to the reactive ion etch chamber and, during the reactive ion etch process, the proportion of oxygen is significantly reduced, which reduces the aberrations of the lens elements formed by the process.
摘要翻译：在用于制造二氧化硅衬底（12）中的透镜元件（15，图4）的反应离子蚀刻工艺（图5）中，改变反应离子蚀刻室中的气体选区以调节形成在二氧化硅基底并减少这种透镜元件的像差。例如，可将两种气体CHF 3和氧气供应到反应离子蚀刻室，并且在反应离子蚀刻工艺期间，氧气的比例显着降低，这降低了由该方法形成的透镜元件的像差。

8. 发明授权

US5024873A Composite films with Langmuir-Blodgett component 失效
标题翻译：复合薄膜与Langmuir-Blodgett组件
公开(公告)号：US5024873A
公开(公告)日：1991-06-18
申请号：US280074
申请日：1988-12-05
申请人： John J. Burack , Jane D. LeGrange , Wesley P. Townsend
发明人： John J. Burack , Jane D. LeGrange , Wesley P. Townsend
IPC分类号： B32B15/08 , B05D1/20 , B32B7/02 , B32B9/00 , H01L21/312 , H05K3/28 , H05K3/46
CPC分类号： B05D1/202 , B82Y30/00 , B82Y40/00 , H05K3/281 , H05K2201/0154 , H05K2201/0195 , H05K2203/0577 , Y10S428/901 , Y10T428/31721
摘要： A Langmuir-Blodgett monolayer polyimide film and a bulk amorphous polyimide film are in contacting superposed relation to form a composite film having improved moisture resistance. The composite film may be either a free film or provide an insulating coating on the surface of a microelectronics device.
摘要翻译： Langmuir-Blodgett单层聚酰亚胺膜和块状无定形聚酰亚胺膜的重叠关系形成具有改善的耐湿性的复合膜。复合膜可以是自由膜或在微电子器件的表面上提供绝缘涂层。

9. 发明授权

US4322457A Method of selectively depositing a metal on a surface 失效
标题翻译：在表面上选择性地沉积金属的方法
公开(公告)号：US4322457A
公开(公告)日：1982-03-30
申请号：US872194
申请日：1978-01-25
申请人： William J. Baron , John T. Kenney , Wesley P. Townsend
发明人： William J. Baron , John T. Kenney , Wesley P. Townsend
IPC分类号： C23C18/16 , H05K3/18 , C23C3/02
CPC分类号： C23C18/1605 , C23C18/1653 , H05K3/182
摘要： A method of selectively depositing a metal on a surface is disclosed. The method comprises selectively coating a surface with a surface active agent, having a first surface energy, to form a coated surface having a coated portion capable of burying a higher surface energy material applied thereto and an uncoated surface pattern not so capable. The selectively coated surface is then treated with a solution, having a second surface energy higher than the first, comprising a species selected from the group comprising (1) a species capable of reducing an activating metal ion to an activating metal and (2) an activating metal species capable of participating in an electroless metal deposition, to form a surface having the species deposited atop the uncoated pattern.
摘要翻译：公开了一种在表面上选择性地沉积金属的方法。该方法包括用具有第一表面能的表面活性剂选择性地涂覆表面以形成具有能够掩埋施加到其上的较高表面能材料的涂覆部分和不能涂覆的未涂覆表面图案的涂覆表面。然后用具有高于第一表面能的第二表面能的溶液处理选择性涂覆的表面，该溶液包含选自以下的物质：（1）能够将活化金属离子还原成活化金属的物质，和（2）激活能够参与无电金属沉积的金属物质，以形成具有沉积在未涂覆图案顶部的物质的表面。

10. 发明授权

US3956077A Methods of providing contact between two members normally separable by an intervening member 失效
标题翻译：提供通常由中间构件分离的两个构件之间的接触的方法
公开(公告)号：US3956077A
公开(公告)日：1976-05-11
申请号：US562733
申请日：1975-03-27
申请人： John T. Hamby, Jr. , Wesley P. Townsend
发明人： John T. Hamby, Jr. , Wesley P. Townsend
IPC分类号： C25D5/02 , C25D7/06 , H05K3/24 , C25D7/00
CPC分类号： H05K3/241 , C25D5/02 , C25D7/0614 , Y10T156/1023
摘要： A continuous length, flexible, polymeric substrate has thin layers of copper clad to opposite sides thereof. Patterns of dry photopolymer material are applied to and mask selected portions of the copper to leave exposed other selected portions of the copper. The copper clad substrate is guided by a series of cathodic electrode rollers exterior of a copper plating bath into successive passes through the bath. Portions of the exposed copper contact the electrode rollers and couple the cathodic potential thereof to the bath to effect the plating of copper from the bath onto the exposed selected portions of the copper.Prior to initial engagement with the cathodic rollers, a series of protrusions are formed in portions of the exposed copper at a height relative to the thickness of the photoresist material sufficient to insure that the copper, by virtue of the protrusions, contacts the electrode rollers to facilitate the plating operation notwithstanding the intervening photoresist material.
摘要翻译：连续长度，柔性的聚合物基底具有包覆在其相对侧的铜薄层。将干燥的光聚合物材料的图案施加到并掩蔽铜的选定部分以留下铜的暴露的其它选定部分。铜包覆基板由镀铜浴外部的一系列阴极电极辊引导到连续通过浴中。暴露的铜的一部分接触电极辊并将其阴极电位耦合到浴中以实现将铜从镀液镀覆到铜的暴露的选定部分上。

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