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1. 发明授权

US5387269A Methods for making planar waveguides with removal of a sacrifical member which surrounds the core 失效
标题翻译：用于制造平面波导的方法，其中移除围绕芯的牺牲部件
公开(公告)号：US5387269A
公开(公告)日：1995-02-07
申请号：US115628
申请日：1993-09-03
申请人： Casimir R. Nijander , Wesley P. Townsend , Yiu-Huen Wong
发明人： Casimir R. Nijander , Wesley P. Townsend , Yiu-Huen Wong
IPC分类号： G02B6/136 , G02B6/255 , C03C15/00
CPC分类号： G02B6/136 , G02B6/2552
摘要： An optical waveguide is made by forming successively of light transmitting material a first clad layer (13), a core layer (15) and a second clad layer (18). The core layer has a higher refractive index than that of the first and second clad layers such that the core layer (15) can transmit light along its length as an optical waveguide. A sacrificial layer (14, 17) is formed surrounding at least a first end potion of the core layer. The sacrificial layer is selectively removed as by selective etching such that the first end portion of the core layer is separated from the first and second clad layers. With the end portion so isolated, a lens (22) can be formed on it such that light may be more effectively coupled to or from the core layer. Preferably, the lens is formed by heating the structure sufficiently to form a meniscus on the free end and then cooling it before the reminder of the core layer flows or melts. The cooling hardens the meniscus such that it constitutes an optical lens.
摘要翻译：光波导通过依次形成第一覆层（13），芯层（15）和第二覆层（18）而形成透光材料。芯层具有比第一和第二包层更高的折射率，使得芯层（15）可以沿着其长度透射光作为光波导。形成围绕芯层的至少第一端部的牺牲层（14,17）。通过选择性蚀刻选择性地去除牺牲层，使得芯层的第一端部与第一和第二覆盖层分离。在端部如此隔离的情况下，可以在其上形成透镜（22），使得光可以更有效地耦合到芯层或从芯层耦合。优选地，通过将结构充分加热以在自由端上形成弯液面并然后在芯层的提醒流动或熔化之前将其冷却来形成透镜。冷却使弯液面硬化从而构成光学透镜。

2. 发明授权

US5412506A Free-space optical interconnection arrangement 失效
标题翻译：自由空间光互连布置
公开(公告)号：US5412506A
公开(公告)日：1995-05-02
申请号：US848456
申请日：1992-03-09
申请人： Avi Y. Feldblum , Jurgen Jahns , Casimir R. Nijander , Frank Sauer , Wesley P. Townsend
发明人： Avi Y. Feldblum , Jurgen Jahns , Casimir R. Nijander , Frank Sauer , Wesley P. Townsend
IPC分类号： G02B3/00 , G02B5/18 , G02B6/26 , G02B6/28 , G02B6/32 , G02B6/43 , G02B27/42 , G02B6/34 , G02F1/03
CPC分类号： G02B6/43 , G02B5/1876 , G02B5/1885 , G02B5/1895 , G02B6/2848 , G02B6/32
摘要： A diffractive and a refractive microlens component are combined into a doublet lens to obtain imaging properties that are improvements over those achievable using separate components. In one application, diffractive/refractive microlens arrays are arranged to provide a free-space optical permutation interconnect arrangement.
摘要翻译：将衍射和折射微透镜组件组合成双透镜，以获得与使用单独部件可实现的成像性能相比的改进的成像性质。在一个应用中，衍射/折射微透镜阵列被布置成提供自由空间光学置换互连布置。

3. 发明授权

US5370768A Method for making microstructures 失效
标题翻译：制造微结构的方法
公开(公告)号：US5370768A
公开(公告)日：1994-12-06
申请号：US135644
申请日：1993-10-14
申请人： Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
发明人： Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
IPC分类号： G02B3/00 , B44C1/22 , C03C15/00 , C03C25/06 , H01L21/306
CPC分类号： G02B3/0018 , G02B3/0056
摘要： Prior to the production of microlenses (29) by the reactive ion etch technique, a pattern of notches (25) is formed in a second surface of a substrate (11) opposite a first surface on which the microlenses (29) are to be formed. Reactive ion etching of the first surface to produce the microlenses is sufficiently deep to reach the pattern of notches, thereby to separate the substrate. The array of notches may define, for example, an array of first areas (26) on the second surface, each area being surrounded by a notch. Photoresist elements (28) are then each located on an area of the first surface corresponding to a first area of the second surface, so that the separation separates the substrate into a plurality of segments (26) each containing only one of the microlenses (29). The notches can be made such that each of the segments (26) is cylindrical so that each of the microlenses formed from the substrate has a circular outer periphery.
摘要翻译：在通过反应离子蚀刻技术生产微透镜（29）之前，在与要在其上形成微透镜（29）的第一表面相对的衬底（11）的第二表面中形成凹口（25）的图案。第一表面的反应离子蚀刻以产生微透镜足够深以达到凹口的图案，从而分离衬底。凹口阵列可以例如限定第二表面上的第一区域（26）的阵列，每个区域被凹口包围。光阻元件（28）然后各自位于与第二表面的第一区域对应的第一表面的区域上，使得该分离将基板分离成多个段（26），每个段仅包含一个微透镜（29 ）。可以制成切口，使得每个片段（26）是圆柱形的，使得由基底形成的每个微透镜具有圆形的外周边。

4. 发明授权

US06265757B1 Forming attached features on a semiconductor substrate 有权
标题翻译：在半导体衬底上形成附着的特征
公开(公告)号：US06265757B1
公开(公告)日：2001-07-24
申请号：US09435640
申请日：1999-11-09
申请人： Michael F. Brady , Casimir R. Nijander , John W. Osenbach , Michael G. Palin , Aleksandra Yudina
发明人： Michael F. Brady , Casimir R. Nijander , John W. Osenbach , Michael G. Palin , Aleksandra Yudina
IPC分类号： H01L2906
CPC分类号： H01S5/02252 , H01S5/005
摘要： A method for creating attached features while controlling the depth profile between the features is presented. First the features are formed with a separating barrier between the features. The separating barrier is then etched in a second step with an orientation dependent etchant to attach the two feature. This method can be used to create attached features of relative similar sizes or attached features of disparate sizes.
摘要翻译：提出了一种在控制特征之间的深度分布的同时创建附加特征的方法。首先，特征形成有特征之间的分离屏障。然后在具有取向依赖性蚀刻剂的第二步骤中蚀刻分离屏障以附接两个特征。该方法可用于创建具有不同尺寸的相对尺寸或附加特征的附加特征。

5. 发明授权

US5439782A Methods for making microstructures 失效
标题翻译：制作微结构的方法
公开(公告)号：US5439782A
公开(公告)日：1995-08-08
申请号：US165203
申请日：1993-12-13
申请人： William H. Haemmerle , William M. MacDonald , Casimir R. Nijander , Joseph Shmulovich , Wesley P. Townsend , Yiu-Huen Wong
发明人： William H. Haemmerle , William M. MacDonald , Casimir R. Nijander , Joseph Shmulovich , Wesley P. Townsend , Yiu-Huen Wong
IPC分类号： C23F4/00 , G02B6/122 , G02B6/13 , G02B6/30 , G02B6/12
CPC分类号： G02B6/1228 , G02B6/1221 , G02B6/305
摘要： Tapered optical waveguides (33') can be easily made by using photolithographic masking and etching to define on a substrate (21) a first polymer structure (22) having a substantially uniform thickness and a tapered width. The first polymer structure is heated sufficiently to form a meniscus along its entire length. The fluidity causes the material to redistribute itself such that, rather than being of uniform thickness, it has a thickness that varies with its width; consequently, the thickness as well as the width of the first polymer structure becomes tapered. The first polymer is cooled and hardened to form a second polymer structure (22') that has a tapered width and a tapered thickness as is desirable for a tapered optical waveguide. The second polymer structure itself can be used as a tapered optical waveguide, or it can be used to control the reactive ion etching of the underlying substrate. In the latter case, the configuration of the tapered second polymer structure is replicated in a glass substrate, for example, which then may be used as a glass tapered optical waveguide (33').
摘要翻译：锥形光波导（33'）可以通过使用光刻掩模和蚀刻来在衬底（21）上限定具有基本上均匀的厚度和锥形宽度的第一聚合物结构（22）来容易地制成。第一聚合物结构被充分加热以在整个长度上形成弯液面。流动性导致材料重新分布自身，使得不是具有均匀的厚度，而是具有随其宽度而变化的厚度; 因此，第一聚合物结构的厚度以及宽度变得逐渐变细。将第一聚合物冷却并硬化以形成第二聚合物结构（22'），其具有如锥形光波导所需的锥形宽度和锥形厚度。第二聚合物结构本身可以用作锥形光波导，或者可以用于控制底层基板的反应离子蚀刻。在后一种情况下，锥形第二聚合物结构的构造被复制在例如可用作玻璃锥形光波导（33'）的玻璃基板中。

6. 发明授权

US5286338A Methods for making microlens arrays 失效
标题翻译：制造微透镜阵列的方法
公开(公告)号：US5286338A
公开(公告)日：1994-02-15
申请号：US24035
申请日：1993-03-01
申请人： Avi Y. Feldblum , Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
发明人： Avi Y. Feldblum , Keith O. Mersereau , Casimir R. Nijander , Wesley P. Townsend
IPC分类号： G02B3/00 , C03C15/00 , G01M11/02 , G02B6/12 , G02B6/124 , B44C1/22 , C03C25/06
CPC分类号： C03C15/00 , G01M11/02 , G02B6/1245 , G02B2006/12176
摘要： During a reactive ion etching process (FIG. 5) for making lens elements (15, FIG. 4) in a silica substrate (12), the gas constituency in the reactive ion etch chamber is changed to adjust the curvature of lens elements formed in the silica substrate and to reduce the aberrations of such lens elements. For example, two gases, CHF.sub.3 and oxygen may be supplied to the reactive ion etch chamber and, during the reactive ion etch process, the proportion of oxygen is significantly reduced, which reduces the aberrations of the lens elements formed by the process.
摘要翻译：在用于制造二氧化硅衬底（12）中的透镜元件（15，图4）的反应离子蚀刻工艺（图5）中，改变反应离子蚀刻室中的气体选区以调节形成在二氧化硅基底并减少这种透镜元件的像差。例如，可将两种气体CHF 3和氧气供应到反应离子蚀刻室，并且在反应离子蚀刻工艺期间，氧气的比例显着降低，这降低了由该方法形成的透镜元件的像差。

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