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    • 5. 发明申请
    • Method for improving atomic layer deposition process and the device thereof
    • 改善原子层沉积工艺的方法及其装置
    • US20060013954A1
    • 2006-01-19
    • US10952293
    • 2004-09-28
    • Wen-Pin Chiu
    • Wen-Pin Chiu
    • C23C16/00
    • C23C16/45519C23C16/45551C23C16/4584
    • A method for improving an atomic layer deposition process and the device thereof are described. A shield is first formed in a chamber to divide the chamber into a first sub-chamber and a second sub-chamber. Then a first precursor gas and a second precursor gas are introduced into the first sub-chamber and the second sub-chamber, respectively. A wafer is transferred into the first sub-chamber. When the surface of the wafer is saturated with the first precursor gas, the wafer is moved into the second sub-chamber by rotating a spindle, and the first precursor gas reacts with the second precursor gas. Further, the shield is employed to remove the excess first precursor gas and the unreacted second precursor gas. Subsequently, another wafer is transferred into the first sub-chamber, and hence two wafers are treated simultaneously to increase the throughput of the process.
    • 描述了一种用于改进原子层沉积工艺的方法及其装置。 首先在腔室中形成屏蔽,以将腔室分成第一子室和第二子室。 然后分别将第一前体气体和第二前体气体引入第一子室和第二子室。 将晶片转移到第一子室中。 当晶片的表面被第一前体气体饱和时,通过旋转主轴将晶片移动到第二子室中,并且第一前体气体与第二前体气体反应。 此外,使用屏蔽来去除多余的第一前体气体和未反应的第二前体气体。 随后,将另一个晶片转移到第一子室中,因此同时处理两个晶片以增加该工艺的生产量。
    • 6. 发明申请
    • [IONIZED PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREOF]
    • [离子化物理蒸发沉积过程及其装置]
    • US20050006232A1
    • 2005-01-13
    • US10605160
    • 2003-09-12
    • WEN-PIN CHIU
    • WEN-PIN CHIU
    • C23C14/04C23C14/34H01J37/32H01J37/34C25B9/00C25B11/00
    • C23C14/345C23C14/046C23C14/3471H01J37/321H01J37/32697H01J37/3408H01J37/3438
    • An ionized physical vapor deposition (I-PVD) process is provided. A plasma reaction chamber is provided. The plasma reaction chamber comprises a metal target and a wafer pedestal set up on the top and bottom section inside the chamber, an ionization unit set up between the target and the wafer pedestal and a conductive mesh set up between the ionization unit and the wafer pedestal. A wafer is put on the wafer pedestal. Thereafter, a negative bias voltage is applied to the metal target and a smaller negative bias voltage is applied to the conductive mesh to deposit a thin film over the wafer. The ionized metallic atoms inside the chamber accelerate towards the conductive mesh but decelerate after passing though the mesh so that step coverage of the deposited thin film is improved without damaging the wafer through ion bombardments.
    • 提供电离物理气相沉积(I-PVD)工艺。 提供等离子体反应室。 等离子体反应室包括设置在室内的顶部和底部的金属靶和晶片基座,设置在靶和晶片基座之间的电离单元和设置在电离单元和晶片基座之间的导电网 。 将晶片放在晶片基座上。 此后,向金属靶施加负偏置电压,并且向导电网施加较小的负偏压,以在晶片上沉积薄膜。 室内的电离金属原子朝向导电网加速,但在穿过网之后减速,从而提高沉积薄膜的阶梯覆盖,而不会通过离子轰击而损坏晶片。
    • 7. 发明授权
    • Tungsten deposition process
    • 钨沉积工艺
    • US06464778B2
    • 2002-10-15
    • US09761881
    • 2001-01-17
    • Wen Pin Chiu
    • Wen Pin Chiu
    • C30B2514
    • C23C16/14H01L21/28556
    • A tungsten deposition process. A crystal growth step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is conducted such that the supply of tungsten hexafluoride to the reaction chamber is cut but the supply of silane is continued. Furthermore, nitrogen is passed into the reaction chamber selectively. A main deposition step is finally conducted to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases.
    • 钨沉积工艺。 在反应室中进行晶体生长步骤以在使用六氟化钨,硅烷和氮作为反应气体的基板上形成钨晶体层。 进行中间步骤,使得向反应室供应六氟化钨,但是继续供应硅烷。 此外,氮气选择性地进入反应室。 最后进行主沉积步骤,使用六氟化钨,氢和氮作为反应气体在钨晶体层上形成钨层。
    • 8. 发明授权
    • Multiplex electrophoretic display driver circuit
    • 多路电泳显示驱动电路
    • US08928641B2
    • 2015-01-06
    • US12629598
    • 2009-12-02
    • Wen-Pin ChiuPing-Yueh ChengFeng-Shou LinCraig LinBryan Chan
    • Wen-Pin ChiuPing-Yueh ChengFeng-Shou LinCraig LinBryan Chan
    • G09G5/00G09G3/30G09G3/34
    • G09G3/344G09G2340/16
    • A multiplex electrophoretic display driver circuit comprises a memory unit, a display controller and a voltage driving unit. The memory unit has two registers respectively storing the current and former gray-level matrix signals. The gray-level matrix signal contains gray-level data corresponding to electrophoretic pixels. The display controller has an encoding circuit and a counting circuit. The encoding circuit generates a difference-value matrix signal containing difference values according to a difference between the current and former gray-level matrix signals and then generates a voltage-difference matrix signal containing voltage-difference signals corresponding to the electrophoretic pixels. The counting circuit receives the difference-value matrix signal and counts to generate refreshing values corresponding to the difference values. The encoding circuit adds the refreshing values to a next-cycled difference-value matrix signal to generate a new voltage-difference matrix signal. The voltage driving unit drives the electrophoretic pixels according to the voltage-difference matrix signal.
    • 多路电泳显示驱动电路包括存储单元,显示控制器和电压驱动单元。 存储单元具有两个寄存器,分别存储当前和以前的灰度级矩阵信号。 灰度级矩阵信号包含对应于电泳像素的灰度级数据。 显示控制器具有编码电路和计数电路。 编码电路根据当前和以前的灰度级矩阵信号之间的差异生成包含差分值的差分值矩阵信号,然后生成包含对应于电泳像素的电压差信号的电压差矩阵信号。 计数电路接收差值矩阵信号并进行计数,以产生与差值对应的刷新值。 编码电路将刷新值添加到下一循环差值矩阵信号以产生新的电压 - 差矩阵信号。 电压驱动单元根据电压差矩阵信号驱动电泳像素。
    • 10. 发明授权
    • Folding mechanism
    • 折叠机构
    • US07669872B2
    • 2010-03-02
    • US11897818
    • 2007-08-31
    • Alfred HuangWen-Pin ChiuYung-Chen LaiYu-Che Huang
    • Alfred HuangWen-Pin ChiuYung-Chen LaiYu-Che Huang
    • B62K3/14
    • B62K15/006
    • The disclosed folding mechanism comprises a rear frame member of a bicycle, which has a combining structure positioned at a front portion thereof, wherein the combining structure includes a first joining surface; a front frame member of the bicycle, which has a second joining surface positioned at a rear portion thereof for being joined with the first joining surface; at least one pivot structure, which is provided at an edge of the combining structure for connecting the front frame member, such that the front and rear frame members can relatively move on the pivot structure; and at least one binder, which is deposited at the combining structure of the rear frame member and a position on the front frame member adjacent to the combining structure for fixing the second joining surface of the front frame member and the first joining surface of the rear frame member at a combining position where the two joining surfaces contact mutually. By using the folding mechanism, a bicycle equipped with the same can be folded or expanded.
    • 所公开的折叠机构包括自行车的后框架构件,其具有位于其前部的组合结构,其中所述组合结构包括第一接合表面; 所述自行车的前框架构件具有位于其后部的与所述第一接合面接合的第二接合面; 至少一个枢转结构,其设置在用于连接前框架构件的组合结构的边缘处,使得前框架构件和后框架构件能够在枢轴结构上相对移动; 以及至少一个粘合剂,其在后框架构件的组合结构处沉积并且与前框架构件上邻近组合结构的位置固定,用于固定前框架构件的第二接合表面和后框架构件的第一接合表面 框架构件在两个接合表面相互接触的组合位置处。 通过使用折叠机构,可以将配备有折叠机构的自行车折叠或扩展。