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    • 5. 发明申请
    • SYSTEM AND METHOD FOR EDITING INTERACTIVE THREE-DIMENSION MULTIMEDIA, AND ONLINE EDITING AND EXCHANGING ARCHITECTURE AND METHOD THEREOF
    • 用于编辑交互式三维多媒体的系统和方法,以及在线编辑和交换架构及其方法
    • US20130007669A1
    • 2013-01-03
    • US13221090
    • 2011-08-30
    • Yu-Ling LuChi-Jui LienChien-Ju LiWei-Ming Chen
    • Yu-Ling LuChi-Jui LienChien-Ju LiWei-Ming Chen
    • G06F3/048
    • G09B5/065A63F2300/632G06T19/00G06T2200/24G11B27/034
    • A system and method are provided to edit interactive three-dimensional multimedia. A user interface of the system is provided with an event level template that includes event series levels with multiple event developing points. Through the user interface, multiple interactive events related to a first character of the event developing point are edited. Through a three-dimensional engine, interactive relevances are built up between interactive events and multiple materials inside one or more database. When the interactive three-dimensional multimedia with multiple materials is output, the interactive events corresponding to the event developing points are performed according to a user command. An online editing and exchanging method integrated with the system and method is also provided to share pre-edited templates on an exchange server; each of the pre-edited templates is extracted from an interactive three-dimensional multimedia pre-edited by the system and method.
    • 提供了一种编辑交互式三维多媒体的系统和方法。 系统的用户界面提供了一个事件级别模板,其中包括具有多个事件开发点的事件级别级别。 通过用户界面编辑与事件开发点的第一个字符相关的多个交互式事件。 通过三维引擎,在一个或多个数据库中的交互式事件和多种材料之间建立交互式相关性。 当输出具有多种材料的交互式三维多媒体时,根据用户命令执行与事件发展点对应的交互式事件。 还提供了与系统和方法集成的在线编辑和交换方法,用于在交换服务器上共享预编辑的模板; 从由系统和方法预编辑的交互式三维多媒体中提取每个预编辑的模板。
    • 8. 发明申请
    • CLEANING SEQUENCE FOR OXIDE QUALITY MONITORING SHORT-LOOP SEMICONDUCTOR WAFER
    • 氧化物质量监测短周期半导体波形清洁序列
    • US20120037191A1
    • 2012-02-16
    • US12857104
    • 2010-08-16
    • Liang Chun SungJhong Zhong ChenKai Yao ChangYuan Pu LiaoChia Jung YangWei Ming Chen
    • Liang Chun SungJhong Zhong ChenKai Yao ChangYuan Pu LiaoChia Jung YangWei Ming Chen
    • B08B3/00
    • H01L21/0206
    • Disclosed herein are methods for novel cleaning processes for inline quality monitoring short-loop semiconductor wafers. In one embodiment, an exemplary process may comprise immersing the short-loop wafer in an SC-2 aqueous solution comprising hydrochloric acid and hydrogen peroxide at a temperature of about 60° C., and for a time period of about 600 seconds, and then rinsing the wafer with deionized water to remove residual SC-2 solution immediately following immersing the wafer in the SC-2 solution. This exemplary method may then comprise immersing the short-loop wafer in an SC-1 aqueous solution comprising ammonia and hydrogen peroxide immediately after rinsing the wafer to remove residual SC-2 solution, and then rinsing the wafer with deionized water to remove residual SC-1 solution immediately following immersing the wafer in the SC-1 solution. In such a method, however, the wafer is immersed in an HF aqueous solution comprising hydrofluoric acid immediately prior to immersing the wafer in the SC-2 solution, or immediately after immersing the wafer in the SC-1 solution.
    • 本文公开了用于在线质量监测短循环半导体晶片的新型清洁方法的方法。 在一个实施方案中,示例性方法可以包括将短环晶片浸入包含盐酸和过氧化氢的SC-2水溶液中,温度约为60℃,时间约为600秒,然后 在将晶片浸入SC-2溶液后立即用去离子水冲洗晶片以去除残留的SC-2溶液。 该示例性方法可以包括在冲洗晶片之后立即将短环晶片浸入包含氨和过氧化氢的SC-1水溶液中以除去残留的SC-2溶液,然后用去离子水冲洗晶片以除去残留的SC- 在将晶片浸入SC-1溶液后立即进行。 然而,在这种方法中,在将晶片浸入SC-2溶液之前或将晶片浸入SC-1溶液之后,立即将晶片浸入包含氢氟酸的HF水溶液中。