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1. 发明授权

US08851886B2 Substrate processing apparatus and method of manufacturing semiconductor device 有权
标题翻译：基板处理装置及半导体装置的制造方法
公开(公告)号：US08851886B2
公开(公告)日：2014-10-07
申请号：US12363059
申请日：2009-01-30
申请人： Shinya Morita , Akihiro Sato , Akinori Tanaka , Shigeo Nakada , Takayuki Nakada , Shuhei Saido , Tomoyuki Matsuda
发明人： Shinya Morita , Akihiro Sato , Akinori Tanaka , Shigeo Nakada , Takayuki Nakada , Shuhei Saido , Tomoyuki Matsuda
IPC分类号： F27D1/18 , C23C16/44 , C23C16/455 , H01L21/67
CPC分类号： H01L21/67109 , C23C16/4401 , C23C16/455 , H01L21/67098
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a non-metallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold includes a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.
摘要翻译：提供了一种基板处理装置。基板处理装置包括反应管; 构造成加热反应管的加热装置; 以及与加热装置相比并且由非金属材料制成的歧管。在垂直于反应管的中心轴的方向上限定的歧管的第一厚度大于在与反应管的中心轴平行的方向上与反应管相邻的位置处限定的歧管的第二厚度。歧管包括突出部分，其至少一部分比反应管的内壁向内突出;以及气体供应单元，设置在至少突出部分处，用于将气体供应到反应管的内部。

2. 发明授权

US08076615B2 Substrate processing apparatus and method of manufacturing semiconductor device 有权
标题翻译：基板处理装置及半导体装置的制造方法
公开(公告)号：US08076615B2
公开(公告)日：2011-12-13
申请号：US12548066
申请日：2009-08-26
申请人： Shinya Morita , Koichi Sada , Takayuki Nakada , Tomoyuki Matsuda
发明人： Shinya Morita , Koichi Sada , Takayuki Nakada , Tomoyuki Matsuda
IPC分类号： F27B5/14 , C23C16/00
CPC分类号： C23C16/4401 , H01L21/67109
摘要： A substrate processing apparatus comprises: an outer tube; a manifold connected to the outer tube and made of a non-metal material; an inner tube disposed in the manifold at a more inner side than the outer tube and configured to process a substrate therein; a heating device installed at a more outer side than the outer tube and configured to heat the inside of the outer tube; a lid configured to open and close an opening of the manifold, with a seal member intervened therebetween; and a heat absorption member installed in the manifold, with a bottom end of the inner tube intervened therebetween, and configured to absorb heat from the heating device, the heat absorption member being made of a non-metal material.
摘要翻译：一种基板处理装置，包括：外管; 连接到外管并由非金属材料制成的歧管; 内管，其设置在所述歧管中比所述外管更内侧并且构造成在其中处理基板; 加热装置，其安装在比所述外管更外侧并且构造成加热所述外管的内部; 盖，其构造成打开和关闭歧管的开口，密封构件插入其间; 以及安装在所述歧管中的吸热构件，所述内管的底端插入其中，并且构造成从所述加热装置吸收热量，所述吸热构件由非金属材料制成。

3. 发明授权

US07964623B2 Tricyclic benzopyrane compound 有权
标题翻译：三环苯并吡喃化合物
公开(公告)号：US07964623B2
公开(公告)日：2011-06-21
申请号：US12591353
申请日：2009-11-17
申请人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
发明人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
IPC分类号： A61K31/429 , C07D513/06
CPC分类号： C07D513/04 , C07D491/04 , C07D515/04
摘要： This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof wherein R1 and R2 are independently of each other hydrogen atom, C1-6alkyl group or C6-14aryl group, R3 is hydrogen atom or C1-6alkylcarbonyloxy group, or together with R4 forms a bond, R4 is hydrogen atom, or together with R3 forms a bond, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R5 is hydrogen atom or C1-6alkyl group, R6 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, amino group, C1-6alkylamino group, di-C1-6alkylamino group, C6-14arylamino group, C2-9heteroarylamino group, C6-14aryl group, C2-9heteroaryl group or C2-9heterocyclyl group, A is 5-, 6- or 7-member ring fused with benzene ring, as constituent atom of the ring, oxygen atom, nitrogen atom or sulfur atom may be contained in the number of 1 to 3 alone or in a combination thereof, the number of unsaturated bond in the ring is 1, 2 or 3 including an unsaturated bond of the benzene ring to be fused, carbon atoms constituting the ring may be carbonyl or thiocarbonyl. These compounds are useful as an anti-arrhythmic agent.
摘要翻译：本发明涉及式（I）或（II）的苯并吡喃衍生物或其药学上可接受的盐，其中R1和R2彼此独立地为氢原子，C1-6烷基或C6-14芳基，R3为氢原子或C1- C 1-6烷基羰基氧基或与R 4一起形成键，R 4为氢原子，或与R 3一起形成键，m为0〜4的整数，n为0〜4的整数，V为单键，CR 7 R 8， NR9，O，S，SO或SO2，R5是氢原子或C1-6烷基，R6是氢原子，C1-6烷基，C3-8环烷基，C3-8环烯基，氨基，C1-6烷基氨基， C 1-6烷基氨基，C 6-14芳基氨基，C 2-9杂芳基氨基，C 6-14芳基，C 2-9杂芳基或C 2-9杂环基，A是与苯环稠合的5-，6-或7-元环作为构成原子的环，氧原子，氮原子或硫原子可以单独或组合1〜3的数量包含在t中的不饱和键的数量环是1,2或3，包括待稠合的苯环的不饱和键，构成环的碳原子可以是羰基或硫代羰基。这些化合物可用作抗心律不齐剂。

4. 发明申请

US20090197409A1 SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：基板加工装置及制造半导体装置的方法
公开(公告)号：US20090197409A1
公开(公告)日：2009-08-06
申请号：US12363059
申请日：2009-01-30
申请人： Shinya MORITA , Akihiro SATO , Akinori TANAKA , Shigeo NAKADA , Takayuki NAKADA , Shuhei SAIDO , Tomoyuki MATSUDA
发明人： Shinya MORITA , Akihiro SATO , Akinori TANAKA , Shigeo NAKADA , Takayuki NAKADA , Shuhei SAIDO , Tomoyuki MATSUDA
IPC分类号： H01L21/285 , C23C16/44
CPC分类号： H01L21/67109 , C23C16/4401 , C23C16/455 , H01L21/67098
摘要： Provided is a substrate processing apparatus. The substrate processing apparatus comprises a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a nonmetallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold comprises a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.
摘要翻译：提供了一种基板处理装置。基板处理装置包括反应管; 构造成加热反应管的加热装置; 以及与加热装置相比并且由非金属材料制成的歧管。在垂直于反应管的中心轴的方向上限定的歧管的第一厚度大于在与反应管的中心轴平行的方向上与反应管相邻的位置处限定的歧管的第二厚度。歧管包括突出部分，其至少一部分比反应管的内壁向内突出;以及气体供应单元，设置在至少突出部分处，以将气体供应到反应管的内部。

5. 发明申请

US20100024728A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20100024728A1
公开(公告)日：2010-02-04
申请号：US12498639
申请日：2009-07-07
申请人： Takayuki NAKADA , Koichi Sada , Tomoyuki Matsuda
发明人： Takayuki NAKADA , Koichi Sada , Tomoyuki Matsuda
IPC分类号： C23C16/54
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/4411 , C23C16/452 , C23C16/455 , C23C16/45561
摘要： A substrate processing apparatus comprises: a process chamber configured to accommodate a substrate; a gas supply line configured to supply gas into the process chamber; and an exhaust line configured to exhaust the inside of the process chamber. In the substrate processing apparatus, the gas supply line comprises: a preheating unit configured to preheat the gas before supplying the gas into the process chamber; a metal pipeline configured to supply the preheated gas into the process chamber; and a heat dissipation member covering the outer periphery of a bend section formed in the metal pipeline.
摘要翻译：衬底处理装置包括：处理室，被配置为容纳衬底; 气体供给管线，其构造成将气体供给到所述处理室中; 以及排气管，其构造成排出处理室的内部。在基板处理装置中，气体供给管线包括：预热单元，其构造成在将气体供给到处理室之前预热气体; 配置为将预热的气体供应到处理室中的金属管道; 以及覆盖形成在所述金属管道中的弯曲部的外周的散热构件。

6. 发明授权

US08398771B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US08398771B2
公开(公告)日：2013-03-19
申请号：US12498639
申请日：2009-07-07
申请人： Takayuki Nakada , Koichi Sada , Tomoyuki Matsuda
发明人： Takayuki Nakada , Koichi Sada , Tomoyuki Matsuda
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/4411 , C23C16/452 , C23C16/455 , C23C16/45561
摘要： A substrate processing apparatus in accordance with the present invention includes a process chamber configured to accommodate a substrate, a gas supply line configured to supply a gas to an inside of the process chamber, and an exhaust line configured to exhaust the inside of the process chamber. The gas supply line of the substrate processing apparatus includes a preheating unit preheating the gas supplied from a gas source, a metal pipeline having an angled section wherein the metal pipe line connects the preheating unit and the inside of the process chamber to supply the gas preheated by the preheating unit into the process chamber, and a heat dissipation member covering the angled section to dissipate heat from the angled section.
摘要翻译：根据本发明的基板处理装置包括被配置为容纳基板的处理室，被配置为向处理室的内部供应气体的气体供给管线和被构造成排出处理室内部的排气管线。基板处理装置的气体供给管线包括：预热单元，用于对从气体源供应的气体进行预热;金属管道，其具有成角度的部分，金属管线将预热单元与处理室的内部连接，以供应预热的气体通过预热单元进入处理室，以及散热构件，其覆盖成角度的部分以从倾斜的部分散发热量。

7. 发明申请

US20100069374A1 Tricyclic benzopyrane compound 有权
标题翻译：三环苯并吡喃化合物
公开(公告)号：US20100069374A1
公开(公告)日：2010-03-18
申请号：US12591353
申请日：2009-11-17
申请人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
发明人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
IPC分类号： A61K31/542 , A61K31/5383 , A61K31/4985 , A61K31/519 , A61K31/436 , A61K31/429 , A61K31/424 , A61K31/4188 , A61K31/4162 , A61K31/407 , C07D513/04 , C07D498/04 , C07D491/052 , A61P9/06
CPC分类号： C07D513/04 , C07D491/04 , C07D515/04
摘要： This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof wherein R1 and R2 are independently of each other hydrogen atom, C1-6alkyl group or C6-14aryl group, R3 is hydrogen atom or C1-6alkylcarbonyloxy group, or together with R4 forms a bond, R4 is hydrogen atom, or together with R3 forms a bond, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R5 is hydrogen atom or C1-6alkyl group, R6 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, amino group, C1-6alkylamino group, di-C1-6alkylamino group, C6-14arylamino group, C2-9heteroarylamino group, C6-14aryl group, C2-9heteroaryl group or C2-9heterocyclyl group, A is 5-, 6- or 7-member ring fused with benzene ring, as constituent atom of the ring, oxygen atom, nitrogen atom or sulfur atom may be contained in the number of 1 to 3 alone or in a combination thereof, the number of unsaturated bond in the ring is 1, 2 or 3 including an unsaturated bond of the benzene ring to be fused, carbon atoms constituting the ring may be carbonyl or thiocarbonyl. These compounds are useful as an anti-arrhythmic agent.
摘要翻译：本发明涉及式（I）或（II）的苯并吡喃衍生物或其药学上可接受的盐，其中R1和R2彼此独立地为氢原子，C1-6烷基或C6-14芳基，R3为氢原子或C1- C 1-6烷基羰基氧基或与R 4一起形成键，R 4为氢原子，或与R 3一起形成键，m为0〜4的整数，n为0〜4的整数，V为单键，CR 7 R 8， NR9，O，S，SO或SO2，R5是氢原子或C1-6烷基，R6是氢原子，C1-6烷基，C3-8环烷基，C3-8环烯基，氨基，C1-6烷基氨基， C 1-6烷基氨基，C 6-14芳基氨基，C 2-9杂芳基氨基，C 6-14芳基，C 2-9杂芳基或C 2-9杂环基，A是与苯环稠合的5-，6-或7-元环作为构成原子的环，氧原子，氮原子或硫原子可以单独或组合1〜3的数量包含在t中的不饱和键的数量环是1,2或3，包括待稠合的苯环的不饱和键，构成环的碳原子可以是羰基或硫代羰基。这些化合物可用作抗心律不齐剂。

8. 发明申请

US20100050945A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20100050945A1
公开(公告)日：2010-03-04
申请号：US12537017
申请日：2009-08-06
申请人： Shinya MORITA , Takayuki NAKADA , Tomoyuki MATSUDA , Keisuke SAKASHITA
发明人： Shinya MORITA , Takayuki NAKADA , Tomoyuki MATSUDA , Keisuke SAKASHITA
IPC分类号： C23C16/00
CPC分类号： C23C16/4412
摘要： When a quartz part is placed on a floor, the inside of a furnace is not polluted by contaminants attached from the floor to a seal surface of the quartz part and entering the inside of the furnace. A substrate processing apparatus includes a reaction tube, a first joining surface, a second joining surface, and a third joining surface. The reaction tube includes a quartz inner tube and a quartz outer tube. The first joining surface is configured to air-tightly join the outer tube and a quartz manifold. The second joining surface is configured to air-tightly join the manifold and a quartz seal cover. The third joining surface is configured to air-tightly join the seal cover and a seal cap. An O-ring is installed at least one of the first, second, and third joining surfaces, and a protrusion is installed outside the O-ring installed at the jointing surface.
摘要翻译：当石英部件放置在地板上时，炉内部不会被从地板附着到石英部件的密封表面并进入炉内的污染物污染。基板处理装置包括反应管，第一接合面，第二接合面和第三接合面。反应管包括石英内管和石英外管。第一接合表面构造成气密地连接外管和石英歧管。第二接合表面构造成气密地连接歧管和石英密封盖。第三连接表面构造成气密地连接密封盖和密封盖。 O形环安装在第一，第二和第三接合表面中的至少一个上，并且突起被安装在安装在接合表面处的O形环的外部。

9. 发明申请

US20080004262A1 Tricyclic Benzopyrane Compound as Anti-Arrhythmic Agents 有权
标题翻译：三环苯并吡喃复合物作为抗心律不齐剂
公开(公告)号：US20080004262A1
公开(公告)日：2008-01-03
申请号：US10590975
申请日：2005-03-23
申请人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
发明人： Kazuhiko Ohrai , Yukohiro Shigeta , Osamu Uesugi , Takumi Okada , Tomoyuki Matsuda
IPC分类号： A61K31/436 , A61K31/403 , A61K31/495 , A61K31/517 , A61K31/538 , A61P9/06 , C07D209/56 , C07D221/02 , C07D235/02 , C07D241/36 , C07D265/38 , C07D515/12
CPC分类号： C07D513/04 , C07D491/04 , C07D515/04
摘要： This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof wherein R1 and R2 are independently of each other hydrogen atom, C1-6alkyl group or C6-14aryl group, R3 is hydrogen atom or C1-6alkylcarbonyloxy group, or together with R4 forms a bond, R4 is hydrogen atom, or together with R3 forms a bond, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R5 is hydrogen atom or C1-6alkyl group, R6 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, amino group, C1-6alkylamino group, di-C1-6alkylamino group, C6-14arylamino group, C2-9heteroarylamino group, C6-14aryl group, C2-9heteroaryl group or C2-9heterocyclyl group, A is 5-, 6- or 7-member ring fused with benzene ring, as constituent atom of the ring, oxygen atom, nitrogen atom or sulfur atom may be contained in the number of 1 to 3 alone or in a combination thereof, the number of unsaturated bond in the ring is 1, 2 or 3 including an unsaturated bond of the benzene ring to be fused, carbon atoms constituting the ring may be carbonyl or thiocarbonyl. These compounds are useful as an anti-arrhythmic agent.
摘要翻译：本发明涉及式（I）或（II）的苯并吡喃衍生物或其药学上可接受的盐，其中R 1和R 2彼此独立地为氢原子，C C 1-6烷基或C 6-14芳基，R 3是氢原子或C 1-6 >烷基羰氧基，或与R 4连接形成键，R 4是氢原子，或与R 3 3一起形成键，m 为0〜4的整数，n为0〜4的整数，V为单键，CR 7，R 8，NR 9， >，O，S，SO或SO 2，R 5是氢原子或C 1-6烷基，R 6 C 1-6烷基，C 3-8环烷基，C 3-8环烯基，C 3-8环烷基，C 3-6环烷基，氨基，C 1-6烷基氨基，二-C 1-6烷基氨基，C 6-14芳基氨基，C _{2-9个杂芳基氨基，C 6-14-14芳基，C 2-9 - 杂芳基 A或C 2-9杂环基，A是与苯环稠合的5-，6-或7-元环，作为环的构成原子，氧原子，氮原子或硫原子可以单独或以其组合存在1〜3的数量，环中的不饱和键数为1,2或3，包括要被稠合的苯环的不饱和键，构成环的碳原子可以是羰基或硫代羰基。这些化合物可用作抗心律不齐剂。}

10. 发明申请

US20070299130A1 Benzopyran Compound 有权
标题翻译：苯并吡喃化合物
公开(公告)号：US20070299130A1
公开(公告)日：2007-12-27
申请号：US10590207
申请日：2005-02-25
申请人： Toru Tsukagoshi , Takayuki Nagatsuka , Tomoyuki Matsuda , Norio Hashimoto
发明人： Toru Tsukagoshi , Takayuki Nagatsuka , Tomoyuki Matsuda , Norio Hashimoto
IPC分类号： A61K31/352 , A61P9/00 , C07D311/00
CPC分类号： C07D311/68 , C07D311/72
摘要： This invention relates to benzopyran compounds of formula (I) wherein X is NR6, Y is a bond, SO or SO2, Z is C1-4alkyl group or phenyl group, W is hydrogen atom, hydroxy group, C1-6 alkoxy group, a halogen atom, C1-4alkyl group or C1-6alkylsulfonylamino group, R1 and R2 are independently of each other C1-3alkyl group, R3 is hydrogen atom, hydroxy group or methoxy group, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R4 is hydrogen atom or C1-6alkyl group, R5 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, C6-14aryl group or C2-9heteroaryl group. These compounds are useful as an anti-arrhythmic agent.
摘要翻译：本发明涉及式（I）的苯并吡喃化合物，其中X为NR 6，Y为键，SO或SO 2，Z为C 1-4 烷基或苯基，W是氢原子，羟基，C 1-6烷氧基，卤素原子，C 1-4烷基或 C 1-6烷基磺酰基氨基，R 1和R 2彼此独立地为C 1-3烷基基团R 3为氢原子，羟基或甲氧基，m为0〜4的整数，n为0〜4的整数，V为单键，CR 7 R 9，R 9，O，S，SO或SO 2，R 4是氢原子或C 1-6烷基，R 5是氢原子，C 1-6烷基，C 3〜C 6烷基， 8个环烷基，C 3〜8个环烯基，C 6-14芳基或C 2-9杂芳基。这些化合物可用作抗心律不齐剂。

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