专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09339443B2 Dental restorative material based on an antimicrobially active compound 有权
标题翻译：基于抗微生物活性化合物的牙齿修复材料
公开(公告)号：US09339443B2
公开(公告)日：2016-05-17
申请号：US13368998
申请日：2012-02-08
申请人： Ulrich Salz , Thorsten Bock , Christoph Peter Fik , Jörg Tiller , Volker Rheinberger
发明人： Ulrich Salz , Thorsten Bock , Christoph Peter Fik , Jörg Tiller , Volker Rheinberger
IPC分类号： A61K6/083 , A61K6/00 , A61K6/093
CPC分类号： A61K6/0023 , A61K6/0008 , A61K6/0017 , A61K6/0067 , A61K6/083 , A61K6/093
摘要： The invention relates to a dental restorative material which comprises (a) at least one antimicrobially active compound of Formula (I) [AG]m-R1—Z—SP—Y—R2—[WG]p (I), or a filler that is surface-modified with at least one compound of Formula (I), (b) at least one radically polymerizable monomer and (c) at least one initiator for the radical polymerization. The invention also relates to a use of such dental restorative material for the preparation of an adhesive, primer, cement, coating material or filling material. The invention also relates to a dental material which comprises at least one compound of Formula (I), as well as a use of a compound of Formula (I) for modifying the surface of a substrate selected from ceramic materials, noble and non-noble metals, hard tooth structure, tooth enamel, dentine, collagen, soft tissue, mucous membrane and leather.
摘要翻译：本发明涉及一种牙科修复材料，其包含（a）至少一种式（I）[AG] m-R1-Z-SP-Y-R2- [WG] p（I）的抗微生物活性化合物或填充剂其用至少一种式（I）的化合物，（b）至少一种可自由基聚合的单体和（c）至少一种用于自由基聚合的引发剂进行表面改性。本发明还涉及这种牙科修复材料用于制备粘合剂，底漆，水泥，涂料或填充材料的用途。本发明还涉及包含至少一种式（I）化合物的牙科材料，以及式（I）化合物用于改性选自陶瓷材料，贵金属和非贵金属的基材表面的用途的牙科材料金属，硬齿结构，牙釉质，牙质，胶原，软组织，粘膜和皮革。

2. 发明授权

US08211956B2 Universal dental adhesion-promoter composition 有权
标题翻译：通用牙科粘合促进剂组合物
公开(公告)号：US08211956B2
公开(公告)日：2012-07-03
申请号：US12491815
申请日：2009-06-25
申请人： Thorsten Bock , Norbert Moszner , Volker M. Rheinberger , Ulrich Salz , Frank Zeuner
发明人： Thorsten Bock , Norbert Moszner , Volker M. Rheinberger , Ulrich Salz , Frank Zeuner
IPC分类号： A61K6/00
CPC分类号： A61K6/0026 , C08L33/08 , C08L33/10 , C08L25/04 , C08L27/00 , C08L31/02 , A61K6/0023
摘要： The invention relates to an adhesion-promoter composition for the adhesive joining of metallic or ceramic dental materials to radically curing dental materials, wherein the adhesion-promoter composition contains an alkoxysilane monomer (i), a phosphoric acid ester monomer (ii), a sulphur-containing monomer (iii) and an organic solvent (iv).
摘要翻译：本发明涉及金属或陶瓷牙科材料与牙科材料自由基固化的粘合剂接合的粘合促进剂组合物，其中粘合促进剂组合物含有烷氧基硅烷单体（ⅰ），磷酸酯单体（ⅱ），硫（ⅲ）和有机溶剂（ⅳ）。

3. 发明申请

US20130090404A1 Dental materials with improved hydrolysis stability based on phthalic acid monomers 有权
标题翻译：具有改善的基于邻苯二甲酸单体的水解稳定性的牙科材料
公开(公告)号：US20130090404A1
公开(公告)日：2013-04-11
申请号：US13630491
申请日：2012-09-28
申请人： Thorsten BOCK , Urs Karl FISCHER , Iris LAMPARTH , Norbert MOSZNER , Volker RHEINBERGER
发明人： Thorsten BOCK , Urs Karl FISCHER , Iris LAMPARTH , Norbert MOSZNER , Volker RHEINBERGER
IPC分类号： A61K6/083
CPC分类号： A61K6/0023 , A61K6/083 , C08L33/24
摘要： Dental material which contains a polymerizable phthalic acid derivative of the general Formula I: with R1═H, methyl or a C1-C5 alkyl residue; R2═H, a phenyl, benzyl or C1-C8 alkyl residue; Q1=is absent or is a C1-C15 alkylene residue, wherein the carbon chain can be interrupted by O or S; Q2=is absent or a (n+1)-valent aliphatic C1-C20 residue, wherein the carbon chain can be interrupted by O or S and wherein Q1 and Q2 cannot be absent simultaneously; X=is absent, is O, S or (—CO—NR4—)—, wherein R4 is H, CH3 or C2H5; Y=is absent, is O, S or (—CO—NR5—)—, wherein R5 is H, CH3 or C2H5; n, m=independently of one another in each case mean 1, 2 or 3; R3═H, CH3, C2H5, Cl, Br or OCH3, and wherein the two carboxyl groups of the benzene ring can together form an anhydride group.
摘要翻译：含有通式I的可聚合邻苯二甲酸衍生物的牙科材料：其中R 1 = H，甲基或C 1 -C 5烷基残基; R2 = H，苯基，苄基或C1-C8烷基残基; Q1 =不存在或是C1-C15亚烷基残基，其中碳链可被O或S间隔; Q2 =不存在或（n + 1）价的脂族C1-C20残基，其中碳链可以被O或S中断，并且其中Q1和Q2不能同时存在; X =不存在，为O，S或（-CO-NR 4 - ） - ，其中R 4为H，CH 3或C 2 H 5; Y =不存在，是O，S或（-CO-NR 5 - ） - ，其中R 5是H，CH 3或C 2 H 5; 在每种情况下，n，m =彼此独立，意指1,2或3; R3 = H，CH3，C2H5，Cl，Br或OCH3，其中苯环的两个羧基可以一起形成酸酐基团。

4. 发明申请

US20120208917A1 Dental restorative material based on an antimicrobially active compound 有权
标题翻译：基于抗微生物活性化合物的牙齿修复材料
公开(公告)号：US20120208917A1
公开(公告)日：2012-08-16
申请号：US13368998
申请日：2012-02-08
申请人： Ulrich SALZ , Thorsten BOCK , Christoph Peter FIK , Jörg TILLER , Volker RHEINBERGER
发明人： Ulrich SALZ , Thorsten BOCK , Christoph Peter FIK , Jörg TILLER , Volker RHEINBERGER
IPC分类号： A61K6/087 , C07F9/40 , C07D209/48 , A61K6/00 , C07D491/048
CPC分类号： A61K6/0023 , A61K6/0008 , A61K6/0017 , A61K6/0067 , A61K6/083 , A61K6/093
摘要： The invention relates to a dental restorative material which comprises (a) at least one antimicrobially active compound of Formula (I) [AG]m-R1—Z—SP—Y—R2—[WG]p (I), or a filler that is surface-modified with at least one compound of Formula (I), (b) at least one radically polymerizable monomer and (c) at least one initiator for the radical polymerization. The invention also relates to a use of such dental restorative material for the preparation of an adhesive, primer, cement, coating material or filling material.The invention also relates to a dental material which comprises at least one compound of Formula (I), as well as a use of a compound of Formula (I) for modifying the surface of a substrate selected from ceramic materials, noble and non-noble metals, hard tooth structure, tooth enamel, dentine, collagen, soft tissue, mucous membrane and leather.
摘要翻译：本发明涉及一种牙科修复材料，其包含（a）至少一种式（I）[AG] m-R1-Z-SP-Y-R2- [WG] p（I）的抗微生物活性化合物或填充剂其用至少一种式（I）的化合物，（b）至少一种可自由基聚合的单体和（c）至少一种用于自由基聚合的引发剂进行表面改性。本发明还涉及这种牙科修复材料用于制备粘合剂，底漆，水泥，涂料或填充材料的用途。本发明还涉及包含至少一种式（I）化合物的牙科材料，以及式（I）化合物用于改性选自陶瓷材料，贵金属和非贵金属的基材表面的用途的牙科材料金属，硬齿结构，牙釉质，牙质，胶原，软组织，粘膜和皮革。

5. 发明申请

US20090017360A1 OLIGOMERIC AND POLYMERIC AROMATIC PHOSPHONIC ACIDS, THEIR BLENDS, PROCESSES FOR PREPARING THEM AND USES AS POLYELECTROLYTES 失效
公开(公告)号：US20090017360A1
公开(公告)日：2009-01-15
申请号：US12279794
申请日：2007-02-12
申请人： Helmut Mohwald , Thorsten Bock , Rolf Mulhaupt
发明人： Helmut Mohwald , Thorsten Bock , Rolf Mulhaupt
IPC分类号： H01M8/10 , C08G79/04 , C08L85/02
CPC分类号： H01M8/1041 , B01D67/0009 , B01D67/0011 , B01D71/82 , B01D2325/04 , B01D2325/14 , C08G65/48 , C08G75/23 , C08J5/2256 , C08L65/00 , C08L71/126 , C08L81/06 , H01M8/0289 , H01M8/1023 , H01M8/1025 , H01M8/1027 , H01M8/103 , H01M8/1032 , H01M8/1039 , C08L2666/02
摘要： The present invention relates to halogen-free, oligomeric or polymeric phosphonic acids made up of units of the general formula (I) —[(O)m—{R1(X)n(Y)o}pR1(X)q]r—[(O)s—R5(X)t]v— (I), where: Xis —P═O(OH)2, Yis carbonyl or sulfonyl, R1, R5are, independently of one another, divalent or polyvalent, substituted or unsubstituted, heteroatom-free or heteroatom- comprising aromatic radicals, m, o, sare each, independently of one another, 0 or 1, n, q, tare each, independently of one another, 0 or an integer from 1 to 8, with n and s not simultaneously being 0, r, vare each, independently of one another, from 0 to 1, with the sum of r and v being from 0.95 to 1.05, and pis 0 or an integer ≧1, where the radicals X are substituents on R1 and R5 and the radicals Y are parts of polymer or oligomer chain, to a process for preparing these compounds and also to halogen-free mixtures comprising one or more compounds of the general formula (I) and a nitrogen-free solvent having a boiling point of >150° C.

6. 发明授权

US09668946B2 Dental materials based on monomers having debonding-on-demand properties 有权
公开(公告)号：US09668946B2
公开(公告)日：2017-06-06
申请号：US14343297
申请日：2012-09-10
申请人： Norbert Moszner , Iris Lamparth , Thorsten Bock , Urs Karl Fischer , Ulrich Salz , Volker Rheinberger , Robert Liska
发明人： Norbert Moszner , Iris Lamparth , Thorsten Bock , Urs Karl Fischer , Ulrich Salz , Volker Rheinberger , Robert Liska
IPC分类号： A61K6/083 , A61K6/00 , C07D239/47 , C07F3/06 , C08F122/22
CPC分类号： A61K6/0835 , A61K6/0002 , A61K6/0023 , A61K6/083 , C07D239/47 , C07F3/06 , C08F122/22 , C08L33/00
摘要： The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]l Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical and k, l, m and n in each case independently are 1, 2 or 3.

7. 发明申请

US20140329929A1 DENTAL MATERIALS BASED ON MONOMERS HAVING DEBONDING-ON-DEMAND PROPERTIES 有权
公开(公告)号：US20140329929A1
公开(公告)日：2014-11-06
申请号：US14343297
申请日：2012-09-10
申请人： Norbert Moszner , Iris Lamparth , Thorsten Bock , Urs Karl Fischer , Ulrich Salz , Volker Rheinberger , Robert Liska
发明人： Norbert Moszner , Iris Lamparth , Thorsten Bock , Urs Karl Fischer , Ulrich Salz , Volker Rheinberger , Robert Liska
IPC分类号： A61K6/083
CPC分类号： A61K6/0835 , A61K6/0002 , A61K6/0023 , A61K6/083 , C07D239/47 , C07F3/06 , C08F122/22 , C08L33/00
摘要： The invention relates to a dental restorative material which comprises a thermolabile or photolabile polymerizable compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]1 Formula I, in which T represents a thermolabile or photolabile group, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, wherein at least one Z1 or Z2 is a polymerizable group, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical and k, l, m and n in each case independently are 1, 2 or 3.

8. 发明授权

US08609789B2 Oligomeric and polymeric aromatic phosphonic acids, their blends, processes for preparing them and uses as polyelectrolytes 失效
标题翻译：低聚和聚合芳族膦酸，它们的共混物，其制备方法和用作聚电解质
公开(公告)号：US08609789B2
公开(公告)日：2013-12-17
申请号：US12279794
申请日：2007-02-12
申请人： Helmut Moehwald , Thorsten Bock , Rolf Muelhaupt
发明人： Helmut Moehwald , Thorsten Bock , Rolf Muelhaupt
IPC分类号： C08F32/00 , C08F32/04 , C08F132/04
CPC分类号： H01M8/1041 , B01D67/0009 , B01D67/0011 , B01D71/82 , B01D2325/04 , B01D2325/14 , C08G65/48 , C08G75/23 , C08J5/2256 , C08L65/00 , C08L71/126 , C08L81/06 , H01M8/0289 , H01M8/1023 , H01M8/1025 , H01M8/1027 , H01M8/103 , H01M8/1032 , H01M8/1039 , C08L2666/02
摘要： The present invention relates to halogen-free, oligomeric or polymeric phosphonic acids made up of units of the general formula (I) —[(O)m—{R1(X)n(Y)o}pR1(X)q]r—[(O)s—R5(X)t]v— (I), where: Xis —P═O(OH)2, Yis carbonyl or sulfonyl, R1, R5are, independently of one another, divalent or polyvalent, substituted or unsubstituted, heteroatom-free or heteroatom- comprising aromatic radicals, m, o, sare each, independently of one another, 0 or 1, n, q, tare each, independently of one another, 0 or an integer from 1 to 8, with n and s not simultaneously being 0, r, vare each, independently of one another, from 0 to 1, with the sum of r and v being from 0.95 to 1.05, and pis 0 or an integer ≧1, where the radicals X are substituents on R1 and R5 and the radicals Y are parts of polymer or oligomer chain, to a process for preparing these compounds and also to halogen-free mixtures comprising one or more compounds of the general formula (I) and a nitrogen-free solvent having a boiling point of >150° C.
摘要翻译：本发明涉及由通式（I） - [（O）m - {R 1（X）n（Y）o} p R 1（X）q] r的单元组成的无卤素，低聚或聚合膦酸 - [（O）s-R5（X）t] v-（I），其中：X是-P = O（OH）2，Y是羰基或磺酰基，R1，R5彼此独立地是二价或多价，取代或未取代的，无杂原子的或含杂原子的芳基，m，o，s各自独立地为0或1，n，q，t各自彼此独立地为0或整数 1至8，其中n和s不同时为0，r，v各自彼此独立地为0至1，r和v之和为0.95至1.05，p为0或整数 > = 1，其中基团X是R 1和R 5上的取代基，基团Y是聚合物或低聚物链的部分，用于制备这些化合物的方法以及含卤素的混合物，其包含一种或多种通式（ I）和沸点为的无氮溶剂 > 150°C

9. 发明申请

US20110217676A1 Compositions Containing Cleaning Particles 有权
标题翻译：含有清洁颗粒的组合物
公开(公告)号：US20110217676A1
公开(公告)日：2011-09-08
申请号：US13008674
申请日：2011-01-18
申请人： Thorsten Bock , Ulrich Salz , Volker Rheinberger
发明人： Thorsten Bock , Ulrich Salz , Volker Rheinberger
IPC分类号： A61C17/00 , A61C5/11 , C11D17/00
CPC分类号： C11D7/20 , A61C8/00 , A61C13/0003 , C11D3/1213 , C11D7/02 , C11D11/0023 , C11D17/0013
摘要： A composition, containing a carrier medium and particles based on a metal compound with a weight-average particle diameter of 1 nm to 10 μm is useful to clean metal or ceramic surfaces which are part of a dental restoration or of an implant abutment.
摘要翻译：含有载体介质和基于重均粒径为1nm至10μm的金属化合物的颗粒的组合物可用于清洁作为牙科修复体或植入物邻接部分的金属或陶瓷表面。

10. 发明申请

US20090048395A1 OLIGOMERIC AND POLYMERIC SILOXANES SUBSTITUTED BY ARYLPHOSPHONIC ACIDS 审中-公开
标题翻译：由芳香族膦取代的低聚硅氧烷和聚硅氧烷
公开(公告)号：US20090048395A1
公开(公告)日：2009-02-19
申请号：US12279656
申请日：2007-02-13
申请人： Helmut Mohwald , Thorsten Bock , Rolf Mulhaupt
发明人： Helmut Mohwald , Thorsten Bock , Rolf Mulhaupt
IPC分类号： C08G77/30 , C08L83/06
CPC分类号： C07F9/6596 , C08G77/045 , C08G77/30 , C08G77/395
摘要： The present invention relates to oligomeric or polymeric siloxanes comprising phosphonic acid groups, a process for preparing them, oligomeric or polymeric siloxanes comprising silyl phosphonate and/or alkyl phosphonate groups, blends comprising at least one oligomeric or polymeric siloxane according to the invention comprising polyphosphonic acid groups and/or at least one oligomeric or polymeric siloxane comprising silyl phosphonate and/or alkyl phosphonate groups and at least one further polymer, membranes, films or composites comprising at least one oligomeric or polymeric siloxane according to the invention comprising phosphonic acid groups and/or at least one oligomeric or polymeric siloxane according to the invention comprising silyl polyphosphonate and/or alkyl polyphosphonate groups or a blend according to the invention, and also various uses of oligomeric or polymeric siloxanes comprising phosphonic acid groups and/or oligomeric or polymeric siloxanes comprising silyl phosphonate and/or alkyl phosphonate groups or blends according to the invention.
摘要翻译：本发明涉及包含膦酸基团的低聚或聚合硅氧烷，其制备方法，包含膦酸甲硅烷基酯和/或烷基膦酸酯基团的低聚或聚合硅氧烷，包含至少一种根据本发明的低聚或聚合硅氧烷的共混物，其包含多膦酸基团和/或至少一种包含甲硅烷基膦酸酯和/或烷基膦酸酯基团的低聚物或聚合物硅氧烷和至少一种包含至少一种根据本发明的低聚或聚合硅氧烷的聚合物，膜，膜或复合材料，其包含膦酸基团和/ 或根据本发明的至少一种包含聚膦酸酯甲硅烷基酯和/或烷基聚膦酸酯基团或根据本发明的共混物的低聚或聚合硅氧烷，以及包含膦酸基团和/或低聚或聚合硅氧烷的低聚或聚合硅氧烷的各种用途，其包含甲硅烷基磷酸酯酸和/或烷基膦酸酯基或本发明的共混物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式