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1. 发明申请

US20110189618A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110189618A1
公开(公告)日：2011-08-04
申请号：US13062180
申请日：2009-09-01
申请人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
发明人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：抗蚀剂处理方法包括以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B），交联剂（C）和酸放大器（D）的作用将其溶于碱水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）硬烘烤第一抗蚀剂图案，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

2. 发明申请

US20080248417A1 Polyhydric phenol compound and chemically amplified resist composition containing the same 失效
标题翻译：多元酚化合物和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20080248417A1
公开(公告)日：2008-10-09
申请号：US11976197
申请日：2007-10-22
申请人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
发明人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
IPC分类号： G03F7/004 , C07C39/12
CPC分类号： C07C39/15 , C07C67/31 , C07C69/712 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R1, R2, R3, R4, and R5 is a group represented by the formula (II): wherein X1, X2, X3 and X4 each independently represent a hydrogen atom or a C1-C4 alkyl group, n represents an integer of 0 to 3, Z1 represents a C1-C6 alkyl group or a C3-C12 cycloalkyl group, and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的多元酚化合物：其中选自R 1，R 2，R 3，O， >，R 4，R 5和R 5是由式（II）表示的基团：其中X 1，X 2， X 3，X 3和X 4各自独立地表示氢原子或C 1 -C 4烷基，n表示0〜3的整数，Z < 1表示C1-C6烷基或C3-C12环烷基，Y表示脂环族烃基，其余为氢原子，含有该烷氧基的化学放大型抗蚀剂组合物。

3. 发明授权

US08426106B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08426106B2
公开(公告)日：2013-04-23
申请号：US12903146
申请日：2010-10-12
申请人： Tatsuro Masuyama , Kazuhiko Hashimoto , Junji Shigematsu
发明人： Tatsuro Masuyama , Kazuhiko Hashimoto , Junji Shigematsu
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F120/34 , C07C251/66 , C07C309/70 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of −1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
摘要翻译：一种光致抗蚀剂组合物，其包含包含衍生自由式（I）表示的化合物的结构单元的聚合物：其中R 1表示氢原子或甲基，R 2表示可以具有一个或多个取代基的C 6 -C 12芳族烃基， R3表示可以具有一个或多个取代基且可以含有一个或多个杂原子的氰基或C 1 -C 12烃基，A 1表示单键， - （CH 2）g -CO-O- *或 - （CH 2） hO-CO-（CH2）i-CO-O- *其中g，h和i各自独立地表示1-6的整数，*表示与氮原子的结合位置，具有酸不稳定基团的树脂和在碱性水溶液中不溶或难溶，但通过酸和酸生成剂可溶于碱水溶液。

4. 发明授权

US08298746B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08298746B2
公开(公告)日：2012-10-30
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： G03C1/00 , G03F7/00 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

5. 发明授权

US08173353B2 Sulfonium compound 有权
标题翻译：锍化合物
公开(公告)号：US08173353B2
公开(公告)日：2012-05-08
申请号：US12729550
申请日：2010-03-23
申请人： Tatsuro Masuyama , Junji Shigematsu , Hanwoo Park
发明人： Tatsuro Masuyama , Junji Shigematsu , Hanwoo Park
IPC分类号： G03F7/004 , C07C309/12
CPC分类号： C07C381/12 , C07C309/17 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A+ represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供由式（I）表示的锍化合物：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1表示具有β-酮基结构的C 5 -C 42有机基团和A + 代表有机抗衡离子，以及包含上述锍化合物的化学放大光致抗蚀剂组合物和包含具有酸不稳定基团的结构单元的树脂，其在碱性水溶液中不溶或难溶，但变得可溶于碱水溶液溶液通过酸的作用。

6. 发明授权

US08057983B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08057983B2
公开(公告)日：2011-11-15
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

7. 发明申请

US20100062365A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100062365A1
公开(公告)日：2010-03-11
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko SHIMADA , Kazuhiko HASHIMOTO , Junji SHIGEMATSU , Takayuki MIYAGAWA , Satoshi YAMAMOTO
发明人： Masahiko SHIMADA , Kazuhiko HASHIMOTO , Junji SHIGEMATSU , Takayuki MIYAGAWA , Satoshi YAMAMOTO
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising:(A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid,(B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, andan acid generator.
摘要翻译：本发明提供一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

8. 发明授权

US07667050B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07667050B2
公开(公告)日：2010-02-23
申请号：US11889596
申请日：2007-08-15
申请人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
发明人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
IPC分类号： C07C309/19 , C07D333/46
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中X表示含有至少一个二价脂环族烃基的C 3 -C 30二价基团，并且C 3 -C 30二价基团中的至少一个-CH 2可以被 -O-或-CO-，Y表示可以被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 6羟基烷基，C 1 -C 6烷氧基，羟基和氰基，C3-C30环状烃基中的至少一个-CH2-可以被-O-或-CO-取代，Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子。

9. 发明授权

US08003296B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08003296B2
公开(公告)日：2011-08-23
申请号：US12536386
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Junji Shigematsu , Takayuki Miyagawa , Satoshi Yamamoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: (A) a resin comprising a structural unit having an acid-labile group and being itself insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and an acid generator.
摘要翻译：本发明提供了一种化学放大阳性组合物，其包含：（A）包含具有酸不稳定基团的结构单元的树脂，其本身不溶于或难溶于碱性水溶液，但通过作用于酸，（B）包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基，Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1〜3的整数，n表示 0〜3的整数，侧链具有氟原子的结构单元和酸发生剂。

10. 发明申请

US20100010129A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100010129A1
公开(公告)日：2010-01-14
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： C08K5/42 , C08L37/00 , C08L55/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

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