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    • 1. 发明授权
    • Surface-emission type semiconductor laser
    • 表面发射型半导体激光器
    • US07974328B2
    • 2011-07-05
    • US12531326
    • 2008-03-14
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • H01S5/00
    • H01S5/06226H01S5/1039H01S5/18308H01S5/18369H01S5/227H01S5/3095
    • The present invention provides a surface-emission type semiconductor laser wherein an effective length of a cavity is reduced, thereby enabling to realize a higher-speed direct modulation. In the surface-emission type semiconductor laser according to the present invention, when supposing the optical path length (L) of a resonator part relative to a lasing wavelength λ0 to be given as 0.9×λ0≦L≦1.1×λ0, and denoting the refractive indexes of a high refractive index layer and a low refractive index layer of a dielectric DBR by nH1 and nL1; the average refractive index within an optical path length λ0/4 in the semiconductor in contact with the dielectric DBR by nS1; and the refractive indexes of the high refractive index layer and the low refractive index layer of a semiconductor DBR by nH2 and nL2, respective materials to be used are selected so as to satisfy the following conditions (1) and (2): nH1>f(nS1)nL12+g(nS1)nL1+h(nS1),  (1) where f(nS1)=0.0266 nS12−0.2407 nS1+0.6347; g(nS1)=−0.0508 nS12+0.4335 nS1−0.0085; and h(nS1)=0.0382 nS12−0.3194 nS1+0.7398, and nH2−nL2>0.4.  (2)
    • 本发明提供了一种表面发射型半导体激光器,其中空腔的有效长度减小,从而能够实现更高速度的直接调制。 在根据本发明的表面发射型半导体激光器中,当假设谐振器部分相对于激光波长λ0的光程长度(L)为0.9×λ0≦̸ L≦̸ 1.1×λ0时,表示 通过nH1和nL1的介电DBR的高折射率层和低折射率层的折射率; 通过nS1与电介质DBR接触的半导体中光路长度λ0/ 4内的平均折射率; 并且通过nH2和nL2对半导体DBR的高折射率层和低折射率层的折射率进行选择,以满足以下条件(1)和(2):nH1> f (nS1)nL12 + g(nS1)nL1 + h(nS1),(1)其中f(nS1)= 0.0266 nS12-0.2407 nS1 + 0.6347; g(nS1)= - 0.0508 nS12 + 0.4335 nS1-0.0085; h(nS1)= 0.0382 nS12-0.3194 nS1 + 0.7398,nH2-nL2> 0.4。 (2)
    • 4. 发明申请
    • SURFACE-EMISSION TYPE SEMICONDUCTOR LASER
    • 表面发射型半导体激光器
    • US20100034233A1
    • 2010-02-11
    • US12531326
    • 2008-03-14
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • H01S5/00
    • H01S5/06226H01S5/1039H01S5/18308H01S5/18369H01S5/227H01S5/3095
    • The present invention provides a surface-emission type semiconductor laser wherein an effective length of a cavity is reduced, thereby enabling to realize a higher-speed direct modulation. In the surface-emission type semiconductor laser according to the present invention, when supposing the optical path length (L) of a resonator part relative to a lasing wavelength λ0 to be given as 0.9×λ0≦L≦1.1×λ0, and denoting the refractive indexes of a high refractive index layer and a low refractive index layer of a dielectric DBR by nH1 and nL1; the average refractive index within an optical path length λ0/4 in the semiconductor in contact with the dielectric DBR by nS1; and the refractive indexes of the high refractive index layer and the low refractive index layer of a semiconductor DBR by nH2 and nL2, respective materials to be used are selected so as to satisfy the following conditions (1) and (2): nH1>f(nS1)nL12+g(nS1)nL1+h(nS1),  (1) where f(nS1)=0.0266 nS12−0.2407 nS1+0.6347; g(nS1)=−0.0508 nS12+0.4335 nS1−0.0085; and h(nS1)=0.0382 nS12−0.3194 nS1+0.7398, and nH2−nL2>0.4.  (2)
    • 本发明提供了一种表面发射型半导体激光器,其中空腔的有效长度减小,从而能够实现更高速度的直接调制。 在根据本发明的表面发射型半导体激光器中,当假设谐振器部分相对于激发波长λ0的光程长度(L)被给定为0.9×λλ<= L <= 1.1×λ10,并且表示 通过nH1和nL1的介电DBR的高折射率层和低折射率层的折射率; 通过nS1与电介质DBR接触的半导体中的光程长度λ0/ 4内的平均折射率; 并且通过nH2和nL2对半导体DBR的高折射率层和低折射率层的折射率进行选择,以满足以下条件(1)和(2):nH1> f (nS1)nL12 + g(nS1)nL1 + h(nS1),(1)其中f(nS1)= 0.0266 nS12-0.2407 nS1 + 0.6347; g(nS1)= - 0.0508 nS12 + 0.4335 nS1-0.0085; h(nS1)= 0.0382 nS12-0.3194 nS1 + 0.7398,nH2-nL2> 0.4。 (2)
    • 7. 发明申请
    • Current Confining Structure and Semiconductor Laser
    • 电流限制结构和半导体激光器
    • US20080089376A1
    • 2008-04-17
    • US11663320
    • 2005-09-08
    • Takayoshi Anan
    • Takayoshi Anan
    • H01S5/30H01S5/32
    • H01S5/18311H01S5/18325H01S5/18383H01S5/2054H01S5/3211H01S2301/166
    • To provide such a technique as to solve problems about a high operating voltage, temperature rise due to heat generation, in-plane non-uniform injection, and a small modulation bandwidth upon high-speed modulation in a surface-emitting laser. A current confining structure according to the present invention includes an n-type semiconductor layer 102, a current confining layer 106, a current-diffusion preventing layer 103, an active layer 104, and a p-type semiconductor layer 105, which are laminated in order on an n-type semiconductor substrate 101. The current confining layer 106 is composed of a current carrying layer 106b and a current blocking layer 106a. The current-diffusion preventing layer 103 includes an n-type or undoped dilute nitrogen-based compound semiconductor layer containing 0.1% or more of nitrogen.
    • 提供这样的技术来解决在表面发射激光器中高速调制时的高工作电压,由于发热引起的温度升高,面内不均匀注入和小调制带宽的问题。 根据本发明的电流限制结构包括层叠在n型半导体层102中的n型半导体层102,电流限制层106,电流扩散防止层103,有源层104和p型半导体层105 在n型半导体衬底101上。 电流限制层106由载流层106b和电流阻挡层106a组成。 电流扩散防止层103包括含有0.1%以上氮的n型或未掺杂的稀氮类化合物半导体层。