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    • 2. 发明授权
    • Surface-emission type semiconductor laser
    • 表面发射型半导体激光器
    • US07974328B2
    • 2011-07-05
    • US12531326
    • 2008-03-14
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • Naofumi SuzukiMasayoshi TsujiTakayoshi AnanKenichiro YashikiHiroshi HatakeyamaKimiyoshi FukatsuTakeshi Akagawa
    • H01S5/00
    • H01S5/06226H01S5/1039H01S5/18308H01S5/18369H01S5/227H01S5/3095
    • The present invention provides a surface-emission type semiconductor laser wherein an effective length of a cavity is reduced, thereby enabling to realize a higher-speed direct modulation. In the surface-emission type semiconductor laser according to the present invention, when supposing the optical path length (L) of a resonator part relative to a lasing wavelength λ0 to be given as 0.9×λ0≦L≦1.1×λ0, and denoting the refractive indexes of a high refractive index layer and a low refractive index layer of a dielectric DBR by nH1 and nL1; the average refractive index within an optical path length λ0/4 in the semiconductor in contact with the dielectric DBR by nS1; and the refractive indexes of the high refractive index layer and the low refractive index layer of a semiconductor DBR by nH2 and nL2, respective materials to be used are selected so as to satisfy the following conditions (1) and (2): nH1>f(nS1)nL12+g(nS1)nL1+h(nS1),  (1) where f(nS1)=0.0266 nS12−0.2407 nS1+0.6347; g(nS1)=−0.0508 nS12+0.4335 nS1−0.0085; and h(nS1)=0.0382 nS12−0.3194 nS1+0.7398, and nH2−nL2>0.4.  (2)
    • 本发明提供了一种表面发射型半导体激光器,其中空腔的有效长度减小,从而能够实现更高速度的直接调制。 在根据本发明的表面发射型半导体激光器中,当假设谐振器部分相对于激光波长λ0的光程长度(L)为0.9×λ0≦̸ L≦̸ 1.1×λ0时,表示 通过nH1和nL1的介电DBR的高折射率层和低折射率层的折射率; 通过nS1与电介质DBR接触的半导体中光路长度λ0/ 4内的平均折射率; 并且通过nH2和nL2对半导体DBR的高折射率层和低折射率层的折射率进行选择,以满足以下条件(1)和(2):nH1> f (nS1)nL12 + g(nS1)nL1 + h(nS1),(1)其中f(nS1)= 0.0266 nS12-0.2407 nS1 + 0.6347; g(nS1)= - 0.0508 nS12 + 0.4335 nS1-0.0085; h(nS1)= 0.0382 nS12-0.3194 nS1 + 0.7398,nH2-nL2> 0.4。 (2)
    • 3. 发明授权
    • Semiconductor photonic element, method of fabricating the same, and semiconductor photonic device equipped therewith
    • 半导体光子元件及其制造方法以及配备有该半导体光子器件的半导体光子器件
    • US06323507B1
    • 2001-11-27
    • US09488508
    • 2000-01-20
    • Yoshitaka YokoyamaKoji KudoMasayoshi Tsuji
    • Yoshitaka YokoyamaKoji KudoMasayoshi Tsuji
    • H01L3300
    • H01S5/227H01S5/0265H01S5/2077H01S5/2215H01S5/2272H01S5/4031H01S5/4087
    • A semiconductor photonic element is provided, which realize low threshold current and satisfactory characteristics in the high temperatures and/or high output operating condition. This element is comprised of (a) a semiconductor substrate; (b) a mesa structure formed on a first surface of the substrate to extend in a specific direction; the mesa structure including an active layer and a pair of p- and n-type cladding layers located respectively at top and bottom sides of the active layer, forming a double heterojunction; (c)a current-constricting structure for constricting an injection current formed at each side of the mesa structure to expose a top of the mesa structure from the current-constricting structure; the current-constricting structure comprising a first current-blocking part and a second current-blocking part; the first current-blocking part having a dielectric current-blocking layer that extends to the mesa structure; the dielectric current-blocking layer being contacted with top edges of the mesa structure; the second current-blocking part having a semiconductor current-blocking layer; and (d) a semiconductor burying layer formed to cover the mesa structure and the multilayer current-constricting structure; the semiconductor burying layer being contacted with the top of the mesa structure.
    • 提供半导体光子元件,其在高温和/或高输出操作条件下实现低阈值电流和令人满意的特性。 该元件由(a)半导体衬底构成; (b)形成在所述基板的第一表面上以沿特定方向延伸的台面结构; 所述台面结构包括分别位于所述有源层的顶侧和底侧的有源层和一对p型和n型覆层,形成双异质结; (c)用于收缩形成在台面结构的每一侧的注入电流的电流收缩结构,以从电流收缩结构暴露台面结构的顶部; 所述电流收缩结构包括第一电流阻挡部分和第二电流阻挡部分; 所述第一电流阻挡部分具有延伸到所述台面结构的介电阻流层; 所述介质电流阻挡层与所述台面结构的顶部边缘接触; 所述第二电流阻挡部分具有半导体电流阻挡层; 以及(d)形成为覆盖所述台面结构和所述多层电流收缩结构的半导体掩埋层; 半导体掩埋层与台面结构的顶部接触。
    • 7. 发明授权
    • Staircase avalanche photodiode
    • 楼梯雪崩光电二极管
    • US5539221A
    • 1996-07-23
    • US224110
    • 1994-04-07
    • Masayoshi TsujiKikuo Makita
    • Masayoshi TsujiKikuo Makita
    • H01L31/107H01L31/0328H01L31/072H01L31/109
    • H01L31/1075
    • An avalanche photodiode is provided which consists of a staircase APD with a periodic multilayer structure graded in composition from InAlAs to InGa.sub.x Al.sub.(1-x) As (x>0.1) as the multiplication layer to improve the dark current characteristic. Another photodiode with separate photoabsorption and multiplication regions is provided with an electric-field relaxation layer whose bandgap is wider than that of the photoabsorption and has a triple structure with a highly-doped layer sandwiched between lightly-doped layers. This photodiode incorporates in detail on an n-type InP substrate, an avalanche multiplication layer 13 of a periodic multilayer structure graded in composition from n.sup.- -InAlAs to InGa.sub.x Al.sub.(1-x) As, a p.sup.- -InGaAs photoabsorption layer 17, and an InP electric-field relaxation triple layer 16 consisting of n.sup.-, p.sup.+, and p.sup.- layers between the avalanche multiplication layer 13 and the photoabsorption layer 17.
    • 提供了一种雪崩光电二极管,其由具有从InAlAs至InGaxAl(1-x)As(x> 0.1)组成的周期性多层结构的阶梯APD作为乘法层,以改善暗电流特性。 具有分离的光吸收和倍增区域的另一个光电二极管设置有电场弛豫层,其带隙比光吸收宽,并且具有夹在轻掺杂层之间的高掺杂层的三重结构。 该光电二极管详细结合在n型InP衬底上,从n-InAlAs至InGaxAl(1-x)As,p-InGaAs光吸收层17的组成中分级的周期性多层结构的雪崩倍增层13和 在雪崩倍增层13和光吸收层17之间由n,p +和p-层构成的InP电场弛豫三层16。