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    • 2. 发明申请
    • METAL COMPLEX, MODIFIED COMPOUND THEREOF AND USEFUL COMPOUND THEREOF
    • 金属复合物,其改性化合物及其有用的化合物
    • US20130210615A1
    • 2013-08-15
    • US13823257
    • 2011-09-14
    • Tadafumi Matsunaga
    • Tadafumi Matsunaga
    • H01M4/86C07F15/06C07D471/22
    • H01M4/8652B01J31/183B01J31/2243B01J2531/0216B01J2531/845C07D471/22C07D519/00C07F15/065H01L51/0083H01L51/009H01M4/9008Y02E60/50
    • Provided is a compound including residues derived from a compound represented by Formula (1) and a divalent aromatic group, wherein the number of the residues is 2 to 4, the number of the divalent aromatic group is 1 to 3, and the sum of the numbers of the residues and the divalent aromatic group is 3 to 5. In Formula (1), each of Y1 to Y4 represent a group represented by any of the following Formula (2); in the following Formula (2), Rα represents a hydrogen atom or a hydrocarbyl group; each of P1 to P4 represents an atomic group forming a heterocyclic ring containing Y1 to Y4; P5 and P6 represent an atomic group forming an aromatic ring or a heterocyclic ring; Q1 and Q2 represent a linking group or a direct bond; and Z1 and Z2 represent a hydrogen atom or a group represented by any of the following Formula (3); and in the following Formula (3), Rβ represents a hydrogen atom or a hydrocarbyl group.
    • 本发明提供一种化合物,其包括由式(1)表示的化合物和二价芳族基团的残基,其中残基数为2〜4,二价芳香族基团的数量为1〜3, 残基和二价芳基的数目为3〜5。式(1)中,Y 1〜Y 4分别表示由下述式(2)表示的基团。 在下式(2)中,Ralpha表示氢原子或烃基; P1〜P4各自表示形成含有Y 1〜Y 4的杂环的原子团; P5和P6表示形成芳环或杂环的原子团; Q1和Q2表示连接基团或直接键; Z 1和Z 2表示氢原子或由下式(3)中的任一个表示的基团。 在下式(3)中,Rbeta表示氢原子或烃基。