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    • 3. 发明授权
    • Apparatus and methods for processing a workpiece
    • 用于加工工件的设备和方法
    • US06806194B2
    • 2004-10-19
    • US10412944
    • 2003-04-14
    • Paul Z. WirthSteven L. PeaceErik Lund
    • Paul Z. WirthSteven L. PeaceErik Lund
    • H01L21311
    • B08B3/04H01L21/32134H01L21/67017H01L21/67051H01L21/67057H01L21/6708H01L21/67086H01L21/6715Y10S134/902Y10S438/906Y10S438/913
    • A system for processing a workpiece includes a head attached to a head lifter. A workpiece is supported in the head between an upper rotor and a lower rotor. A base has a bowl for containing a liquid. The head is movable by the head lifter from a first position vertically above the bowl, to a second position where the workpiece is at least partially positioned in the bowl. The bowl has a contour section with a sidewall having a radius of curvature which increases adjacent to a drain outlet in the bowl, to help rapid draining of liquid from the bowl. The head has a load position, where the rotors are spaced apart by a first amount, and a process position, where the rotors are engaged and sealed against each other. For rapid evacuation of fluid, the head also has a fast drain position, where the rotors are moved apart sufficiently to create an annular drain gap. Fluid is rapid evacuated by spinning the rotors with the head rotors slightly apart and unsealed, causing the fluid to flow our quickly under centrifugal force.
    • 用于处理工件的系统包括附接到头部升降器的头部。 工件在上转子和下转子之间的头部中被支撑。 底座有一个容纳液体的碗。 头部可由头部升降器从垂直于碗的第一位置移动到第二位置,在该位置,工件至少部分地定位在碗中。 碗具有轮廓部分,其侧壁具有与碗中的排水出口相邻增加的曲率半径,以帮助液体从碗中快速排出。 头部具有负载位置,其中转子间隔开第一量,以及处理位置,其中转子彼此接合并密封。 为了快速排出流体,头部还具有快速的排放位置,其中转子被足够地移动以产生环形的排水间隙。 流体通过旋转转子而迅速抽空,头部转子稍微分开并开封,导致流体在离心力下快速流动。
    • 4. 发明授权
    • Flat media processing machine
    • 扁平媒体加工机
    • US06494984B2
    • 2002-12-17
    • US09231194
    • 1999-01-14
    • Steven L. Peace
    • Steven L. Peace
    • H01L213065
    • H01L21/6838
    • A machine for processing the front side of a flat media workpiece, such as a silicon wafer, seals the backside of the wafer from processing chemicals. A rotor has an inside ring and an outside ring protruding from the rotor face. The inside ring and outside ring are separated by an annular groove in the rotor. A O-ring is positioned between the inside ring and the outside ring. A membrane extends from the inside ring, over the annular groove and the O-ring, to the outside ring. The membrane and face of the rotor form a sealable wafer back face chamber between them. Vacuum is applied to the back face chamber to hold the wafer against the membrane. The back surface of the wafer is sealed from processing chemicals, which are allowed to contact only the front surface and edges of the wafer.
    • 用于处理诸如硅晶片的平坦介质工件的前侧的机器将晶片的背面与处理化学品密封。 转子具有从转子表面突出的内环和外环。 内环和外环由转子中的环形槽分隔开。 O形圈位于内圈和外圈之间。 膜从内环延伸到环形槽和O形环上方到外部环。 转子的膜和面在它们之间形成可密封的晶片背面室。 真空被施加到背面腔室以将晶片保持在膜上。 晶片的后表面与处理化学品密封,化学品只允许与晶片的前表面和边缘接触。