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1. 发明授权

US08017196B2 Method for plasma coating an object of elastomeric material 失效
标题翻译：用于等离子体涂覆弹性体材料的方法
公开(公告)号：US08017196B2
公开(公告)日：2011-09-13
申请号：US11982078
申请日：2007-10-31
申请人： Kurt Burger , Guenter Schneider , Ronald Neidhardt , Manfred Hauser , Klaus Burghoff , Stefan Grosse , Alexander Schattke , Sascha Henke , Christian Bayer , Oliver Schmautz
发明人： Kurt Burger , Guenter Schneider , Ronald Neidhardt , Manfred Hauser , Klaus Burghoff , Stefan Grosse , Alexander Schattke , Sascha Henke , Christian Bayer , Oliver Schmautz
IPC分类号： C23C16/00 , F04B17/00
CPC分类号： F04B53/164 , C23C8/36 , C23C16/26 , C23C30/00 , F04B1/0448 , F05C2253/12
摘要： A pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material with an additionally applied coating are/is proposed. To improve the durability characteristics, the pump piston and/or the elements sealing the pump piston have a coating which is formed at least predominantly of halogen-, silicon-, carbon-containing and/or metal-organic monomers. Furthermore, a device and a method for coating an object of elastomeric material utilizing a plasma are proposed.
摘要翻译：提出了泵活塞和/或密封泵活塞的元件，特别是具有额外施加的涂层的弹性体材料的密封环。为了提高耐久性特性，泵活塞和/或密封泵活塞的元件具有至少主要由卤素，硅，含碳和/或金属 - 有机单体形成的涂层。此外，提出了利用等离子体涂覆弹性体材料的装置和方法。

2. 发明申请

US20090296099A1 Interferometric Layer Thickness Determination 审中-公开
标题翻译：干涉层厚度测定
公开(公告)号：US20090296099A1
公开(公告)日：2009-12-03
申请号：US11992402
申请日：2006-08-02
申请人： Kurt Burger , Thomas Beck , Hartmut Spennemann , Stefan Grosse , Bernd Schmidtke , Ulrich Kallmann , Sebastian Jackisch
发明人： Kurt Burger , Thomas Beck , Hartmut Spennemann , Stefan Grosse , Bernd Schmidtke , Ulrich Kallmann , Sebastian Jackisch
IPC分类号： G01B11/02
CPC分类号： G01B11/0675
摘要： An interferometric measuring device for measuring layer thicknesses of partially transparent layers on substrates, especially of wear protection layers based on carbon, having a scanning device which scans these layers automatically in its depth direction, using which an interference plane is displaceable relative to the layer structure, having an interferometer part that has a white light interferometer and/or a wavelength-scanning interferometer. Also described is a corresponding evaluation method.
摘要翻译：一种干涉测量装置，用于测量基板上的部分透明层的层厚度，特别是基于碳的耐磨保护层，其具有扫描装置，其在其深度方向上自动扫描这些层，利用该扫描装置，干涉平面相对于层结构可移位具有白光干涉仪和/或波长扫描干涉仪的干涉仪部分。还描述了相应的评估方法。

3. 发明申请

US20090181185A1 METHOD AND APPARATUS FOR SURFACE TREATMENT OF CONTAINERS OR OBJECTS 审中-公开
标题翻译：用于表面处理容器或物体的方法和装置
公开(公告)号：US20090181185A1
公开(公告)日：2009-07-16
申请号：US12302594
申请日：2007-03-26
申请人： Stefan Grosse , Johannes Rauschnabel , Jochen Feichtinger , Carsten Herweg
发明人： Stefan Grosse , Johannes Rauschnabel , Jochen Feichtinger , Carsten Herweg
IPC分类号： H05H1/24 , C23C16/54
CPC分类号： C23C16/045 , B05D1/62 , B05D3/144 , B05D7/227 , C23C16/452
摘要： The invention relates to a method and a device for treating the surfaces of containers or objects in which the inner surfaces to be treated are exposed to functionalizing plasma during a process step, and/or to coating plasma during a further process step. The functionalizing plasma and the coating plasma are preferably produced by a plasma source which is located inside or outside the containers or objects.
摘要翻译：本发明涉及一种用于处理容器或物体的表面的方法和装置，其中待处理的内表面在工艺步骤期间暴露于官能化等离子体中，和/或在进一步的工艺步骤期间涂覆等离子体。功能化等离子体和涂覆等离子体优选地由位于容器或物体内部或外部的等离子体源产生。

4. 发明申请

US20110129617A1 Plasma system and method of producing a functional coating 审中-公开
标题翻译：等离子体系统和功能性涂层的制造方法
公开(公告)号：US20110129617A1
公开(公告)日：2011-06-02
申请号：US10240477
申请日：2001-12-05
申请人： Stefan Grosse , Sascha Henke , Susanne Spindler
发明人： Stefan Grosse , Sascha Henke , Susanne Spindler
IPC分类号： C23C16/50 , C23C16/455 , C23C16/458 , C23C16/52
CPC分类号： H01J37/32357 , C23C16/513 , C23C16/515 , H01J37/32706 , H05H1/30
摘要： A plasma system has at least one inductively coupled high-frequency plasma jet source having a burner body delimiting a plasma generating space having an outlet orifice for the plasma jet, a coil surrounding the plasma generating space in some areas, an inlet for supplying a gas and/or a precursor material into the plasma generating space and a high-frequency generator which is connected to the coil for igniting the plasma and for injecting an electric power into the plasma. The plasma jet source has an electric component using which the intensity of the plasma jet is variable periodically over time. In addition, a method of producing the functional coating on a substrate by using this plasma system is described.
摘要翻译：等离子体系统具有至少一个感应耦合的高频等离子体喷射源，其具有限定等离子体产生空间的燃烧器主体，该等离子体产生空间具有用于等离子体射流的出口孔，围绕某些区域中的等离子体产生空间的线圈，用于供应气体和/或前体材料进入等离子体产生空间;以及高频发生器，其连接到用于点燃等离子体并用于向等离子体注入电力的线圈。等离子体喷射源具有电子部件，其中等离子体射流的强度随时间周期性地变化。此外，描述了通过使用该等离子体系在基板上制造功能性涂层的方法。

5. 发明申请

US20120222617A1 PLASMA SYSTEM AND METHOD OF PRODUCING A FUNCTIONAL COATING 审中-公开
标题翻译：等离子体系和生产功能性涂料的方法
公开(公告)号：US20120222617A1
公开(公告)日：2012-09-06
申请号：US13472830
申请日：2012-05-16
申请人： Stefan GROSSE , Sascha Henke , Susanne Spindler
发明人： Stefan GROSSE , Sascha Henke , Susanne Spindler
IPC分类号： C23C16/513
CPC分类号： H01J37/32357 , C23C16/513 , C23C16/515 , H01J37/32706 , H05H1/30
摘要： A plasma system has at least one inductively coupled high-frequency plasma jet source having a burner body delimiting a plasma generating space, having an outlet orifice for the plasma jet, and a chamber communicating with the plasma jet source through the outlet orifice, having a substrate situated in the chamber, where it is exposed to the plasma jet. The substrate is situated on a substrate electrode to which an electric voltage may be applied. In addition, a method of producing a functional coating on the substrate using such a plasma system is also described. In a preferred embodiment, during operation of the plasma system, both the plasma jet and the electric voltage on the substrate electrode are pulsed and/or a pressure gradient is maintained between the interior of the plasma jet source and the interior of the chamber.
摘要翻译：等离子体系统具有至少一个感应耦合的高频等离子体喷射源，其具有限定等离子体产生空间的燃烧器主体，具有用于等离子体射流的出口孔，以及通过出口孔与等离子体喷射源连通的室，位于室中的基板，其暴露于等离子体射流。衬底位于可施加电压的衬底电极上。此外，还描述了使用这种等离子体系统在基板上制备功能性涂层的方法。在优选实施例中，在等离子体系统的操作期间，基板电极上的等离子体射流和电压都被脉冲化和/或在等离子体射流源的内部和腔室的内部之间保持压力梯度。

6. 发明授权

US06396214B1 Device for producing a free cold plasma jet 有权
标题翻译：用于生产免费冷等离子体射流的装置
公开(公告)号：US06396214B1
公开(公告)日：2002-05-28
申请号：US09601732
申请日：2000-11-20
申请人： Stefan Grosse , Thomas Weber , Astrid Gahl
发明人： Stefan Grosse , Thomas Weber , Astrid Gahl
IPC分类号： H01J724
CPC分类号： H01J37/32357 , H05H1/30
摘要： A device for generating a free cold plasma beam having a high-frequency plasma source and a hollow body transparent to electromagnetic radiation, which is provided with at least one gas inlet opening and at least one beam outlet opening is proposed. The high-frequency plasma source is in particular a microwave plasma source or a high-frequency plasma source and initially generates at least within the hollow body a cold gas plasma, which is conducted as a free cold plasma beam via the beam outlet opening from the hollow body and enters the work chamber. The work chamber is under vacuum. The free plasma beam remains bundled in the work chamber and can be used there for cleaning, etching, or plasma coating with a reactive gas.
摘要翻译：提出了一种用于产生具有高频等离子体源和对电磁辐射透明的中空体的自由冷等离子体束的装置，其具有至少一个气体入口和至少一个射束出口。高频等离子体源特别是微波等离子体源或高频等离子体源，并且最初至少在中空体内产生冷气体等离子体，该等离子体作为自由冷等离子体束通过束出口开口从空心体进入工作室。工作室是在真空下。自由等离子体束保持捆扎在工作室中，并可用于清洁，蚀刻或用反应气体等离子体涂覆。

7. 发明授权

US07455906B2 Tribologically loaded component and accompanying gas engine or internal combustion engine 有权
标题翻译：摩擦学装载的部件和伴随的燃气发动机或内燃机
公开(公告)号：US07455906B2
公开(公告)日：2008-11-25
申请号：US10740710
申请日：2003-12-18
申请人： Stefan Grosse , Sascha Henke , Rainer Feuerfeil , Andreas Gross
发明人： Stefan Grosse , Sascha Henke , Rainer Feuerfeil , Andreas Gross
IPC分类号： B32B9/00
CPC分类号： C23C16/26 , C23C16/02 , F02M61/12 , F02M61/166 , F02M61/168 , F02M2200/9038 , F02M2200/9046 , Y10T428/265 , Y10T428/30
摘要： A tribologically loaded component, in particular an injection needle, an injection valve, or a component of a combustion-engine injection system. This component has a surface region, which moves in relation to a counterbody during operation, is tribologically loaded in the process, and is provided with a first coating. This first coating has a first layer of diamond-like carbon having a hydrogen level of at least 30 atom %. Additionally provided is a gas engine or an internal combustion engine, which is driven by a dry gas, such as natural gas or hydrogen, as a fuel, or is driven under oil-free and/or water-free combustion conditions, and has such a tribologically loaded component.
摘要翻译：摩擦学加载的部件，特别是喷射针，喷射阀或燃烧发动机喷射系统的部件。该组件具有在操作期间相对于反体运动的表面区域，在该过程中被摩擦学地加载，并且设置有第一涂层。该第一涂层具有氢含量至少为30原子％的第一层类金刚石碳。另外提供了一种燃气发动机或内燃机，其由诸如天然气或氢气的干燥气体作为燃料驱动，或者在无油和/或无水燃烧条件下被驱动，并且具有这样的摩擦学加载的部件。

8. 发明授权

US06934142B2 Device and method for charge removal from dielectric surfaces 失效
标题翻译：从电介质表面去除电荷的装置和方法
公开(公告)号：US06934142B2
公开(公告)日：2005-08-23
申请号：US10258309
申请日：2002-02-14
申请人： Stefan Grosse , Sascha Henke
发明人： Stefan Grosse , Sascha Henke
IPC分类号： C08J7/00 , C23C16/50 , C23C16/511 , H01J37/02 , H01J37/32 , H05F3/04 , H02H3/00
CPC分类号： H01J37/32752 , H01J37/026 , H01J2237/0044 , H01J2237/336 , H05F3/04
摘要： A device and a method for at least partial removal of electric charges from dielectric surfaces, in particular surfaces of plastic films, paper webs or plastic fibers are described. First, a plasma is generated through microstructure discharges with a plasma device in at least one plasma region. In addition, the dielectric surface is introduced into the plasma region with a feed mechanism and is temporarily exposed to electrically charged particles generated by the plasma there.
摘要翻译：描述了用于至少部分地从电介质表面去除电荷的装置和方法，特别是塑料膜，纸幅或塑料纤维的表面。首先，通过在至少一个等离子体区域中的等离子体装置的微结构放电产生等离子体。此外，电介质表面用进料机构引入等离子体区域，并且暂时暴露于由其中的等离子体产生的带电粒子。

9. 发明申请

US20100203253A1 Plasma system and method of producing a functional coating 审中-公开
标题翻译：等离子体系统和功能性涂层的制造方法
公开(公告)号：US20100203253A1
公开(公告)日：2010-08-12
申请号：US10240474
申请日：2001-12-05
申请人： Stefan Grosse , Sasha Henke , Susanne Spindler
发明人： Stefan Grosse , Sasha Henke , Susanne Spindler
IPC分类号： C23C4/12 , H05H1/26
CPC分类号： H01J37/32357 , C23C16/513 , C23C16/515 , H01J37/32706 , H05H1/30
摘要： A plasma system has at least one inductively coupled high-frequency plasma jet source having a burner body delimiting a plasma generating space, having an outlet orifice for the plasma jet, and a chamber communicating with the plasma jet source through the outlet orifice, having a substrate situated in the chamber, where it is exposed to the plasma jet. The substrate is situated on a substrate electrode to which an electric voltage may be applied. In addition, a method of producing a functional coating on the substrate using such a plasma system is also described. In a preferred embodiment, during operation of the plasma system, both the plasma jet and the electric voltage on the substrate electrode are pulsed and/or a pressure gradient is maintained between the interior of the plasma jet source and the interior of the chamber.
摘要翻译：等离子体系统具有至少一个感应耦合的高频等离子体喷射源，其具有限定等离子体产生空间的燃烧器主体，具有用于等离子体射流的出口孔，以及通过出口孔与等离子体喷射源连通的室，位于室中的基板，其暴露于等离子体射流。衬底位于可施加电压的衬底电极上。此外，还描述了使用这种等离子体系统在基板上制备功能性涂层的方法。在优选实施例中，在等离子体系统的操作期间，基板电极上的等离子体射流和电压都被脉冲化和/或在等离子体射流源的内部和腔室的内部之间保持压力梯度。

10. 发明授权

US07771798B1 Method for producing composite layers using a plasma jet source 有权
标题翻译：使用等离子体喷射源制造复合层的方法
公开(公告)号：US07771798B1
公开(公告)日：2010-08-10
申请号：US10148842
申请日：2000-10-11
申请人： Stefan Grosse , Johannes Voigt
发明人： Stefan Grosse , Johannes Voigt
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： C23C16/513 , C23C4/123 , C23C4/134
摘要： A method is for producing a functional coating, e.g., composite layers or metal alloys, on a substrate using at least one plasma jet source able to be operated in a fine vacuum up to an almost atmospheric pressure range. For this purpose, the plasma jet source produces a plasma, which emerges from the plasma jet source in the form of a plasma jet and acts on a substrate. In this context, at least two precursor materials, which are modified or fused in the plasma jet and subsequently deposited on the substrate, are introduced into the plasma.
摘要翻译：一种方法是使用能够在几乎大气压力范围内的细小真空中操作的至少一个等离子体射流来在衬底上产生功能性涂层，例如复合层或金属合金。为此，等离子体喷射源产生等离子体，其以等离子体射流的形式从等离子体喷射源出射并作用在基底上。在本文中，在等离子体射流中修饰或熔融并随后沉积在衬底上的至少两种前体材料被引入到等离子体中。

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