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    • 8. 发明授权
    • Device for producing a free cold plasma jet
    • 用于生产免费冷等离子体射流的装置
    • US06396214B1
    • 2002-05-28
    • US09601732
    • 2000-11-20
    • Stefan GrosseThomas WeberAstrid Gahl
    • Stefan GrosseThomas WeberAstrid Gahl
    • H01J724
    • H01J37/32357H05H1/30
    • A device for generating a free cold plasma beam having a high-frequency plasma source and a hollow body transparent to electromagnetic radiation, which is provided with at least one gas inlet opening and at least one beam outlet opening is proposed. The high-frequency plasma source is in particular a microwave plasma source or a high-frequency plasma source and initially generates at least within the hollow body a cold gas plasma, which is conducted as a free cold plasma beam via the beam outlet opening from the hollow body and enters the work chamber. The work chamber is under vacuum. The free plasma beam remains bundled in the work chamber and can be used there for cleaning, etching, or plasma coating with a reactive gas.
    • 提出了一种用于产生具有高频等离子体源和对电磁辐射透明的中空体的自由冷等离子体束的装置,其具有至少一个气体入口和至少一个射束出口。 高频等离子体源特别是微波等离子体源或高频等离子体源,并且最初至少在中空体内产生冷气体等离子体,该等离子体作为自由冷等离子体束通过束出口开口从 空心体进入工作室。 工作室是在真空下。 自由等离子体束保持捆扎在工作室中,并可用于清洁,蚀刻或用反应气体等离子体涂覆。
    • 9. 发明申请
    • Plasma system and method of producing a functional coating
    • 等离子体系统和功能性涂层的制造方法
    • US20100203253A1
    • 2010-08-12
    • US10240474
    • 2001-12-05
    • Stefan GrosseSasha HenkeSusanne Spindler
    • Stefan GrosseSasha HenkeSusanne Spindler
    • C23C4/12H05H1/26
    • H01J37/32357C23C16/513C23C16/515H01J37/32706H05H1/30
    • A plasma system has at least one inductively coupled high-frequency plasma jet source having a burner body delimiting a plasma generating space, having an outlet orifice for the plasma jet, and a chamber communicating with the plasma jet source through the outlet orifice, having a substrate situated in the chamber, where it is exposed to the plasma jet. The substrate is situated on a substrate electrode to which an electric voltage may be applied. In addition, a method of producing a functional coating on the substrate using such a plasma system is also described. In a preferred embodiment, during operation of the plasma system, both the plasma jet and the electric voltage on the substrate electrode are pulsed and/or a pressure gradient is maintained between the interior of the plasma jet source and the interior of the chamber.
    • 等离子体系统具有至少一个感应耦合的高频等离子体喷射源,其具有限定等离子体产生空间的燃烧器主体,具有用于等离子体射流的出口孔,以及通过出口孔与等离子体喷射源连通的室, 位于室中的基板,其暴露于等离子体射流。 衬底位于可施加电压的衬底电极上。 此外,还描述了使用这种等离子体系统在基板上制备功能性涂层的方法。 在优选实施例中,在等离子体系统的操作期间,基板电极上的等离子体射流和电压都被脉冲化和/或在等离子体射流源的内部和腔室的内部之间保持压力梯度。