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1. 发明授权

US09142168B2 Method and apparatus for driving a display device 有权
标题翻译：用于驱动显示装置的方法和装置
公开(公告)号：US09142168B2
公开(公告)日：2015-09-22
申请号：US13170162
申请日：2011-06-27
申请人： Xie-Ren Hsu , Wei-Song Huang
发明人： Xie-Ren Hsu , Wei-Song Huang
IPC分类号： G09G5/10 , G09G3/36
CPC分类号： G09G3/3685 , G09G3/36 , G09G2290/00 , G09G2310/08 , G09G2320/0276 , G09G2320/066 , G09G2320/0673 , G09G2330/021
摘要： The present invention discloses a driving device of a display device. The driving device comprises a gamma voltage generator, for generating a gamma voltage according to a control signal to a source driver of the display device, and a logic unit, for generating the control signal to the gamma voltage generator according to a difference among image properties of a plurality of frames to be displayed, to adjust the gamma voltage.
摘要翻译：本发明公开了一种显示装置的驱动装置。驱动装置包括伽马电压发生器，用于根据对显示装置的源极驱动器的控制信号产生伽马电压，以及逻辑单元，用于根据图像特性之间的差异生成到伽马电压发生器的控制信号要显示的多个帧，以调整伽马电压。

2. 发明授权

US08866202B2 Device with gaps for capacitance reduction 有权
标题翻译：具有间隙的器件，用于降低电容
公开(公告)号：US08866202B2
公开(公告)日：2014-10-21
申请号：US13457147
申请日：2012-04-26
申请人： S. M. Reza Sadjadi , Zhi-Song Huang
发明人： S. M. Reza Sadjadi , Zhi-Song Huang
IPC分类号： H01L21/70 , H01L23/48 , H01L23/52 , H01L21/768 , H01L23/482 , H01L21/033 , H01L21/311
CPC分类号： H01L21/7682 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76802 , H01L21/76843 , H01L23/4821 , H01L2924/0002 , H01L2924/00
摘要： A method for reducing capacitances between semiconductor devices is provided. A plurality of contact structures is formed in a dielectric layer. A mask is formed to cover the contact structures wherein the mask has mask features for exposing parts of the dielectric layer wherein the mask features have widths. The widths of the mask features are shrunk with a sidewall deposition. Gaps are etched into the dielectric layer through the sidewall deposition. The gaps are closed to form pockets in the gaps.
摘要翻译：提供一种降低半导体器件之间的电容的方法。在电介质层中形成多个接触结构。形成掩模以覆盖接触结构，其中掩模具有用于暴露电介质层的部分的掩模特征，其中掩模特征具有宽度。掩模特征的宽度随着侧壁沉积而收缩。间隙通过侧壁沉积蚀刻到介电层中。间隙封闭以形成间隙中的凹坑。

3. 发明授权

US08846295B2 Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof 有权
标题翻译：含有被保护的羟基用于负显影的光致抗蚀剂组合物和使用它的图案形成方法
公开(公告)号：US08846295B2
公开(公告)日：2014-09-30
申请号：US13457735
申请日：2012-04-27
申请人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li
发明人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li
IPC分类号： G03F7/038 , G03F7/021
CPC分类号： G03F7/0382 , G03F7/021 , G03F7/0397 , G03F7/20 , G03F7/325
摘要： The present invention relates to a photoresist composition capable of negative development and a pattern forming method using the photoresist composition. The photoresist composition includes an imaging polymer, a crosslinking agent and a radiation sensitive acid generator. The imaging polymer includes a monomeric unit having an acid-labile moiety-substituted hydroxyl group. The patterning forming method utilizes an organic solvent developer to selectively remove an unexposed region of a photoresist layer of the photoresist composition to form a patterned structure in the photoresist layer. The photoresist composition and the pattern forming method are especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
摘要翻译：本发明涉及能够显影的光致抗蚀剂组合物和使用光致抗蚀剂组合物的图案形成方法。光致抗蚀剂组合物包括成像聚合物，交联剂和辐射敏感的酸发生剂。成像聚合物包括具有酸不稳定部分取代的羟基的单体单元。图案形成方法利用有机溶剂显影剂选择性地除去光致抗蚀剂组合物的光致抗蚀剂层的未曝光区域，以在光致抗蚀剂层中形成图案化结构。光致抗蚀剂组合物和图案形成方法对于使用193nm（ArF）光刻在半导体衬底上形成材料图案特别有用。

4. 发明授权

US08387237B2 Device for assembling and disassembling inner support of vehicle tire 有权
标题翻译：装配和拆卸车辆轮胎内部支撑的装置
公开(公告)号：US08387237B2
公开(公告)日：2013-03-05
申请号：US12495859
申请日：2009-07-01
申请人： Song Huang , Ji Chen
发明人： Song Huang , Ji Chen
IPC分类号： B23P19/00 , B25B27/00 , B30B5/04
CPC分类号： B60C25/00 , B60C25/0509 , Y10T29/49822 , Y10T29/53448 , Y10T29/53657 , Y10T29/53796 , Y10T29/53909
摘要： A device for assembling and disassembling an inner support of a vehicle tire, comprising a supporter, a fastening belt, a retracting device, a securing device, and a gear unit. The retracting device and the securing device are disposed on the supporter. One end of the fastening belt is connected to the retracting device, the other end of the fastening belt is connected to the securing device. The retracting device is connected to the gear unit. The device facilitates assembling and disassembling on demand and allows for a simple and fast disassembling process.
摘要翻译：一种用于组装和拆卸车辆轮胎的内部支撑件的装置，包括支撑件，紧固带，缩回装置，固定装置和减速器。缩回装置和固定装置设置在支撑件上。紧固带的一端连接到缩回装置，紧固带的另一端连接到固定装置。回缩装置连接到减速器。该装置有助于根据需要组装和拆卸，并允许简单快速的拆卸过程。

5. 发明授权

US08293451B2 Near-infrared absorbing film compositions 有权
标题翻译：近红外吸收膜组合物
公开(公告)号：US08293451B2
公开(公告)日：2012-10-23
申请号：US12543003
申请日：2009-08-18
申请人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
发明人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/091 , G03F9/7026
摘要： A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译：包含至少（i）一种或多种近红外吸收性三苯胺类染料的可固化液体制剂，和（ii）一种或多种浇铸溶剂。本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法和光刻胶膜。

6. 发明申请

US20120210977A1 THROTTLE VALVE BODY AND THROTTLE VALVE DEVICE HAVING THE SAME 有权
标题翻译：节流阀阀体和带有相同阀门的阀门装置
公开(公告)号：US20120210977A1
公开(公告)日：2012-08-23
申请号：US13430867
申请日：2012-03-27
申请人： Wei-Shin KUO , Bi-Song HUANG
发明人： Wei-Shin KUO , Bi-Song HUANG
IPC分类号： F02D9/00 , F02D9/08
CPC分类号： F02D9/1055
摘要： A throttle valve body includes a main body, a main valve, and a bypass valve. The main body includes intake and bypass passages, a sensor mounting hole, and a bypass valve mounting hole. The main valve divides the intake passage into upstream and downstream portions. The bypass valve divides the bypass passage into upstream and downstream sections that are in fluid communication respectively with the upstream and downstream portions. The sensor mounting hole extends along an axis along which the downstream section extends. The bypass valve mounting hole is in fluid communication with a portion of the bypass passage disposed between the upstream and downstream sections.
摘要翻译：节流阀体包括主体，主阀和旁通阀。主体包括进气和旁路通道，传感器安装孔和旁通阀安装孔。主阀将进气通道分成上游和下游部分。旁通阀将旁通通道分成与上游和下游部分流体连通的上游和下游部分。传感器安装孔沿着下游部分延伸的轴线延伸。旁通阀安装孔与设置在上游部分和下游部分之间的旁路通路的一部分流体连通。

7. 发明授权

US08234706B2 Enabling access to aggregated software security information 有权
标题翻译：启用访问聚合的软件安全信息
公开(公告)号：US08234706B2
公开(公告)日：2012-07-31
申请号：US11820759
申请日：2007-06-20
申请人： Dongmei Zhang , Yingnong Dang , Xiaohui Hou , Song Huang , Jian Wang
发明人： Dongmei Zhang , Yingnong Dang , Xiaohui Hou , Song Huang , Jian Wang
IPC分类号： G06F11/00
CPC分类号： G06Q10/00
摘要： A method for enabling access to software security data is provided. The method includes accessing data associated with software vulnerabilities from a plurality of on-line sources. The method further includes aggregating the data from the plurality of on-line sources and identifying attributes associated with the data. The method also includes enabling access to the aggregated data through a graphical user interface that can be used to analyze the data according to the attributes.
摘要翻译：提供了一种用于访问软件安全数据的方法。该方法包括从多个在线源访问与软件漏洞相关联的数据。该方法还包括聚合来自多个在线源的数据和识别与该数据相关联的属性。该方法还包括通过可用于根据属性分析数据的图形用户界面来访问聚合数据。

8. 发明申请

US20120178027A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS 有权
标题翻译：多次曝光光刻法
公开(公告)号：US20120178027A1
公开(公告)日：2012-07-12
申请号：US13418421
申请日：2012-03-13
申请人： Kuang-Jung Chen , Wu-Song Huang , Ranee Wai-Ling Kwong , Sen Liu , Pushkara R. Varanasi
发明人： Kuang-Jung Chen , Wu-Song Huang , Ranee Wai-Ling Kwong , Sen Liu , Pushkara R. Varanasi
IPC分类号： G03F7/20
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/095 , G03F7/20 , G03F7/2022 , G03F7/30 , G03F7/38 , G03F7/70466 , Y10S430/12
摘要： A method. The method forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second image pattern, respectively. The photoresist composition includes a polymer including labile group(s), base soluble group(s), a photosensitive acid generator, and a photosensitive base generator. The photosensitive acid generator generates first and second amounts of acid upon exposure to first and second doses of radiation, respectively. The second amount of acid exceeds the first amount of acid. The second dose of radiation exceeds the first dose of radiation. The photosensitive base generator generates a first and second amount of base upon exposure to the first and second dose of radiation, respectively. The first amount of base exceeds the first amount of acid. The second amount of acid exceeds the second amount of base.
摘要翻译：一个方法。该方法在衬底上形成光致抗蚀剂组合物的膜，并分别通过具有第一和第二图像图案的第一和第二掩模使膜的第一和第二区域暴露于辐射。光致抗蚀剂组合物包括包含不稳定基团，碱溶性基团，光敏酸发生剂和感光基底发生剂的聚合物。感光酸发生器分别在暴露于第一和第二剂量的辐射时产生第一和第二量的酸。第二量的酸超过第一量的酸。第二剂辐射超过第一剂量的辐射。光敏底物发生器分别在暴露于第一和第二剂量的辐射时产生第一和第二量的碱。碱的第一量超过第一量的酸。第二量的酸超过第二量的碱。

9. 发明申请

US20120156450A1 MULTI-EXPOSURE LITHOGRAPHY EMPLOYING DIFFERENTIALLY SENSITIVE PHOTORESIST LAYERS 审中-公开
标题翻译：使用差分感光层的多次曝光光刻
公开(公告)号：US20120156450A1
公开(公告)日：2012-06-21
申请号：US13406965
申请日：2012-02-28
申请人： Wu-Song Huang , Wai-kin Li , Ping-Chuan Wang
发明人： Wu-Song Huang , Wai-kin Li , Ping-Chuan Wang
IPC分类号： B32B3/00
CPC分类号： G03F7/70466 , Y10S438/947 , Y10S438/948 , Y10T428/24802
摘要： A stack of a second photoresist having a second photosensitivity and a first photoresist having a first photosensitivity, which is greater than second photosensitivity, is formed on a substrate. A first pattern is formed in the first photoresist by a first exposure and a first development, while the second photoresist underneath remains intact. A second pattern comprising an array of lines is formed in the second photoresist. An exposed portion of the second photoresist underneath a remaining portion of the first photoresist forms a narrow portion of a line pattern, while an exposed portion of the second photoresist outside the area of the remaining portions of the photoresist forms a wide portion of the line pattern. Each wide portion of the line pattern forms a bulge in the second pattern, which increases overlay tolerance between the second pattern and the pattern of conductive vias.
摘要翻译：在基板上形成具有第二感光性的第二光致抗蚀剂的叠层和具有大于第二光敏性的第一光敏性的第一光致抗蚀剂。通过第一曝光和第一显影在第一光致抗蚀剂中形成第一图案，而下面的第二光致抗蚀剂保持完整。在第二光致抗蚀剂中形成包括线阵列的第二图案。在第一光致抗蚀剂的剩余部分下面的第二光致抗蚀剂的暴露部分形成线图案的窄部分，而在光致抗蚀剂的剩余部分的区域外的第二光致抗蚀剂的暴露部分形成线图案的宽部分。线图案的每个宽部分在第二图案中形成凸起，这增加了第二图案和导电通孔图案之间的覆盖公差。

10. 发明授权

US08187412B2 Apparatus for providing device with gaps for capacitance reduction 有权
标题翻译：用于为器件提供间隙以减少电容的装置
公开(公告)号：US08187412B2
公开(公告)日：2012-05-29
申请号：US12341568
申请日：2008-12-22
申请人： S. M. Reza Sadjadi , Zhi-Song Huang
发明人： S. M. Reza Sadjadi , Zhi-Song Huang
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： H01L21/7682 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76802 , H01L21/76843 , H01L23/4821 , H01L2924/0002 , H01L2924/00
摘要： A method for reducing capacitances between semiconductor devices is provided. A plurality of contact structures is formed in a dielectric layer. A mask is formed to cover the contact structures wherein the mask has mask features for exposing parts of the dielectric layer wherein the mask features have widths. The widths of the mask features are shrunk with a sidewall deposition. Gaps are etched into the dielectric layer through the sidewall deposition. The gaps are closed to form pockets in the gaps.
摘要翻译：提供一种用于降低半导体器件之间的电容的方法。在电介质层中形成多个接触结构。形成掩模以覆盖接触结构，其中掩模具有用于暴露电介质层的部分的掩模特征，其中掩模特征具有宽度。掩模特征的宽度随着侧壁沉积而收缩。间隙通过侧壁沉积蚀刻到介电层中。间隙封闭，形成缝隙。

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