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    • 5. 发明授权
    • Methods of producing damascene main pole for perpendicular magnetic recording head
    • 生产用于垂直磁记录头的镶嵌主极的方法
    • US08262918B1
    • 2012-09-11
    • US12411270
    • 2009-03-25
    • Yun-Fei LiRonghui ZhouGuanghong LuoMing Jiang
    • Yun-Fei LiRonghui ZhouGuanghong LuoMing Jiang
    • B44C1/22
    • G11B5/1278G11B5/3116G11B5/3163
    • Methods of producing magnetic recording heads are disclosed. The methods can include providing a wafer comprising a substrate layer in which are disposed a plurality of damascene trenches. The method can further include depositing a pole material across the whole wafer, wherein the plurality of trenches are filled with the pole material. The methods can further include depositing a mask material over the pole material across the whole wafer. The methods can further include performing a first material removal process across the whole wafer to remove the mask material and a first portion of the pole material at a same material removal rate. The methods can further include performing a second material removal process to remove a second portion of the pole material above the substrate layer.
    • 公开了制造磁记录头的方法。 所述方法可以包括提供包括其中布置有多个镶嵌沟槽的基底层的晶片。 该方法还可以包括在整个晶片上沉积极材料,其中多个沟槽用极材料填充。 该方法还可以包括在整个晶片上沉积超过极材料的掩模材料。 该方法还可以包括在整个晶片上执行第一材料去除工艺,以相同的材料去除速率移除掩模材料和极材料的第一部分。 所述方法还可以包括执行第二材料去除工艺以去除衬底层上方的极材料的第二部分。
    • 6. 发明授权
    • Process for fabricating a magnetic pole and shields
    • 制造磁极和屏蔽的工艺
    • US08578594B2
    • 2013-11-12
    • US13154191
    • 2011-06-06
    • Ming JiangRonghui ZhouGuanghong LuoMasahiro OsugiDanning Yang
    • Ming JiangRonghui ZhouGuanghong LuoMasahiro OsugiDanning Yang
    • G11B5/127H04R31/00
    • G11B5/1278G11B5/3116G11B5/315G11B5/3163
    • A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.
    • 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底,底层和第一非磁性中间层,在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度,在所述第一中间层的平坦化的第一部分中提供主极,在所述第一中间层的所述第一部分的第一部分上提供第一图案, 第一中间层,图案包括用于限定侧屏蔽沟槽的孔,执行湿蚀刻以去除第一中间层的至少一部分,从而暴露多个主极侧中的至少一个,以及沉积侧屏蔽材料 在侧盾沟。
    • 7. 发明授权
    • Damascene write poles produced via full film plating
    • 大马士革通过全电镀制作电极
    • US08486285B2
    • 2013-07-16
    • US12544998
    • 2009-08-20
    • Ronghui ZhouMing JiangXiaohai XiangJinwen WangGuanghong LuoYun-Fei Li
    • Ronghui ZhouMing JiangXiaohai XiangJinwen WangGuanghong LuoYun-Fei Li
    • B44C1/22
    • G11B5/855Y10T29/49048
    • A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.
    • 用于形成写极的方法包括在晶片的衬底层上形成阻挡层,所述阻挡层在衬底层中具有在镶嵌沟槽上方的开口,以及在停止层上形成缓冲层,所述缓冲层具有 在停止层的开口上方开口。 该方法还包括在晶片上镀覆一层磁性材料,在金刚石沟槽上方的磁性材料的区域上设置第一牺牲材料,在晶片上进行研磨或蚀刻操作,以去除第一 牺牲材料并且去除第一牺牲材料,在晶片上设置第二牺牲材料,以及在晶片上执行抛光操作以去除镶嵌沟槽,第二牺牲材料和缓冲层之上的磁性材料的区域。
    • 8. 发明授权
    • Method and system for providing a full wrap-around shield using a frame configured wet etch in a damascene process
    • 用于在镶嵌过程中使用框架配置的湿法蚀刻来提供全包裹屏蔽的方法和系统
    • US08454846B1
    • 2013-06-04
    • US12817376
    • 2010-06-17
    • Ronghui ZhouMing JiangDanning YangYun-Fei Li
    • Ronghui ZhouMing JiangDanning YangYun-Fei Li
    • B44C1/22G11B5/31
    • G11B5/3163G11B5/315
    • A method and system for fabricating magnetic recording transducer are described. The magnetic recording transducer has a main pole including a plurality of sides, an intermediate layer adjacent to the sides of the main pole, and a field region distal from the main pole. The method and system include providing at least one trench in the intermediate layer. The trench(es) are between the main pole and the field region. The method and system also include providing a stop layer. A portion of the stop layer resides in at least part of the trench(es) and on at least part of the field region. The method and system also include removing a portion of the intermediate layer using a wet etch. The stop layer is resistant to removal by the wet etch. The method and system also include depositing a full wrap-around shield layer on the main pole.
    • 描述了用于制造磁记录换能器的方法和系统。 磁记录传感器具有包括多个侧面的主极,与主极的侧面相邻的中间层和远离主极的场区域。 该方法和系统包括在中间层中提供至少一个沟槽。 沟槽在主极和场区之间。 该方法和系统还包括提供停止层。 停止层的一部分位于沟槽的至少一部分中,并且位于场区域的至少一部分上。 该方法和系统还包括使用湿蚀刻去除中间层的一部分。 止挡层耐湿蚀刻能够去除。 该方法和系统还包括在主极上沉积完整的环绕屏蔽层。
    • 9. 发明申请
    • PROCESS FOR FABRICATING A MAGNETIC POLE AND SHIELDS
    • 制造磁性和石英的方法
    • US20120304454A1
    • 2012-12-06
    • US13154191
    • 2011-06-06
    • MING JIANGRONGHUI ZHOUGUANGHONG LUOMASAHIRO OSUGIDANNING YANG
    • MING JIANGRONGHUI ZHOUGUANGHONG LUOMASAHIRO OSUGIDANNING YANG
    • G11B5/127
    • G11B5/1278G11B5/3116G11B5/315G11B5/3163
    • A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.
    • 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底,底层和第一非磁性中间层,在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度,在所述第一中间层的平坦化的第一部分中提供主极,在所述第一中间层的所述第一部分的第一部分上提供第一图案, 第一中间层,图案包括用于限定侧屏蔽沟槽的孔,执行湿蚀刻以去除第一中间层的至少一部分,从而暴露多个主极侧中的至少一个,以及沉积侧屏蔽材料 在侧盾沟。
    • 10. 发明申请
    • DAMASCENE WRITE POLES PRODUCED VIA FULL FILM PLATING
    • 大容量写波长通过全电镀
    • US20110042349A1
    • 2011-02-24
    • US12544998
    • 2009-08-20
    • Ronghui ZHOUMing JIANGXiaohai XIANGJinwen WANGGuanghong LUOYun-Fei LI
    • Ronghui ZHOUMing JIANGXiaohai XIANGJinwen WANGGuanghong LUOYun-Fei LI
    • B44C1/22B05D5/12
    • G11B5/855Y10T29/49048
    • A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.
    • 用于形成写极的方法包括在晶片的衬底层上形成阻挡层,所述阻挡层在衬底层中具有在镶嵌沟槽上方的开口,以及在停止层上形成缓冲层,所述缓冲层具有 在停止层的开口上方开口。 该方法还包括在晶片上镀覆一层磁性材料,在金刚石沟槽上方的磁性材料的区域上设置第一牺牲材料,在晶片上进行研磨或蚀刻操作,以去除第一 牺牲材料并且去除第一牺牲材料,在晶片上设置第二牺牲材料,以及在晶片上执行抛光操作以去除镶嵌沟槽,第二牺牲材料和缓冲层之上的磁性材料的区域。