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1. 发明申请

US20120258603A1 CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE 有权
标题翻译：钳式单声道淋浴电极
公开(公告)号：US20120258603A1
公开(公告)日：2012-10-11
申请号：US13526974
申请日：2012-06-19
申请人： Roger Patrick , Gregory R. Bettencourt , Michael C. Kellogg
发明人： Roger Patrick , Gregory R. Bettencourt , Michael C. Kellogg
IPC分类号： H01L21/302
CPC分类号： H01L21/3065 , C23C16/45565 , C23C16/4557 , H01J37/32091 , H01J37/3244 , H01J37/32458 , H01J37/32532 , H01J37/32541 , H01J37/32568 , H01J37/32605 , Y10S403/12 , Y10S403/13
摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.
摘要翻译：用于等离子体反应室的电极组件，用于半导体衬底处理。该组件包括上部喷头电极，其通过一系列间隔开的凸轮锁定机械地附接到背板。保护环围绕背板并且可移动到保护环中的开口与背板中的开口对准的位置，使得凸轮锁可以用工具旋转以释放从电极的上表面延伸的锁定销。

2. 发明申请

US20090003133A1 Acoustic Telemetry 审中-公开
标题翻译：声学遥测
公开(公告)号：US20090003133A1
公开(公告)日：2009-01-01
申请号：US12279089
申请日：2007-03-20
申请人： Roger Patrick Dalton , Ian Andrew Jamieson , Matthew Waters
发明人： Roger Patrick Dalton , Ian Andrew Jamieson , Matthew Waters
IPC分类号： E21B47/16 , B06B1/00
CPC分类号： E21B47/16
摘要： A method of transmitting data acoustically through a tubular structure, such as a drill string or production tubing in an oil or gas well, predominantly comprising a series of tubing sections (1)joined end to end by couplings (2), at least a preponderance of the tubing sections having an axial length of at least a dimension X between couplings and at least a preponderance of the couplings having an axial length of no more than a dimension x, where X is substantially greater than x. The method comprises propagating acoustic signals along the structure, between transducers (9,10) over a distance N of at least 10X, in the form of tone bursts at least predominantly comprising a selected guided wave mode (preferably the L(0, 1) mode at low frequency) with a wavelength of at least 2x, and each burst having a temporal length of substantially less than 2N/C and preferably no more than 2X/C, where C is the phase velocity of the selected mode. In this way interference problems associated with Brillouin scattering in such structures can be overcome without excessive power consumption.
摘要翻译：一种通过管状结构传输数据的方法，例如在油井或气井中的钻柱或生产管道，主要包括由联轴器（2）端到端连接的一系列管段（1），至少一个优势管段的轴向长度至少为联轴器之间的尺寸X，并且至少具有轴向长度不大于尺寸x的连接件的优势，其中X基本上大于x。该方法包括以至少主要包括选定的导波模式（优选L（0,1））的音调脉冲串的形式沿着结构传播在至少10X的距离N之间的换能器（9,10）之间的声信号，具有至少2x的波长的低频模式，并且每个脉冲串的时间长度基本上小于2N / C，优选不大于2X / C，其中C是所选模式的相速度。以这种方式，可以克服与这种结构中的布里渊散射相关的干扰问题，而不需要过多的功耗。

3. 发明授权

US07190119B2 Methods and apparatus for optimizing a substrate in a plasma processing system 有权
标题翻译：用于优化等离子体处理系统中的衬底的方法和装置
公开(公告)号：US07190119B2
公开(公告)日：2007-03-13
申请号：US10703843
申请日：2003-11-07
申请人： Roger Patrick , Brett Richardson , Norman Williams
发明人： Roger Patrick , Brett Richardson , Norman Williams
IPC分类号： H01J7/24
CPC分类号： H01J37/3299 , H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H03H7/40
摘要： An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being coupled with a first electrical measuring device, the second terminal being coupled with a second electrical measuring device. The arrangement also includes coupling a compensating circuit to the second terminal. The arrangement further includes providing a feedback circuit coupled to receive information from the first electrical measuring device and the second electrical measuring device, an output of the feedback circuit being employed to control the compensating circuit in order to keep a ratio between a first electrical value at the first terminal and a second electrical value at the second terminal substantially at a predefined value.
摘要翻译：公开了一种在等离子体处理系统中处理半导体衬底的装置。该装置包括提供具有第一端子和第二端子的RF耦合结构，第一端子与第一电测量装置耦合，第二端子与第二电测量装置耦合。该布置还包括将补偿电路耦合到第二端子。该装置还包括提供耦合以从第一电测量装置和第二电测量装置接收信息的反馈电路，反馈电路的输出被用于控制补偿电路，以便保持第一电气值在第一端子和第二端子处的第二电气值基本上是预定义的值。

4. 发明授权

US6134908A Ice making apparatus with improved extrusion nozzle 有权
标题翻译：制冰机具有改进的挤压喷嘴
公开(公告)号：US6134908A
公开(公告)日：2000-10-24
申请号：US168260
申请日：1998-10-08
申请人： Roger Patrick Brunner , Jack Richard Miller
发明人： Roger Patrick Brunner , Jack Richard Miller
IPC分类号： F25C1/14 , F25C5/14
CPC分类号： F25C1/147 , F25C5/14 , F25C2500/02
摘要： An auger-type ice maker comprises a generally cylindrical-walled freezing chamber, a rotatable ice auger within the chamber, and a compacting head whereby ice formed in the freezing chamber is transferred by rotation of the auger into the compacting head and discharged therefrom via a nozzle. The nozzle is provided with an annular water-receiving canal for receiving water squeezed from ice as it compressed while passing through a converging nozzle. The configuration of the converging nozzle is arcuate, and is defined by a surface of revolution that is a frustum of a radius-defined convex conical passageway.
摘要翻译：螺旋式制冰机包括大致圆柱形的冷冻室，腔室内的可旋转的冰螺旋推运器和压实头部，其中形成在冷冻室中的冰通过螺旋钻旋转到压实头中并经由喷嘴。喷嘴设置有环形的水接收通道，用于在通过会聚喷嘴时被压缩时接收从冰挤压的水。会聚喷嘴的构造是弧形的，并且由旋转表面限定，其是半径限定的凸形锥形通道的截头圆锥体。

5. 发明授权

US5474648A Uniform and repeatable plasma processing 失效
标题翻译：均匀和可重复的等离子体处理
公开(公告)号：US5474648A
公开(公告)日：1995-12-12
申请号：US283296
申请日：1994-07-29
申请人： Roger Patrick , Frank A. Bose , Philippe Schoenborn
发明人： Roger Patrick , Frank A. Bose , Philippe Schoenborn
IPC分类号： H01J37/32 , H01L21/306 , B44C1/22
CPC分类号： H01J37/32082 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H01J37/32963 , H01J37/3299 , H01J2237/332 , H01J2237/334
摘要： Dynamic control and delivery of radio frequency power in plasma process systems is utilized to enhance the repeatability and uniformity of the process plasma. Power, voltage, current, phase, impedance, harmonic content and direct current bias of the radio frequency energy being delivered to the plasma chamber may be monitored at the plasma chamber and used to control or characterize the plasma load. Dynamic pro-active control of the characteristics of the radio frequency power to the plasma chamber electrode during the formation of the plasma enhances the uniformity of the plasma for more exact and controllable processing of the work pieces.
摘要翻译：利用等离子体处理系统中的射频功率的动态控制和传递来提高过程等离子体的重复性和均匀性。输送到等离子体室的射频能量的功率，电压，电流，相位，阻抗，谐波含量和直流偏压可以在等离子体室处监测并用于控制或表征等离子体负载。在形成等离子体期间对等离子体室电极的射频功率的特性的动态主动控制增强了等离子体的均匀性，从而更精确和可控地处理工件。

6. 发明授权

US4082860A Electrostatic deposition of fine vitreous enamel 失效
标题翻译：精细维生素E的静电沉积
公开(公告)号：US4082860A
公开(公告)日：1978-04-04
申请号：US558453
申请日：1975-03-14
申请人： Roger Patrick Corbett , Trevor Robert Gilson , Terence Patrick Nealon , Patrick John Hendra
发明人： Roger Patrick Corbett , Trevor Robert Gilson , Terence Patrick Nealon , Patrick John Hendra
IPC分类号： B05B5/00 , B05D1/18 , B05D1/22 , C23D5/04 , B05B5/02
CPC分类号： B82Y30/00 , B05B5/00 , B05D1/185 , B05D1/22 , B82Y40/00 , C23D5/04
摘要： The invention provides a powder of fine semiconducting vitreous enamelling particles, such as alkali-boro silicate glass frit, especially applicable to an electrostatic powder coating process, for providing improved electrostatic adhesion to a base metallic surface. The preferred powder treatment is to expose the dried powder to tri-chloro-silane vapor which reacts with the hydroxyl surface groups on the particles to form a surface layer which is then exposed to water vapor producing a hydrophobic cross-linked silicone structure. In the final firing stage of the enamelling process excess organic groups are driven off, and the enamel is not contaminated.

7. 发明申请

US20120175062A1 CAM-LOCKED SHOWERHEAD ELECTRODE AND ASSEMBLY 有权
标题翻译： CAM锁住的淋浴电极和组件
公开(公告)号：US20120175062A1
公开(公告)日：2012-07-12
申请号：US12985568
申请日：2011-01-06
申请人： Anthony de la Llera , Pratik Mankidy , Rajinder Dhindsa , Michael C. Kellogg , Gregory R. Bettencourt , Roger Patrick
发明人： Anthony de la Llera , Pratik Mankidy , Rajinder Dhindsa , Michael C. Kellogg , Gregory R. Bettencourt , Roger Patrick
IPC分类号： C23C16/50 , C23F1/08 , C23C16/455
CPC分类号： H01J37/32091 , H01J37/3244 , H01J37/32532
摘要： A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.
摘要翻译：用于等离子体蚀刻的喷头电极和组件包括提供喷头电极和背板之间改进的热接触的凸轮锁。凸轮锁包括背板中的凸轮轴，其接合安装在喷头电极上的螺柱的扩大头部。组件可以包括围绕喷头电极的环形护罩，并且背板中的八个凸轮轴可以被操作，使得每个凸轮轴同时接合环形护罩上的螺柱和喷头电极的外排螺柱中的螺柱。可以操作另外八个凸轮轴，使得每个凸轮轴接合在喷头电极安装的螺柱的内部和中间行上的一对螺柱。

8. 发明授权

US08187413B2 Electrode assembly and plasma processing chamber utilizing thermally conductive gasket 有权
标题翻译：使用导热垫片的电极组件和等离子体处理室
公开(公告)号：US08187413B2
公开(公告)日：2012-05-29
申请号：US12050195
申请日：2008-03-18
申请人： Roger Patrick , Raj Dhindsa , Greg Bettencourt , Alexei Marakhtanov
发明人： Roger Patrick , Raj Dhindsa , Greg Bettencourt , Alexei Marakhtanov
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： C23C16/45565 , H01J37/32541 , H01J37/32724
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and a thermally conductive gasket, wherein respective profiles of a frontside of the thermal control plate and a backside of the showerhead electrode cooperate to define a disjointed thermal interface comprising portions proximal to showerhead passages of the showerhead electrode and portions displaced from the showerhead passages. The displaced portions are recessed relative to the proximal portions and are separated from the showerhead passages by the proximal portions of the thermal interface. The gasket is positioned along the displaced portions such that the gasket is isolated from the showerhead passages and may facilitate heat transfer across the thermal interface from the showerhead electrode to the thermal control plate.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和导热衬垫，其中热控制板的前侧和喷头的背面的各自的轮廓电极配合以限定不连接的热界面，其包括靠近喷头电极的喷头通道的部分和从喷头通道移位的部分。移位部分相对于近端部分凹陷，并且通过热界面的近端部分与喷头通道分离。垫圈沿着移位的部分定位，使得垫圈与喷头通道隔离，并且可以促进跨过从喷头电极到热控制板的热界面的热传递。

9. 发明授权

US08152954B2 Showerhead electrode assemblies and plasma processing chambers incorporating the same 有权
标题翻译：喷头电极组件和包括其的等离子体处理室
公开(公告)号：US08152954B2
公开(公告)日：2012-04-10
申请号：US11871586
申请日：2007-10-12
申请人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
发明人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在硅基喷头电极和位于部分凹部中的背面插入件。热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。固定硬件和背面插入件被配置为保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料硅基喷头电极在分离时与固定硬件摩擦接触。

10. 发明申请

US20090061542A1 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment 有权
标题翻译：用于在等离子体处理设备中实时诊断部件状态的方法和装置
公开(公告)号：US20090061542A1
公开(公告)日：2009-03-05
申请号：US11896637
申请日：2007-09-04
申请人： Roger Patrick
发明人： Roger Patrick
IPC分类号： H01L21/66 , G01N27/20
CPC分类号： G01N27/20 , C23C16/50 , G01N17/00 , G01N17/04 , Y10T29/49004
摘要： Apparatus and methods for diagnosing status of a consumable part of a plasma reaction chamber, the consumable part including at least one conductive element embedded therein. The method includes the steps of: coupling the conductive element to a power supply so that a bias potential relative to the ground is applied to the conductive element; exposing the consumable part to plasma erosion until the conductive element draws a current from the plasma upon exposure of the conductive element to the plasma; measuring the current; and evaluating a degree of erosion of the consumable part due to the plasma based on the measured current.
摘要翻译：用于诊断等离子体反应室的可消耗部件的状态的装置和方法，所述可消耗部件包括嵌入其中的至少一个导电元件。该方法包括以下步骤：将导电元件耦合到电源，使得相对于地面的偏置电位被施加到导电元件; 将所述消耗部件暴露于等离子体侵蚀，直到所述导电元件在将所述导电元件暴露于所述等离子体时从所述等离子体吸取电流; 测量电流; 以及基于测量的电流评估由于等离子体引起的消耗部件的侵蚀程度。

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