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1. 发明申请

US20120160941A1 SHOWERHEAD ELECTRODES 有权
标题翻译：淋浴电极
公开(公告)号：US20120160941A1
公开(公告)日：2012-06-28
申请号：US13409527
申请日：2012-03-01
申请人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
发明人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
IPC分类号： B05B5/00
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.
摘要翻译：提供一种硅基喷头电极，其可以包括从硅基喷头电极的背面延伸到硅基喷头电极的前侧的背面，前侧和多个喷头通道。硅基喷头电极可以包括单晶硅。硅基喷头电极还可以包括沿着硅基喷头电极的背面形成在单晶硅内的多个部分凹部。多个部分凹部可以在每个部分凹部和硅基喷头电极的前侧之间留下单晶硅的厚度。

2. 发明授权

US08152954B2 Showerhead electrode assemblies and plasma processing chambers incorporating the same 有权
标题翻译：喷头电极组件和包括其的等离子体处理室
公开(公告)号：US08152954B2
公开(公告)日：2012-04-10
申请号：US11871586
申请日：2007-10-12
申请人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
发明人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在硅基喷头电极和位于部分凹部中的背面插入件。热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。固定硬件和背面插入件被配置为保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料硅基喷头电极在分离时与固定硬件摩擦接触。

3. 发明授权

US08268117B2 Showerhead electrodes 有权
标题翻译：喷头电极
公开(公告)号：US08268117B2
公开(公告)日：2012-09-18
申请号：US13409527
申请日：2012-03-01
申请人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
发明人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.
摘要翻译：提供一种硅基喷头电极，其可以包括从硅基喷头电极的背面延伸到硅基喷头电极的前侧的背面，前侧和多个喷头通道。硅基喷头电极可以包括单晶硅。硅基喷头电极还可以包括沿着硅基喷头电极的背面形成在单晶硅内的多个部分凹部。多个部分凹部可以在每个部分凹部和硅基喷头电极的前侧之间留下单晶硅的厚度。

4. 发明申请

US20090095424A1 SHOWERHEAD ELECTRODE ASSEMBLIES AND PLASMA PROCESSING CHAMBERS INCORPORATING THE SAME 有权
标题翻译：淋浴电极组件和等离子体加工炉
公开(公告)号：US20090095424A1
公开(公告)日：2009-04-16
申请号：US11871586
申请日：2007-10-12
申请人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
发明人： Greg Bettencourt , Raj Dhindsa , George Diercks , Randall A. Hardin , Jon Keihl , Duane Lytle , Alexei Marakhtanov , Roger Patrick , John Pegg , Shannon Spencer
IPC分类号： C23C16/00 , H05H1/00
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.
摘要翻译：本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在硅基喷头电极和位于部分凹部中的背面插入件。热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。固定硬件和后侧插入件构造成保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料硅基喷头电极在分离时与固定硬件摩擦接触。

5. 发明申请

US20100038033A1 ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS 有权
标题翻译：锚固插件，电极组件和等离子体处理室
公开(公告)号：US20100038033A1
公开(公告)日：2010-02-18
申请号：US12409984
申请日：2009-03-24
申请人： Randall Hardin , John Keihl , Duane Lytle
发明人： Randall Hardin , John Keihl , Duane Lytle
IPC分类号： C23F1/08 , C23C16/54
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.
摘要翻译：提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径的插入。此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

6. 发明授权

US08187414B2 Anchoring inserts, electrode assemblies, and plasma processing chambers 有权
标题翻译：锚固插件，电极组件和等离子体处理室
公开(公告)号：US08187414B2
公开(公告)日：2012-05-29
申请号：US12409984
申请日：2009-03-24
申请人： Randall Hardin , John Keihl , Duane Lytle
发明人： Randall Hardin , John Keihl , Duane Lytle
IPC分类号： C23C16/00 , H01L21/306 , C23F1/00
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.
摘要翻译：提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径的插入。此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

7. 发明授权

US09023177B2 Anchoring inserts, electrode assemblies, and plasma processing chambers 有权
标题翻译：锚固插件，电极组件和等离子体处理室
公开(公告)号：US09023177B2
公开(公告)日：2015-05-05
申请号：US13443307
申请日：2012-04-10
申请人： Randall Hardin , Jonathan Keihl , Duane Lytle
发明人： Randall Hardin , Jonathan Keihl , Duane Lytle
IPC分类号： F16B21/00 , H01L21/306 , C23F1/00 , H01J37/04 , C23C16/44 , C23C16/455 , H01J37/32
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a tool engaging portion. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque-receiving slots.
摘要翻译：提供了一种喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。后侧插入件包括工具接合部分。工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径的插入。此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

8. 发明申请

US20120193449A1 Anchoring Inserts, Electrode Assemblies, and Plasma Processing Chambers 审中-公开
标题翻译：锚固插件，电极组件和等离子体处理室
公开(公告)号：US20120193449A1
公开(公告)日：2012-08-02
申请号：US13443307
申请日：2012-04-10
申请人： Randall Hardin , John Keihl , Duane Lytle
发明人： Randall Hardin , John Keihl , Duane Lytle
IPC分类号： B05B15/00
CPC分类号： H01J37/04 , C23C16/4401 , C23C16/45565 , H01J37/3255 , H01J37/32605 , H01J37/32724 , H01J2237/032
摘要： A showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque-receiving slots.
摘要翻译：提供了一种喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超过螺纹外径的插入。此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

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