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1. 发明申请

US20090121132A1 Material processing system and method 有权
标题翻译：材料加工系统及方法
公开(公告)号：US20090121132A1
公开(公告)日：2009-05-14
申请号：US12232972
申请日：2008-09-26
申请人： Hans W.P. Koops , Peter Hoffrogge
发明人： Hans W.P. Koops , Peter Hoffrogge
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
摘要翻译：提供了一种用于处理工件的材料处理系统。材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。辐射优选由电子显微镜提供。电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

2. 发明申请

US20050116165A1 Particle beam device 有权
标题翻译：粒子束装置
公开(公告)号：US20050116165A1
公开(公告)日：2005-06-02
申请号：US10974000
申请日：2004-10-26
申请人： Martin Kienle , Helmut Muller , Peter Hoffrogge , Wilhelm Bolsinger
发明人： Martin Kienle , Helmut Muller , Peter Hoffrogge , Wilhelm Bolsinger
IPC分类号： G01N23/22 , H01J37/28 , H01J37/305 , G01N23/00
CPC分类号： G01N23/2204 , H01J37/28 , H01J37/3056 , H01J2237/20207
摘要： A particle beam device, in particular an electron microscope, having at least two particle beam columns and one object slide having a receiving surface for receiving an object. The particle beam device makes it possible to align the surface of the object perpendicular to the beam axes of the particle beam columns, using simple means, in an accurate and error-free manner. The object slide assumes a basic position from which it may be tilted into the position in which the first or the second beam axis is perpendicular or at least almost perpendicular to the receiving surface of the object slide. In the basic position, a normal to the receiving surface of the object slide is spatially oriented such that an angle formed between the first beam axis and the normal is greater than or equal to an angle formed between the second beam axis and the normal.
摘要翻译：具有至少两个粒子束列的粒子束装置，特别是电子显微镜，具有用于接收物体的接收表面的一个物体载玻片。粒子束装置可以使用简单的手段以准确无误的方式将物体的表面垂直于粒子束列的束轴对准。物体滑动件呈现基本位置，从该位置可将其倾斜到第一或第二梁轴垂直或至少几乎垂直于物体滑动件的接收表面的位置。在基本位置，物体滑块的接收表面的法线在空间上定向成使得在第一光束轴与法线之间形成的角度大于或等于第二光束轴与法线之间形成的角度。

3. 发明申请

US20060284090A1 Material processing system and method 有权
公开(公告)号：US20060284090A1
公开(公告)日：2006-12-21
申请号：US11499776
申请日：2006-08-07
申请人： Hans Koops , Peter Hoffrogge
发明人： Hans Koops , Peter Hoffrogge
IPC分类号： G21K7/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.

4. 发明申请

US20050103272A1 Material processing system and method 审中-公开
标题翻译：材料加工系统及方法
公开(公告)号：US20050103272A1
公开(公告)日：2005-05-19
申请号：US10923814
申请日：2004-08-24
申请人： Hans Koops , Peter Hoffrogge
发明人： Hans Koops , Peter Hoffrogge
IPC分类号： C23C16/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
摘要翻译：提供了一种用于处理工件的材料处理系统。材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。辐射优选由电子显微镜提供。电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

5. 发明授权

US06855938B2 Objective lens for an electron microscopy system and electron microscopy system 有权
标题翻译：用于电子显微镜系统和电子显微镜系统的物镜
公开(公告)号：US06855938B2
公开(公告)日：2005-02-15
申请号：US10619475
申请日：2003-07-16
申请人： Dirk Preikszas , Michael Steigerwald , Peter Hoffrogge , Peter Gnauck
发明人： Dirk Preikszas , Michael Steigerwald , Peter Hoffrogge , Peter Gnauck
IPC分类号： H01J37/141 , H01J37/145 , H01J37/28 , H01J37/317
CPC分类号： H01J37/145 , H01J2237/2817 , H01J2237/31745 , H01J2237/31749
摘要： An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.
摘要翻译：提供了一种用于电子显微镜系统的具有磁性和静电聚焦的物镜，其至少部分为圆锥形的外部形状允许相对于电子束以大角度范围定向要成像的物体，所述物镜同时展现，光学参数好。这可以通过镜头元件的特定几何形状来实现。此外，提出了一种用于同时成像和处理物体的检查，除了具有上述物镜的电子显微镜系统之外，还包括离子束处理系统和物体支撑。

6. 发明授权

US07435973B2 Material processing system and method 有权
标题翻译：材料加工系统及方法
公开(公告)号：US07435973B2
公开(公告)日：2008-10-14
申请号：US11499776
申请日：2006-08-07
申请人： Hans W. P. Koops , Peter Hoffrogge
发明人： Hans W. P. Koops , Peter Hoffrogge
IPC分类号： G21K7/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
摘要翻译：提供了一种用于处理工件的材料处理系统。材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。辐射优选由电子显微镜提供。电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

7. 发明申请

US20060154150A1 Arrangement for the production of photomasks 审中-公开
标题翻译：制作光掩模的安排
公开(公告)号：US20060154150A1
公开(公告)日：2006-07-13
申请号：US10520648
申请日：2003-07-09
申请人： Thomas Engel , Wolfgang Harnisch , Peter Hoffrogge , Axel Zibold
发明人： Thomas Engel , Wolfgang Harnisch , Peter Hoffrogge , Axel Zibold
IPC分类号： G03F1/00
CPC分类号： G03F1/72 , G03F1/84
摘要： An arrangement and a method for the production of photomasks in which at least one defect control system is connected to at least one repair system by a stationary data connection or online connection, and the defect control system and repair system are connected to one another by data in such a way that the results obtained on one of the systems are immediately available to the other system for further processing. The defect control system conveys detected defects to the repair system via a data connection for data exchange. An AIMS system is advantageously provided as defect control system and an electron beam system is advantageously provided for defect control.
摘要翻译：一种用于生产光掩模的布置和方法，其中至少一个缺陷控制系统通过固定数据连接或在线连接连接到至少一个修复系统，并且所述缺陷控制系统和修复系统通过数据彼此连接以使得在其中一个系统上获得的结果立即可用于另一个系统用于进一步处理。缺陷控制系统通过用于数据交换的数据连接将检测到的缺陷传送到维修系统。有利地提供AIMS系统作为缺陷控制系统，并且有利地提供用于缺陷控制的电子束系统。

8. 发明授权

US07868290B2 Material processing system and method 有权
标题翻译：材料加工系统及方法
公开(公告)号：US07868290B2
公开(公告)日：2011-01-11
申请号：US12232972
申请日：2008-09-26
申请人： Hans W. P. Koops , Peter Hoffrogge
发明人： Hans W. P. Koops , Peter Hoffrogge
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
摘要翻译：提供了一种用于处理工件的材料处理系统。材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。辐射优选由电子显微镜提供。电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

9. 发明授权

US07109487B2 Particle beam device 有权
标题翻译：粒子束装置
公开(公告)号：US07109487B2
公开(公告)日：2006-09-19
申请号：US10974000
申请日：2004-10-26
申请人： Martin Kienle , Helmut Muller , Peter Hoffrogge , Wilhelm Bolsinger
发明人： Martin Kienle , Helmut Muller , Peter Hoffrogge , Wilhelm Bolsinger
IPC分类号： G01N23/00
CPC分类号： G01N23/2204 , H01J37/28 , H01J37/3056 , H01J2237/20207
摘要： A particle beam device, in particular an electron microscope, having at least two particle beam columns and one object slide having a receiving surface for receiving an object. The particle beam device makes it possible to align the surface of the object perpendicular to the beam axes of the particle beam columns, using simple means, in an accurate and error-free manner. The object slide assumes a basic position from which it may be tilted into the position in which the first or the second beam axis is perpendicular or at least almost perpendicular to the receiving surface of the object slide. In the basic position, a normal to the receiving surface of the object slide is spatially oriented such that an angle formed between the first beam axis and the normal is greater than or equal to an angle formed between the second beam axis and the normal.
摘要翻译：具有至少两个粒子束列的粒子束装置，特别是电子显微镜，具有用于接收物体的接收表面的一个物体载玻片。粒子束装置可以使用简单的手段以准确无误的方式将物体的表面垂直于粒子束列的束轴对准。物体滑动件呈现基本位置，从该位置可将其倾斜到第一或第二梁轴垂直或至少几乎垂直于物体滑动件的接收表面的位置。在基本位置，物体滑块的接收表面的法线在空间上定向成使得在第一光束轴与法线之间形成的角度大于或等于第二光束轴与法线之间形成的角度。

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