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1. 发明申请

US20090121132A1 Material processing system and method 有权
标题翻译：材料加工系统及方法
公开(公告)号：US20090121132A1
公开(公告)日：2009-05-14
申请号：US12232972
申请日：2008-09-26
申请人： Hans W.P. Koops , Peter Hoffrogge
发明人： Hans W.P. Koops , Peter Hoffrogge
IPC分类号： G01N23/00
CPC分类号： H01J37/3056 , H01J2237/006 , H01J2237/162 , H01J2237/166 , H01J2237/31732 , H01J2237/31744
摘要： A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas.
摘要翻译：提供了一种用于处理工件的材料处理系统。材料处理通过提供反应气体和能量辐射来激活反应气体到待处理工件的位置的周围。辐射优选由电子显微镜提供。电子显微镜的物镜优选设置在电子显微镜的检测器和工件之间。材料处理系统的气体供应装置包括与处理位置间隔开的阀，阀之间的气体体积和反应气体的出现位置较小。气体供应装置还包括温度调节的特别冷却的储存器，用于容纳用于反应气体的起始材料。

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