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1. 发明授权

US08808793B2 Disc vapor lubrication 有权
标题翻译：圆盘蒸气润滑
公开(公告)号：US08808793B2
公开(公告)日：2014-08-19
申请号：US12905991
申请日：2010-10-15
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C16/00 , C23C16/448 , C23C16/455 , C23C16/458 , C23C16/54 , C23C14/24 , B05D5/08
CPC分类号： C23C16/4485 , B05D1/60 , B05D5/08 , B05D5/083 , C23C14/243 , C23C16/448 , C23C16/455 , C23C16/45563 , C23C16/45565 , C23C16/458 , C23C16/4582 , C23C16/4587 , C23C16/54 , G11B5/8408 , G11B11/10582 , G11B11/10584
摘要： A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.
摘要翻译：一种方法，包括将工件支撑件引入装置的室中。工件支撑件用于在其上支撑多个工件。该装置包括：该室具有被配置为保持在低于大气压的压力的内部空间; 用于向腔室的内部空间供应线性延伸的润滑剂蒸汽流的蒸汽源; 用于在其上支撑具有面向蒸气源的表面的多个工件的工件支撑件; 以及用于将工件支撑件横向移动通过来自蒸汽源的线性延伸的润滑剂蒸汽流的输送机。该方法还包括使支撑在其上的多个工件连续移动工件支撑件横向地从蒸气源穿过线性延伸的润滑剂蒸汽流，并将均匀的厚度的润滑剂膜沉积在多个工件中的每一个的至少一个表面上。

2. 发明授权

US06613151B1 Single disc vapor lubrication 有权
标题翻译：单盘蒸汽润滑
公开(公告)号：US06613151B1
公开(公告)日：2003-09-02
申请号：US09798934
申请日：2001-03-06
申请人： Michael Joseph Stirniman , Paul Stephen McLeod
发明人： Michael Joseph Stirniman , Paul Stephen McLeod
IPC分类号： H01L2144
CPC分类号： B05D1/60 , B05D5/083 , G11B5/8408
摘要： Vapor deposition of a uniform thickness thin film of lubricant on at least one surface of a substrate, comprises the steps of: (a) providing an apparatus comprising: (i) a chamber having an interior space maintained below atmospheric pressure; (ii) a substrate loader/unloader for supplying the interior space with at least one substrate and for withdrawing at least one substrate from the interior space; (iii) at least one lubricant vapor source for supplying the interior space with a stream of lubricant vapor; and (iv) a substrate transporter/conveyor for continuously moving at least one substrate past the stream of vapor from the at least one lubricant vapor source; (b) supplying the interior space with a substrate having at least one surface; (c) continuously moving the substrate past the stream of lubricant vapor and depositing a uniform thickness thin film of the lubricant on the at least one surface; and (d) withdrawing the lubricant-coated substrate from the interior space. The invention has particular utility in depositing thin films of polymeric lubricants onto disc-shaped substrates in the manufacture of magnetic and MO recording media.
摘要翻译：均匀厚度的润滑剂薄膜在衬底的至少一个表面上的气相沉积包括以下步骤：（a）提供一种装置，包括：（i）具有保持在大气压以下的内部空间的室;（ii）用于向内部空间供应至少一个基板并用于从内部空间抽出至少一个基板;（iii）至少一个润滑剂蒸汽源，用于向内部空间供应润滑剂蒸汽流; （iv）用于从至少一个润滑剂蒸汽源连续地移动至少一个基板通过蒸汽流的基底输送器/输送器;（b）向内部空间供应具有至少一个表面的基底;（c）连续地将衬底移动通过润滑剂蒸汽流并在该至少一个表面上沉积均匀厚度的润滑剂薄膜; 并且（d）从内部空间中取出润滑剂涂覆的基材。本发明在将磁性和MO记录介质的制造中将聚合物润滑剂的薄膜沉积到盘形基材上具有特别的用途。

3. 发明授权

US06582572B2 Target fabrication method for cylindrical cathodes 失效
标题翻译：圆柱形阴极的目标制造方法
公开(公告)号：US06582572B2
公开(公告)日：2003-06-24
申请号：US09871051
申请日：2001-05-31
申请人： Paul Stephen McLeod
发明人： Paul Stephen McLeod
IPC分类号： C23C1434
CPC分类号： C23C14/3407 , Y10T29/49 , Y10T29/49826 , Y10T29/49885 , Y10T29/49906
摘要： A method for fabricating cylindrical sputter targets for rotary cylindrical cathodes used in depositing a dielectric layer of desired alloy on non-planar substrates during sputtering is disclosed. The method includes forming a cooling tube having a passage within to receive a cooling medium, then fabricating multiple annular rings including each of the basic metal constituents of the desired alloy and attaching the annular rings to the cooling tube such that the exposed outer portions of the annular rings provide a homogeneous layer of the desired alloy on the non-planar substrates during sputtering.
摘要翻译：公开了一种用于制造用于在溅射期间在非平面基板上沉积所需合金的电介质层的旋转圆柱形阴极的圆柱形溅射靶的方法。该方法包括形成具有通道以便接收冷却介质的冷却管，然后制造包括所需合金的每个基本金属成分的多个环形环，并将环形环附接到冷却管，使得暴露的外部部分环形环在溅射期间在非平面基板上提供所需合金的均匀层。

4. 发明授权

US06482301B1 Target shields for improved magnetic properties of a recording medium 有权
标题翻译：用于提高记录介质的磁性能的目标屏蔽
公开(公告)号：US06482301B1
公开(公告)日：2002-11-19
申请号：US09326245
申请日：1999-06-04
申请人： Qixu Chen , Charles Leu , Mark Anthony Shows , Paul Stephen McLeod , Rajiv Yadav Ranjan
发明人： Qixu Chen , Charles Leu , Mark Anthony Shows , Paul Stephen McLeod , Rajiv Yadav Ranjan
IPC分类号： C23C1432
CPC分类号： G11B5/851 , C23C14/34 , H01J37/34 , H01J37/3447
摘要： A collimator system is disclosed for use in an in-line pass-by sputtering system during the fabrication of recording media to improve the data storage density and read/write performance characteristics of the media. The collimator system includes a collimator shield and a collimator honeycomb. The shield includes a rectangular tube having a flange and a frame at inner and outer ends, respectively. The various components of the shield in part serve to prevent possible contamination of substrates due to target atom accumulation on the chamber walls during the sputtering process. The collimator honeycomb is provided for blocking target atoms from contacting the substrate at low incident angles. The collimator honeycomb is comprised of a plurality of collimators which are identical to each other. In a preferred embodiment, the collimators have a hexagonal cross-section taken from a perspective perpendicular to the substrate. The collimators may also have other geometric shapes. It is also contemplated that more than one collimator honeycomb level be used in alternative embodiments.
摘要翻译：在制造记录介质期间公开了一种用于在线传递溅射系统的准直器系统，以改善数据存储密度和读/写性能特性。准直仪系统包括准直器屏蔽和准直器蜂窝。护罩包括分别在内端和外端具有凸缘和框架的矩形管。屏蔽件的各种部件部分地用于防止在溅射过程期间由于靶室原子在室壁上的积聚而引起的基板的可能污染。提供准直器蜂窝用于阻止目标原子以低入射角接触基板。准直器蜂窝体由多个彼此相同的准直器构成。在优选实施例中，准直器具有垂直于衬底的透视图的六边形截面。准直器也可以具有其他几何形状。还可以想到，在替代实施例中可以使用多于一个准直器蜂窝等级。

5. 发明申请

US20100019168A1 TWO-ZONE ION BEAM CARBON DEPOSITION 有权
标题翻译：两区离子束碳沉积
公开(公告)号：US20100019168A1
公开(公告)日：2010-01-28
申请号：US12179234
申请日：2008-07-24
申请人： Paul Stephen McLeod , Kueir-Weei Chour
发明人： Paul Stephen McLeod , Kueir-Weei Chour
IPC分类号： H01J27/02 , A61N5/00
CPC分类号： H01J27/028 , G11B5/8408
摘要： The invention relates an ion source for ion beam deposition comprising multiple anodes, wherein the ion source deposits multiple zones of a source material and thicknesses of at least two of the multiple zones are different.
摘要翻译：本发明涉及用于包括多个阳极的离子束沉积的离子源，其中离子源沉积源材料的多个区域，并且多个区域中的至少两个区域的厚度是不同的。

6. 发明申请

US20100018857A1 SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS 审中-公开
标题翻译：防爆电子设备允许厚度磁性目标
公开(公告)号：US20100018857A1
公开(公告)日：2010-01-28
申请号：US12178446
申请日：2008-07-23
申请人： Paul Stephen McLeod , Larry Dowd Hartsough
发明人： Paul Stephen McLeod , Larry Dowd Hartsough
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , H01J37/3408 , H01J37/3452
摘要： A sputtering apparatus allowing thick targets and method of making the same. The apparatus includes a sputtering target with a glow discharge plasma formed thereon during sputtering. The sputtering target is disposed in a plane, with a front of the plane defined as the side on which the glow discharge plasma is located during sputtering and a back of the plane defined as the opposite side. The sputtering apparatus also includes a magnetic circuit with an electrically floating center pole and an electrically floating outside pole. Both the center pole and outside pole are at least partially disposed on the front side of the plane defined by the sputtering target.
摘要翻译：允许厚目标的溅射装置及其制造方法。该装置包括在溅射期间形成有辉光放电等离子体的溅射靶。溅射靶设置在平面中，其中在溅射期间将辉光放电等离子体所在的一侧的平面定义为平面的正面，并将该平面的背面定义为相反侧。溅射装置还包括具有电浮动中心极和电浮动外极的磁路。中心极和外极两者至少部分地设置在由溅射靶限定的平面的正面上。

7. 发明授权

US07537676B2 Cathode apparatus to selectively bias pallet during sputtering 有权
标题翻译：用于在溅射期间选择性地偏置托板的阴极装置
公开(公告)号：US07537676B2
公开(公告)日：2009-05-26
申请号：US10844653
申请日：2004-05-12
申请人： Thomas Larson Greenberg , Paul Stephen McLeod
发明人： Thomas Larson Greenberg , Paul Stephen McLeod
IPC分类号： C23C14/35
CPC分类号： C23C14/024 , C23C14/165 , C23C14/568 , G11B5/851 , H01J37/32779 , H01J37/34
摘要： A system and method for sputtering having a substrate holder, the target-cathode and the shield that are all electrically isolated from each other and are all capable of independently being subjected to different voltages. The substrate holder can be a pallet that holds a plurality of substrates. The system further includes a plurality of target-cathodes and shields disposed along the path of travel of the moving substrate holder, and a controller configured to selectively vary the target-cathode voltage, the shield voltage, and the pallet bias voltage while the pallet moves along the path of travel. The target-cathodes and shields are spaced apart along the path of travel by a distance less than a length of the pallet and on both sides of the path of travel. The controller can include a timing circuit for synchronizing changes in the target-cathode voltages with changes in the pallet bias voltage and shield voltage.
摘要翻译：一种用于溅射的系统和方法，其具有彼此电隔离的基板保持器，靶阴极和屏蔽层，并且都能够独立地经受不同的电压。基板保持器可以是保持多个基板的托盘。该系统还包括沿着移动的衬底保持器的行进路径设置的多个靶阴极和屏蔽件，以及控制器，被配置为在托盘移动时选择性地改变目标阴极电压，屏蔽电压和托盘偏置电压沿途旅行。目标阴极和屏蔽沿着行进路径间隔一段距离小于托盘的长度和行进路径的两侧。控制器可以包括用于使目标阴极电压的变化与托盘偏置电压和屏蔽电压的变化同步的定时电路。

8. 发明授权

US06830600B2 Cold traps for vapor lubrication processes 有权
标题翻译：用于蒸气润滑过程的冷阱
公开(公告)号：US06830600B2
公开(公告)日：2004-12-14
申请号：US09833748
申请日：2001-04-12
申请人： Paul Stephen McLeod , Michael Joseph Stirniman , Jing Gui
发明人： Paul Stephen McLeod , Michael Joseph Stirniman , Jing Gui
IPC分类号： B01D800
CPC分类号： C23C14/564 , C23C14/568 , Y10S55/15
摘要： A method for preventing migration of lubrication molecules into adjacent process chambers while coating a thin layer of lubricant over a storage surface of a disc using a vapor lubrication process. The method includes trapping the lubrication molecules that are not deposited onto the storage surface of the discs during the vapor lubrication process by using one or more cold traps including cold trapping surfaces in a vapor lubrication station.
摘要翻译：一种用于防止润滑分子进入相邻处理室的方法，同时使用蒸气润滑方法在盘的存储表面上涂覆薄层润滑剂。该方法包括在蒸汽润滑过程中通过使用包括蒸汽润滑站中的冷陷阱的一个或多个冷阱来捕获未沉积在盘的储存表面上的润滑分子。

9. 发明授权

US06733590B1 Method and apparatus for multilayer deposition utilizing a common beam source 有权
标题翻译：利用共用光束源的多层沉积的方法和装置
公开(公告)号：US06733590B1
公开(公告)日：2004-05-11
申请号：US09526556
申请日：2000-03-16
申请人： Paul Stephen McLeod , Mark A. Shows
发明人： Paul Stephen McLeod , Mark A. Shows
IPC分类号： C23C1600
CPC分类号： C23C14/221
摘要： A single, or common, ion beam source is utilized for ion beam deposition (IBD) of defect-free multilayer coatings, e.g., multilayer, carbon-based protective overcoats for magnetic and/or magneto-optical (MO) data recording/information storage and retrieval media such as hard disks. According to the inventive methodology, a plurality of source gas supply means for supplying a single IBD source with different source gases for each of the layers of the multilayer are selectively operated in “vent” and “run” modes by means of a plurality of valves, the opening and closing of which are determined by a programmable gas flow controller. The inventive method and apparatus advantageously provide IBD of multilayer coatings with minimum cross-contamination of individual layers, at a reduced equipment cost and size obtained by elimination of the need for separate ion beam sources and associated vacuum pump means for each constituent layer of the multilayer.
摘要翻译：单个或常见的离子束源用于无缺陷多层涂层的离子束沉积（IBD），例如用于磁和/或磁光（MO）数据记录/信息存储的多层，基于碳的保护性外涂层以及诸如硬盘之类的检索媒体。根据本发明的方法，用于为单层IBD源提供不同源气体的多个源气体供应装置通过多个阀门以“通气”和“运行”模式选择性地操作，，其开启和关闭由可编程气体流量控制器决定。本发明的方法和装置有利地提供具有最小的单层的交叉污染的多层涂层的IBD，以减少的设备成本和尺寸获得，通过消除对多层的每个构成层的分离的离子束源和相关联的真空泵装置的需要而获得。

10. 发明授权

US06569294B1 Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone 失效
标题翻译：用于沉积具有窄过渡区的厚度梯度层的溅射靶组件和方法
公开(公告)号：US06569294B1
公开(公告)日：2003-05-27
申请号：US09884482
申请日：2001-06-20
申请人： Alexander Boris Khazanov , Shanghsien Rou , Jie-Ming Yu , Paul Stephen McLeod , Mark Anthony Shows , Kuo-Hsing Hwang , Chung-Yuang Shih
发明人： Alexander Boris Khazanov , Shanghsien Rou , Jie-Ming Yu , Paul Stephen McLeod , Mark Anthony Shows , Kuo-Hsing Hwang , Chung-Yuang Shih
IPC分类号： C23C1434
CPC分类号： C23C14/3407 , H01J37/3414 , Y02T50/67
摘要： Selective deposition of a layer of a material, such as a thick protective overcoat, onto a selected substrate area, such as the inner or CSS landing zone, is achieved using a sputtering target assembly comprising a target/cathode having a planar sputtering surface including an erosion track area, a collimating shield positioned proximate the sputtering surface and surrounding at least a portion of the erosion track area, the collimating shield including an inwardly facing wall, and a blocking shield centrally positioned over the surface of the target/cathode and including an outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall, wherein the inwardly facing wall of the collimating shield and the outwardly facing wall of the central blocking shield form an open-ended collimating channel for directing sputtered particles onto the selected substrate area.
摘要翻译：使用包括具有平面溅射表面的靶/阴极的溅射靶组件来选择性地沉积诸如厚保护外涂层的材料层到所选择的衬底区域（例如内部或CSS着陆区域），溅射靶组件包括平面溅射表面冲蚀轨道区域，位于溅射表面附近并围绕侵蚀轨迹区域的至少一部分的准直屏蔽，准直屏蔽包括面向内的壁和位于靶/阴极表面上方的阻挡屏蔽，准直屏蔽面向内的壁和面向外的壁，其中准直屏蔽件的面向内的壁和中央阻挡屏蔽的面向外的壁形成用于引导溅射的颗粒进入的开放式准直通道所选择的衬底区域。

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