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1. 发明授权

US4991541A Device and process for treating fine particles 失效
标题翻译：用于处理细颗粒的装置和方法
公开(公告)号：US4991541A
公开(公告)日：1991-02-12
申请号：US443862
申请日：1989-11-30
申请人： Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
发明人： Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
IPC分类号： C23C14/24 , B01J4/00 , B01J12/00 , B01J12/02 , B01J19/08 , B22F1/00 , B22F1/02 , B22F9/12 , C23C16/48 , C23C16/54
CPC分类号： B01J4/001 , B01J12/00 , B01J12/02 , B22F1/0088 , B22F1/02 , B22F9/12 , C23C16/54 , B22F2999/00
摘要： A device for treating fine particles is provided which comprises a plural number of reaction chambers for providing reaction fields different from each other provided along the flow pathway on the downstream side of a nozzle which jets out fine particles in a beam. The device may be provided with a chamber for a starting material for forming fine particles. The nozzle may be a convergent-divergent nozzle.

2. 发明授权

US4958185A Photographing apparatus 失效
标题翻译：拍摄装置
公开(公告)号：US4958185A
公开(公告)日：1990-09-18
申请号：US206987
申请日：1988-06-07
申请人： Osamu Kamiya , Yasutomo Fujiyama
发明人： Osamu Kamiya , Yasutomo Fujiyama
IPC分类号： G03B7/099 , G03B7/0997 , G03B7/28
CPC分类号： G03B7/099
摘要： In a photographing apparatus such as a single lens reflex camera, metering photoelectric conversion elements are provided in the optical path of an imaging optical system or a finder optical system and the line width of the pattern forming the elements is set to a width undiscernable by the human eye. Thus, with such metering photoelectric conversion elements, no irregularity of the quantity of amount is caused in the image observed through the finder or the image photographed.
摘要翻译：在诸如单镜头反射照相机的拍摄设备中，在成像光学系统或取景器光学系统的光路中设置计量光电转换元件，并且将形成元件的图案的线宽设置为不可忽视的宽度人类的眼睛。因此，通过这样的计量光电转换元件，在通过取景器或所拍摄的图像观察到的图像中不会引起量的不均匀。

3. 发明授权

US4248166A Sewing machine attachment 失效
标题翻译：缝纫机附件
公开(公告)号：US4248166A
公开(公告)日：1981-02-03
申请号：US44954
申请日：1979-06-04
申请人： Osamu Kamiya
发明人： Osamu Kamiya
IPC分类号： D05B3/24 , D05B37/06 , D05B81/00 , D05B37/00 , D05B3/02
CPC分类号： D05B81/00
摘要： Disclosed is a sewing machine attachment which is adapted to be detachably attached, after opening a part of a machine bed, to the portion of the machine bed in the vicinity of the opened part, and to be operatively connected to a motion mechanism in the machine bed through the opened part of the machine bed. The attachment actuating mechanism includes a connection arm which is adapted to extend through the opened part of the machine bed into engagement with the motion mechanism in the machine bed, when a lock lever is moved to a position for locking the attachment to the machine bed. The connection arm is further adapted to be disengaged from the motion mechanism in the machine bed, as the lock lever is moved back to a position for releasing the attachment from the machine bed.
摘要翻译：公开了一种缝纫机附件，其适于在将机床的一部分打开到打开部分附近的机床部分之后可拆卸地附接并且可操作地连接到机器中的运动机构床通过机床的开放部分。附接致动机构包括连接臂，当锁定杆移动到用于将附件锁定到机床的位置时，连接臂适于延伸通过机床的打开部分与机床中的运动机构接合。连接臂还适于在机床中与运动机构分离，因为锁定杆被移回到用于从机床释放附件的位置。

4. 发明授权

US4244310A Zigzag sewing machine with a trimming device 失效
标题翻译：曲折缝纫机带修边装置
公开(公告)号：US4244310A
公开(公告)日：1981-01-13
申请号：US80806
申请日：1979-10-01
申请人： Toshio Sasaki , Osamu Kamiya
发明人： Toshio Sasaki , Osamu Kamiya
IPC分类号： D05B3/02 , D05B37/00 , D05B37/04
CPC分类号： D05B3/02
摘要： Disclosed is a zigzag sewing machine in which a trimming device for trimming the marginal edge of a work fabric is removably disposed at a predetermined position on a machine bed so that the trimming device is driven in relation to the operation of the sewing machine. The zigzag sewing machine comprises a switching device for changing the field position of the needle oscillation and an operated member for actuating the switching device in relation to the disposition of the trimming device at the predetermined position. In this zigzag sewing machine, while overedge stitching is performed by using the trimming device, the field position of the needle oscillation is set so that zigzag stitches having a desired stitch width are always placed along and over the marginal edge of the work fabric trimmed by the trimming device.
摘要翻译：公开了一种锯齿缝纫机，其中用于修整工作织物的边缘的修剪装置可拆卸地设置在机床上的预定位置，使得修剪装置相对于缝纫机的操作被驱动。锯齿缝纫机包括用于改变针振荡的场位置的开关装置和用于相对于修整装置在预定位置处的布置来致动切换装置的操作构件。在这种之字形缝纫机中，通过使用修剪装置进行封边缝合时，针摆动的位置被设定为使得具有期望的针迹宽度的锯齿形针迹总是沿着工作织物的边缘边缘并且越过由修剪装置。

5. 发明授权

US3960441A Anti-reflection coating having pseudo-inhomogeneous layers 失效
标题翻译：防反射涂层具有假不均匀层
公开(公告)号：US3960441A
公开(公告)日：1976-06-01
申请号：US583969
申请日：1975-06-05
申请人： Osamu Kamiya , Susumu Itoh
发明人： Osamu Kamiya , Susumu Itoh
IPC分类号： G02B1/11 , G02B5/28
CPC分类号： G02B1/115
摘要： A coating for reducing unwanted reflection off a surface of a substrate. The coating is made up of an inner layer, and outer layer subsequently deposited in that order from the substrate, at least one of these layers being an inhomogeneous layer having a moderate distribution of refractive index in the direction of thickness. Desired different gradients of the refractive index distribution are effected by the superposition of sublayers of materials having a high index of refraction and a low index of refraction deposited by vacuum evaporation one upon the other and having different combinations of thicknesses thereof.
摘要翻译：用于减少衬底表面的不希望的反射的涂层。涂层由内层和随后从衬底依次沉积的外层组成，这些层中的至少一层是在厚度方向上具有适度的折射率分布的不均匀层。期望的折射率分布的不同梯度通过叠加具有高折射率的折射率和通过真空蒸发沉积的低折射率并具有不同厚度的组合的材料的叠层来实现。

6. 发明授权

US4666734A Apparatus and process for mass production of film by vacuum deposition 失效
标题翻译：通过真空沉积大量生产膜的装置和方法
公开(公告)号：US4666734A
公开(公告)日：1987-05-19
申请号：US491799
申请日：1983-05-05
申请人： Osamu Kamiya , Keijiro Nishida , Yasutomo Fujiyama , Kyosuke Ogawa
发明人： Osamu Kamiya , Keijiro Nishida , Yasutomo Fujiyama , Kyosuke Ogawa
IPC分类号： C23C16/50 , C23C14/56 , C23C16/54 , B05D3/06
CPC分类号： C23C14/566 , C23C14/568 , C23C16/54
摘要： An apparatus and a process for mass production of films by vacuum deposition comprise a substrate charging stage which is evacuated, an interconnecting stage which is positioned adjacent to said substrate charging stage and is evacuated, and a film forming stage which is removably attached to the interconnecting stage and is evacuated independently of the interconnecting stage.
摘要翻译：通过真空沉积大量生产膜的装置和方法包括抽真空的基板充电阶段，与所述基板充电阶段相邻并被抽真空的互连级，以及可移除地连接到互连的成膜台并且独立于互连级排空。

7. 发明授权

US4628862A Photochemical vapor deposition apparatus 失效
标题翻译：光化学气相沉积装置
公开(公告)号：US4628862A
公开(公告)日：1986-12-16
申请号：US715411
申请日：1985-03-25
申请人： Osamu Kamiya
发明人： Osamu Kamiya
IPC分类号： B01J19/12 , C23C16/48 , C23C13/08
CPC分类号： C23C16/48
摘要： A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy and deposites a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, characterized in that the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.
摘要翻译：一种光化学气相沉积装置，其包括反应室，用于将用于成膜的起始气体引入反应室的装置和用于以高能量的光照射起始气体的装置，并将薄膜沉积在置于通过利用光化学反应的反应室，其特征在于，该装置包括用于预先加热到待引入反应室的起始气体的装置。

8. 发明授权

US4522485A Copying machine including a dielectric covered metal reflective device 失效
标题翻译：复印机包括电介质覆盖的金属反射装置
公开(公告)号：US4522485A
公开(公告)日：1985-06-11
申请号：US429145
申请日：1982-09-30
申请人： Osamu Kamiya , Nobuyuki Sekimura
发明人： Osamu Kamiya , Nobuyuki Sekimura
IPC分类号： G03G15/04
CPC分类号： G03G15/04
摘要： A copying machine has at least one metal surface of high reflectance provided with a dielectric multilayer film vapor deposited thereon. The dielectric film has a wavelength selectivity and serves to match the wavelength characteristics of the light source used in the copying machine to the sensitivity characteristics of the photosensitive medium used in the same copying machine. Thus, in the copying machine, the spectral sensitivity characteristics get adjusted to the optimum by the particular effect of the metal reflective surface or by a synergistic effect of two or more such reflective metal surface.
摘要翻译：复印机具有至少一个高反射率的金属表面，其上沉积有介电多层膜气相沉积。电介质膜具有波长选择性，用于将复印机中使用的光源的波长特性与在同一复印机中使用的光敏介质的灵敏度特性相匹配。因此，在复印机中，通过金属反射表面的特定效果或由两个或更多个这样的反射金属表面的协同效应将光谱灵敏度特性调节到最佳。

9. 发明授权

US4325608A Optical system of a copying machine 失效
标题翻译：复印机的光学系统
公开(公告)号：US4325608A
公开(公告)日：1982-04-20
申请号：US92509
申请日：1979-11-08
申请人： Osamu Kamiya , Nobuyuki Sekimura
发明人： Osamu Kamiya , Nobuyuki Sekimura
IPC分类号： G03G15/04 , G02B5/28 , G03B27/54 , G02B1/10
CPC分类号： G03B27/542 , G02B5/285
摘要： In a copying machine including a halogen lamp, a CdS photosensitive medium and a transmitting type projection lens system, a 5-layer or 7-layer multi-layered interference film comprising a dielectric material is applied to a surface of the transmitting type projection lens system so that a spectral distribution comprising the spectral wavelength characteristic of the original light, the spectral transmission characteristic of the multi-layered interference film and the spectral sensitivity characteristic of the photosensitive medium superposed one upon another becomes a uniform distribution.
摘要翻译：在包括卤素灯，CdS光敏介质和透射型投影透镜系统的复印机中，将包括电介质材料的5层或7层多层干涉膜施加到透射型投影透镜系统的表面使得包含原始光的光谱波长特性，多层干涉膜的光谱透射特性和彼此叠加的光敏介质的光谱灵敏度特性的光谱分布变得均匀分布。

10. 发明授权

US4218134A Optical system for copier 失效
标题翻译：复印机光学系统
公开(公告)号：US4218134A
公开(公告)日：1980-08-19
申请号：US964986
申请日：1978-11-30
申请人： Osamu Kamiya , Nobuyuki Sekimura
发明人： Osamu Kamiya , Nobuyuki Sekimura
IPC分类号： G03G15/04 , G02B5/28 , G02B17/08 , G02B27/32 , G03B27/32 , G03B27/50 , G03G15/043 , G03B27/76 , G03B15/00
CPC分类号： G02B5/285 , G02B5/281 , G03G15/0435
摘要： In a copier utilizing a halogen lamp as a light source and a CdS element as a photosensitive member and comprising a reflective lens system, a mirror contained in the reflective projection lens system is provided with a multi-layered coating of 5 to 9 layers of a dielectric substance to reduce exposure in the red wavelength range without reducing exposure in the blue and green wavelength ranges thereby matching the spectral characteristics of the light from an original with the spectral sensitivity of the photosensitive member.
摘要翻译：在利用卤素灯作为光源和CdS元件作为感光部件并且包括反射透镜系统的复印机中，包含在反射投影透镜系统中的反射镜设置有5至9层的多层涂层介电物质，以减少在红色波长范围的曝光，而不会减少蓝色和绿色波长范围的曝光，从而使来自原件的光的光谱特性与感光构件的光谱灵敏度相匹配。

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