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1. 发明授权

US06765645B1 De-pellicle tool 失效
标题翻译：去皮工具
公开(公告)号：US06765645B1
公开(公告)日：2004-07-20
申请号：US10345633
申请日：2003-01-15
申请人： Kuang-Yang Lee , Chi-Chang Chang , Ming-Tao Ho , Bill Chiu
发明人： Kuang-Yang Lee , Chi-Chang Chang , Ming-Tao Ho , Bill Chiu
IPC分类号： G03B2752
CPC分类号： G03F7/70983
摘要： A de-pellicle tool for removing a pellicle from a reticle during the formation of circuit patterns on substrates in the fabrication of integrated circuits. The de-pellicle tool of the present invention comprises a support frame on which is mounted the reticle and the pellicle supported on the reticle. A pair of handle-actuated lift pins on opposite sides of the support frame are extended into respective pin openings in the pellicle frame, after which the handles are pushed downwardly to raise the lift pins and lift the pellicle frame from the reticle. Accordingly, no moving parts contact the reticle during the pellicle-removing procedure, preventing scratching or other damage to the reticle.
摘要翻译：用于在集成电路的制造中在衬底上形成电路图案期间从掩模版移除防护薄膜的去皮膜工具。本发明的防护薄膜工具包括支撑框架，其上安装有掩模版和支撑在掩模版上的防护薄膜组件。在支撑框架的相对侧上的一对手柄驱动的提升销延伸到防护薄膜组件框架中的相应的销开口中，然后将手柄向下推动以升高升降销并将防护膜框架从掩模版提起。因此，在防护薄膜组件除去过程中，没有移动部件接触掩模版，防止对掩模版划伤或其它损坏。

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