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1. 发明授权

US06325858B1 Long life high temperature process chamber 有权
标题翻译：长寿命高温加工室
公开(公告)号：US06325858B1
公开(公告)日：2001-12-04
申请号：US09184490
申请日：1998-11-02
申请人： John F. Wengert , Ivo Raaijmakers , Mike Halpin , Loren Jacobs , Michael J. Meyer , Frank van Bilsen , Matt Goodman , Eric Barrett , Eric Wood , Blake Samuels
发明人： John F. Wengert , Ivo Raaijmakers , Mike Halpin , Loren Jacobs , Michael J. Meyer , Frank van Bilsen , Matt Goodman , Eric Barrett , Eric Wood , Blake Samuels
IPC分类号： C23C1600
CPC分类号： H01L21/67115 , C23C16/4401 , C23C16/481 , G01K1/12 , G01K7/04
摘要： A generally horizontally-oriented quartz CVD chamber is disclosed with front and rear chamber divider plates adjacent a centrally positioned susceptor and surrounding temperature control ring which divide the chamber into upper and lower regions. Improvement to the lifetime of CVD process components and related throughput improvements are disclosed. A getter plate for attracting some of the unused reactant gas is positioned downstream from the susceptor extending generally parallel to and spaced between the divider plate and the upper chamber wall. This getter plate also minimizes deposition on the chamber walls and improves the efficiency of a cleaning step. Reradiating elements are also located adjacent side walls of the chamber to heat cooler chamber wall areas. The getter plate and the reradiating elements plus the susceptor and surrounding ring are all made of solid chemical vapor deposited SiC to improve the life of the chamber. Also, thermocouples adjacent the susceptor are provided with SiC sheaths to enable the thermocouples to withstand more process cycles than that of quartz sheaths. SiC shields may be provided on quartz components throughout the chamber to protect the quartz from devitrification. Throughput is improved by both reducing down time and reducing the cleaning step time of the process cycle.
摘要翻译：公开了一种大致水平取向的石英CVD室，其具有邻近中心定位的基座和周围温度控制环的前室和后室分隔板，其将室分成上部和下部区域。公开了CVD工艺组件的寿命的改善和相关的生产率改进。用于吸引一些未使用的反应气体的吸气板位于大致平行于分隔板和上室壁之间并间隔开的基座的下游。该吸气板还使得室壁上的沉积最小化并且提高了清洁步骤的效率。辐射元件也位于腔室的侧壁附近以加热冷却器室壁区域。吸气板和再辐射元件加上感受器和环绕环均由固体化学气相沉积SiC制成，以提高腔室的使用寿命。此外，靠近基座的热电偶设置有SiC护套，以使得热电偶能够承受比石英护套更多的工艺循环。可以在整个室中的石英组件上提供SiC护罩以保护石英免于失透。通过减少停机时间和减少处理循环的清洗步骤时间来改善产量。

2. 发明申请

US20090052498A1 THERMOCOUPLE 审中-公开
标题翻译：热电偶
公开(公告)号：US20090052498A1
公开(公告)日：2009-02-26
申请号：US12193924
申请日：2008-08-19
申请人： Mike Halpin , Matt Goodman
发明人： Mike Halpin , Matt Goodman
IPC分类号： G01K7/02 , B05C11/00
CPC分类号： G01K7/04 , G05D23/1931 , G05D23/22
摘要： A thermocouple for measuring temperature at a position adjacent to a substrate being processed in a chemical vapor deposition reactor is provided. The thermocouple includes a sheath having a measuring tip. The thermocouple also includes a support tube disposed within the sheath. The thermocouple further includes first and second wires supported by the support tube. The first and second wires are formed of different metals. A junction is formed between the first and second wires, wherein the junction is located adjacent to a distal end of the support tube. A spring is disposed about a portion of the support tube. The spring is compressed to exert a spring force on the support tube to bias the junction against the measuring tip to maintain the junction in continuous contact with the measuring tip. The spring force is small enough to prevent significant deformation of the junction as well as reducing variation of spring force or junction location from one thermocouple to another.
摘要翻译：提供了一种用于在化学气相沉积反应器中处理的衬底附近的位置处测量温度的热电偶。热电偶包括具有测量尖端的护套。热电偶还包括设置在护套内的支撑管。热电偶还包括由支撑管支撑的第一和第二线。第一和第二导线由不同的金属形成。在第一和第二导线之间形成接头，其中接合部位于支撑管的远端附近。围绕支撑管的一部分设置弹簧。弹簧被压缩以在支撑管上施加弹簧力以将接合部偏压到测量尖端，以保持接合处与测量尖端连续接触。弹簧力足够小以防止接头的显着变形，以及减少弹簧力或结合位置从一个热电偶到另一个热电偶的变化。

3. 发明申请

US20050193952A1 Substrate support system for reduced autodoping and backside deposition 有权
标题翻译：用于减少自动掺杂和背面沉积的基板支撑系统
公开(公告)号：US20050193952A1
公开(公告)日：2005-09-08
申请号：US11057111
申请日：2005-02-11
申请人： Matt Goodman , Jereon Stoutyesdijk , Ravinder Aggarwal , Mike Halpin , Tony Keeton , Mark Hawkins , Lee Haen , Armand Ferro , Paul Brabant , Robert Vyne , Gregory Bartlett , Joseph Italiano , Bob Haro
发明人： Matt Goodman , Jereon Stoutyesdijk , Ravinder Aggarwal , Mike Halpin , Tony Keeton , Mark Hawkins , Lee Haen , Armand Ferro , Paul Brabant , Robert Vyne , Gregory Bartlett , Joseph Italiano , Bob Haro
IPC分类号： C23C16/00 , C23C16/458 , C30B25/12 , C30B25/14 , H01L21/00 , H01L21/687
CPC分类号： H01L21/68735 , H01J37/32871 , H01L21/67028
摘要： A substrate support system comprises a relatively thin circular substrate holder having a plurality of passages extending between top and bottom surfaces thereof. The substrate holder includes a single substrate support ledge or a plurality of substrate support spacer vanes configured to support a peripheral portion of the substrate backside so that a thin gap is formed between the substrate and the substrate holder. The vanes can be angled to resist backside deposition of reactant gases as the substrate holder is rotated. A hollow support member provides support to an underside of the substrate holder. The hollow support member is configured to convey gas (e.g., inert gas or cleaning gas) upward into one or more of the passages of the substrate holder. The upwardly conveyed gas flows into the gap between the substrate and the substrate holder. Depending upon the embodiment of the invention, the gas in the gap can then flow either (1) outward and upward around the substrate edge or (2) downward through passages of the substrate holder, if any, that do not lead back into the hollow support member. The gas that flows outward and upward around the substrate edge inhibits backside deposition of reactant gases above the substrate. The gas that flows downward through the passages that do not lead back to the support member advantageously inhibits autodoping by sweeping out-diffused dopant atoms away from the substrate front side. In one embodiment, the support member comprises a hollow multi-armed support spider that conveys gas into selected ones of the passages. In another embodiment, the support member comprises a bowl- or cup-shaped structure that conveys gas upward into all of the passages. In yet another embodiment, the support member comprises a bowl- or cup-shaped structure that conveys gas upward into all but one or more of the passages.
摘要翻译：衬底支撑系统包括相对薄的圆形衬底保持器，其具有在其顶表面和底表面之间延伸的多个通道。衬底保持器包括单个衬底支撑凸缘或多个衬底支撑间隔器叶片，其构造成支撑衬底背面的周边部分，使得在衬底和衬底保持器之间形成薄的间隙。当基板保持器旋转时，叶片可以成角度以抵抗反应气体的背面沉积。中空的支撑构件为衬底保持器的下侧提供支撑。中空支撑构件被构造成将气体（例如，惰性气体或清洁气体）向上输送到衬底保持器的一个或多个通道中。向上输送的气体流入基板和基板支架之间的间隙。根据本发明的实施例，间隙中的气体然后可以（1）围绕衬底边缘向外和向上流动，或者（2）向下通过衬底保持器的通道（如果有的话），其不会引导回到空心支持会员在衬底边缘周围向外和向上流动的气体阻止在衬底上方的反应物气体的背面沉积。通过通道向下流动的气体不会返回到支撑构件，有利地通过从扩散的掺杂剂原子远离衬底正面来扫除自发掺杂。在一个实施例中，支撑构件包括将气体输送到选定的通道中的中空多臂支撑蜘蛛。在另一个实施例中，支撑构件包括将气体向上输送到所有通道中的碗形或杯状结构。在另一个实施例中，支撑构件包括碗形或杯状结构，其将气体向上输送到除了一个或多个通道中的所有通道中。

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