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1. 发明申请

US20140087561A1 METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT 审中-公开
标题翻译：用于基板传输和放射性约束的方法和装置
公开(公告)号：US20140087561A1
公开(公告)日：2014-03-27
申请号：US13985843
申请日：2012-02-29
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Paul B. Reuter , Imad Yousif , Aniruddha Pal
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Paul B. Reuter , Imad Yousif , Aniruddha Pal
IPC分类号： H01L21/677 , H01L21/306
CPC分类号： H01L21/67742 , C23C16/45517 , C23C16/4586 , H01L21/306 , H01L21/67751 , H01L21/68742
摘要： Embodiments of the present invention provide an apparatus for transferring substrates and confining a processing environment in a chamber. One embodiment of the present invention provides a hoop assembly for using a processing chamber. The hoop assembly includes a confinement ring defining a confinement region therein, and three or more lifting fingers attached to the hoop. The three or more lifting fingers are configured to support a substrate outside the inner volume of the confinement ring.
摘要翻译：本发明的实施例提供了一种用于传送基板并将处理环境限制在室中的装置。本发明的一个实施例提供一种用于使用处理室的环形组件。环箍组件包括在其中限定限制区域的限制环和连接到箍的三个或更多个提升手指。三个或更多个提升指状物构造成在限制环的内部容积之外支撑衬底。

2. 发明授权

US08562742B2 Apparatus for radial delivery of gas to a chamber and methods of use thereof 失效
标题翻译：用于将气体径向输送到室的装置及其使用方法
公开(公告)号：US08562742B2
公开(公告)日：2013-10-22
申请号：US12907947
申请日：2010-10-19
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
IPC分类号： C23C16/00 , C23C16/455 , H01L21/3065
CPC分类号： H01L21/67017 , H01L21/67115 , H01L21/6719 , H01L21/67201 , H01L21/68785 , Y10T137/6416 , Y10T137/8593
摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
摘要翻译：本文提供了将气体输送到室的装置及其使用方法。在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

3. 发明申请

US20110269314A1 PROCESS CHAMBERS HAVING SHARED RESOURCES AND METHODS OF USE THEREOF 审中-公开
标题翻译：具有共享资源的过程池及其使用方法
公开(公告)号：US20110269314A1
公开(公告)日：2011-11-03
申请号：US12905032
申请日：2010-10-14
申请人： JARED AHMAD LEE , JAMES P. CRUSE , ANDREW NGUYEN , CORIE LYNN COBB , MING XU , MARTIN JEFF SALINAS , ANCHEL SHEYNER
发明人： JARED AHMAD LEE , JAMES P. CRUSE , ANDREW NGUYEN , CORIE LYNN COBB , MING XU , MARTIN JEFF SALINAS , ANCHEL SHEYNER
IPC分类号： H01L21/3065
CPC分类号： H01L21/67109 , H01L21/6719
摘要： Process chambers having shared resources and methods of use are provided. In some embodiments, substrate processing systems may include a first process chamber having a first substrate support disposed within the first process chamber, wherein the first substrate support has a first heater and a first cooling plate to control a temperature of the first substrate support; a second process chamber having a second substrate support disposed within the second process chamber, wherein the second substrate support has a second heater and a second cooling plate to control a temperature of the second substrate support; and a shared heat transfer fluid source having an outlet to provide a heat transfer fluid to the first cooling plate and the second cooling plate and an inlet to receive the heat transfer fluid from the first cooling plate and the second cooling plate.
摘要翻译：提供了具有共享资源和使用方法的过程室。在一些实施例中，衬底处理系统可以包括第一处理室，其具有设置在第一处理室内的第一衬底支撑件，其中第一衬底支撑件具有第一加热器和第一冷却板以控制第一衬底支撑件的温度; 第二处理室，具有设置在所述第二处理室内的第二基板支撑件，其中所述第二基板支撑件具有第二加热器和第二冷却板，以控制所述第二基板支撑件的温度; 以及共用传热流体源，其具有出口以向第一冷却板和第二冷却板提供传热流体，以及从第一冷却板和第二冷却板接收传热流体的入口。

4. 发明申请

US20110265831A1 METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROCESS CHAMBERS 失效
标题翻译：将气体混合物提供给过程池对的方法和装置
公开(公告)号：US20110265831A1
公开(公告)日：2011-11-03
申请号：US12907944
申请日：2010-10-19
申请人： JARED AHMAD LEE , MARTIN JEFF SALINAS , EZRA ROBERT GOLD , JAMES P. CRUSE
发明人： JARED AHMAD LEE , MARTIN JEFF SALINAS , EZRA ROBERT GOLD , JAMES P. CRUSE
IPC分类号： B08B5/00 , B08B13/00 , F15D1/00 , C23F1/08
CPC分类号： F17D3/03 , H01J37/3244 , H01J37/32899 , H01L21/02071 , H01L21/6719 , H01L21/67201 , Y10T137/0318 , Y10T137/877
摘要： A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line.
摘要翻译：描述了一种将气体混合物供应到负载锁定室的方法和装置。在一个实施例中，该装置将气体混合物提供给一对处理室，包括第一臭氧发生器以向第一处理室提供第一气体混合物，第二臭氧发生器将第二气体混合物提供给第二处理室，第一气体源，经由第一质量流量控制器和第一气体管线耦合到第一臭氧发生器，并且经由第二质量流量控制器和第二气体管线耦合到第二臭氧发生器，以及耦合到第一气体源的第一气体源臭氧发生器，经由第三质量流量控制器和第三气体管线，并经由第四质量流量控制器和第四气体管线与第二臭氧发生器连接。

5. 发明申请

US20110094683A1 RF FEED STRUCTURE FOR PLASMA PROCESSING 审中-公开
标题翻译：用于等离子体处理的射频馈送结构
公开(公告)号：US20110094683A1
公开(公告)日：2011-04-28
申请号：US12821626
申请日：2010-06-23
申请人： ZHIGANG CHEN , SHAHID RAUF , KENNETH S. COLLINS , MARTIN JEFF SALINAS , SAMER BANNA , VALENTIN N. TODOROW
发明人： ZHIGANG CHEN , SHAHID RAUF , KENNETH S. COLLINS , MARTIN JEFF SALINAS , SAMER BANNA , VALENTIN N. TODOROW
IPC分类号： H05H1/24 , H01P5/12
CPC分类号： H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32174
摘要： Apparatus for plasma processing are provided. In some embodiments, an RF feed structure includes a first RF feed to couple RF power to a plurality of symmetrically arranged stacked first RF coil elements; a second RF feed coaxially disposed about the first RF feed and electrically insulated therefrom, the second RF feed to couple RF power to a plurality of symmetrically arranged stacked second RF coil elements coaxially disposed with respect to the first RF coil elements. In some embodiments, a plasma processing apparatus includes a first RF coil; a second RF coil coaxially disposed with respect to the first RF coil; a first RF feed coupled to the first RF coil to provide RF power thereto; and a second RF feed coaxially disposed with respect to the first RF feed and electrically insulated therefrom, the second RF feed coupled to the second RF coil to provide RF power thereto.
摘要翻译：提供等离子体处理装置。在一些实施例中，RF馈送结构包括用于将RF功率耦合到多个对称布置的堆叠的第一RF线圈元件的第一RF馈送; 第二RF馈送，其围绕第一RF馈电同轴设置并与其电绝缘，第二RF馈送将RF功率耦合到相对于第一RF线圈元件同轴设置的多个对称布置的堆叠的第二RF线圈元件。在一些实施例中，等离子体处理装置包括第一RF线圈; 相对于所述第一RF线圈同轴设置的第二RF线圈; 耦合到所述第一RF线圈以向其提供RF功率的第一RF馈送; 以及第二RF馈电，其相对于所述第一RF馈电同轴设置并与其电绝缘，所述第二RF馈电耦合到所述第二RF线圈以向其提供RF功率。

6. 发明申请

US20090032522A1 ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS 审中-公开
标题翻译：用于轨道光刻系统的区域控制加热板
公开(公告)号：US20090032522A1
公开(公告)日：2009-02-05
申请号：US12192857
申请日：2008-08-15
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.
摘要翻译：一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

7. 发明授权

US07427728B2 Zone control heater plate for track lithography systems 失效
公开(公告)号：US07427728B2
公开(公告)日：2008-09-23
申请号：US11483832
申请日：2006-07-07
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

8. 发明申请

US20080006619A1 Zone control heater plate for track lithography systems 失效
标题翻译：用于轨道光刻系统的区域控制加热板
公开(公告)号：US20080006619A1
公开(公告)日：2008-01-10
申请号：US11483832
申请日：2006-07-07
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.
摘要翻译：一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

9. 发明申请

US20110265887A1 APPARATUS FOR RADIAL DELIVERY OF GAS TO A CHAMBER AND METHODS OF USE THEREOF 失效
标题翻译：用于将气体径向输送到室的装置及其使用方法
公开(公告)号：US20110265887A1
公开(公告)日：2011-11-03
申请号：US12907947
申请日：2010-10-19
申请人： JARED AHMAD LEE , MARTIN JEFF SALINAS , ANKUR AGARWAL , EZRA ROBERT GOLD , JAMES P. CRUSE , ANIRUDDHA PAL , ANDREW NGUYEN
发明人： JARED AHMAD LEE , MARTIN JEFF SALINAS , ANKUR AGARWAL , EZRA ROBERT GOLD , JAMES P. CRUSE , ANIRUDDHA PAL , ANDREW NGUYEN
IPC分类号： F15D1/00
CPC分类号： H01L21/67017 , H01L21/67115 , H01L21/6719 , H01L21/67201 , H01L21/68785 , Y10T137/6416 , Y10T137/8593
摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
摘要翻译：本文提供了将气体输送到室的装置及其使用方法。在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

10. 发明授权

US07741585B2 Integrated thermal unit having a shuttle with two-axis movement 有权
标题翻译：具有双轴运动的梭子的集成热单元
公开(公告)号：US07741585B2
公开(公告)日：2010-06-22
申请号：US11929650
申请日：2007-10-30
申请人： David H. Quach , Martin Jeff Salinas
发明人： David H. Quach , Martin Jeff Salinas
IPC分类号： H05B3/68 , C23C16/00
CPC分类号： H05B3/68 , H01L21/67109 , H01L21/67184 , H01L21/67748
摘要： An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the cool plate, wherein the substrate transfer shuttle has a temperature controlled substrate holding surface that is capable of cooling a substrate heated by the bake plate.
摘要翻译：一种集成热单元，包括：烘烤板，被配置为加热支撑在所述烘烤板的表面上的基底; 冷却板，被配置为冷却支撑在所述冷却板的表面上的基板; 以及衬底传送梭，其构造成将衬底从烘烤板转移到冷却板，其中衬底传送梭具有能够冷却由烘烤板加热的衬底的温度控制的衬底保持表面。

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