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1. 发明申请

US20140087561A1 METHOD AND APPARATUS FOR SUBSTRATE TRANSFER AND RADICAL CONFINEMENT 审中-公开
标题翻译：用于基板传输和放射性约束的方法和装置
公开(公告)号：US20140087561A1
公开(公告)日：2014-03-27
申请号：US13985843
申请日：2012-02-29
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Paul B. Reuter , Imad Yousif , Aniruddha Pal
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Paul B. Reuter , Imad Yousif , Aniruddha Pal
IPC分类号： H01L21/677 , H01L21/306
CPC分类号： H01L21/67742 , C23C16/45517 , C23C16/4586 , H01L21/306 , H01L21/67751 , H01L21/68742
摘要： Embodiments of the present invention provide an apparatus for transferring substrates and confining a processing environment in a chamber. One embodiment of the present invention provides a hoop assembly for using a processing chamber. The hoop assembly includes a confinement ring defining a confinement region therein, and three or more lifting fingers attached to the hoop. The three or more lifting fingers are configured to support a substrate outside the inner volume of the confinement ring.
摘要翻译：本发明的实施例提供了一种用于传送基板并将处理环境限制在室中的装置。本发明的一个实施例提供一种用于使用处理室的环形组件。环箍组件包括在其中限定限制区域的限制环和连接到箍的三个或更多个提升手指。三个或更多个提升指状物构造成在限制环的内部容积之外支撑衬底。

2. 发明授权

US08562742B2 Apparatus for radial delivery of gas to a chamber and methods of use thereof 失效
标题翻译：用于将气体径向输送到室的装置及其使用方法
公开(公告)号：US08562742B2
公开(公告)日：2013-10-22
申请号：US12907947
申请日：2010-10-19
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Ankur Agarwal , Ezra Robert Gold , James P. Cruse , Aniruddha Pal , Andrew Nguyen
IPC分类号： C23C16/00 , C23C16/455 , H01L21/3065
CPC分类号： H01L21/67017 , H01L21/67115 , H01L21/6719 , H01L21/67201 , H01L21/68785 , Y10T137/6416 , Y10T137/8593
摘要： Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
摘要翻译：本文提供了将气体输送到室的装置及其使用方法。在一些实施例中，用于处理室的气体分配系统可以包括主体，其具有构造成将主体连接到处理室的内表面的第一表面，主体具有穿过主体设置的开口; 靠近所述开口的与所述主体的第一表面相对的第一端附近的凸缘，所述凸缘向内延伸到所述开口中并且构造成在其上支撑窗户; 以及多个气体分配通道，其设置在所述主体内并且将设置在所述主体内并且围绕所述开口的通道流体连接到设置在所述凸缘中的多个孔，其中所述多个孔围绕所述凸缘径向设置。

3. 发明授权

US08616224B2 Methods and apparatus for providing a gas mixture to a pair of process chambers 失效
标题翻译：将气体混合物提供给一对处理室的方法和装置
公开(公告)号：US08616224B2
公开(公告)日：2013-12-31
申请号：US12907944
申请日：2010-10-19
申请人： Jared Ahmad Lee , Martin Jeff Salinas , Ezra Robert Gold , James P. Cruse
发明人： Jared Ahmad Lee , Martin Jeff Salinas , Ezra Robert Gold , James P. Cruse
IPC分类号： B08B3/00
CPC分类号： F17D3/03 , H01J37/3244 , H01J37/32899 , H01L21/02071 , H01L21/6719 , H01L21/67201 , Y10T137/0318 , Y10T137/877
摘要： A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line.
摘要翻译：描述了一种将气体混合物供应到负载锁定室的方法和装置。在一个实施例中，该装置将气体混合物提供给一对处理室，包括第一臭氧发生器以向第一处理室提供第一气体混合物，第二臭氧发生器将第二气体混合物提供给第二处理室，第一气体源，经由第一质量流量控制器和第一气体管线耦合到第一臭氧发生器，并且经由第二质量流量控制器和第二气体管线耦合到第二臭氧发生器，以及耦合到第一气体源的第一气体源臭氧发生器，经由第三质量流量控制器和第三气体管线，并经由第四质量流量控制器和第四气体管线与第二臭氧发生器连接。

4. 发明授权

US07972469B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US07972469B2
公开(公告)日：2011-07-05
申请号：US11738505
申请日：2007-04-22
申请人： Hiroji Hanawa , Andrew Nguyen , Keiji Horioka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger A. Lindley , Hong S. Yang
发明人： Hiroji Hanawa , Andrew Nguyen , Keiji Horioka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger A. Lindley , Hong S. Yang
IPC分类号： H01L21/00
CPC分类号： H01J37/3266 , H01J37/32623
摘要： Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.
摘要翻译：本发明的实施例涉及等离子体处理装置及其使用方法。在一些实施例中，等离子体控制磁体组件包括以预定图案布置的多个磁体，其在靠近组件的区域中产生强度大于10高斯的磁场，并且在远离组件的区域中小于10高斯。

5. 发明申请

US20080260966A1 PLASMA PROCESSING METHOD 审中-公开
标题翻译：等离子体处理方法
公开(公告)号：US20080260966A1
公开(公告)日：2008-10-23
申请号：US11738507
申请日：2007-04-22
申请人： Hiroji Hanawa , Andrew Nguyen , Keiji Horioka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
发明人： Hiroji Hanawa , Andrew Nguyen , Keiji Horioka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
IPC分类号： H05H1/24
CPC分类号： H01J37/3266 , H01J37/32623
摘要： Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a method of controlling a plasma in a process chamber includes providing a chamber for processing a substrate and having a processing volume defined therein wherein a plasma is to be formed during operation, the chamber further having a plasma control magnet assembly comprising a plurality of magnets that provide a magnetic field having a magnitude is greater than about 10 Gauss in an upper region of the processing volume and less than about 10 Gauss in a lower region of the processing volume proximate a substrate to be processed; supplying a process gas to the chamber; and forming a plasma in the processing volume from the process gas.
摘要翻译：本发明的实施例涉及等离子体处理装置及其使用方法。在一些实施例中，控制处理室中的等离子体的方法包括提供用于处理衬底并具有其中限定的处理体积的室，其中在操作期间将形成等离子体，所述室还具有等离子体控制磁体组件，其包括提供具有幅度的磁场的多个磁体在处理体积的上部区域中大于约10个高斯，并且在处理体积的接近待处理衬底的较低区域中小于约10个高斯; 向所述室供应处理气体; 以及从所述处理气体在所述处理容积中形成等离子体。

6. 发明申请

US20080257261A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20080257261A1
公开(公告)日：2008-10-23
申请号：US11738505
申请日：2007-04-22
申请人： Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
发明人： Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
IPC分类号： H05H1/00
CPC分类号： H01J37/3266 , H01J37/32623
摘要： Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.
摘要翻译：本发明的实施例涉及等离子体处理装置及其使用方法。在一些实施例中，等离子体控制磁体组件包括以预定图案布置的多个磁体，其在靠近组件的区域中产生强度大于10高斯的磁场，并且在远离组件的区域中小于10高斯。

7. 发明授权

US07297906B2 Integrated thermal unit having a shuttle with two-axis movement 有权
标题翻译：具有双轴运动的梭子的集成热单元
公开(公告)号：US07297906B2
公开(公告)日：2007-11-20
申请号：US11174781
申请日：2005-07-05
申请人： David H. Quach , Martin Jeff Salinas
发明人： David H. Quach , Martin Jeff Salinas
IPC分类号： H05B3/68 , C23C16/80
CPC分类号： H01L21/67184 , H01L21/67109 , H01L21/67742 , H01L21/67748 , H01L21/67751
摘要： An integrated thermal unit comprises a bake station comprising a bake plate configured to hold and heat a substrate; a chill station comprising a chill plate configured to hold and cool a substrate; and a substrate transfer shuttle configured to transfer substrates from the bake plate to the chill plate along a horizontally linear path within the thermal unit and raise and lower substrates along a vertical path within the integrated thermal unit.
摘要翻译：集成热单元包括烘焙站，烘烤站包括构造成保持和加热基材的烘烤板; 冷却站，包括构造成保持和冷却衬底的冷却板; 以及基板传送梭，其构造成沿着所述热单元内的水平线性路径将基板从所述烘烤板传送到所述冷却板，并且沿着所述集成热单元内的垂直路径升高和降低基板。

8. 发明申请

US20090032522A1 ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS 审中-公开
标题翻译：用于轨道光刻系统的区域控制加热板
公开(公告)号：US20090032522A1
公开(公告)日：2009-02-05
申请号：US12192857
申请日：2008-08-15
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.
摘要翻译：一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

9. 发明授权

US07427728B2 Zone control heater plate for track lithography systems 失效
公开(公告)号：US07427728B2
公开(公告)日：2008-09-23
申请号：US11483832
申请日：2006-07-07
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.

10. 发明申请

US20080006619A1 Zone control heater plate for track lithography systems 失效
标题翻译：用于轨道光刻系统的区域控制加热板
公开(公告)号：US20080006619A1
公开(公告)日：2008-01-10
申请号：US11483832
申请日：2006-07-07
申请人： Martin Jeff Salinas , David H. Quach
发明人： Martin Jeff Salinas , David H. Quach
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.
摘要翻译：一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和包括在耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下侧和周边侧表面间隔开并且大致围绕烘烤板的下表面和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多根导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及连接器，电连接到所述图案化信号层中的所述多个信号迹线，适于促进与所述多根电线的电连接。

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