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    • 4. 发明申请
    • DATA PATH FOR LITHOGRAPHY APPARATUS
    • 数据路径为LITHOGRAPHY设备
    • US20120287410A1
    • 2012-11-15
    • US13290139
    • 2011-11-07
    • Marco Jan-Jaco WielandTeunis Van De PeutFloris Pepijn Van Der WiltErnst Habekotte
    • Marco Jan-Jaco WielandTeunis Van De PeutFloris Pepijn Van Der WiltErnst Habekotte
    • G03B27/00G06F3/12H04Q11/00
    • H01J37/3177B82Y10/00B82Y40/00H01J2237/31762H01J2237/31774
    • The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.
    • 本发明涉及一种用于使用多个带电粒子子束来图案化靶的无掩模光刻系统。 该系统包括电子光学柱,其包括用于调制子束的阻挡阵列。 消隐器阵列包括用于接收数据信号的接收器和用于根据数据信号调制子束的消隐元件。 该系统还包括数据路径,该数据路径包括用于处理模式数据的预处理系统和用于将处理后的图案数据发送到消隐元件的多个传输通道。 数据路径还包括用于接收模式数据和产生数据信号的模式流传输系统。 第一和第二信道选择器连接用于模式数据传输的所选传输信道的子集。 第一通道选择器连接在预处理系统和传输通道之间。 第二通道选择器连接在通道和消声器元件之间。
    • 5. 发明申请
    • DATA PATH FOR LITHOGRAPHY APPARATUS
    • 数据路径为LITHOGRAPHY设备
    • US20120286168A1
    • 2012-11-15
    • US13290141
    • 2011-11-07
    • Henk DerksMarco Jan-Jaco WielandTeunis Van De Peut
    • Henk DerksMarco Jan-Jaco WielandTeunis Van De Peut
    • G06F11/20G21K5/04
    • H01J37/3177B82Y10/00B82Y40/00H01J2237/31754H01J2237/31762H01J2237/31793
    • A maskless charged particle lithography system comprises an electron-optical column and a data path. The column includes a blanker array including blanker elements. The data path comprises a preprocessing system, transmission channels, and a pattern streaming system. The lithography system is configured for exposing a target field in two passes by allocating a first beamlet subset for exposing a first field subset during a first pass and a second beamlet subset for exposing a second field subset during a second pass. A first beam selector selects a first pattern data subset containing exposure data for the first beamlet subset and a second pattern data subset containing exposure data for the second beamlet subset. Second beam selectors connect transmission channels assigned for transmitting the first pattern data subset to a first blanker elements subset, and transmission channels assigned for transmitting the second pattern data subset to a second blanker elements subset.
    • 无掩模带电粒子光刻系统包括电子 - 光学柱和数据路径。 该列包括一个包含消隐元素的消隐数组。 数据路径包括预处理系统,传输信道和模式流传输系统。 光刻系统被配置为通过在第一次通过期间分配用于暴露第一场子集的第一子束子集和用于在第二遍期间暴露第二场子集的第二子束子集来分两次通过中的目标场曝光。 第一光束选择器选择包含第一子束子集的曝光数据的第一图案数据子集和包含第二子束子集的曝光数据的第二图案数据子集。 第二光束选择器将分配用于发射第一图案数据子集的传输通道连接到第一消隐元素子集,以及分配用于将第二图案数据子集发送到第二消隐元素子集的传输信道。
    • 10. 发明申请
    • PROJECTION LENS ARRANGEMENT
    • 投影镜头布置
    • US20120091358A1
    • 2012-04-19
    • US12905126
    • 2010-10-15
    • Marco Jan Jaco WIELANDAlexander Hendrik Vincent VAN VEEN
    • Marco Jan Jaco WIELANDAlexander Hendrik Vincent VAN VEEN
    • G21K1/08
    • H01J37/10B82Y10/00B82Y40/00H01J37/147H01J37/1471H01J37/1478H01J37/30H01J37/3007H01J37/3177H01J2237/0437H01J2237/0492
    • The invention relates to a charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system has a charged particle source, an aperture array, a beamlet manipulator, a beamlet blanker, and an array of projection lens systems. The charged particle source is configured to generate a charged particle beam. The aperture array is configured to define separate beamlets from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target. The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.
    • 本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统具有带电粒子源,孔径阵列,子束操纵器,子束消除器和投影透镜系统阵列。 带电粒子源被配置为产生带电粒子束。 孔径阵列被配置为从所产生的光束定义单独的子束。 子束操纵器被配置为将每个子束的组合朝向每个组的公共收敛点收敛。 子束消除器被配置为可控地遮挡子束组中的子束。 最后,投影透镜系统的阵列被配置成将子束组的未平坦的子束投影到目标的表面上。 子束操纵器还适于将每个子束组朝向对应于投影透镜系统中的一个的点聚焦。