专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06567715B1 Method and system for automated on-chip material and structural certification of MEMS devices 有权
标题翻译： MEMS器件自动化芯片材料和结构认证的方法和系统
公开(公告)号：US06567715B1
公开(公告)日：2003-05-20
申请号：US09553989
申请日：2000-04-19
申请人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith , Brian D. Jensen , Samuel L. Miller
发明人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith , Brian D. Jensen , Samuel L. Miller
IPC分类号： G06F1900
CPC分类号： B81C99/005
摘要： A new approach toward MEMS quality control and materials characterization is provided by a combined test structure measurement and mechanical response modeling approach. Simple test structures are cofabricated with the MEMS devices being produced. These test structures are designed to isolate certain types of physical response, so that measurement of their behavior under applied stress can be easily interpreted as quality control and material properties information.
摘要翻译：通过组合的测试结构测量和机械响应建模方法提供了MEMS质量控制和材料表征的新方法。简单的测试结构与正在生产的MEMS器件共同构成。这些测试结构设计用于隔离某些类型的物理响应，从而可以轻易地将其在施加的应力下的行为测量解释为质量控制和材料属性信息。

2. 发明授权

US06446486B1 Micromachine friction test apparatus 有权
标题翻译：微机械摩擦试验装置
公开(公告)号：US06446486B1
公开(公告)日：2002-09-10
申请号：US09299804
申请日：1999-04-26
申请人： Maarten P. deBoer , James M. Redmond , Terry A. Michalske
发明人： Maarten P. deBoer , James M. Redmond , Terry A. Michalske
IPC分类号： G01N356
CPC分类号： B81B3/0021 , B81B2201/0292 , B81B2203/051 , G01N3/56 , G01N19/02 , G01N2203/0282 , G01N2203/0286 , G01N2203/0676 , G01N2203/0682
摘要： A microelectromechanical (MEM) friction test apparatus is disclosed for determining static or dynamic friction in MEM devices. The friction test apparatus, formed by surface micromachining, is based on a friction pad supported at one end of a cantilevered beam, with the friction pad overlying a contact pad formed on the substrate. A first electrostatic actuator can be used to bring a lower surface of the friction pad into contact with an upper surface of the contact pad with a controlled and adjustable force of contact. A second electrostatic actuator can then be used to bend the cantilevered beam, thereby shortening its length and generating a relative motion between the two contacting surfaces. The displacement of the cantilevered beam can be measured optically and used to determine the static or dynamic friction, including frictional losses and the coefficient of friction between the surfaces. The test apparatus can also be used to assess the reliability of rubbing surfaces in MEM devices by producing and measuring wear of those surfaces. Finally, the friction test apparatus, which is small in size, can be used as an in situ process quality tool for improving the fabrication of MEM devices.
摘要翻译：公开了一种用于确定MEM装置中静态或动态摩擦的微机电（MEM）摩擦试验装置。通过表面微加工形成的摩擦试验装置基于支撑在悬臂梁的一端的摩擦垫，摩擦垫覆盖在基底上形成的接触垫。可以使用第一静电致动器来使摩擦垫的下表面与接触垫的上表面接触，并具有受控且可调节的接触力。然后可以使用第二静电致动器来弯曲悬臂梁，从而缩短其长度并在两个接触表面之间产生相对运动。可以光学地测量悬臂梁的位移，并用于确定静摩擦或动摩擦，包括摩擦损失和表面之间的摩擦系数。测试装置也可用于通过产生和测量这些表面的磨损来评估MEM装置中摩擦表面的可靠性。最后，尺寸小的摩擦试验装置可以用作改进MEM装置制造的原位工艺质量工具。

3. 发明授权

US06721094B1 Long working distance interference microscope 有权
标题翻译：长工作距离干涉显微镜
公开(公告)号：US06721094B1
公开(公告)日：2004-04-13
申请号：US09800047
申请日：2001-03-05
申请人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith
发明人： Michael B. Sinclair , Maarten P. DeBoer , Norman F. Smith
IPC分类号： G02B2122
CPC分类号： G01B9/04 , G01B9/02082 , G02B21/14 , G02B21/22
摘要： Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.
摘要翻译：公开了一种长工作距离干涉显微镜，适用于标准微电子探针台上的MEMS器件和测试结构的三维成像和计量。 10-30 mm的长工作距离允许使用标准探头或探针卡。这使得能够在整个晶片上获取MEMS测试结构的纳米级3-D高度分布。与Linnik微型干涉仪相比，不需要很好匹配的参考/样品目标对，显着降低了该显微镜的成本。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式