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1. 发明授权

US09583908B2 Pulsed iodine laser apparatus 有权
标题翻译：脉冲碘激光仪
公开(公告)号：US09583908B2
公开(公告)日：2017-02-28
申请号：US14857114
申请日：2015-09-17
申请人： Kiwamu Takehisa
发明人： Kiwamu Takehisa
IPC分类号： H01S3/223 , H01S3/036 , H01S3/092 , H01S3/22 , H01S3/23
CPC分类号： H01S3/036 , H01S3/092 , H01S3/09505 , H01S3/10038 , H01S3/104 , H01S3/2215 , H01S3/2308 , H01S3/2333
摘要： The disclosed invention relates to a pulsed iodine laser apparatus. The laser apparatus has a flashlamp-pumped iodine laser oscillator which produces a laser pulse with a full pulse width of longer than 1 microsecond, and a COIL amplifier. The laser apparatus may has a controller which controls the timing of injecting chlorine gas contained in a high-pressure chlorine tank into the singlet oxygen generator by outputting an open/close signal of the valve V2, and the timing of injecting iodine molecules contained in a iodine molecule tank into an amplifier chamber of the COIL amplifier.
摘要翻译：本发明涉及脉冲碘激光装置。激光装置具有闪光灯泵浦的碘激光振荡器，其产生具有大于1微秒的全脉冲宽度的激光脉冲和COIL放大器。激光装置可以具有控制器，该控制器通过输出阀V2的打开/关闭信号以及注入包含在单体氧气发生器中的碘分子的注入时间来控制将高压氯罐中所含的氯气注入到单线态氧发生器中的定时碘分子罐进入COIL放大器的放大器室。

2. 发明授权

US07787076B2 Backlight unit for liquid crystal display 失效
标题翻译：背光单元用于液晶显示
公开(公告)号：US07787076B2
公开(公告)日：2010-08-31
申请号：US11989424
申请日：2006-07-21
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Kiwamu Takehisa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Kiwamu Takehisa
IPC分类号： G02F1/1335
CPC分类号： G02B6/0031 , G02B6/0018 , G02F1/133605 , G02F1/133615
摘要： As a shape on a cross-section vertical to a longitudinal direction (L) of the hot cathode fluorescent lamp (20a (20b)), a light source rear side reflecting plane (62) of a reflector (60) includes a mound portion (623). The mound portion (623) is defined by two recessed inclining planes and protrudes toward a hot cathode fluorescent lamp (20a (20b)).
摘要翻译：作为垂直于热阴极荧光灯（20a（20b））的纵向（L）的横截面的形状，反射器（60）的光源后侧反射面（62）包括墩部（ 623）。墩部（623）由两个凹入的倾斜平面限定，朝向热阴极荧光灯（20a（20b））突出。

3. 发明授权

US07764414B2 Illumination apparatus and illumination method 有权
标题翻译：照明装置和照明方法
公开(公告)号：US07764414B2
公开(公告)日：2010-07-27
申请号：US11959051
申请日：2007-12-18
申请人： Haruhiko Kusunose , Kiwamu Takehisa
发明人： Haruhiko Kusunose , Kiwamu Takehisa
IPC分类号： G02B26/08
CPC分类号： G02B27/0944 , G02B27/0933 , G02B27/0994
摘要： According to one aspect of the present invention, there is provided an illumination apparatus 110 including a laser source 11, a two dimensional diffraction optics 13 on which laser beam from the laser source is made incident, a rectangular rod 14 on which diffraction beams from the two dimensional diffraction optics 13 are made incident and through which incident beams travel while repeating total reflection, and a galvano mirror 12 changing an incident position of the diffraction beams from the two dimensional diffraction optics 13 in an incident end surface of the rectangular rod 14.
摘要翻译：根据本发明的一个方面，提供了一种照明装置110，其包括激光源11，来自激光源的激光束入射的二维衍射光学元件13，矩形棒14，来自二维衍射光学器件13被入射并且入射光束在重复全反射的同时移动，并且电流镜12在矩形棒14的入射端面中改变来自二维衍射光学元件13的衍射光束的入射位置。

4. 发明授权

US07474383B2 Mask making method, mask making device, and mask drawing device 失效
标题翻译：掩模制作方法，制膜装置和掩模拉伸装置
公开(公告)号：US07474383B2
公开(公告)日：2009-01-06
申请号：US10543454
申请日：2004-01-28
申请人： Tadahiro Ohmi , Shigetoshi Sugawa , Kiwamu Takehisa
发明人： Tadahiro Ohmi , Shigetoshi Sugawa , Kiwamu Takehisa
IPC分类号： G03B27/54 , G03B27/52
CPC分类号： G03F7/70283 , G03F7/70291
摘要： Laser light in a pattern reflected by a two-dimensional array micromirror 106 that is controlled on the basis of mask data of a mask pattern data output device 107 forms an enlarged pattern 110. This enlarged pattern is projected in a reduced manner onto a mask substrate 109 through a reduction-projection optical system 102, thereby forming a lithography pattern 111. Since a large number of patterns are written in an instant by the two-dimensional array micromirror 106, a time required for lithography the entire mask pattern is extremely shortened as compared with a conventional one. As a result, the mask cost can be largely reduced.
摘要翻译：由基于掩模图案数据输出装置107的掩模数据控制的由二维阵列微镜106反射的图案的激光形成放大图案110.该放大图案以减小的方式投影到掩模基板上通过缩小投影光学系统102，从而形成光刻图案111.由于通过二维阵列微镜106瞬时写入大量图案，因此平版印刷整个掩模图案所需的时间被极大地缩短为与传统的相比。结果，掩模成本可以大大降低。

5. 发明授权

US06839373B1 Ultra-narrow band flourine laser apparatus 有权
标题翻译：超窄带激光设备
公开(公告)号：US06839373B1
公开(公告)日：2005-01-04
申请号：US09608964
申请日：2000-06-30
申请人： Kiwamu Takehisa , Hakaru Mizoguchi , Shinji Nagai , Tatsumi Gotou
发明人： Kiwamu Takehisa , Hakaru Mizoguchi , Shinji Nagai , Tatsumi Gotou
IPC分类号： H01S3/223 , B23K26/06 , H01S3/00 , H01S3/08 , H01S3/097 , H01S3/22 , H01S3/225 , H01S3/23
CPC分类号： H01S3/10092 , B23K26/064 , B23K26/0643 , B23K26/0648 , H01S3/005 , H01S3/08059 , H01S3/097 , H01S3/225 , H01S3/2325 , H01S3/2366
摘要： An ultra-narrow band fluorine laser apparatus is provided in which a line width of a fluorine laser can be narrowed to about 0.2 to 0.3 pm without using any band-narrowing element such as an etalon. In an oscillator 11, a laser chamber 15 is provided in a stable type resonator constituted by an output mirror 13 and a totally reflecting mirror 14. The laser chamber 15 is filled with a laser gas at about 0.8 atm. As a result, when discharge is caused in the laser chamber 15 to cause laser oscillation, laser light L10 in a bandwidth of about 0.3 pm is provided. The power of the laser light L10 is increased by an amplifier 12. The amplifier 12 emits laser light L20 in a bandwidth of about 0.3 pm having laser energy of 10 mJ or more.

6. 发明授权

US06560269B1 Fluorine laser device 有权
标题翻译：氟激光装置
公开(公告)号：US06560269B1
公开(公告)日：2003-05-06
申请号：US09625969
申请日：2000-07-26
申请人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
发明人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
IPC分类号： H01S308
CPC分类号： H01S3/08 , H01S3/08004 , H01S3/2258
摘要： Fluorine laser device capable of obtaining laser light with strong monochromatic property and large power is provided. For this purpose, the fluorine laser device is in a fluorine laser device including a laser chamber (2) in which a laser medium including fluorine is contained and is excited to thereby oscillate laser light (11), a front slit (116) disposed in front of said laser chamber (2) and having a front opening (33) for transmitting the laser light (11), and a rear slit (117) disposed behind said laser chamber (2) and having a rear opening (34) for transmitting the laser light (11), at least one of the front slit (116) and the rear slit (117) is a slit (16; 17) in which a slit inclined plane (35) is formed on a surface at a laser chamber side to make one of the front opening (33) and the rear opening (34) convex.
摘要翻译：提供能够获得具有强的单色性能和大功率的激光的氟激光装置。为此，氟激光器件在氟激光器件中，包括激光室（2），其中包含氟的激光介质被包含并激发以激发激光（11），前狭缝（116）设置在所述激光室（2）的前部并具有用于透射激光（11）的前开口（33）和设置在所述激光室（2）后面的后狭缝（117），并且具有用于传输的后开口激光（11），前狭缝（116）和后狭缝（117）中的至少一个是在激光室的表面上形成有狭缝倾斜面（35）的狭缝（16; 17）使前开口（33）和后开口（34）中的一个凸起。

7. 发明申请

US20060104413A1 Mask repeater and mask manufacturing method 审中-公开
标题翻译：掩模中继器和掩模制造方法
公开(公告)号：US20060104413A1
公开(公告)日：2006-05-18
申请号：US10548287
申请日：2004-03-02
申请人： Tadahiro Ohmi , Shigetoshi Sugawa , Kimio Yanagida , Kiwamu Takehisa
发明人： Tadahiro Ohmi , Shigetoshi Sugawa , Kimio Yanagida , Kiwamu Takehisa
IPC分类号： G21K5/00 , G03B27/72 , G03B27/42 , G03F1/00
CPC分类号： G03F7/70425 , G03F7/70291 , G03F7/70358 , G03F7/70433 , G03F7/70441 , G03F7/70466 , G03F7/70475 , G03F7/70866
摘要： A mask repeater for transferring the pattern of a master mask onto a real mask by exposure and transferring the pattern on the real mask onto a substrate such as a semiconductor wafer. The size of the master mask is larger than that of the real mask. By using an optical system for reduction-projecting soft X-rays, a 1:1 magnification mask, which is the next generation mask, is fabricated. In a scan exposure system, the shape of a slit used for scanning is made fixed, and exposure is conducted only for the exposed region to realize oblique exposure. When the shape of the slit is a trapezoid and when the exposed region is reciprocated in the scanning direction, the number of joint exposures can be decreased.
摘要翻译：一种掩模中继器，用于通过曝光将主掩模的图案转印到真实掩模上，并将真实掩模上的图案转印到诸如半导体晶片的基板上。主掩模的尺寸大于真面罩的尺寸。通过使用用于还原投射软X射线的光学系统，制造作为下一代掩模的1：1放大掩模。在扫描曝光系统中，用于扫描的狭缝的形状被固定，并且仅对曝光区域进行曝光以实现倾斜曝光。当狭缝的形状是梯形时，并且当暴露区域沿扫描方向往复运动时，可以减少关节暴露的次数。

8. 发明授权

US06819699B1 Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权
标题翻译： Arf准分子激光装置，扫描型曝光装置和紫外线激光装置
公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译：用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体控制器向准分子激光气体添加痕量的氙气。因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

9. 发明授权

US06594291B1 Ultra narrow band fluorine laser apparatus and fluorine exposure apparatus 有权
标题翻译：超窄带氟激光装置和氟曝光装置
公开(公告)号：US06594291B1
公开(公告)日：2003-07-15
申请号：US09589274
申请日：2000-06-08
申请人： Kiwamu Takehisa
发明人： Kiwamu Takehisa
IPC分类号： H01S313
CPC分类号： H01S3/225 , H01S3/08004 , H01S3/08036 , H01S3/082 , H01S3/0823 , H01S3/1062 , H01S3/2251 , H01S3/2325
摘要： An etalon as a wavelength selection element is configured by an optical element whose transmittance or reflectivity cyclically varies, such that, of two oscillation lines of different wavelengths and light intensities in fluorine laser, when a center wavelength of an oscillation line having a stronger light intensity is situated at one selected wavelength in the element, a center wavelength of an oscillation line having a weaker light intensity is situated between two adjacent selected wavelengths in the element. Accordingly, it is possible to oscillate an ultra narrow band fluorine laser apparatus by one line only, a wavelength width of this line can be narrowed to about 0.2 pm, and the drop in laser output can be reduced. By monitoring the laser output (output characteristics) with the etalon serving as the wavelength selection element, the wavelength selected by the etalon can be adjusted so as to maximize the output of the laser output from the etalon. Thus, the wavelength of laser light of a fluorine laser, which has been band-narrowed from 1-2 pm to about 0.2 pm, can be calibrated accurately.
摘要翻译：作为波长选择元件的标准具由透光率或反射率循环变化的光学元件构成，使得当氟激光中的两个不同波长的振荡线和光强度的两个振荡线具有较强的光强度的振荡线的中心波长位于元件中的一个选定波长处，具有较弱光强度的振荡线的中心波长位于元件中两个相邻选定波长之间。因此，可以将超窄带氟激光装置振荡一行，该线的波长宽度可以变窄到约0.2μm，并且可以降低激光输出的下降。通过用作为波长选择元件的标准具监测激光输出（输出特性），可以调节由标准具选择的波长，以使得从标准具的激光输出的输出最大化。因此，可以精确地校准已经从1-2μm到约0.2μm的带狭窄的氟激光器的激光波长。

10. 发明授权

US4643889A System for generation of singlet-delta oxygen 失效
标题翻译：用于产生单重态三氧化氮的系统
公开(公告)号：US4643889A
公开(公告)日：1987-02-17
申请号：US846254
申请日：1986-03-31
申请人： Taro Uchiyama , Kiwamu Takehisa , Isao Ishizaki
发明人： Taro Uchiyama , Kiwamu Takehisa , Isao Ishizaki
IPC分类号： C01B13/02 , C01B13/00
CPC分类号： C01B13/02
摘要： A process for generating an excited molecular oxygen by a procedure which comprises causing a mixture of an alkaline aqueous solution with hydrogen peroxide to wet the surface portion of a layer of a hydrophilic and gas-pervious material, causing a molecular chlorine-containing gas to penetrate said layer from the side opposite said surface thereof, enabling said gas during the penetration thereof through said material to react with said mixed aqueous solution which has wetted said surface portion of said material, and thereby inducing generation of said excited molecular oxygen, O.sub.2 (.sup.1 .DELTA.), through said surface portion of said layer wetted by said mixed aqueous solution.
摘要翻译：通过包括使碱性水溶液与过氧化氢的混合物润湿亲水和气体可透过材料层的表面部分，使分子含氯气体渗透的方法产生激发的分子氧的方法所述层从与所述表面相对的一侧，使得所述气体在其穿透所述材料期间与所述混合水溶液反应，所述混合水溶液润湿所述材料的所述表面部分，从而引起所述激发的分子氧O 2（1 DELTA），通过由所述混合水溶液润湿的所述层的所述表面部分。

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