专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06560269B1 Fluorine laser device 有权
标题翻译：氟激光装置
公开(公告)号：US06560269B1
公开(公告)日：2003-05-06
申请号：US09625969
申请日：2000-07-26
申请人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
发明人： Kiwamu Takehisa , Tatsuya Ariga , Osamu Wakabayashi
IPC分类号： H01S308
CPC分类号： H01S3/08 , H01S3/08004 , H01S3/2258
摘要： Fluorine laser device capable of obtaining laser light with strong monochromatic property and large power is provided. For this purpose, the fluorine laser device is in a fluorine laser device including a laser chamber (2) in which a laser medium including fluorine is contained and is excited to thereby oscillate laser light (11), a front slit (116) disposed in front of said laser chamber (2) and having a front opening (33) for transmitting the laser light (11), and a rear slit (117) disposed behind said laser chamber (2) and having a rear opening (34) for transmitting the laser light (11), at least one of the front slit (116) and the rear slit (117) is a slit (16; 17) in which a slit inclined plane (35) is formed on a surface at a laser chamber side to make one of the front opening (33) and the rear opening (34) convex.
摘要翻译：提供能够获得具有强的单色性能和大功率的激光的氟激光装置。为此，氟激光器件在氟激光器件中，包括激光室（2），其中包含氟的激光介质被包含并激发以激发激光（11），前狭缝（116）设置在所述激光室（2）的前部并具有用于透射激光（11）的前开口（33）和设置在所述激光室（2）后面的后狭缝（117），并且具有用于传输的后开口激光（11），前狭缝（116）和后狭缝（117）中的至少一个是在激光室的表面上形成有狭缝倾斜面（35）的狭缝（16; 17）使前开口（33）和后开口（34）中的一个凸起。

2. 发明授权

US06819699B1 Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权
标题翻译： Arf准分子激光装置，扫描型曝光装置和紫外线激光装置
公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译：用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体控制器向准分子激光气体添加痕量的氙气。因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

3. 发明授权

US06628682B1 Wavelength detection device for line-narrowed laser apparatus and ultra line-narrowed fluorine laser apparatus 有权
标题翻译：线窄激光装置和超线窄氟激光装置的波长检测装置
公开(公告)号：US06628682B1
公开(公告)日：2003-09-30
申请号：US09716411
申请日：2000-11-21
申请人： Kiwamu Takehisa , Kouji Shio , Shinji Nagai , Yasuaki Iwata , Osamu Wakabayashi
发明人： Kiwamu Takehisa , Kouji Shio , Shinji Nagai , Yasuaki Iwata , Osamu Wakabayashi
IPC分类号： H01S313
CPC分类号： H01S3/225 , H01S3/137 , H01S3/139 , H01S3/2258
摘要： Of spontaneous emission beams emitted from a laser medium but not line-narrowed, a spontaneous emission beam whose wavelength approximates a narrowed emission beam and whose light intensity is equal to or higher than a certain level is used as a reference light.
摘要翻译：从激光介质发射而不是线窄的自发发射光束，其波长近似于发射光束并且光强度等于或高于某一水平的自发发射光束被用作参考光。

4. 发明申请

US20060104413A1 Mask repeater and mask manufacturing method 审中-公开
标题翻译：掩模中继器和掩模制造方法
公开(公告)号：US20060104413A1
公开(公告)日：2006-05-18
申请号：US10548287
申请日：2004-03-02
申请人： Tadahiro Ohmi , Shigetoshi Sugawa , Kimio Yanagida , Kiwamu Takehisa
发明人： Tadahiro Ohmi , Shigetoshi Sugawa , Kimio Yanagida , Kiwamu Takehisa
IPC分类号： G21K5/00 , G03B27/72 , G03B27/42 , G03F1/00
CPC分类号： G03F7/70425 , G03F7/70291 , G03F7/70358 , G03F7/70433 , G03F7/70441 , G03F7/70466 , G03F7/70475 , G03F7/70866
摘要： A mask repeater for transferring the pattern of a master mask onto a real mask by exposure and transferring the pattern on the real mask onto a substrate such as a semiconductor wafer. The size of the master mask is larger than that of the real mask. By using an optical system for reduction-projecting soft X-rays, a 1:1 magnification mask, which is the next generation mask, is fabricated. In a scan exposure system, the shape of a slit used for scanning is made fixed, and exposure is conducted only for the exposed region to realize oblique exposure. When the shape of the slit is a trapezoid and when the exposed region is reciprocated in the scanning direction, the number of joint exposures can be decreased.
摘要翻译：一种掩模中继器，用于通过曝光将主掩模的图案转印到真实掩模上，并将真实掩模上的图案转印到诸如半导体晶片的基板上。主掩模的尺寸大于真面罩的尺寸。通过使用用于还原投射软X射线的光学系统，制造作为下一代掩模的1：1放大掩模。在扫描曝光系统中，用于扫描的狭缝的形状被固定，并且仅对曝光区域进行曝光以实现倾斜曝光。当狭缝的形状是梯形时，并且当暴露区域沿扫描方向往复运动时，可以减少关节暴露的次数。

5. 发明授权

US06594291B1 Ultra narrow band fluorine laser apparatus and fluorine exposure apparatus 有权
标题翻译：超窄带氟激光装置和氟曝光装置
公开(公告)号：US06594291B1
公开(公告)日：2003-07-15
申请号：US09589274
申请日：2000-06-08
申请人： Kiwamu Takehisa
发明人： Kiwamu Takehisa
IPC分类号： H01S313
CPC分类号： H01S3/225 , H01S3/08004 , H01S3/08036 , H01S3/082 , H01S3/0823 , H01S3/1062 , H01S3/2251 , H01S3/2325
摘要： An etalon as a wavelength selection element is configured by an optical element whose transmittance or reflectivity cyclically varies, such that, of two oscillation lines of different wavelengths and light intensities in fluorine laser, when a center wavelength of an oscillation line having a stronger light intensity is situated at one selected wavelength in the element, a center wavelength of an oscillation line having a weaker light intensity is situated between two adjacent selected wavelengths in the element. Accordingly, it is possible to oscillate an ultra narrow band fluorine laser apparatus by one line only, a wavelength width of this line can be narrowed to about 0.2 pm, and the drop in laser output can be reduced. By monitoring the laser output (output characteristics) with the etalon serving as the wavelength selection element, the wavelength selected by the etalon can be adjusted so as to maximize the output of the laser output from the etalon. Thus, the wavelength of laser light of a fluorine laser, which has been band-narrowed from 1-2 pm to about 0.2 pm, can be calibrated accurately.
摘要翻译：作为波长选择元件的标准具由透光率或反射率循环变化的光学元件构成，使得当氟激光中的两个不同波长的振荡线和光强度的两个振荡线具有较强的光强度的振荡线的中心波长位于元件中的一个选定波长处，具有较弱光强度的振荡线的中心波长位于元件中两个相邻选定波长之间。因此，可以将超窄带氟激光装置振荡一行，该线的波长宽度可以变窄到约0.2μm，并且可以降低激光输出的下降。通过用作为波长选择元件的标准具监测激光输出（输出特性），可以调节由标准具选择的波长，以使得从标准具的激光输出的输出最大化。因此，可以精确地校准已经从1-2μm到约0.2μm的带狭窄的氟激光器的激光波长。

6. 发明授权

US4643889A System for generation of singlet-delta oxygen 失效
标题翻译：用于产生单重态三氧化氮的系统
公开(公告)号：US4643889A
公开(公告)日：1987-02-17
申请号：US846254
申请日：1986-03-31
申请人： Taro Uchiyama , Kiwamu Takehisa , Isao Ishizaki
发明人： Taro Uchiyama , Kiwamu Takehisa , Isao Ishizaki
IPC分类号： C01B13/02 , C01B13/00
CPC分类号： C01B13/02
摘要： A process for generating an excited molecular oxygen by a procedure which comprises causing a mixture of an alkaline aqueous solution with hydrogen peroxide to wet the surface portion of a layer of a hydrophilic and gas-pervious material, causing a molecular chlorine-containing gas to penetrate said layer from the side opposite said surface thereof, enabling said gas during the penetration thereof through said material to react with said mixed aqueous solution which has wetted said surface portion of said material, and thereby inducing generation of said excited molecular oxygen, O.sub.2 (.sup.1 .DELTA.), through said surface portion of said layer wetted by said mixed aqueous solution.
摘要翻译：通过包括使碱性水溶液与过氧化氢的混合物润湿亲水和气体可透过材料层的表面部分，使分子含氯气体渗透的方法产生激发的分子氧的方法所述层从与所述表面相对的一侧，使得所述气体在其穿透所述材料期间与所述混合水溶液反应，所述混合水溶液润湿所述材料的所述表面部分，从而引起所述激发的分子氧O 2（1 DELTA），通过由所述混合水溶液润湿的所述层的所述表面部分。

7. 发明申请

US20150171591A1 OXYGEN LASER OSCILLATOR 审中-公开
标题翻译：氧气激光振荡器
公开(公告)号：US20150171591A1
公开(公告)日：2015-06-18
申请号：US14237006
申请日：2013-10-21
申请人： Kiwamu Takehisa
发明人： Kiwamu Takehisa
IPC分类号： H01S3/123 , H01S3/097 , H01S3/08 , H01S3/034 , H01S3/22 , H01S3/104
CPC分类号： H01S3/123 , H01S3/034 , H01S3/036 , H01S3/08059 , H01S3/081 , H01S3/0815 , H01S3/0816 , H01S3/0817 , H01S3/0818 , H01S3/0835 , H01S3/095 , H01S3/097 , H01S3/104 , H01S3/121 , H01S3/134 , H01S3/22 , H01S3/223
摘要： The disclosed invention relates to a method of realizing an oxygen laser oscillator. The laser oscillator relating to one aspect of the invention is provided with a laser cavity consisting of a high-reflectivity mirror (108) and a partial-reflectivity output mirror (107), a singlet oxygen generator (105), a focusing optics (109), and a shutter (113). Singlet oxygen (O2(1Δg)) is supplied to the chamber (102A) which is pumped beforehand by a vacuum pump. In order to produce a laser oscillation, the shutter (113) is pulled out so that the radiation from O2(1Δg) goes back and forth inside the laser cavity. This causes a stimulated emission from O2(1Δg), and a pulsed laser is extracted from the output mirror (107).
摘要翻译：所公开的发明涉及一种实现氧激光振荡器的方法。涉及本发明的一个方面的激光振荡器设置有由高反射率反射镜（108）和部分反射率输出镜（107），单线态氧发生器（105），聚焦光学元件（109））和快门（113）。将单线态氧（O2（1＆Dgr; g））供给到由真空泵预先泵送的室（102A）。为了产生激光振荡，拉出快门（113），使得来自O2（1＆Dgr; g）的辐射在激光腔内前后移动。这导致来自O2（1＆Dgr; g）的受激发射，并且从输出反射镜（107）中提取脉冲激光。

8. 发明授权

US08130340B2 Liquid crystal display and light guide plate 失效
标题翻译：液晶显示屏和导光板
公开(公告)号：US08130340B2
公开(公告)日：2012-03-06
申请号：US11990751
申请日：2006-08-14
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Kiwamu Takehisa , Mitsuo Matsumoto , Tokuo Ikari , Toshiaki Sato , Ikuo Onishi , Etsuo Nakazato , Yuichiro Yamada , Tokihiko Shinomiya , Takashi Ishizumi , Yuhsaku Ajichi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Kiwamu Takehisa , Mitsuo Matsumoto , Tokuo Ikari , Toshiaki Sato , Ikuo Onishi , Etsuo Nakazato , Yuichiro Yamada , Tokihiko Shinomiya , Takashi Ishizumi , Yuhsaku Ajichi
IPC分类号： G02F1/13357
CPC分类号： G02B6/0046 , G02B6/002 , G02B6/0053 , G02F1/133605 , G02F1/133611 , G02F1/133615
摘要： A large liquid crystal display (100) comprises a light guide plate (3) arranged on the back side of a liquid crystal panel (1). The front surface of the light guide plate (3) is flat, while the back surface thereof is concave. The upper and lower end faces of the light guide plate (3) respectively facing hot cathode fluorescent lamps (2a, 2b) have a convex shape projecting toward the respective lamps. White light from the fluorescent lamps is incident on the upper and lower end faces of the light guide plate directly or by being reflected by reflectors (4a, 4b), and propagates within the light guide plate while being reflected by the front and back surfaces of the light guide plate. At the front surface of the light guide plate, a part of the white light is directed toward the back side of the liquid crystal panel (1) by a light guide portion (5).
摘要翻译：大型液晶显示器（100）包括布置在液晶面板（1）背面的导光板（3）。导光板（3）的前表面是平坦的，而其后表面是凹形的。分别面对热阴极荧光灯（2a，2b）的导光板（3）的上端面和下端面具有向各个灯突出的凸形。来自荧光灯的白光直接入射到导光板的上端面和下端面，或者被反射器（4a，4b）反射，并在导光板内传播，同时由导光板的正面和背面反射导光板。在导光板的前表面，一部分白光通过导光部（5）指向液晶面板（1）的背面。

9. 发明申请

US20090168191A1 PHOTOMASK INSPECTION APPARATUS 有权
标题翻译：光电检测设备
公开(公告)号：US20090168191A1
公开(公告)日：2009-07-02
申请号：US11964318
申请日：2007-12-26
申请人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
发明人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
IPC分类号： G02B3/12
CPC分类号： G03F1/84
摘要： According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.
摘要翻译：根据本发明的一个方面，提供了一种光掩模检查装置，其观察设置在掩模的掩模基板上的图案，以检查包括物镜的掩模和存在于侧面的最后一个透镜之间的液体更靠近物镜的掩模和掩模。

10. 发明申请

US20080144148A1 ILLUMINATION APPARATUS AND ILLUMINATION METHOD 有权
标题翻译：照明装置和照明方法
公开(公告)号：US20080144148A1
公开(公告)日：2008-06-19
申请号：US11959051
申请日：2007-12-18
申请人： Haruhiko Kusunose , Kiwamu Takehisa
发明人： Haruhiko Kusunose , Kiwamu Takehisa
IPC分类号： G02B26/08
CPC分类号： G02B27/0944 , G02B27/0933 , G02B27/0994
摘要： According to one aspect of the present invention, there is provided an illumination apparatus 110 including a laser source 11, a two dimensional diffraction optics 13 on which laser beam from the laser source is made incident, a rectangular rod 14 on which diffraction beams from the two dimensional diffraction optics 13 are made incident and through which incident beams travel while repeating total reflection, and a galvano mirror 12 changing an incident position of the diffraction beams from the two dimensional diffraction optics 13 in an incident end surface of the rectangular rod 14.
摘要翻译：根据本发明的一个方面，提供了一种照明装置110，其包括激光源11，来自激光源的激光束入射的二维衍射光学元件13，矩形棒14，来自二维衍射光学器件13被入射并且入射光束在重复全反射的同时移动，并且电流镜12在矩形棒14的入射端面中改变来自二维衍射光学元件13的衍射光束的入射位置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式