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1. 发明申请

US20120295451A1 Magnetic connecting device 审中-公开
标题翻译：磁连接装置
公开(公告)号：US20120295451A1
公开(公告)日：2012-11-22
申请号：US13349850
申请日：2012-01-13
申请人： Kim Hyun-Jun , Youn Dae-Young , Jeong Seung-Ju , Kim Jung Gyo , Kim Hyo-Nam
发明人： Kim Hyun-Jun , Youn Dae-Young , Jeong Seung-Ju , Kim Jung Gyo , Kim Hyo-Nam
IPC分类号： H01R11/30
CPC分类号： H01R13/6205
摘要： The present invention relates to a magnetic connecting device, which is magnetically and electrically coupled to an external device via a communication-type magnetic connector and is configured to transfer operating power to the external device after checking the external device using communication when the external device is coupled to the connecting device, thus ensuring convenience and safety in use. The magnetic connecting device includes a plurality of power terminals magnetically coupled to a connector of an external device and configured to transfer power to the external device, and at least one communication terminal arranged adjacent to the plurality of power terminals and configured to come into contact with the connector of the external device and to transmit or receive data when the external device is coupled.
摘要翻译：磁连接装置技术领域本发明涉及一种磁连接装置，其通过通信型磁性连接器磁耦合到外部装置，并且被配置为当外部装置是外部装置时使用通信检查外部装置之后将工作电力传送到外部装置耦合到连接装置，从而确保使用方便和安全。磁性连接装置包括多个电力端子，磁性地耦合到外部设备的连接器并且被配置为将功率传递到外部设备，以及至少一个通信终端，其布置成与多个电源端子相邻并被配置为与外部设备的连接器，并且当外部设备耦合时发送或接收数据。

2. 发明授权

US06403461B1 Method to reduce capacitance between metal lines 有权
标题翻译：降低金属线之间电容的方法
公开(公告)号：US06403461B1
公开(公告)日：2002-06-11
申请号：US09912606
申请日：2001-07-25
申请人： Kim-Hyun Tae , Chok-Kho Liep , Choi-Byoung Il
发明人： Kim-Hyun Tae , Chok-Kho Liep , Choi-Byoung Il
IPC分类号： H01L214763
CPC分类号： H01L21/76807 , H01L21/7682 , H01L21/76885 , H01L23/5222 , H01L23/5329 , H01L2221/1026 , H01L2924/0002 , H01L2924/00
摘要： A process for reducing device capacitance via inclusion of an air gap in a low dielectric constant (low k), layer, used to fill narrow spaces between metal lines, has been developed. The process features the formation of dual damascene metal lines, comprised with a narrow space between the top portions of the dual damascene metal structures, and a wider space between bottom portions of these same structures. Deposition of a low k layer, using a deposition procedure lacking acceptable conformality properties, results in the narrow space between top portions of the dual damascene metal structures being completely filled with low k layer, while the wider space located between bottom portions of the metal structures remains unfilled. The unfilled portion of the low k layer now features an embedded air gap, resulting in decreased capacitance for the dielectric layer located between metal lines, thus reducing performance degrading RC delays.
摘要翻译：已经开发了用于通过包含用于填充金属线之间的狭窄空间的低介电常数（低k）层中的气隙来降低器件电容的工艺。该方法的特征在于形成双镶嵌金属线，其包括在双镶嵌金属结构的顶部之间的狭窄空间以及这些相同结构的底部之间较宽的空间。使用不具有可接受的共形特性的沉积程序沉积低k层导致双镶嵌金属结构的顶部之间的狭窄空间被完全填充低k层，而位于金属结构的底部之间的较宽空间仍未填写低k层的未填充部分现在具有嵌入的气隙，导致位于金属线之间的电介质层的电容降低，从而降低了RC延迟的性能。

3. 发明申请

US20090180808A1 POWER TRANSMISSION APPARATUS AND IMAGE FORMING APPARATUS HAVING THE SAME 有权
标题翻译：电力传输装置和具有该装置的图像形成装置
公开(公告)号：US20090180808A1
公开(公告)日：2009-07-16
申请号：US12252849
申请日：2008-10-16
申请人： Kim Hyun-ho
发明人： Kim Hyun-ho
IPC分类号： G03G15/06 , G03G15/00
CPC分类号： G03G15/234 , G03G2215/00675 , Y10T74/19367
摘要： A power transmission apparatus and an image forming apparatus are provided. The a power transmission apparatus of transmitting driving power to first and second movable members includes: a driving unit which receives the driving power from a driving power source, and which rotates in forward and backward directions; a first driven unit which transmits the driving power to the first movable member; an elastic clutch which is provided between the driving unit and the first driven unit to selectively allow the driving power from the driving unit to be conveyed to the first driven unit based on the direction of the driving power; a second driven unit to convey the driving power to the second movable member regardless of the direction of the driving power so as to allow the second movable member to rotate bi-directionally. The first movable member may be, e.g., a photosensitive body. The second movable member may be, e.g., exit rollers for ejecting processed printing medium out of the image forming apparatus.
摘要翻译：提供电力传输装置和图像形成装置。向第一和第二可移动部件传递驱动力的动力传递装置包括：驱动单元，其从驱动动力源接收驱动力并沿前后方向旋转; 第一驱动单元，其将驱动力传递到第一可动构件; 弹性离合器，设置在所述驱动单元和所述第一从动单元之间，以选择性地允许来自所述驱动单元的驱动力基于所述驱动力的方向被传送到所述第一从动单元; 第二从动单元，用于将驱动力传递到第二可动构件，而与驱动力的方向无关，以允许第二可动构件双向旋转。第一可移动部件可以是例如感光体。第二可动构件可以是例如用于将处理后的打印介质从图像形成装置中排出的出纸辊。

4. 发明申请

US20120206090A1 Charging device using magnets 审中-公开
标题翻译：充电装置使用磁铁
公开(公告)号：US20120206090A1
公开(公告)日：2012-08-16
申请号：US13278278
申请日：2011-10-21
申请人： Kim Hyun-Jun , Youn Dae-Young , Jeong Seung-Ju , Kim Jung Gyo , Kim Hyo-Nam
发明人： Kim Hyun-Jun , Youn Dae-Young , Jeong Seung-Ju , Kim Jung Gyo , Kim Hyo-Nam
IPC分类号： H02J7/00 , H01R11/30
CPC分类号： H02J50/10 , H02J7/025
摘要： A charging device using magnets is disclosed. The charging device using magnets includes a sleeve and a charging pad. The sleeve includes a connector connected to the charging terminal of a mobile terminal, and a plurality of magnetic terminals connected to the connector. The charging pad includes magnetic electrodes which magnetically come into contact with the respective magnetic terminals of the sleeve, and supplies charging power to the magnetic terminals using the magnetic electrodes. The magnetic electrodes of the charging pad are configured such that magnetic forces are attenuated due to magnetic fields of coils or such that repulsive forces are generated between the magnetic electrodes of the charging pad and the magnetic terminals of the sleeve which come into contact with the magnetic electrodes.
摘要翻译：公开了一种使用磁体的充电装置。使用磁体的充电装置包括套筒和充电垫。套筒包括连接到移动终端的充电终端的连接器和连接到连接器的多个磁性端子。充电垫包括磁性地与套筒的各个磁性端子接触的磁极，并且使用该磁性电极向磁性端子提供充电电力。充电垫的磁极被配置为使得磁力由于线圈的磁场而衰减，或者在充电垫的磁极和与磁体接触的套筒的磁性端子之间产生排斥力电极。

5. 发明授权

US07828994B2 Conductive paint compositions for forming conductive coatings on substrates 有权
标题翻译：用于在基材上形成导电涂层的导电涂料组合物
公开(公告)号：US07828994B2
公开(公告)日：2010-11-09
申请号：US11190580
申请日：2005-07-26
申请人： Kim Hyun Don , Chung Hae Ryong , Song Mi Kyung , Bae Chang Seok , Joung Young Gak , Hyun Myung Eok
发明人： Kim Hyun Don , Chung Hae Ryong , Song Mi Kyung , Bae Chang Seok , Joung Young Gak , Hyun Myung Eok
IPC分类号： H01B1/06 , H01B1/24
CPC分类号： C09D5/24 , C08G18/0823 , C08K3/08 , C09D175/06 , C08L2666/54
摘要： A conductive paint composition includes a solvent, metal powder, a rheology control agent and a water-dispersible polyurethane resin therein. The water-dispersible polyurethane resin has at least one aromatic group and a repeat unit of ether therein.
摘要翻译：导电涂料组合物包括溶剂，金属粉末，流变控制剂和水分散性聚氨酯树脂。水分散性聚氨酯树脂具有至少一个芳族基团和其中的醚的重复单元。

6. 发明申请

US20070049621A1 6-Alkylamino-2-methyl-2'-(N-methyl substituted sulfonamido)methyl-2H-1-benzopyran derivative as anti-inflammatory inhibitor 失效
标题翻译： 6-烷基氨基-2-甲基-2' - （N-甲基取代亚磺酰氨基）甲基-2H-1-苯并吡喃衍生物作为抗炎抑制剂
公开(公告)号：US20070049621A1
公开(公告)日：2007-03-01
申请号：US11491320
申请日：2006-07-21
申请人： Young-Dae Gong , Hyae-Gyeong Cheon , Moon-Kook Jeon , Cho Sik , Jong Hwang , Choi Sub , Jeon Suk , Soon-Hee Hwang , Song Sook , Kim Hyun , Sung-eun Yoo
发明人： Young-Dae Gong , Hyae-Gyeong Cheon , Moon-Kook Jeon , Cho Sik , Jong Hwang , Choi Sub , Jeon Suk , Soon-Hee Hwang , Song Sook , Kim Hyun , Sung-eun Yoo
IPC分类号： A61K31/4433 , A61K31/381 , A61K31/353 , C07D409/02 , C07D405/02
CPC分类号： C07D311/58 , C07D405/12 , C07D409/12 , C07D409/14
摘要： The present invention relates to a noble 6-alkylamino-2-methyl-2′-(N-methyl substituted sulfonamido)methyl-2H-1-benzopyran derivative, a method for preparing the same with high efficiency using a parallel synthetic method, one of combinatorial chemical synthetic techniques, and a use of the novel compound showing a high inhibitory effect to 5-lipoxygenase (5-LO) activity for preventing and treating leukotriene (LTA4, B4, C4, D4) activation-related diseases such as inflammatory diseases, rheumatoid arthritis, colitis, asthma and psoriasis.
摘要翻译：本发明涉及6-烷基氨基-2-甲基-2' - （N-甲基取代亚磺酰氨基）甲基-2H-1-苯并吡喃衍生物，其使用平行合成法制备高效的方法，一种的组合化学合成技术的用途，以及对预防和治疗白三烯（LTA4，B4，C4，D4）活化相关疾病如炎性疾病的5-脂氧合酶（5-LO）活性具有高抑制作用的新化合物的用途，类风湿关节炎，结肠炎，哮喘和牛皮癣。

7. 发明授权

US07259072B2 Shallow low energy ion implantation into pad oxide for improving threshold voltage stability 有权
标题翻译：浅层低能离子注入衬垫氧化物，以提高阈值电压稳定性
公开(公告)号：US07259072B2
公开(公告)日：2007-08-21
申请号：US10828887
申请日：2004-04-21
申请人： Yisuo Li , Francis Benistant , Kim Hyun Sik , Zhao Lun
发明人： Yisuo Li , Francis Benistant , Kim Hyun Sik , Zhao Lun
IPC分类号： H01L21/336
CPC分类号： H01L21/2652 , H01L21/823807 , H01L21/823892 , H01L29/78
摘要： A method is described to fabricate a MOSFET device with increased threshold voltage stability. After the pad oxide and pad nitride are deposited on the silicon substrate and shallow trenches are patterned and the pad nitride removed. As+ or P+ species are then implanted using low energy ions of approximately 5 keV into the pad oxide. Conventional As+ or P+ implant follows the shallow implant to form the n-wells. With this procedure of forming a sacrificial shallow implantation oxide layer, surface dopant concentration variation at pad oxide:silicon substrate interface is minimized; and threshold voltage stability variation of the device is significantly decreased.
摘要翻译：描述了一种制造具有增加的阈值电压稳定性的MOSFET器件的方法。在衬底氧化物和衬垫氮化物沉积在硅衬底上并且浅沟槽被图案化并且去除衬垫氮化物之后。然后使用约5keV的低能离子注入到垫氧化物中，将 + /或P + + / 常规作为 +或/或P / N>植入物沿着浅植入物形成n孔。通过形成牺牲浅注入氧化物层的方法，使衬底氧化物：硅衬底界面处的表面掺杂剂浓度变化最小化; 并且器件的阈值电压稳定性变化显着降低。

8. 发明申请

US20060275944A1 CMOS image sensor and method for fabricating the same 审中-公开
标题翻译： CMOS图像传感器及其制造方法
公开(公告)号：US20060275944A1
公开(公告)日：2006-12-07
申请号：US11446659
申请日：2006-06-05
申请人： Kim Hyun
发明人： Kim Hyun
IPC分类号： H01L21/00 , H01L27/10
CPC分类号： H01L27/14625 , H01L27/14621 , H01L27/14645 , H01L27/14685 , H01L27/14689
摘要： A CMOS image sensor and a method of fabricating the same are provided. The CMOS image sensor can incorporate one or more photodiodes formed on a substrate at a regular interval, an interlayer insulating layer formed on the substrate; one or more trenches in the interlayer insulating layer at predetermined locations corresponding to the photodiodes, a color filter layer formed in each of the trenches; and at least one microlens corresponding to a color filter layer formed on the resulting substrate. The sensitivity of the CMOS image sensor is improved by reducing the thickness of the CMOS image sensor by forming the trenches in the interlayer insulating layer and forming the color filters in the trenches.
摘要翻译：提供CMOS图像传感器及其制造方法。 CMOS图像传感器可以以规则的间隔结合在基板上形成的一个或多个光电二极管，形成在基板上的层间绝缘层; 在对应于光电二极管的预定位置处的层间绝缘层中的一个或多个沟槽，形成在每个沟槽中的滤色器层; 以及对应于形成在所得基板上的滤色器层的至少一个微透镜。通过在层间绝缘层中形成沟槽并在沟槽中形成滤色器来减小CMOS图像传感器的厚度来提高CMOS图像传感器的灵敏度。

9. 发明授权

US06350695B1 Pillar process for copper interconnect scheme 失效
标题翻译：铜互连方案的支柱工艺
公开(公告)号：US06350695B1
公开(公告)日：2002-02-26
申请号：US09594414
申请日：2000-06-16
申请人： Kim Hyun Tae , Kim Hock Ang , Kiok Boone Elgin Quek
发明人： Kim Hyun Tae , Kim Hock Ang , Kiok Boone Elgin Quek
IPC分类号： H01L21311
CPC分类号： H01L21/76885
摘要： A method for forming reliable inter-level metal interconnections in semiconductor integrated circuits is described where pillars are formed to connect between different metal layers. A first conductive layer is deposited overlying a substrate. A conductive etch stop layer is deposited overlying the first conductive layer and then patterned to form a mask for the fist conductive layer. This is followed by a deposition of via metal layer overlying the entire surface. A hard mask layer is deposited and patterned to form the mask where via pillars are to be formed. Subsequent anisotropic etching forms pillars in the via met layer and openings in the first conductive layer. An inter-metal dielectric (IMD) layer is deposited covering and filling both the openings in the first conductive layer and in between the via pillars. The surface is then planarized.
摘要翻译：描述了在半导体集成电路中形成可靠的层间金属互连的方法，其中形成支柱以在不同的金属层之间连接。沉积在衬底上的第一导电层。沉积覆盖在第一导电层上的导电蚀刻停止层，然后将其图案化以形成用于第一导电层的掩模。之后是覆盖整个表面的通孔金属层的沉积。沉积硬掩模层并图案化以形成要形成通孔柱的掩模。随后的各向异性蚀刻在通孔结合层中形成柱状并在第一导电层中形成开口。沉积金属间电介质（IMD）层，其覆盖并填充第一导电层中的开口和通孔之间的两个开口。然后将表面平坦化。

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