会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Substrate processing apparatus
    • 基板加工装置
    • US08267037B2
    • 2012-09-18
    • US12166492
    • 2008-07-02
    • Kazuo Sakamoto
    • Kazuo Sakamoto
    • B05C5/02
    • G03F7/162B05C5/0208B05C11/08H01L21/0276
    • A substrate processing apparatus including a holder for rotatably holding a substrate; a coating solution supply nozzle for supplying a coating solution onto a front surface of the substrate to be processed held by the holder; a treatment chamber housing the holder and the coating solution supply nozzle; a cooling device which cools the substrate before the coating solution is supplied to the substrate, to a predetermined temperature; a heating devices which heats the substrate coated with the coating solution to a predetermined temperature; and a transferer that transfers the substrate between the treatment chamber, the cooling device and the heating device, wherein the treatment chamber, the cooling device and the heating device are partitioned from ambient air, and wherein at least the treatment chamber is connected to a gas supply mechanism having a supply source of a gas having a kinematic viscosity coefficient higher than that of air.
    • 一种基板处理装置,包括用于可旋转地保持基板的保持器; 涂料溶液供给喷嘴,用于将涂布溶液供给到由保持器保持的待处理基板的前表面; 容纳所述保持器和所述涂布溶液供给喷嘴的处理室; 冷却装置,其在将所述涂布溶液供给到所述基板之前冷却所述基板至预定温度; 加热装置,其将涂覆有涂层溶液的基材加热至预定温度; 以及在所述处理室,所述冷却装置和所述加热装置之间传送所述基板的转移器,其中所述处理室,所述冷却装置和所述加热装置与环境空气隔开,并且其中至少所述处理室连接到气体 供给机构具有运动粘度系数高于空气的运动粘度系数的气体供给源。
    • 2. 发明申请
    • DATA PROCESSING DEVICE AND MOBILE DEVICE
    • 数据处理设备和移动设备
    • US20110231694A1
    • 2011-09-22
    • US13152676
    • 2011-06-03
    • KAZUO SAKAMOTONaozumi MorinoIkuo Kudo
    • KAZUO SAKAMOTONaozumi MorinoIkuo Kudo
    • G06F1/04
    • G06F5/06G06F1/10
    • A microcomputer is provided having a memory card interface capable of correctly latching data even when a card such as an MMC card is connected thereto. In the microcomputer having an interface with an external device such as a memory card, the interface unit is provided with an output driver connected to an external terminal for outputting a clock signal to output the clock signal and with an equivalent load circuit capable of imparting, to the clock signal extracted from an arbitrary position in a stage previous to the output driver in a clock signal path, delay equivalent to delay resulting from an external load connected to the external terminal in order to generate a clock signal for latching data inputted from the memory card.
    • 即使当诸如MMC卡的卡连接到其上时,也提供具有能够正确地锁存数据的存储卡接口的微型计算机。 在具有与诸如存储卡的外部设备的接口的微型计算机中,接口单元设置有连接到外部端子的输出驱动器,用于输出时钟信号以输出时钟信号,并且具有能够传递时钟信号的等效负载电路, 与从时钟信号路径中的输出驱动器之前的级中的任意位置提取的时钟信号相当于连接到外部端子的外部负载引起的延迟的延迟,以便产生用于锁存从外部端子输入的数据的时钟信号 存储卡。
    • 3. 发明授权
    • Substrate treatment apparatus
    • 基板处理装置
    • US08006636B2
    • 2011-08-30
    • US12177243
    • 2008-07-22
    • Kazuo TeradaKazuo SakamotoTakeshi Uehara
    • Kazuo TeradaKazuo SakamotoTakeshi Uehara
    • B05C11/02B05B15/04
    • H01L21/6715H01L21/67178H01L21/68785
    • A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowing in a radial direction.
    • 本发明的基板处理装置包括:用于可旋转地保持待处理基板的保持装置; 涂布溶液供给喷嘴,用于将涂布溶液供给到保持在保持装置上的被处理基板的前表面上; 处理容器,其上表面打开以容纳它们; 用于从底部排出处理容器中的气氛的排气装置; 设置在处理容器的内周上的多叶离心风扇,用于将衬底的前表面侧的气流流向排气装置; 以及控制器,用于控制与所述基板的旋转数相对应的所述多叶离心风扇的转数,其中所述多叶离心风扇的转数受到控制,使得在圆周方向上流动的湍流气流在 由于基板的旋转而产生的基板被校正成沿径向流动的层流。
    • 4. 发明申请
    • RADIO-CONTROLLED TIMEPIECE AND METHOD OF ASSEMBLING THE SAME
    • 无线电控制时序及其组装方法
    • US20100097895A1
    • 2010-04-22
    • US12449544
    • 2008-03-05
    • Tatsuo SumidaKazuo SakamotoTadashi Yasuoka
    • Tatsuo SumidaKazuo SakamotoTadashi Yasuoka
    • G04C11/02G04B19/24G04D3/00H01Q7/08
    • H01Q7/06G04R60/12H01Q1/273H01Q7/08Y10T29/49018Y10T29/49579
    • A radio-controlled timepiece in which its reception sensitivity is further enhanced. The radio-controlled timepiece includes: an antenna core 11 made of a magnetic material and formed as a single integrated body including a coiled portion (11a) wound with a coil 19 and extension portions 11b and 11c which are located respectively on the end-portion sides; additional cores 15 and 16 made of a magnetic material; magnetism-collection members 17 and 18 made of a magnetic material; a main plate 31 (timepiece substrate) made of a non-magnetic material; a guide member 33 made of a non-magnetic material; and a liquid-crystal-panel supporting frame 32 (magnetism-collection-member supporting members, pressing member) made of a non-magnetic material and having protrusions 32a and 32b (pressing members) formed thereon. When the main plate 31, the guide member 33, and the liquid-crystal-panel supporting frame 32 are assembled together, the protrusions 32a and 32b press the magnetism-collection members, respectively. Thus, the magnetism-collection members 17 and 18 come into contact respectively with the additional cores 15 and 16, and, at the same time, the additional cores 15 and 16 come into contact respectively with the extension portions 11b and 11c of the antenna core 11. Accordingly an antenna-core body with a large single body is formed, which enhances the reception performance.
    • 其接收灵敏度进一步提高的无线电控制式钟表。 无线电遥控钟表包括:由磁性材料制成并形成为单个集成体的天线芯11,其包括卷绕有线圈19的线圈部分(11a)和分别位于端部部分上的延伸部分11b和11c 侧面 由磁性材料制成的附加芯15和16; 由磁性材料制成的磁集合件17和18; 由非磁性材料制成的主板31(钟表基板) 由非磁性材料制成的引导构件33; 以及由非磁性材料制成的具有形成在其上的突起32a和32b(按压构件)的液晶面板支撑框架32(集磁构件支撑构件,按压构件)。 当主板31,引导构件33和液晶面板支撑框架32组装在一起时,突起32a和32b分别按压磁性收集构件。 因此,磁性收集构件17和18分别与附加芯15和16接触,并且同时,附加芯15和16分别与天线芯的延伸部分11b和11c接触 因此,形成具有大的单体的天线芯体,这增强了接收性能。
    • 6. 发明申请
    • SUBSTRATE TREATMENT APPARATUS
    • 基板处理设备
    • US20090025637A1
    • 2009-01-29
    • US12177243
    • 2008-07-22
    • Kazuo TERADAKazuo SakamotoTakeshi Uehara
    • Kazuo TERADAKazuo SakamotoTakeshi Uehara
    • B05C13/00
    • H01L21/6715H01L21/67178H01L21/68785
    • A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowing in a radial direction.
    • 本发明的基板处理装置包括:用于可旋转地保持待处理基板的保持装置; 涂布溶液供给喷嘴,用于将涂布溶液供给到保持在保持装置上的被处理基板的前表面上; 处理容器,其上表面打开以容纳它们; 用于从底部排出处理容器中的气氛的排气装置; 设置在处理容器的内周上的多叶离心风扇,用于将衬底的前表面侧的气流流向排气装置; 以及控制器,用于控制与所述基板的旋转数相对应的所述多叶离心风扇的转数,其中所述多叶离心风扇的转数受到控制,使得在圆周方向上流动的湍流气流在 由于基板的旋转而产生的基板被校正成沿径向流动的层流。
    • 7. 发明授权
    • Method and apparatus for semi-molten metal injection molding
    • 半熔融金属注射成型的方法和装置
    • US06619370B2
    • 2003-09-16
    • US09345487
    • 1999-07-01
    • Kazuo SakamotoKyoso IshidaYukio Yamamoto
    • Kazuo SakamotoKyoso IshidaYukio Yamamoto
    • B22D2709
    • B22D17/007Y10S164/90
    • In a semi-molten metal injection molding method of producing a thin molded product by injecting a semi-molten metal M of a magnesium alloy, in a semi-melting state, into a cavity of a mold through a product gate, characterized in that it is made possible to obtain a high-quality thin molded product by maintaining satisfactory fluidity of the semi-molten metal M. A grain size of the solid fraction in the melt M is set to not more than 0.13 times the average thickness of the product portion of the thin molded product and a molten metal velocity at the product gate is set to not less than 30 m/s and, moreover, a solid fraction Fs (%) of the semi-molten metal M and a grain size D (&mgr;m) of the solid phase of the semi-molten metal M are set so as to define the relationship Fs×D≦1500.
    • 在半熔融金属注射成型方法中,通过将半熔融状态的镁合金的半熔融金属M通过产品浇口注入到模具的空腔中来制造薄的模制产品,其特征在于, 可以通过保持半熔融金属M的令人满意的流动性来获得高质量的薄模制品。熔体M中的固体部分的晶粒尺寸被设定为产品部分的平均厚度的0.13倍以下 的薄模制品和产品浇口处的熔融金属速度设定为不小于30m / s,此外,半熔融金属M的固体分率Fs(%)和晶粒尺寸D(母体) 设定半熔融金属M的固相以定义FsxD <= 1500的关系。
    • 8. 发明授权
    • Method and apparatus for semi-molten metal injection molding
    • 半熔融金属注射成型的方法和装置
    • US06470956B2
    • 2002-10-29
    • US09924847
    • 2001-08-09
    • Kazuo SakamotoKyoso IshidaYukio Yamamoto
    • Kazuo SakamotoKyoso IshidaYukio Yamamoto
    • B22D2709
    • B22D17/007Y10S164/90
    • In a semi-molten metal injection molding method of producing a thick molded article by injecting a semi-molten melt M of a magnesium alloy, in a semi-melting state, into a cavity 13 of a mold 11 through a product gate 17, characterized in that it is made possible to obtain a high-quality thick molded article free from internal defects. A solid fraction of the semi-molten melt M is set to not less than 10%, and more preferably within a range of 40 to 80%. A sectional area Sg of a product gate portion of the thick molded article corresponding to the product gate 17 is set to not less than 0.1 times a sectional area Sp in the vicinity of the product gate 17 in the product portion corresponding to the cavity 13. Furthermore, a product gate velocity Vg mm/s of the semi-molten melt M, a sectional area Sg mm2 of the product gate portion of the thick molded article and a volume Vp mm3 of the product portion are set so as to satisfy the following relationships: Vg≦8.0×104; and, Vg×Sg/Vp≧10.
    • 在半熔融金属注射成型方法中,通过将半熔融状态的镁合金的半熔融熔体M通过产品浇口17注入到模具11的空腔13中来制造厚的模制品,其特征在于 因为可以获得没有内部缺陷的高品质的厚模制品。 将半熔融熔融物M的固体成分设定为10%以上,更优选在40〜80%的范围内。 对应于产品门17的厚模制品的产品浇口部分的截面面积Sg被设定为与空腔13相对应的产品部分中的产品浇口17附近的截面面积Sp的0.1倍以上。 此外,将半熔融熔体M的产品闸门速度Vg mm / s,厚的成形品的产品门部的截面积Sg mm2和产品部分的体积Vp mm3设定为满足以下条件 关系:Vg <= 8.0×104; VgxSg / Vp> = 10。
    • 9. 发明授权
    • Coating apparatus
    • 涂装设备
    • US06391111B1
    • 2002-05-21
    • US09231659
    • 1999-01-15
    • Akihiro FujimotoKazuo SakamotoNobukazu IshizakaIzumi Hasegawa
    • Akihiro FujimotoKazuo SakamotoNobukazu IshizakaIzumi Hasegawa
    • B05B1302
    • B05C11/1034B05C11/08B05C11/1026B05C11/1047H01L21/6715H01L21/67253
    • To provide a coating apparatus which is capable of making short a lag time up to action of a valve and making operate a discharging pump and a valve with the best timing. By employing electric-air regulators ER1 and ER2 of small size and high response speed as a speed controller for controlling a switching speed of a switching valve AV or a suck-back valve SV, total flowing course is made short, thereby a time lag up to operation of a valve is made short. Further, by detecting the pressure of a resist liquid being discharged from a discharging pump 120 by a pressure sensor 123, and by controlling the operation of each device of a discharging pump 120, a switching valve AV, and a suck-back valve SV through a controller 180, a discharging pump 120, a switching valve AV, and a suck-back valve SV can be operated with the best timings, and generation of particles due to dripping of a resist liquid at a tip end of a resist nozzle 60 is prevented from occurring.
    • 提供一种涂覆装置,其能够使阀的作用更短的滞后时间,并且以最佳时机操作排出泵和阀。 通过采用小型,高响应速度的电气调节器ER1和ER2作为用于控制切换阀AV或回吸阀SV的切换速度的速度控制器,总流程减短,从而时间延迟 使阀门的操作变短。 此外,通过检测由压力传感器123从排出泵120排出的抗蚀剂液体的压力,并且通过控制排出泵120,切换阀AV和回吸阀SV的每个装置的操作,通过 控制器180,排出泵120,切换阀AV和回吸阀SV可以以最佳的时机运行,并且由于抗蚀剂喷嘴60的尖端处的抗蚀剂液体的滴落而产生的颗粒是 防止发生。