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1. 发明申请

US20120140890A1 X-RAY DIFFRACTION APPARATUS AND X-RAY DIFFRACTION MEASUREMENT METHOD 有权
标题翻译： X射线衍射装置和X射线衍射测量方法
公开(公告)号：US20120140890A1
公开(公告)日：2012-06-07
申请号：US13311228
申请日：2011-12-05
申请人： Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
发明人： Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
IPC分类号： G01N23/207 , G01N23/20
CPC分类号： G01N23/207
摘要： There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.
摘要翻译：提供一种X射线衍射装置，其包括用于对从样品的平面区域出射的X射线提供空间几何对应关系以检测X射线作为平面X射线显微照片的X射线形貌装置，以及输出X射线拓扑图作为信号; 二维成像装置，用于接收样品的平面区域的光图像并输出作为由平面位置信息指定的信号的光图像; 以及视频合成算术控制装置，用于根据来自X射线显微图的输出信号和来自成像装置的输出信号产生合成的视频数据。

2. 发明授权

US5063489A Switching regulator having improved switching control arrangement 失效
标题翻译：具有改进的开关控制装置的开关调节器
公开(公告)号：US5063489A
公开(公告)日：1991-11-05
申请号：US505391
申请日：1990-04-06
申请人： Katsuhiko Inaba
发明人： Katsuhiko Inaba
IPC分类号： H02M3/28 , H02M3/335
CPC分类号： H02M3/33523 , Y10S323/902
摘要： In order to obtain a stable dc output from a switching regulator of a type in which a switching control arrangement is provided with an optical coupler, an A-D converter is arranged to provide the optical coupler with a digital error signal. This error signal corresponds to a difference between the regulated dc output and a reference voltage. The digital output of the optical coupler is converted into a corresponding analog signal at a D-A converter. The output of the D-A converter is applied to a comparator and is compared thereat with a reference signal voltage for controlling a switching device.
摘要翻译：为了从开关控制装置提供光耦合器的开关调节器获得稳定的直流输出，A-D转换器被布置成为光耦合器提供数字误差信号。该误差信号对应于稳压直流输出和参考电压之间的差值。光耦合器的数字输出在D-A转换器转换成相应的模拟信号。 D-A转换器的输出被施加到比较器，并将其与用于控制开关器件的参考信号电压进行比较。

3. 发明授权

US09074992B2 X-ray diffraction apparatus and X-ray diffraction measurement method 有权
$X-ray diffraction apparatus and X-ray diffraction measurement method$
标题翻译： X射线衍射装置和X射线衍射测定法
公开(公告)号：US09074992B2
公开(公告)日：2015-07-07
申请号：US13311228
申请日：2011-12-05
申请人： Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
发明人： Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
IPC分类号： G01N23/207 , G01N23/20
CPC分类号： G01N23/207
摘要： There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.
摘要翻译：提供一种X射线衍射装置，其包括用于对从样品的平面区域出射的X射线提供空间几何对应关系以检测X射线作为平面X射线显微照片的X射线形貌装置，以及输出X射线拓扑图作为信号; 二维成像装置，用于接收样品的平面区域的光图像并输出作为由平面位置信息指定的信号的光图像; 以及视频合成算术控制装置，用于根据来自X射线显微镜的输出信号和来自成像装置的输出信号产生合成的视频数据。

4. 发明申请

US20090225946A1 Method and Device for Judging Polarity of Single Crystal Sample 有权
标题翻译：用于判断单晶样品极性的方法和装置
公开(公告)号：US20090225946A1
公开(公告)日：2009-09-10
申请号：US11991495
申请日：2006-08-30
申请人： Katsuhiko Inaba
发明人： Katsuhiko Inaba
IPC分类号： G01N23/207
CPC分类号： G01N23/20
摘要： Wavelength dependence of diffraction X-ray intensity of a single crystal sample is measured using an X-ray incident optical system of simple structure so that the polarity of the single crystal sample can be judged. When the polarity of the {111} face of a GaAs single crystal sample (18) is judged, for example, an X-ray source (10) which can generate X-rays in a predetermined wavelength range including in the middle the wavelength at the K absorption end of Ga, i.e. an X-ray source of Au target, is employed. An X-ray beam (12) emitted from that X-ray source is reflected on a paraboloidal multilayer film mirror (14) to form a parallel beam (16) including an X-ray in a predetermined wavelength range. The sample (18) is irradiated with the parallel beam and the intensity of a diffraction X-ray therefrom is detected by an X-ray detector (22). Wavelength dependence of diffraction X-ray intensity is measured in the wavelength range including the wavelength at the absorption end by performing 2θ/ω scanning. Polarity is judged by determining the ratio of diffraction X-ray intensity on the shorter wavelength side than the absorption end to diffraction X-ray intensity on the longer wavelength side than the absorption on end.
摘要翻译：使用具有简单结构的X射线入射光学系统测量单晶样品的X射线强度的波长依赖性，从而可以判断单晶样品的极性。当判断GaAs单晶样品（18）的{111}面的极性时，例如可以在预定波长范围内产生X射线的X射线源（10）使用Ga的K吸收端，即Au靶的X射线源。从该X射线源射出的X射线束（12）在抛物面多层膜反射镜（14）上反射，形成包含规定波长范围的X射线的平行光束（16）。用平行光束照射样品（18），用X射线检测器（22）检测衍射X射线的强度。衍射的波长依赖性通过进行2θ/ω扫描，在包括吸收端的波长的波长范围内测量X射线强度。通过确定比吸收端更短的波长侧的衍射X射线强度与长波长侧的衍射X射线强度的比值比终端的吸收判定极性。

5. 发明授权

US06970532B2 Method and apparatus for measuring thin film, and thin film deposition system 失效
标题翻译：测量薄膜的方法和装置以及薄膜沉积系统
公开(公告)号：US06970532B2
公开(公告)日：2005-11-29
申请号：US09852111
申请日：2001-05-09
申请人： Seiichi Hayashi , Jimpei Harada , Tetsuo Kikuchi , Kazuhiko Omote , Katsuhiko Inaba
发明人： Seiichi Hayashi , Jimpei Harada , Tetsuo Kikuchi , Kazuhiko Omote , Katsuhiko Inaba
IPC分类号： G01B15/02 , G01N23/20
CPC分类号： C23C14/545 , G01B15/02
摘要： The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.
摘要翻译：用于在设置在密封薄膜沉积炉中的基板的表面上沉积薄膜的薄膜沉积系统包括在与薄膜沉积炉连通的位置处的测量单元，测量单元包括薄膜沉积样品基板，用于允许在测量单元的侧壁上设置X射线入射和提取窗口的同时从薄膜沉积炉流入的薄膜物质，其中在测量单元中的薄膜沉积样品基板上照射X射线通过设置在薄膜沉积炉外部的薄膜测量单元通过X射线入射窗，并且通过X射线提取窗口感测从薄膜沉积样品基底反射的X射线。

6. 发明授权

US07684543B2 X-ray beam conditioning device and X-ray analysis apparatus 有权
标题翻译： X射线束调理装置和X射线分析装置
公开(公告)号：US07684543B2
公开(公告)日：2010-03-23
申请号：US11476888
申请日：2006-06-29
申请人： Ryuji Matsuo , Tetsuya Ozawa , Katsuhiko Inaba , Makoto Aoyagi
发明人： Ryuji Matsuo , Tetsuya Ozawa , Katsuhiko Inaba , Makoto Aoyagi
IPC分类号： G21K1/06
CPC分类号： G01N23/00 , G21K1/06 , G21K2201/062
摘要： An X-ray beam conditioning device that has a crystal holder and a motor is provided. The crystal holder supports a first crystal block and a second crystal block, each of which diffracts X-ray by a specific diffraction angle. The motor can rotate the crystal holder around an axis extending at right angles to a plane including an optical axis of X-ray and can fixedly support the crystal holder at the rotated position. The crystal holder holds the first and second crystal blocks at such angles to each other such that both crystal blocks diffract X-ray. The optical axes of the two crystal blocks can be adjusted by rotating the crystal holder about the axis, that is, the only one axis.
摘要翻译：提供具有晶体保持器和电动机的X射线束调节装置。晶体保持器支撑第一晶体块和第二晶体块，每个晶体块通过特定的衍射角衍射X射线。马达可以使晶体夹持器围绕包括X射线的光轴的平面成直角延伸的轴旋转，并且能够将晶体保持器固定在旋转位置。晶体保持器以彼此相等的角度保持第一和第二晶体块，使得两个晶体块衍射X射线。两个晶体块的光轴可以通过围绕轴线旋转晶体夹持器来调整，也就是说，只有一个轴。

7. 发明授权

US07680246B2 Method and device for judging polarity of single crystal sample 有权
标题翻译：用于判断单晶样品极性的方法和装置
公开(公告)号：US07680246B2
公开(公告)日：2010-03-16
申请号：US11991495
申请日：2006-08-30
申请人： Katsuhiko Inaba
发明人： Katsuhiko Inaba
IPC分类号： G01N23/207
CPC分类号： G01N23/20
摘要： Wavelength dependence of diffraction X-ray intensity of a single crystal sample is measured using an X-ray incident optical system of simple structure so that the polarity of the single crystal sample can be judged. When the polarity of the {111} face of a GaAs single crystal sample (18) is judged, for example, an X-ray source (10) which can generate X-rays in a predetermined wavelength range including in the middle the wavelength at the K absorption end of Ga, i.e. an X-ray source of Au target, is employed. An X-ray beam (12) emitted from that X-ray source is reflected on a paraboloidal multilayer film mirror (14) to form a parallel beam (16) including an X-ray in a predetermined wavelength range. The sample (18) is irradiated with the parallel beam and the intensity of a diffraction X-ray therefrom is detected by an X-ray detector (22). Wavelength dependence of diffraction X-ray intensity is measured in the wavelength range including the wavelength at the absorption end by performing 2θ/ω scanning. Polarity is judged by determining the ratio of diffraction X-ray intensity on the shorter wavelength side than the absorption end to diffraction X-ray intensity on the longer wavelength side than the absorption on end.
摘要翻译：使用具有简单结构的X射线入射光学系统测量单晶样品的X射线强度的波长依赖性，从而可以判断单晶样品的极性。当判断GaAs单晶样品（18）的{111}面的极性时，例如可以在预定波长范围内产生X射线的X射线源（10）使用Ga的K吸收端，即Au靶的X射线源。从该X射线源射出的X射线束（12）在抛物面多层膜反射镜（14）上反射，形成包含规定波长范围的X射线的平行光束（16）。用平行光束照射样品（18），用X射线检测器（22）检测衍射X射线的强度。衍射的波长依赖性通过进行2＆amp; t /ω扫描，在包括吸收端的波长的波长范围内测量X射线强度。通过确定比吸收端更短的波长侧的衍射X射线强度与长波段侧的衍射X射线强度的比值比终端的吸收判定极性。

8. 发明申请

US20070003013A1 X-ray beam conditioning device and X-ray analysis apparatus 有权
标题翻译： X射线束调理装置和X射线分析装置
公开(公告)号：US20070003013A1
公开(公告)日：2007-01-04
申请号：US11476888
申请日：2006-06-29
申请人： Ryuji Matsuo , Tetsuya Ozawa , Katsuhiko Inaba , Makoto Aoyagi
发明人： Ryuji Matsuo , Tetsuya Ozawa , Katsuhiko Inaba , Makoto Aoyagi
IPC分类号： G21K1/06
CPC分类号： G01N23/00 , G21K1/06 , G21K2201/062
摘要： Described herein is an X-ray beam conditioning device that has a crystal holder and a motor. The crystal holder supports a first crystal block and a second crystal block, each of which diffracts X-ray by a specific diffraction angle. The motor can rotate the crystal holder around an axis extending at right angles to a plane including an optical axis of X-ray and can support the crystal holder and fixedly supporting the crystal holder at thus rotated position. The crystal holder holds the first and second crystal blocks at such angles to each other that both crystal blocks diffract X-ray. The optical axes of the two crystal blocks can be adjusted, merely by rotating the crystal holder about said axis, namely only one axis.
摘要翻译：这里描述的是具有晶体保持器和电动机的X射线束调节装置。晶体保持器支撑第一晶体块和第二晶体块，每个晶体块通过特定的衍射角衍射X射线。电机可以使晶体保持器围绕包括X射线的光轴的平面成直角延伸的轴线旋转，并且可以支撑晶体支架并将晶体支架固定地支撑在旋转位置。晶体保持器以彼此相等的角度保持第一和第二晶体块，两个晶体块衍射X射线。只有通过使晶体保持器围绕所述轴线旋转，即只有一个轴，可以调节两个晶体块的光轴。

9. 发明授权

US06999557B2 Method of setting measuring range of reciprocal-space mapping 有权
标题翻译：设置互余空间映射测量范围的方法
公开(公告)号：US06999557B2
公开(公告)日：2006-02-14
申请号：US10854563
申请日：2004-05-25
申请人： Susumu Yamaguchi , Tetsuya Ozawa , Katsuhiko Inaba , Ryuji Matsuo
发明人： Susumu Yamaguchi , Tetsuya Ozawa , Katsuhiko Inaba , Ryuji Matsuo
IPC分类号： G01N23/20
CPC分类号： G01N23/20
摘要： Reciprocal-space mapping measurement of X-ray diffraction requires setting of the measuring range of 2θ/ω and setting of the measuring range of ω. When the measuring range of ω is designated in absolute angle, the absolute-angle-designated range is converted into a relative-angle-designated range to be acquired; preventing setting of a warped measuring region. When the measuring range of ω is designated in relative angle, it is acquired as it is. For the measuring range of 2θ/ω, any one of the absolute-angle-designated range and the relative-angle-designated range may be acquired.
摘要翻译： X射线衍射的互惠空间映射测量需要设置2θ/Ω的测量范围，并设置Ω的测量范围。当以绝对角度指定ω的测量范围时，将绝对角度指定范围转换为要获取的相对角指定范围; 防止翘曲测量区域的设置。当以相对角度指定ω的测量范围时，它被原样获取。对于2θ/ω的测量范围，可以获取绝对角度指定范围和相对角度指定范围中的任何一个。

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