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1. 发明授权

US07667050B2 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US07667050B2
公开(公告)日：2010-02-23
申请号：US11889596
申请日：2007-08-15
申请人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
发明人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
IPC分类号： C07C309/19 , C07D333/46
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中X表示含有至少一个二价脂环族烃基的C 3 -C 30二价基团，并且C 3 -C 30二价基团中的至少一个-CH 2可以被 -O-或-CO-，Y表示可以被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 6羟基烷基，C 1 -C 6烷氧基，羟基和氰基，C3-C30环状烃基中的至少一个-CH2-可以被-O-或-CO-取代，Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子。

2. 发明申请

US20080086014A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 有权
标题翻译：适用于酸产生剂的盐和含有它的化学放大型正性抗蚀剂组合物
公开(公告)号：US20080086014A1
公开(公告)日：2008-04-10
申请号：US11889596
申请日：2007-08-15
申请人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
发明人： Junji Shigematsu , Isao Yoshida , Yukako Harada , Masumi Suetsugu
IPC分类号： C07C303/02
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH2— in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH2— in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中X表示在C 3中含有至少一个二价脂环族烃基的C 3 -C 30二价基团和至少一个-CH 2 - -C30二价基团可以被-O-或-CO-取代，Y表示可被至少一个选自C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 4烷氧基， C 3 -C 30环烃基中的C 1 -C 6羟基烷基，羟基和氰基以及至少一个-CH 2 - 可以被-O-或-CO-取代， Q 1和Q 2各自独立地表示氟原子或C 1 -C 6全氟烷基，并且A H +表示有机抗衡离子。

3. 再颁专利

USRE40964E1 Negative type resist composition 有权
标题翻译：负型抗蚀剂组合物
公开(公告)号：USRE40964E1
公开(公告)日：2009-11-10
申请号：US10664355
申请日：2003-09-17
申请人： Masumi Suetsugu , Takehiro Kusumoto , Naoki Takeyama , Masanori Shinada
发明人： Masumi Suetsugu , Takehiro Kusumoto , Naoki Takeyama , Masanori Shinada
IPC分类号： G03F7/004 , G03F7/038
CPC分类号： G03F7/038 , C08F8/30 , C08F12/26 , C08F293/005 , C08F297/02 , C08F297/026 , C08L53/00 , G03F7/0045 , Y10S430/122 , C08F12/24 , C08L2666/02
摘要： A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents sulfide group, disulfide group or bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.
摘要翻译：提供了负极型抗蚀剂组合物，其提供优异的分辨率，令人满意的轮廓和优异的工艺稳定性; 适用于深紫外线的曝光; 并且包含碱溶性树脂，酸产生剂，交联剂和由下式（I）表示的碱性化合物，其中A表示可任选被亚氨基，硫醚基，或二硫基，X表示氮原子或C（NH 2），R 1和R 2独立地表示氢或烷基。

4. 发明申请

US20080286691A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20080286691A1
公开(公告)日：2008-11-20
申请号：US12121458
申请日：2008-05-15
申请人： Makoto AKITA , Masumi Suetsugu , Kazuhiko Hashimoto
发明人： Makoto AKITA , Masumi Suetsugu , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F8/12 , C08F8/14 , C08F12/22 , C08F212/14 , C08F212/32 , C08F220/18 , C08F2220/1891 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：（ii）由式（II）表示的聚合单元：和（iii）至少一种聚合选自由式（III）表示的聚合单元组的单元和由式（IV）表示的聚合单元：和（B）至少一种酸产生剂。

5. 发明授权

US06284863B1 Polymers having O-substituted vinylphenol unit and resist compositions containing them 失效
标题翻译：具有O-取代的乙烯基苯酚单元的聚合物和含有它们的抗蚀剂组合物
公开(公告)号：US06284863B1
公开(公告)日：2001-09-04
申请号：US09559966
申请日：2000-04-28
申请人： Yoshiteru Ohta , Sang-tae Kim , Masumi Suetsugu
发明人： Yoshiteru Ohta , Sang-tae Kim , Masumi Suetsugu
IPC分类号： C08G6538
CPC分类号： G03F7/039 , C08F8/30 , C08F12/26 , C08F293/005 , C08F297/02 , C08F297/026 , C08L53/00 , G03F7/0045 , G03F7/038 , C08F12/24 , C08L2666/02
摘要： A polymer having an O-substituted vinylphenol unit represented by the following formula (I) wherein R1, R2 and R3 represent an alkyl; or R1 and R2, R1 and R3 or R2 and R3 are bound together and respectively form an alkylene; or R2 is methylidyne wherein one bond in the methylidyne is bound to R1, the other bond is bound to R3, and R1 and R3 represent alkylene, and a resist composition comprising the polymer are provided.
摘要翻译：具有由下式（I）表示的O-取代的乙烯基苯酚单元的聚合物，其中R 1，R 2和R 3表示烷基; 或R 1和R 2，R 1和R 3或R 2和R 3结合在一起并分别形成亚烷基; 或R 2是亚甲基，其中甲基炔中的一个键与R 1结合，另一个键与R 3结合，并且R 1和R 3表示亚烷基，并且提供包含该聚合物的抗蚀剂组合物。

6. 发明申请

US20080153036A1 Chemically amplified positive resist compostion 有权
标题翻译：化学放大阳性抗蚀剂组合
公开(公告)号：US20080153036A1
公开(公告)日：2008-06-26
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

7. 发明授权

US07144674B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07144674B2
公开(公告)日：2006-12-05
申请号：US10390903
申请日：2003-03-19
申请人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
发明人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： The present invention provides a positive resist composition comprising (A) at least one resin selected from the group consisting of {circle around (1)} resin which is itself insoluble or poorly soluble in an alkali aqueous solution but cause a chemical change by the action of an acid to become soluble in an alkali aqueous solution with a proviso that the resin is not novolak resin and {circle around (2)} alkali-soluble resin, (B) novolak resin containing protective group which can be dissociated by the action of an acid and (C) an acid generator.
摘要翻译：本发明提供了一种正型抗蚀剂组合物，其包含（A）至少一种选自以下的树脂：圆周（1个树脂本身不溶于或难溶于碱水溶液，但通过酸溶解在碱性水溶液中，条件是树脂不是酚醛清漆树脂和{圆周（2碱溶性树脂，（B）含有保护基的酚醛清漆树脂，其可以通过酸的作用解离和（ C）酸产生器。

8. 发明授权

US06689531B2 Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US06689531B2
公开(公告)日：2004-02-10
申请号：US10228190
申请日：2002-08-27
申请人： Sang Tae Kim , Seung Jin Kang , Shi Jin Sung , Masumi Suetsugu , Airi Yamada
发明人： Sang Tae Kim , Seung Jin Kang , Shi Jin Sung , Masumi Suetsugu , Airi Yamada
IPC分类号： G03F7023
CPC分类号： C08K5/0008 , C08L61/06
摘要： A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.
摘要翻译：在基板和抗蚀剂的界面上显示优异的紧密附着性的抗蚀剂组合物，改善了湿蚀刻中的问题，灵敏度和分辨率优异，抗蚀性能优异，并且包含通式（I）的化合物：其中， R 1和R 2各自独立地表示氢原子或烷基，R 3表示氢原子，烷基，芳基，芳烷基，烯基，烷基羰基，芳基羰基或芳烷基羰基， n表示1〜40的整数，m表示1〜5的整数，l表示1〜5的整数。

9. 发明授权

US5476320A Developer preparing apparatus and developer preparing method 失效
标题翻译：显影剂制备装置和显影剂制备方法
公开(公告)号：US5476320A
公开(公告)日：1995-12-19
申请号：US338222
申请日：1994-11-09
申请人： Satoshi Taguchi , Masumi Suetsugu , Tsutomu Nagase , Norikazu Nakagawa
发明人： Satoshi Taguchi , Masumi Suetsugu , Tsutomu Nagase , Norikazu Nakagawa
IPC分类号： G03F7/30 , B01F15/04
CPC分类号： G03F7/30 , Y10T137/0329
摘要： A developer preparing apparatus for obtaining a developer containing a developer component having a definite content by mixing an undiluted developer solution containing 5 to 40% by weight of tetramethylammonium hydroxide (TMAH) and pure water, and a developer preparing method for preparing the developer using the developer preparing apparatus. The developer preparing apparatus comprising a mixing bath equipped with a means for receiving and mixing an undiluted developer solution and pure water, an ultrasonic densitometer for measuring the developer component contained in the developer in the mixing bath, a flow rate controlling means for controlling the supplying flow rate of the undiluted developer solution and/or pure water into the mixing bath by the output signal from the ultrasonic densitometer, and a storage tank for receiving and storing the developer containing the developer component having the definite content in the mixing bath.
摘要翻译：一种显影剂制备装置，用于通过混合含有5〜40重量％的四甲基氢氧化铵（TMAH）和纯水的未稀释的显影液，得到含有具有确定含量的显影剂成分的显影剂和显影剂的制备方法，显影剂制备装置。该显影剂制备装置包括配备有用于接收和混合未稀释的显影剂溶液和纯水的装置的混合浴，用于测量混合浴中显影剂中所含的显影剂成分的超声波密度计，用于控制供给的流量控制装置通过来自超声波密度计的输出信号将未稀释的显影剂溶液和/或纯水流入混合槽中的流速;以及储存罐，用于接收和储存含有在混合槽中具有确定含量的显影剂组分的显影剂。

10. 发明授权

US07972763B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07972763B2
公开(公告)日：2011-07-05
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/039
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

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