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1. 发明申请

US20110189618A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110189618A1
公开(公告)日：2011-08-04
申请号：US13062180
申请日：2009-09-01
申请人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
发明人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：抗蚀剂处理方法包括以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B），交联剂（C）和酸放大器（D）的作用将其溶于碱水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）硬烘烤第一抗蚀剂图案，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

2. 发明申请

US20100010129A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100010129A1
公开(公告)日：2010-01-14
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： C08K5/42 , C08L37/00 , C08L55/00
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

3. 发明授权

US08298746B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08298746B2
公开(公告)日：2012-10-30
申请号：US12490828
申请日：2009-06-24
申请人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
发明人： Junji Shigematsu , Kunishige Edamatsu , Takayuki Miyagawa , Akira Kamabuchi
IPC分类号： G03C1/00 , G03F7/00 , G03F7/039
CPC分类号： G03F7/0397 , G03F7/0046
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having —COO— and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II): wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱溶液的树脂（A），其包含具有侧链中的酸不稳定基团和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X1表示未取代或取代的具有-COO-和C3的C 3 -C 30环烃基表示1〜4的整数，由式（II）表示的结构单元构成的树脂（B）：其中R2表示氢原子，甲基或三氟甲基，酸产生剂。

4. 发明申请

US20100273113A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN 审中-公开
标题翻译：生产光电子图案的工艺
公开(公告)号：US20100273113A1
公开(公告)日：2010-10-28
申请号：US12763675
申请日：2010-04-20
申请人： Mitsuhiro HATA , Akira Kamabuchi
发明人： Mitsuhiro HATA , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a process for producing a photoresist pattern that contains steps (1) to (11)as described in the specification.
摘要翻译：本发明提供一种制造光刻胶图案的方法，其包含如说明书中所述的步骤（1）至（11）。

5. 发明授权

US5965748A Succinimide derivative, process for production and use thereof 失效
标题翻译：琥珀酰亚胺衍生物，其制备方法和用途
公开(公告)号：US5965748A
公开(公告)日：1999-10-12
申请号：US54476
申请日：1998-04-03
申请人： Akira Kamabuchi , Naoki Takeyama , Jun Tomioka , Haruyoshi Osaki
发明人： Akira Kamabuchi , Naoki Takeyama , Jun Tomioka , Haruyoshi Osaki
IPC分类号： C07D207/46
CPC分类号： C07D207/46 , Y02P20/55
摘要： N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.
摘要翻译：提供由式（I）表示的N-（10-樟脑磺酰氧基） - 琥珀酰亚胺，其可以通过N-羟基琥珀酰亚胺与10-樟脑磺酸，其盐或其卤化物反应制备。使用该化合物作为酸发生剂，可以通过包括具有通过酸的作用除去的保护基的碱溶性树脂来获得抗蚀剂组合物; 并且抗蚀剂组合物具有优异的耐热性，显影后的残留膜厚度的比例，膜厚度的均匀性，轮廓，感光度和分辨率，并且在时间延迟效应和图案的附着方面得到改善。

6. 发明授权

US08697882B2 Compound, resin and photoresist composition 有权
标题翻译：化合物，树脂和光致抗蚀剂组合物
公开(公告)号：US08697882B2
公开(公告)日：2014-04-15
申请号：US13175072
申请日：2011-07-01
申请人： Hyungjoo Kim , Akira Kamabuchi , Yuichi Mukai
发明人： Hyungjoo Kim , Akira Kamabuchi , Yuichi Mukai
IPC分类号： C07D291/00 , C07D275/02 , C07D275/04 , C07D275/06 , C07C317/30 , C07D291/02
CPC分类号： C07D291/02 , C07C317/30 , C07D275/02 , C07D275/04 , C07D275/06 , C08F220/38 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more —CH2— in the C2-C36 heterocyclic group can be replaced by —CO— or —O—, R2 is independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.
摘要翻译：本发明提供由式（I）表示的化合物：其中R1表示氢原子，卤素原子或可具有一个或多个卤素原子的C1-C6烷基，A1表示二价连接基团，X1表示 C2-C36杂环基和C2-C36杂环基中的一个或多个-CH2-可以被-CO-或-O-替代，R2在每次出现时独立地为卤素原子，羟基，C1-C24烃基团，C 1 -C 12烷氧基，C 2 -C 4酰基或C 2 -C 4酰氧基，m表示0〜10的整数。

7. 发明授权

US08481243B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US08481243B2
公开(公告)日：2013-07-09
申请号：US13345941
申请日：2012-01-09
申请人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
发明人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F20/38 , C07D327/04 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12- (a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中R 1表示任选具有一个或多个卤素原子，氢原子或卤素原子的C 1 -C 6烷基，T 1表示C 4 -C 34磺内酯任选具有一个或多个取代基的环基，Z1表示任选具有一个或多个取代基的C1-C6烷二基或由式（a-1）表示的基团：-A10X10-A11sX11-A12-（a-1）其中 X10和X11各自独立地表示-O-，-NH-，-CO-，-CO-O-，-O-CO-，-CO-NH-或-NH-CO-，A10，A11和A12各自独立地表示任选具有一个或多个取代基的C 1 -C 5二价脂族烃基，s表示0或1，Z 2表示单键或-CO-。

8. 发明申请

US20070123674A1 Chemical amplification type resist composition 失效
公开(公告)号：US20070123674A1
公开(公告)日：2007-05-31
申请号：US11643662
申请日：2006-12-22
申请人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
发明人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
IPC分类号： C08F28/02
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

9. 发明申请

US20070020479A1 Luminescent-polymer composition 审中-公开
标题翻译：发光聚合物组合物
公开(公告)号：US20070020479A1
公开(公告)日：2007-01-25
申请号：US10556463
申请日：2004-05-11
申请人： Yasunori Uetani , Akira Kamabuchi , Satoshi Kobayashi , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Akira Kamabuchi , Satoshi Kobayashi , Hirotoshi Nakanishi
IPC分类号： H01L51/54 , C09K11/06 , H05B33/14
CPC分类号： C07D213/22 , C07D213/24 , C07D219/02 , C07D401/14 , C07F5/027 , C07F15/04 , C09K11/06 , C09K2211/1425 , C09K2211/18 , H05B33/14
摘要： A light-emitting polymer composition comprising a light-emitting polymer and an ion pair, wherein the ion pair has a negative ion of a specific structure in which one group 13 atom and is bonding to an aryl group having an electron-withdrawing group, or a heterocyclic group having an electron-withdrawing group, directly or through a connecting group; or two or more group 13 atoms, and all the atoms are respectively bonding to an aryl group having an electron-withdrawing group, or a heterocyclic group having an electron-withdrawing group, directly or through a connecting group.
摘要翻译：一种发光聚合物组合物，其包含发光聚合物和离子对，其中所述离子对具有其中一个基团13原子并与具有吸电子基团的芳基键合的特定结构的负离子，或具有吸电子基团的杂环基，直接或通过连接基团; 或两个或更多个13族原子，并且所有原子分别直接或通过连接基团键合到具有吸电子基团的芳基或具有吸电子基团的杂环基。

10. 发明授权

US07135268B2 Amplification type positive resist composition 失效
标题翻译：放大型正光刻胶组合物
公开(公告)号：US07135268B2
公开(公告)日：2006-11-14
申请号：US10440201
申请日：2003-05-19
申请人： Akira Kamabuchi , Yasunori Uetani , Hiroshi Moriuma
发明人： Akira Kamabuchi , Yasunori Uetani , Hiroshi Moriuma
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/114 , Y10S430/115 , Y10S430/12
摘要： The present invention provides a sulfonate of the formula (I′): wherein Q1, Q2, Q3, Q4 and Q5 each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, or electron attractive group, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 represents alkyl having 3 to 16 carbon atoms or alkoxy having 3 to 16 carbon atoms, and at least one of Q1, Q2, Q3, Q4 and Q5 is electron attractive group; and A′+ represents a counter ion of the formula (IIa), (IIb), (IIc) or (IId) which are identified in the specification. The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) wherein A+ represents counter ion, and Q1, Q2, Q3, Q4 and Q5 are as defined above; and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（I'）的磺酸盐：其中Q 1，Q 2，Q 3，Q 4，各自独立地表示氢，具有1至16个碳原子的烷基，具有1至16个碳原子的烷氧基或吸电子基团，条件是Q < Q 1，Q 2，Q 3，Q 4和Q 5代表具有 3至16个碳原子或具有3至16个碳原子的烷氧基，以及Q 1，Q 2，Q 3，Q 3中的至少一个，Q 3 4+和Q 5是吸电子基团; 并且A'^{+ 表示在说明书中确定的式（IIa），（IIb），（IIc）或（IId）的抗衡离子。本发明还提供了一种化学扩增型正性抗蚀剂组合物，其包含式（I）的磺酸盐，其中A 0+表示抗衡离子，Q 1， 2，Q 3，Q 4和Q 5如上所定义; 以及含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。}

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