专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US4749867A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4749867A
公开(公告)日：1988-06-07
申请号：US856221
申请日：1986-04-28
申请人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G01B11/26
CPC分类号： G03F7/70691 , G03F7/70358
摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented. Also, any positional deviation which may be caused by the locking of the stage is compensated for, by controlling supply of air pressure to linear air-bearings supporting the carriage.
摘要翻译：一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。该装置包括：镜像成像光学系统，用于将图案的图像投影到板状构件上;滑架，用于在曝光时相对于镜像成像系统扫描地移动板状构件;以及可移动的台安装在滑架上，用于在不曝光时对板状构件进行步进供给，以便将板状构件的不同区域依次放置在镜像摄像系统下的曝光站。提供锁定系统以在曝光时通过使用真空来相对于托架锁定台架，由此防止了在扫描曝光时板状构件相对于托架的不期望的移动。此外，通过控制对支撑滑架的线性空气轴承的空气压力的供给来补偿可能由级的锁定引起的任何位置偏差。

2. 发明授权

US4748477A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4748477A
公开(公告)日：1988-05-31
申请号：US856222
申请日：1986-04-28
申请人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G03B27/42 , G03B27/53
CPC分类号： G03F7/70691
摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The exposure apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member. Also, the exposure apparatus includes a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging optical system and a stage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. The stage is mounted on the carriage, and the movement of the carriage is guided by linear air-bearings. The apparatus is arranged such that inclination of the carriage relative to the mirror imaging system to be caused by the movement of the stage is corrected by controlling the amount of air supply to the linear air-bearings, whereby occurrence of shift between the images to be transferred onto the plate-like member is prevented regardless of the change in position of the stage relative to the carriage. In another aspect, the amount of movement of the stage is corrected in accordance the amount of image shift which otherwise may be caused, whereby occurrence of such image shift is prevented.
摘要翻译：一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。曝光装置包括用于将图案的图像投影到板状构件上的镜像成像光学系统。此外，曝光装置还包括在曝光时相对于镜面成像光学系统在板状部件上进行扫描移动的台架，以及在不曝光时使板状部件逐步进给的台阶以将该板状构件的不同区域依次放置在镜像摄像系统下方的曝光站。台架安装在滑架上，滑架的运动由线性空气轴承引导。该装置被布置成使得通过控制对线性空气轴承的空气供应量来校正由台架的运动引起的托架相对于镜像成像系统的倾斜，由此在图像之间发生偏移不管台架相对于托架的位置的变化如何，都能够防止转印到板状构件上。在另一方面，根据否则可能引起的图像偏移量校正舞台的移动量，从而防止了这种图像偏移的发生。

3. 发明授权

US4864360A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4864360A
公开(公告)日：1989-09-05
申请号：US183317
申请日：1988-04-05
申请人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G02F1/13 , G02F1/1362 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70475 , G03F7/70691 , H01L21/30 , G02F2001/13625
摘要： An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.
摘要翻译：通过使用光掩模将与液晶显示装置的像素对应的图案和与驱动电路等对应的图案光刻地转印到板状构件上的装置。板状构件的表面被划分成不同的区域，并且每当片状构件的不同区域中的一个受到图案转印操作时，板状构件相对于所提供的光学系统逐步进给将光掩模的图像投影到板状构件上。同时，要转印到板状构件上的光掩模图案的范围被改变。由此，将图像元素图案的一部分和电路图案的一部分转印到板状构件上的各个不同区域中，由此形成大尺寸图案，形成大尺寸显示画面，形成用于控制画面的控制电路的图形被转印在板状构件上。

4. 发明授权

US4998134A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4998134A
公开(公告)日：1991-03-05
申请号：US383086
申请日：1989-07-21
申请人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G02F1/13 , G02F1/1362 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70475 , G03F7/70691 , H01L21/30 , G02F2001/13625
摘要： An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.

5. 发明授权

US4676630A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4676630A
公开(公告)日：1987-06-30
申请号：US854541
申请日：1986-04-22
申请人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus for exposing a plate-like member to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the plate-like member. The apparatus includes an X-Y stage for moving the plate-like member in X and Y directions, a .theta.-stage for moving the plate-like member in a .theta. (rotational) direction relative to the X-Y stage, and laser interferometers for measuring an amount of movement of the plate-like member, by the X-Y stage, in each of the X and Y directions by use of a mirror mounted on the .theta.-stage. Placement of the mirror on the .theta.-stage allows correction of yawing if it occurs during movement of the plate-like member by X-Y stage. Also, deviation of the plate-like member in the Y direction if it occurs during movement of the plate-like member by the X-Y stage in the X direction, is detected by the laser interferometers. This allows detection of a positional error of the mirror in the .theta. direction and allows correction of the .theta.-error by the .theta.-stage.
摘要翻译：一种用于以逐步重复的方式将板状构件暴露于具有辐射的图案的曝光装置，从而将图案的图像转印到板状构件的表面上的不同区域上。该装置包括用于在X和Y方向上移动板状构件的XY平台，用于相对于XY平台以θ（旋转）方向移动板状构件的θ级和用于测量量的激光干涉仪通过使用安装在θ级上的反射镜，通过XY台在X和Y方向中的每一个中移动板状构件。如果在X-Y平台上移动板状构件时发生偏转，则可以在θ级放置镜子。此外，通过激光干涉仪检测板状构件在X方向上通过X-Y台移动期间在Y方向上的偏移。这允许在θ方向上检测反射镜的位置误差，并且允许通过θ级校正θ-误差。

6. 发明授权

US4708465A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4708465A
公开(公告)日：1987-11-24
申请号：US19663
申请日：1987-02-27
申请人： Junji Isohata , Hironori Yamamoto , Koichi Matsushita
发明人： Junji Isohata , Hironori Yamamoto , Koichi Matsushita
IPC分类号： G03F9/00 , G01B11/26 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G03B27/42
CPC分类号： G03F7/70716
摘要： A position detecting device usable in an exposure apparatus for transferring an image of a first object onto a second object, for detecting the position of at least one of the first and second objects, includes a rotatable portion having a carrying portion for carrying thereon the at least one object, a first supporting member for supporting the rotatable portion, the first supporting member including a first driving system for moving the rotatable portion in a rotational direction, second supporting member for supporting the first supporting member, the second supporting member including a second driving system for moving the first supporting member in a rotational direction, and a displacement detecting system for detecting displacement of the first supporting member.
摘要翻译：一种可用于曝光装置的位置检测装置，用于将第一物体的图像转印到第二物体上，用于检测第一和第二物体中的至少一个的位置，包括可旋转部分，其具有用于在其上承载至少一个物体，用于支撑可旋转部分的第一支撑构件，第一支撑构件包括用于沿旋转方向移动可旋转部分的第一驱动系统，用于支撑第一支撑构件的第二支撑构件，第二支撑构件包括第二支撑构件驱动系统，用于沿旋转方向移动第一支撑构件;以及位移检测系统，用于检测第一支撑构件的位移。

7. 发明授权

US4422754A Projection-printing apparatus 失效
标题翻译：投影印刷设备
公开(公告)号：US4422754A
公开(公告)日：1983-12-27
申请号：US340843
申请日：1982-01-20
申请人： Junji Isohata , Hironori Yamamoto
发明人： Junji Isohata , Hironori Yamamoto
IPC分类号： G03B27/32 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03B27/52 , G03B27/70
CPC分类号： G03F7/70691 , G03F7/70358
摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.
摘要翻译：投影印刷装置相对于光学系统沿导向器精确地直线移动掩模和晶片中的至少一个，用于将掩模的图像投影到晶片上，并且在垂直于光学系统的光轴的平面中由此将掩模的图像印刷在晶片上。

8. 发明授权

US4370054A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4370054A
公开(公告)日：1983-01-25
申请号：US260387
申请日：1981-05-04
申请人： Junji Isohata , Hironori Yamamoto
发明人： Junji Isohata , Hironori Yamamoto
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70358
摘要： A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.
摘要翻译：一种投影曝光装置，其中掩模和晶片在垂直于投影光学系统的光轴的平面中移位，以在晶片的整个表面上形成电路图案。掩模和晶片沿着具有两个导轨的引导件移位，在其之间设置有用于补偿导轨之一的非线性的装置。

9. 发明授权

US4993696A Movable stage mechanism 失效
标题翻译：活动舞台机制
公开(公告)号：US4993696A
公开(公告)日：1991-02-19
申请号：US125566
申请日：1987-11-25
申请人： Motomu Furukawa , Makoto Higomura , Masaru Ohtsuka , Hironori Yamamoto , Shinkichi Ohkawa , Koichi Matsushita , Yasuo Kawai , Takao Kariya , Haruyuki Kusunoki , Toshihiko Yamaura
发明人： Motomu Furukawa , Makoto Higomura , Masaru Ohtsuka , Hironori Yamamoto , Shinkichi Ohkawa , Koichi Matsushita , Yasuo Kawai , Takao Kariya , Haruyuki Kusunoki , Toshihiko Yamaura
IPC分类号： G03F7/20
CPC分类号： G03F7/70766 , G03F7/70358 , G03F7/70716 , G03F7/70991
摘要： A stage device usable, e.g., in an X-ray exposure apparatus, for moving a semiconductor wafer placed in a vacuum ambience and held by a wafer chuck, is disclosed. In the stage device, the wafer chuck holds the wafer so that the surface of the wafer onto which a circuit pattern is to be transferred is placed in a vertical plane, and the wafer chuck is moved vertically and horizontally for step-and-repeat exposure of the wafer. The device includes a guide mechanism, locking mechanism and a constant-tension spring mechanism, to thereby ensure high-accuracy movement of the wafer chuck in the vertical direction as well as high-precision positioning of the wafer. Further, in the stage device, a drive source producing a drive to move the wafer chuck is disposed in a vacuum ambience while, on the other hand, the supply of operating fluids to air bearing assemblies, for guiding the movement of the wafer chuck, is achieved by use of metal pipes coupled by rotary joints. The wafer chuck is resiliently supported by one of the air bearing assemblies, such that the wafer chuck can be moved in the vacuum ambience very accurately and without difficulties.
摘要翻译：公开了一种用于移动放置在真空环境中并由晶片卡盘保持的半导体晶片的X射线曝光设备中的舞台装置。在平台装置中，晶片卡盘保持晶片，使得将要传输电路图案的晶片的表面放置在垂直平面中，并且晶片卡盘垂直和水平移动以进行步进和重复曝光的晶片。该装置包括引导机构，锁定机构和恒定张力弹簧机构，从而确保晶片卡盘在垂直方向上的高精度移动以及晶片的高精度定位。此外，在平台装置中，在真空环境中设置产生移动晶片卡盘的驱动器的驱动源，而另一方面，向空气轴承组件供应工作流体，用于引导晶片卡盘的运动，通过使用通过旋转接头联接的金属管实现。晶片卡盘由空气轴承组件中的一个弹性地支撑，使得晶片卡盘可以非常准确且无困难地在真空环境中移动。

10. 发明授权

US08998734B2 Thread forming tap 有权
标题翻译：螺纹成型龙头
公开(公告)号：US08998734B2
公开(公告)日：2015-04-07
申请号：US13379535
申请日：2009-07-07
申请人： Kentaroh Norimatsu , Takayuki Matsushita , Hironori Yamamoto
发明人： Kentaroh Norimatsu , Takayuki Matsushita , Hironori Yamamoto
IPC分类号： B23G7/02
CPC分类号： B23G7/02 , Y10T408/89
摘要： A thread forming tap has a full thread portion and a leading portion contiguous with the full thread portion and reducing in diameter toward its tip. The full thread and leading portions are provided with external thread on which lobes and recesses are alternately formed. When δ represents an angle around a tool center line toward a thread forming side, the shape of the lobe varies along a quadratic curve relative to angle δ so that relief amount increases toward inflection point angle δ. However, in a rough plastic deformation section where angle δ is greater than inflection point angle θ and exceeds the working region, the shape varies along an Archimedean curve with clearance angle α1 so that the relief amount increases linearly relative to angle δ, and a margin section is substantially zero or within a range where angle δ is less than or equal to 1°.
摘要翻译：螺纹成型丝锥具有全螺纹部分和与全螺纹部分相邻的引导部分，并且朝向其末端减小直径。全螺纹和引导部分设置有外螺纹，其上交替地形成有凸角和凹槽。当δ表示围绕工具中心线朝向螺纹形成侧的角度时，凸角的形状沿着相对于角度δ的二次曲线变化，使得释放量朝向拐点角度δ增加。然而，在角度δ大于拐点角度的粗糙塑性变形部分中; 并且超过工作区域，形状沿着具有间隙角α1的阿基米德曲线变化，使得释放量相对于角度δ线性增加，并且边缘部分基本上为零或在角度δ小于或等于1的范围内 °。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式