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1. 发明授权

US5150152A Exposure apparatus including device for determining movement of an object 失效
标题翻译：曝光装置包括用于确定物体的移动的装置
公开(公告)号：US5150152A
公开(公告)日：1992-09-22
申请号：US755619
申请日：1991-09-05
申请人： Junji Isohata , Shinji Tsutsui
发明人： Junji Isohata , Shinji Tsutsui
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70358 , G03F7/70775
摘要： An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, a .theta. stage for moving the wafer in a rotational direction relative to the XY stage, laser interferometers for measuring an amount of movement of the wafer by the XY stage, in each of the X- and Y-directions, by use of a mirror member mounted on the .theta. stage, and a carriage for carrying the XY and .theta. stages and a portion of the interferometers to move the wafer relative to an exposing system for effecting the scan-exposure on the region of the wafer. The mirror member is placed on the .theta. stage, and another portion of the interferometers is mounted on a fixed system independent of the carriage. The inclination of the mirror member is detected at any desired time by moving the carriage and calculating the inclination from the amount of movement of the carriage and the amount of displacement of the mirror member measured by the interferometer mounted on the fixed system. Based on the thus detected inclination of the mirror member, the inclination is corrected and the stepwise movement of the XY stage can be performed with a higher accuracy, so that the transfer accuracy between the pattern images printed on the wafer in the case of the step-and-repeat exposure can be highly improved.
摘要翻译：一种用于以曝光部件或晶片以逐步重复的方式将辐射曝光到图案的曝光装置，从而将图案的图像转印到曝光部件的表面上的不同区域上。该装置包括用于在X方向和Y方向上移动晶片的XY平台，用于相对于XY平台沿旋转方向移动晶片的θ级，激光干涉仪，用于通过XY平台测量晶片的移动量在X和Y方向中的每一个中，通过使用安装在θ台上的反射镜部件和用于承载XY和θ级和一部分干涉仪的滑架相对于曝光系统移动晶片在晶片的区域上进行扫描曝光。镜构件放置在θ台上，另一部分干涉仪安装在独立于托架的固定系统上。通过移动滑架并根据滑架的移动量计算倾斜度和通过安装在固定系统上的干涉仪测量的反射镜部件的位移量来检测反射镜部件的倾斜度。基于这样检测到的镜构件的倾斜度，校正倾斜度，并且可以以更高的精度执行XY平台的逐步移动，从而在步骤的情况下打印在晶片上的图案图像之间的转印精度重复曝光可以大大提高。

2. 发明授权

US4561688A Method of and apparatus for adsorbingly fixing a body 失效
标题翻译：用于吸附固定身体的方法和装置
公开(公告)号：US4561688A
公开(公告)日：1985-12-31
申请号：US727206
申请日：1985-04-29
申请人： Shinji Tsutsui
发明人： Shinji Tsutsui
IPC分类号： H01L21/30 , B66C1/02 , G03F7/20 , H01L21/027 , H01L21/683
CPC分类号： G03F7/707 , B66C1/0256 , G03F7/70875 , Y10T279/11
摘要： A method of and an apparatus for adsorbingly fixing a body, such as a photomask (mask) or a wafer to a chuck, effect a preliminary vacuum-adsorbing step of preventing the creation of internal stress due to the temperature change between the body and the chuck before the final vacuum adsorption is effected, or effect a preliminary vacuum releasing step for relieving the created internal stress.
摘要翻译：用于将诸如光掩模（掩模）或晶片等的身体吸附固定到卡盘的方法和装置进行初步真空吸附步骤，以防止由于身体与体内的温度变化而产生内部应力在进行最终真空吸附之前进行卡盘，或者实现初步真空释放步骤，以缓解所产生的内部应力。

3. 发明申请

US20050206867A1 Scanning exposure apparatus and method 审中-公开
标题翻译：扫描曝光装置和方法
公开(公告)号：US20050206867A1
公开(公告)日：2005-09-22
申请号：US11131175
申请日：2005-05-18
申请人： Tohru Kohda , Shinji Tsutsui
发明人： Tohru Kohda , Shinji Tsutsui
IPC分类号： G02F1/13 , G03F1/44 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70641 , G03F7/70358 , G03F7/70783 , G03F9/7011 , G03F9/7034
摘要： A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral support.
摘要翻译：扫描曝光装置包括用于使用弧形照明光照射掩模上的图案的照明光学系统，用于将由照明光学系统照射的掩模上的图案投影到板上的投影光学系统，用于扫描掩模，用于扫描板的印版台，扫描曝光装置相对于投影光学系统同步地扫描掩模台和印版台，用于支撑掩模的周边的掩模支撑机构和用于布置在由投影光学系统的物体表面侧焦平面中的弧形照明光照射的区域中的图案，其中所述掩模由于其自身的重量而从外围支撑件变形。

4. 发明授权

US06947122B2 Scanning exposure apparatus and method 失效
标题翻译：扫描曝光装置和方法
公开(公告)号：US06947122B2
公开(公告)日：2005-09-20
申请号：US10601553
申请日：2003-06-24
申请人： Tohru Kohda , Shinji Tsutsui
发明人： Tohru Kohda , Shinji Tsutsui
IPC分类号： G02F1/13 , G03F1/44 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/52 , G03B27/58 , G03B27/62 , G03B27/68
CPC分类号： G03F7/70641 , G03F7/70358 , G03F7/70783 , G03F9/7011 , G03F9/7034
摘要： A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.
摘要翻译：扫描曝光装置包括用于使用弧形照明光照射掩模上的图案的照明光学系统，用于将由照明光学系统照射的掩模上的图案投影到板上的投影光学系统，用于扫描掩模，用于扫描板的印版台，扫描曝光装置相对于投影光学系统同步地扫描掩模台和印版台，用于支撑掩模的周边的掩模支撑机构和用于布置在由投影光学系统的物体表面侧焦平面中的弧形照明光照射的区域中的图案，其中，所述掩模由于所支撑的外围的自身重量而变形。

5. 发明授权

US06491652B1 Massage device with flexible support straps 有权
标题翻译：具有柔性支撑带的按摩装置
公开(公告)号：US06491652B1
公开(公告)日：2002-12-10
申请号：US09472208
申请日：1999-12-27
申请人： Hitoshi Hata , Shigeru Dono , Yukihiko Kitano , Masamichi Miyaguchi , Shinji Tsutsui , Yuichi Nishibori , Toshiaki Nanno
发明人： Hitoshi Hata , Shigeru Dono , Yukihiko Kitano , Masamichi Miyaguchi , Shinji Tsutsui , Yuichi Nishibori , Toshiaki Nanno
IPC分类号： A61H1900
CPC分类号： A61H9/0078 , A61H2201/0134 , A61H2201/0149 , A61H2201/1635 , A61H2201/164 , A61H2205/10
摘要： A massage device capable of applying favorable pressure stimulation owing to expansion and shrinking of air bags irrespective of thickness of portions to be massaged such as legs or arms. The massage device has supporting bodies, strap bodies made of pliable material that are attached to the supporting bodies at their ends to form U-shaped sections, air bags provided at inner surfaces of strap bodies for receiving portions of a human body such as legs or arms to be massaged, and an air supply means for expanding and shrinking of the air bags. Upon locating portions to be massaged on the strap bodies, the strap bodies assume shapes that fit along the shapes of the portions of the body to be massaged to thus support the portions to be massaged on the strap bodies. Pressuring stimulation can then be applied to the portions to be massaged by making the air bags perform expansion and shrinking.
摘要翻译：一种能够由于气囊的膨胀和收缩而施加有利的压力刺激而不管诸如腿或手臂的按摩部分的厚度如何的按摩装置。按摩装置具有支撑体，由柔韧材料制成的带体，其端部附接到支撑体以形成U形部分，设置在带体的内表面处的气袋用于容纳人体的腿部或部分的部分要按摩的手臂和用于使气袋膨胀和收缩的空气供应装置。在将要按摩的部分定位在条带主体上时，条带体呈沿着待按摩身体部分的形状配合的形状，从而支撑待贴在皮带主体上的部分。然后可以通过使气囊膨胀和收缩来对按摩部分施加压力刺激。

6. 发明申请

US20100210979A1 CHAIR TYPE MASSAGE MACHINE 审中-公开
标题翻译：椅子类型按摩机
公开(公告)号：US20100210979A1
公开(公告)日：2010-08-19
申请号：US12679561
申请日：2008-09-17
申请人： Shinji Tsutsui , Koji Terada , Keisuke Shimizu
发明人： Shinji Tsutsui , Koji Terada , Keisuke Shimizu
IPC分类号： A61H1/00 , A44B18/00
CPC分类号： A47C7/425 , A61H7/002 , A61H2201/0149 , A61H2201/1654 , A61H2201/1669 , A61H2205/081 , Y10T24/27
摘要： A chair type massage machine that enables a massager to effectively perform massages, ensures safety, reduces costs, and allows for easy attachment and removal of a cushion to and from a backrest. The massage machine includes a massage unit (5) that may be raised and lowered in a backrest (2). The massage unit (5) includes a massager (7) projecting toward the front from the backrest (2). A cushion (4) is formed to be generally U-shaped and arranged on a front surface of the backrest (2). The cushion (4) includes an opening (8) in which is arranged the massager (7), which is lowered and raised with the massage unit (5). The massager (7) is movable in the opening (8) of the cushion (4). A fastening means fastens the cushion (4) to the front surface of the backrest (2). The fastening includes hook-and-loop fasteners (10, 11) that are separated by application of downward external force of a certain amount or more to a lower rim of the opening (8) in the cushion (4).
摘要翻译：一种椅子式按摩机，使按摩器能够有效地进行按摩，确保安全性，降低成本，并且允许容易地将靠背靠背和靠背靠背移除。按摩机包括可在靠背（2）中升高和降低的按摩单元（5）。按摩单元（5）包括从靠背（2）向前突出的按摩器（7）。衬垫（4）形成为大致U形并且设置在靠背（2）的前表面上。衬垫（4）包括一个开口（8），其中按摩器（7）布置在所述按摩器（7）中，所述按摩器（7）由所述按摩单元（5）下降并升高。按摩器（7）可在垫（4）的开口（8）中移动。紧固装置将坐垫（4）紧固到靠背（2）的前表面。紧固件包括通过施加一定量或更多的向下的外力而在衬垫（4）中的开口（8）的下边缘分开的钩环紧固件（10,11）。

7. 发明授权

US07241271B2 Massage machine 失效
标题翻译：按摩机
公开(公告)号：US07241271B2
公开(公告)日：2007-07-10
申请号：US11084141
申请日：2005-03-21
申请人： Yousuke Kurata , Yuki Yoda , Shinji Tsutsui , Masamichi Miyaguchi , Takeo Iijima , Daisuke Tsukada , Takayoshi Tanizawa , Junji Nakamura , Motoharu Muto
发明人： Yousuke Kurata , Yuki Yoda , Shinji Tsutsui , Masamichi Miyaguchi , Takeo Iijima , Daisuke Tsukada , Takayoshi Tanizawa , Junji Nakamura , Motoharu Muto
IPC分类号： A61H1/02
CPC分类号： A61H1/0266 , A61H2201/0134 , A61H2201/0142 , A61H2201/0149 , A61H2201/1609 , A61H2201/1614 , A61H2201/1623 , A61H2201/164 , A61H2201/5007
摘要： This massage machine comprises a seat 20, a leg-rest 50, a footrest 60, an electric extendable mechanism 80, a link mechanism 70, and a controller. The footrest is movably linked to a lower end of the leg-rest to be movable relative to the leg-rest, and is provided with air bags 63 configured to restrain a foot of the user. The electric extendable mechanism and the link mechanism are configured to move the footrest relative to the leg-rest. The controller gives the user a leg stretching mode, and in the leg stretching mode, the controller controls the electric extendable mechanism and the air bags such that the electric extendable mechanism moves the footrest relative to the leg-rest while the air bags restrains the foot of the user.
摘要翻译：该按摩机包括座椅20，脚凳50，搁脚板60，电动伸缩机构80，连杆机构70和控制器。搁脚板可移动地连接到腿部的下端以相对于腿部支架可移动，并且设置有被配置为限制使用者的脚部的气囊63。电动可伸缩机构和连杆机构构造成相对于腿部支架移动搁脚板。控制器为用户提供腿部拉伸模式，并且在腿部拉伸模式中，控制器控制电动伸缩机构和气囊，使得电动伸缩机构相对于腿部支架移动脚踏板，同时气囊限制脚部的用户。

8. 发明授权

US5993081A In-line processing system 失效
标题翻译：在线处理系统
公开(公告)号：US5993081A
公开(公告)日：1999-11-30
申请号：US732718
申请日：1996-10-18
申请人： Hiroyuki Itoh , Shinji Tsutsui , Masahide Sato
发明人： Hiroyuki Itoh , Shinji Tsutsui , Masahide Sato
IPC分类号： B65G49/07 , G03F7/20 , H01L21/677 , G03D5/00 , B65G25/00
CPC分类号： H01L21/67748 , G03F7/7075 , G03F7/70991 , H01L21/67745 , H01L21/67778 , Y10S414/137 , Y10S414/138
摘要： An in-line processing system having an exposure processing unit and a coating and development processing unit is provided with a conveyance arm for transferring a workpiece between these units. The conveyance arm can access to each of these units, and these units have horizontal workpiece holding planes of substantially the same level. The workpiece can be conveyed between these units while being kept laid horizontally.
摘要翻译：具有曝光处理单元和涂布显影处理单元的在线处理系统设置有用于在这些单元之间传送工件的输送臂。输送臂可以接近这些单元中的每一个，并且这些单元具有基本上相同水平的水平工件保持平面。工件可以在这些单元之间传送并保持水平放置。

9. 发明授权

US08035668B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08035668B2
公开(公告)日：2011-10-11
申请号：US11336754
申请日：2006-01-19
申请人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
发明人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
IPC分类号： G03G13/04
CPC分类号： G03F7/70275
摘要： An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.
摘要翻译：在物体上形成图案的曝光装置。该装置包括其中排列多个元素曝光单元的曝光头结构，每个元素曝光单元包括：（i）至少一个用于发射曝光光的光源;以及（ii）至少形成至少一个图像的光学元件对象上的一个光源，用于暴露对象。至少一个光源的图像在垂直于物体表面的方向上的位置包括彼此不同的多个位置。传感器检测物体表面的位置并产生检测结果。控制器接收检测结果并控制曝光头结构，使得通过曝光在物体上形成图案被选择以基于传感器的检测结果来曝光物体。

10. 发明授权

US07789466B2 Chair-type massage machine 失效
标题翻译：椅式按摩机
公开(公告)号：US07789466B2
公开(公告)日：2010-09-07
申请号：US11984910
申请日：2007-11-26
申请人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
发明人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
IPC分类号： A47C7/50
CPC分类号： A47C1/034
摘要： A chair-type massage machine includes a seat on which a user sits; a leg rest whose one end portion is pivotally connected with a front portion of the seat for pivotal movement up and down, the leg rest supporting calves of the user; a driving unit for pivotally moving the leg rest with respect to the seat; a footrest pivotally connected with the other end portion of the leg rest for pivotal movement up and down, the footrest supporting feet of the user; and a massage means provided to at least one of the leg rest and the footrest. Also, a stopper unit is provided for restricting a pivotal movement range of the footrest with respect to the leg rest, and a biasing unit is disposed for applying a biasing force to the footrest in either an upward or downward a direction of the pivotal movement.
摘要翻译：椅式按摩机包括用户所在的座位; 腿部支撑部，其一端部与座椅的前部可枢转地连接，用于上下枢转运动;腿部支撑用户的小腿; 驱动单元，用于相对于座椅枢转地移动腿托; 与所述腿部支架的另一端部枢转地连接的脚踏板，用于上下摆动地移动，所述脚踏支撑脚的使用者; 以及提供给至少一个腿托和脚踏板的按摩装置。另外，设置有用于限制脚踏板相对于脚托的枢转运动范围的止动单元，并且设置有偏置单元，用于在枢转运动的向上或向下的方向上向搁脚板施加偏置力。

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