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    • 3. 发明授权
    • RF plasma method
    • 射频等离子体法
    • US06270687B1
    • 2001-08-07
    • US09564042
    • 2000-04-27
    • Yan YeDonald OlgadoAvi TepmanDiana MaGerald Zheyao YinPeter LoewenhardtJeng HwangSteve S. Y. Mak
    • Yan YeDonald OlgadoAvi TepmanDiana MaGerald Zheyao YinPeter LoewenhardtJeng HwangSteve S. Y. Mak
    • B44C122
    • H01J37/32477H01J37/321
    • An RF plasma etch reactor having an etch chamber with electrically conductive walls and a protective layer forming the portion of the walls facing the interior of the chamber. The protective layer prevents sputtering of material from the chamber walls by a plasma formed within the chamber. The etch reactor also has an inductive coil antenna disposed within the etch chamber which is used to generate the plasma by inductive coupling. Like the chamber walls, the inductive coil antenna is constructed to prevent sputtering of the material making up the antenna by the plasma. The coil antenna can take on any configuration (e.g. location, shape, orientation) that is necessary to achieve a desired power deposition pattern within the chamber. Examples of potential coil antenna configurations for achieving the desired power deposition pattern include constructing the coil antenna with a unitary or a segmented structure. The segmented structure involves the use of at least two coil segments wherein each segment is electrically isolated from the other segments and connected to a separate RF power signal. The unitary coil antenna or each of the coil segments can have a planar shape, a cylindrical shape, a truncated conical shape, a dome shape, or any combination thereof. The conductive walls are electrically grounded to serve as an electrical ground (i.e. anode) for a workpiece-supporting pedestal which is connected to a source of RF power to create a bias voltage at the surface of the workpiece.
    • RF等离子体蚀刻反应器具有具有导电壁的蚀刻室和形成面向腔室内部的部分壁的保护层。 保护层防止在室内形成的等离子体从室壁溅射材料。 蚀刻反应器还具有设置在蚀刻室内的感应线圈天线,其用于通过感应耦合产生等离子体。 类似于室壁,感应线圈天线被构造成防止由等离子体溅射构成天线的材料。 线圈天线​​可以承受在室内实现期望的功率沉积图案所必需的任何配置(例如位置,形状,取向)。 用于实现期望的功率沉积模式的电位线圈天线配置的示例包括以整体或分段结构构造线圈天线。 分段结构涉及使用至少两个线圈段,其中每个段与其它段电隔离并连接到单独的RF功率信号。 单线圈天线或每个线圈段可以具有平面形状,圆柱形,截顶圆锥形,圆顶形或其任何组合。 导电壁电接地以用作工件支撑基座的电接地(即阳极),工件支撑基座连接到RF功率源,以在工件的表面产生偏置电压。
    • 9. 发明授权
    • Power supplying device for flashes
    • 供电装置闪光
    • US06289179B1
    • 2001-09-11
    • US09201706
    • 1998-12-01
    • Jeng-Hwang You
    • Jeng-Hwang You
    • G03B726
    • H01M2/204G03B7/26H01M6/42
    • A power supplying device for flashes includes a base having a bottom formed with two opposite grooves, a threaded hole vertically extending therethrough, and two threaded holes, at least a rechargeable battery having a top provided with two conducting terminals and a protuberance, an extension cord provided at one end with a plug engageable with a power socket of the battery and at another end with a socket, and a power cord having an end provided with a plug engageable with the socket of the extension cord and another end provided with a positive and negative wires each provided with a metal conductor. One of the wires has a buzzer. A circuit protecting switch and a metal conductor are fitted within a cylinder with the metal conductor partially projected out of an end of the cylinder. Another one of the wires is provided at an end with a metal conductor which is fitted within another cylinder and partially extends out of the cylinder. Hence, the power supplying device can be easily mounted on the camera platform of a camera for supplying power to the flash of the camera.
    • 用于闪光的供电装置包括底部,底部形成有两个相对的凹槽,垂直延伸穿过其中的螺纹孔和两个螺纹孔,至少一个可再充电电池,其顶部设置有两个导电端子和突起,延伸线 在一端具有可与电池的电源插座接合的插头,在另一端设有插座,电源线具有端部,该端部设置有可与延长线的插座接合的插头,另一端具有阳极和 每根带有金属导线的负极线。 其中一根电线有一个蜂鸣器。 电路保护开关和金属导体装配在气缸内,金属导体部分地突出到气缸的端部之外。 另一条电线在一端设置有金属导体,金属导体安装在另一个气缸内并部分地延伸出气缸。 因此,供电装置可以容易地安装在相机的相机平台上,以向相机的闪光灯供电。